CN206947318U - A kind of wafer carrying platform - Google Patents
A kind of wafer carrying platform Download PDFInfo
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- CN206947318U CN206947318U CN201720670153.6U CN201720670153U CN206947318U CN 206947318 U CN206947318 U CN 206947318U CN 201720670153 U CN201720670153 U CN 201720670153U CN 206947318 U CN206947318 U CN 206947318U
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- wafer
- carrying platform
- wafer carrying
- wafers
- slot
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Abstract
A kind of wafer carrying platform, including rotary shaft；A wafer carrying platform is fixed with the rotary shaft；The wafer carrying platform is provided with 8 annular opening wafer slots；The square arrangement of 8 annulars opening wafer slot, two-by-two on one side, wafer slot opening direction is vertical with one side where it outside；The wafer slot is provided inwardly with least two block machine ranks, to place various sizes of wafer；Wafer carrying platform described in the utility model, 8 wafers can once be placed, 2 wafers can be provided and synchronize processing, and plummer can be rotated after 2 wafers process, machining position is moved out, performs next process, and 2 wafers to be processed are rotated to machining position simultaneously and synchronize processing, wafer carrying platform described in the utility model saves the waiting process in wafer fabrication processes, greatly accelerates processing efficiency.
Description
Technical field
It the utility model is related to the crystalline substance in integrated circuit processing technical field, more particularly to integrated circuit processing processing procedure
Circle transmission bogey.
Background technology
Development of the integrated circuit technique to modern society's science and technology is particularly significant, all kinds of electronic goods, collection inside it be present
Into circuit unit.Among integrated circuit industry with keen competition, the yield and yield of integrated circuit package, are manufacturing enterprises
Base oneself upon the essential condition with development.
Wafer is the basic semi-finished product of contemporary integrated circuits, and the fine or not speed of the working process of wafer is also to influence integrated electricity
One of important factor is developed on road.
, it is necessary to using relevant device in the process of wafer, wafer is processed, for example, being carried out to it
The flow such as photoetching, ion implanting, mechanical grinding device, photoetching and automatic double surface gluer or Wafer Cleaning equipment.In the prior art,
It is that wafer can only be placed in wafer carrying platform mostly, after the completion for the treatment of this wafer working process, uses mechanical arm etc.
Device is first removed, and then moves into untreated wafer again.Such a process moving process lose time it is more, and when moving at
Reason process can only be suspended, therefore whole work efficiency is low.Therefore, spy of the present invention devises a kind of wafer carrying platform, can be once
Transmit 2 wafers and synchronize processing, and process will not be suspended because mechanical arm shifts wafer.
The content of the invention
The purpose of this utility model is to provide a kind of wafer carrying platform, can once transmit 2 wafers and synchronize processing, and
And process will not be suspended because mechanical arm shifts wafer, save the waiting process in wafer fabrication processes, significantly
Accelerate processing efficiency.
To achieve the above object, technical scheme provided by the utility model is：A kind of wafer carrying platform, including rotation
Axle；A wafer carrying platform is fixed with the rotary shaft；The wafer carrying platform is provided with 8 annular opening wafer slots；
The square arrangement of 8 annulars opening wafer slot, two-by-two on one side, wafer slot opening direction is vertical with one side where it
Outwards；The wafer slot is provided inwardly with least two block machine ranks, to place various sizes of wafer；Wafer carrying of the present invention
Platform, it can once place 8 wafers, it is possible to provide 2 wafers synchronize processing, and rotation can be held after 2 wafers process
Microscope carrier, machining position is moved out, performs next process, and 2 wafers to be processed are rotated to machining position simultaneously and carried out together
Step processing.
Further, described a kind of wafer carrying platform, applied to ion implantation device, mechanical grinding device, photoetching with
Automatic double surface gluer or Wafer Cleaning equipment.
