CN206812540U - A kind of compound transparent electricity conductive film - Google Patents

A kind of compound transparent electricity conductive film Download PDF

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Publication number
CN206812540U
CN206812540U CN201720589137.4U CN201720589137U CN206812540U CN 206812540 U CN206812540 U CN 206812540U CN 201720589137 U CN201720589137 U CN 201720589137U CN 206812540 U CN206812540 U CN 206812540U
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China
Prior art keywords
transparent
oxide
conductive film
compound
electricity conductive
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CN201720589137.4U
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Chinese (zh)
Inventor
刘钧
米赛
裴世铀
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Anhui Weidi Intelligent Glass Co ltd
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Hefei Weidi Color Glass Co Ltd
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Abstract

The utility model provides a kind of compound transparent electricity conductive film, including substrate, ion barrier, transparent metal layer and the including transparent conducting oxide layer being sequentially stacked.The utility model can reduce the sheet resistance of transparent conductive oxide, can reduce thickness again and improve light transmittance, and have certain heat-proof quality, there is good application prospect and commercial value.

Description

A kind of compound transparent electricity conductive film
Technical field
It the utility model is related to glass technology field, and in particular to a kind of compound transparent electricity conductive film, can be applied to film The fields such as solar energy, electrochromic intelligent glass, display panel.
Background technology
, such as ito glass, AZO glass and FTO, film all be present in conventional metal conductive oxide film in the market The problem of thicker, sheet resistance is smaller, but light transmittance can significantly reduce, and common metal conductive oxide film is without heat-insulated Performance.
Transparent conductive oxide (TCO) glass, i.e. transparent conductive oxide coated glass, are passed through in surface of plate glass The method of physics or plated film uniformly plates the conductive oxide film of layer of transparent, mainly including In, Sn, Zn and Cd Oxide and its composite multi-component oxide film material.TCO is not only conductive, while has visible light transmission.
TCO glass is mainly used in the building such as flat-panel monitor, Low emissivity (LOW-E) glass and electrochromic intelligent glass Field.Compared with other kinds of conductive film, oxidic transparent conducting film not only good conductivity, but also have glass-like There is the high transparency, so, it can be regarded as a kind of quite varied feature functionality film of purposes.Main application is:Display Electrode material, touch-screen electrode for capacitors, electrode of solar battery, thin film resistor, electrochromic conducting film in device Electrode etc..
The transparent conductive oxide of technology production at present is mostly to be splashed to metal oxide using magnetron sputtering method Glass surface forms transparent conductive film.Current this technology faces problems with:If film conductivity is improved, it is necessary to increase Blooming is thick, as a result film light transmittance can be caused to significantly reduce;Whereas to improving film transmission rate, thickness is reduced, but again can Film conductivity is caused to reduce.
Utility model content
In order to solve the above technical problems, the utility model provides a kind of compound transparent electricity conductive film, can overcome well The contradictory problems of low square resistance and high transmittance, concrete technical scheme are as follows:
A kind of compound transparent electricity conductive film, including the substrate, ion barrier, the transparent conductive oxide that are sequentially stacked buffer Layer, transparent metal layer and including transparent conducting oxide layer, are additionally provided with electrically conducting transparent between ion barrier and transparent metal layer Oxide buffer layer, it uses zinc oxide, tin oxide, Al-Doped ZnO, tin indium oxide or fluorine doped tin oxide as material.
Preferably, the substrate uses glass substrate or transparent polymer flexible base board.
Preferably, the material of the ion barrier is using the oxide of silicon, the oxide of aluminium, titanyl compound, titanium The nitride of nitride or silicon.
Preferably, the composition of the transparent metal layer uses gold, silver, copper or alloy.
Preferably, the film thickness of the transparent metal layer is between 1~30 nanometer.
From above technical scheme, the utility model can reduce the sheet resistance of transparent conductive oxide, can reduce again Thickness improves light transmittance, and metal nanometer thin film has the heat-proof quality of certain reflection infrared ray, before having good application Scape and commercial value.
Brief description of the drawings
Fig. 1 is layer structure schematic diagram of the present utility model;
Fig. 2 is layer structure schematic diagram of the present utility model, adds layer of transparent conductive oxide cushion.
Embodiment
Below in conjunction with the drawings and specific embodiments, the utility model is described in detail, it is new describing this practicality in detail Before the technical scheme of each embodiment of type, involved noun and term are explained, in this manual, title is identical Or label identical part represents similar or identical structure, and it is only limitted to the purpose of signal.
As shown in figure 1, the utility model provides a kind of low-resistance transparent conductive film of high transmission rate, it includes substrate 1 And it is sequentially formed in the ion barrier 2 on the substrate, very thin nano level transparent metal layer 3 and transparent conductive oxide Layer 4.The ion barrier close to the substrate, transparent metal layer between ion barrier and including transparent conducting oxide layer, Including transparent conducting oxide layer is in outermost layer, and above film layer is deposited by magnetron sputtering method and prepared.
The 1 preferred glass substrate of substrate but it is not limited to glass or transparent polymer substrate.
The ion barrier 2 can be formed by the nitride of the oxide of silicon, titanyl compound or silicon, e.g. by two Silica (SiO2), alundum (Al2O3) (Al2O3), titanium dioxide (TiO2) or silicon nitride (Si3N4) are formed;Preferably, it is Silica, thickness are 10~30nm.
The transparent metal layer 4 can be the metal or alloy with good conductivity such as gold, silver, copper, thickness is 5~ 50nm, it is preferable that be silver layer, thickness is 5~15nm.
The including transparent conducting oxide layer 4 can by zinc oxide, tin oxide, Al-Doped ZnO (AZO), tin indium oxide (ITO), The transparent conductive oxides such as fluorine doped tin oxide (FTO) are formed, and thickness is 5~500nm;Preferably, it is tin indium oxide, thickness 5 ~100nm.
Due to adding layer of metal layer, in order to improve electrical efficiency, more preferable protection against oxidation effect is played to silver layer, It is alternatively possible between ion barrier 2 and transparent metal layer 3 plus plating layer of transparent conductive oxide cushion 5, its into It is point consistent with including transparent conducting oxide layer can also be inconsistent, its thickness is 5~300nm, it is preferable that be tin indium oxide, thickness For 5~100nm, as shown in Figure 2.
In the present embodiment, the transparent metal layer 3 selects silver layer, the silver layer can extra reflection infrared heat and prevent heat By wherein so that compound transparent electricity conductive film can prevent heat from passing through.So as to which the utility model compound transparent electricity conductive film has The advantages of transmitance is high, resistance is low, heat-proof quality is good can be had simultaneously by having.
The present embodiment sample and the performance comparison of certain commercially available prod see the table below:
The utility model adds transparent metal layer, the normal transparent of the sheet resistance of compound transparent electricity conductive film compared with same thickness Conductive film is smaller, and electric conductivity is improved significantly;Compared with the normal transparent conductive film of identical sheet resistance, the utility model Compound transparent electricity conductive film thickness it is smaller, the material such as tin indium oxide consumed is less, and material cost will not substantially increase.
Embodiment described above is only that preferred embodiment of the present utility model is described, not to this practicality New scope is defined, and on the premise of the utility model design spirit is not departed from, those of ordinary skill in the art are to this The various modifications and improvement that the technical scheme of utility model is made, the guarantor that claims of the present utility model determine all should be fallen into In the range of shield.

Claims (5)

1. a kind of compound transparent electricity conductive film, it is characterised in that including the substrate, ion barrier, transparent metal being sequentially stacked Layer and including transparent conducting oxide layer.
2. compound transparent electricity conductive film according to claim 1, it is characterised in that the substrate is using glass substrate or thoroughly Bright polymer flexibility substrate.
3. compound transparent electricity conductive film according to claim 1, it is characterised in that the material of the ion barrier uses The oxide of silicon, the oxide of aluminium or titanyl compound.
4. compound transparent electricity conductive film according to claim 1, it is characterised in that in ion barrier and transparent metal layer Between be additionally provided with transparent conductive oxide cushion, the material of the transparent conductive oxide cushion is using zinc oxide, oxidation Tin, Al-Doped ZnO, tin indium oxide or fluorine doped tin oxide.
5. compound transparent electricity conductive film according to claim 1, it is characterised in that the composition of the transparent metal layer uses Gold, silver, copper or alloy.
CN201720589137.4U 2017-05-24 2017-05-24 A kind of compound transparent electricity conductive film Active CN206812540U (en)

Priority Applications (1)

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Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN108335781A (en) * 2018-02-11 2018-07-27 无锡博硕珈睿科技有限公司 Composite conductive thin film, preparation method, its application, product with heating film
CN109243678A (en) * 2018-08-23 2019-01-18 北京载诚科技有限公司 A kind of composite transparent conductive film
CN109686477A (en) * 2019-01-29 2019-04-26 山东金晶科技股份有限公司 A kind of composite transparent conductive film resistant to high temperature and preparation method thereof
CN114005603A (en) * 2021-11-02 2022-02-01 合肥工业大学智能制造技术研究院 Method for improving conductivity of nano-silver film
EP4006635A1 (en) * 2020-11-30 2022-06-01 Ricoh Company, Ltd. Electrochromic element and electrochromic light control lens
CN115583803A (en) * 2022-11-08 2023-01-10 宁波海燕新材料有限公司 AZO transparent conductive film and preparation method thereof

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN108335781A (en) * 2018-02-11 2018-07-27 无锡博硕珈睿科技有限公司 Composite conductive thin film, preparation method, its application, product with heating film
CN109243678A (en) * 2018-08-23 2019-01-18 北京载诚科技有限公司 A kind of composite transparent conductive film
CN109686477A (en) * 2019-01-29 2019-04-26 山东金晶科技股份有限公司 A kind of composite transparent conductive film resistant to high temperature and preparation method thereof
CN109686477B (en) * 2019-01-29 2020-11-06 山东金晶科技股份有限公司 High-temperature-resistant composite transparent conductive film and preparation method thereof
EP4006635A1 (en) * 2020-11-30 2022-06-01 Ricoh Company, Ltd. Electrochromic element and electrochromic light control lens
CN114005603A (en) * 2021-11-02 2022-02-01 合肥工业大学智能制造技术研究院 Method for improving conductivity of nano-silver film
CN115583803A (en) * 2022-11-08 2023-01-10 宁波海燕新材料有限公司 AZO transparent conductive film and preparation method thereof

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Effective date of registration: 20221221

Address after: 233000 Chaoyang Industrial Park, the intersection of Middle Ring Road and Guxing Road, Longzihu District, Bengbu City, Anhui Province

Patentee after: Anhui Weidi Intelligent Glass Co.,Ltd.

Address before: 230012 no.1399 wulishan Road, Xinzhan District, Hefei City, Anhui Province

Patentee before: Hefei Wedi Color Glass Co.,Ltd.