Compared to existing wafer carrying platform, the beneficial effects of the utility model are：Wafer carrying platform of the present invention,
Improve in the prior art, be that wafer can only be placed in wafer carrying platform mostly, treat that this wafer working process is complete
Cheng Hou, first removed using devices such as mechanical arms, then move into the mode of untreated wafer again.Crystalline substance of the present invention
Circle plummer can once place 8 wafers, it is possible to provide 2 wafers synchronize processing, and can be revolved after 2 wafers process
Vicarious microscope carrier, is moved out machining position, performs next process, and rotate to machining position by 2 wafers to be processed simultaneously
Row synchronous processing, wafer carrying platform of the present invention save the waiting process in wafer fabrication processes, greatly accelerate and add
Work efficiency rate.
Brief description of the drawings
Fig. 1 is a kind of wafer carrying platform schematic diagram；
Fig. 2 is a kind of wafer carrying platform diagrammatic cross-section；
1. rotary shaft；2. plummer；3. wafer slot；4. wafer slot first step；5. wafer slot second step.
Embodiment
The utility model is described further with reference to the accompanying drawings and examples.
The utility model preferred embodiment is：Referring to accompanying drawing 1, accompanying drawing 2.A kind of wafer carrying platform of this example, including rotation
Axle 1, rotary shaft 1 are fixed in ion implantation device, mechanical grinding device, photoetching and automatic double surface gluer or Wafer Cleaning equipment；
A wafer carrying platform 2 is fixed with the rotary shaft 1, by controlling the rotation of rotating shaft 1, drives wafer carrying platform 2
Rotate, to shift wafer；The wafer carrying platform 2 is provided with 8 annular opening wafer slots 3, the wafer slot 3 be it is hollow and
Opening, in annular；8 annular openings wafer slot, the 3 square arrangement, two-by-two on one side, the opening direction of wafer slot 3
It is vertical with one side where it outside, it is easy to mechanical arm crawl transfer wafer, and the A/F of the wafer slot 3 is less than wafer
The diameter of groove 3, more than the width of mechanical arm end effector；
The wafer slot 3 is provided inwardly with comprising at least wafer slot first step 4, two block machine ranks of wafer slot second step 5,
To place various sizes of wafer；
Wafer carrying platform of the present invention, it can once place 8 wafers, it is possible to provide 2 wafers synchronize processing, and
Plummer can be rotated after 2 wafers process, machining position is moved out, performs next process, and it is simultaneously to be added by 2
The wafer of work, which is rotated to machining position, synchronizes processing.
Example described above is only the preferred embodiments of the utility model, not limits implementation model of the present utility model with this
Enclose.Therefore any modifications, equivalent substitutions and improvements done in the spirit and principle of above-mentioned embodiment etc., it should be included in this
In the protection domain of utility model.
Claims (2)
1. a kind of wafer carrying platform, it is characterized in that：Including rotary shaft；A wafer carrying platform is fixed with the rotary shaft；Institute
State wafer carrying platform and be provided with 8 annular opening wafer slots；The square arrangement of 8 annulars opening wafer slot, two
Two on one side, and wafer slot opening direction is vertical with one side where it outside；The wafer slot is provided inwardly with least two block machine ranks, with
Place various sizes of wafer.
2. a kind of wafer carrying platform according to claim 1, it is characterized in that：A kind of described wafer carrying platform, is applied to
Ion implantation device, mechanical grinding device, photoetching and automatic double surface gluer or Wafer Cleaning equipment.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201720670153.6U CN206947318U (en) | 2017-06-10 | 2017-06-10 | A kind of wafer carrying platform |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201720670153.6U CN206947318U (en) | 2017-06-10 | 2017-06-10 | A kind of wafer carrying platform |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN206947318U true CN206947318U (en) | 2018-01-30 |
Family
ID=61363922
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201720670153.6U Active CN206947318U (en) | 2017-06-10 | 2017-06-10 | A kind of wafer carrying platform |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN206947318U (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN114743912A (en) * | 2022-04-22 | 2022-07-12 | 南京中安半导体设备有限责任公司 | Wafer loading device and wafer detection equipment |
-
2017
- 2017-06-10 CN CN201720670153.6U patent/CN206947318U/en active Active
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN114743912A (en) * | 2022-04-22 | 2022-07-12 | 南京中安半导体设备有限责任公司 | Wafer loading device and wafer detection equipment |
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