CN206301130U - A kind of high infrared reflection electrochomeric glass - Google Patents
A kind of high infrared reflection electrochomeric glass Download PDFInfo
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- CN206301130U CN206301130U CN201621391104.0U CN201621391104U CN206301130U CN 206301130 U CN206301130 U CN 206301130U CN 201621391104 U CN201621391104 U CN 201621391104U CN 206301130 U CN206301130 U CN 206301130U
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Abstract
The utility model discloses a kind of high infrared reflection electrochomeric glass, its drip irrigation device is：Including the first glass substrate and the second glass substrate, dielectric substrate is provided between first glass substrate and the second glass substrate, first glass substrate includes first substrate and the ITO layer being sequentially arranged between the first substrate and dielectric substrate and WO3Layer.A kind of high infrared reflection electrochomeric glass of the present utility model, is mutually combined using active energy-conservation with passive energy-conservation, and product all band transmitance is adjustable, with high infrared reflection effect.
Description
【Technical field】
The utility model is related to a kind of coated glass, and in particular to a kind of high infrared reflection electrochomeric glass.
【Background technology】
Coated glass has the double effects of energy-saving and emission-reduction and decorative curtain wall, after releasing market, is loved by people, Low-
E glass is also referred to as low radiation coated glass, and traditional LOW-E glass loads onto visible ray and infrared transmitance and reflection after wall
Rate is fixed, it is impossible to is changed again, is referred to as passive energy-conservation；And current electrochomeric glass, although energy active energy-conservation, but its is right
Infrared reflection is whether coloured to or colour fading state is not obvious.
【The content of the invention】
A kind of high infrared reflection electrochomeric glass of the present utility model, is mutually combined using active energy-conservation with passive energy-conservation,
Product all band transmitance is adjustable, with high infrared reflection effect.
The utility model another object is to provide a kind of preparation method of high infrared reflection electrochomeric glass.
The utility model is achieved through the following technical solutions：
A kind of high infrared reflection electrochomeric glass, including the first glass substrate and the second glass substrate, first glass
Dielectric substrate is provided between glass substrate and the second glass substrate, first glass substrate includes first substrate and is sequentially arranged in described
ITO layer and WO between first substrate and dielectric substrate3Layer.
Preferably, the second glass substrate includes second substrate and is sequentially arranged between the second substrate and dielectric substrate
ITO layer, AZO layer, Ag layers and NiO layer.
Preferably, 120~135nm of the ITO layer thickness, sheet resistance<15 Europe.
Preferably, the WO3500~600nm of tunic thickness.
Preferably, the dielectric substrate electrical conductivity>10-6μs/cm。
Preferably, 50~100nm of the NiO layer thickness.
Preferably, 8~12nm of the Ag tunics thickness.
Preferably, 300~400nm of the AZO tunics thickness.
Preferably, the first substrate and second substrate are respectively the float glass of 4~8mm of thickness.
A kind of method for preparing high infrared reflection electrochomeric glass, comprises the following steps：
1st, magnetron sputtering ITO layer, with AC power, Ar gas as protective gas, magnetron sputtering tin indium oxide target In2O3：
SnO2=90：10 (wt%), with Ar throughputs 800SCCM；
2nd, magnetron sputtering WO3Layer, with AC power, Ar gas, O2Gas is used as protective gas, magnetron sputtering tungsten target, argon oxygen flow
Than being 400~425SCCM:600~630SCCM；
3rd, dielectric substrate is prepared, by PVB, lithium salts, auxiliary agent by weight 60~70：10~20：10~30 extrusion curtain coating systems
Into, wherein lithium salts is the mixture of lithium perchlorate, lithium tantalate etc., other auxiliary agents are injection agent, antioxidant, ultraviolet light absorption agent,
Stabilizer；
4th, magnetron sputtering NiO layer, with AC power, Ar gas, O2Gas is used as protective gas, magnetron sputtering tungsten nickel target W：Ni=
8：92 (wt%), argon oxygen flow ratio is 380~400SCCM:600~625SCCM；
5th, magnetron sputtering Ag layers, dc source sputtering, with Ar gas as protective gas, 500~550SCCM of gas flow；
6th, AZO layers, the zinc oxide film of aluminium doping are prepared；
7th, piece is closed, by first substrate, ITO layer and WO3Layer the first glass substrate of composition, by second substrate, ITO layer, AZO
Layer, Ag layers, NiO layer the second glass substrate of composition, the first glass substrate, dielectric substrate are entered with the second glass substrate by autoclave
Row closes piece, is prepared into high infrared reflection electrochomeric glass.
A kind of television set for being equipped with the double-colored anti-transparent diffusion plate support.
Compared with prior art, the utility model has the following advantages that：
1st, high infrared reflection electrochomeric glass of the present utility model, tin indium oxide film layer has electrically conducting transparent function, and
Chemical resistance stabilization, effectively can be reflected simultaneously infrared, can play a part of defencive function film layer, with LOW-E glass
The passive energy-saving effect of glass high infrared reflection；
2nd, high infrared reflection electrochomeric glass of the present utility model, with electrochromic active energy-saving effect, to red
Outside line reflectivity reaches more than 80%；
3rd, high infrared reflection electrochomeric glass of the present utility model, can interconnect, with smart home by controlling circuit reality
Existing Based Intelligent Control；
4th, high infrared reflection electrochomeric glass preparation method of the present utility model, functional film layer is sequentially deposited at glass base
It is excellent that on piece, film layer has that weatherability and decay resistance are outstanding, radiance is low, sheet resistance is small, uniformity is good, adhesion is strong
Point.
【Brief description of the drawings】
Fig. 1 is the utility model structural representation.
【Specific embodiment】
A kind of high infrared reflection electrochomeric glass as shown in Figure 1, including the first glass substrate 1 and the second glass base
Dielectric substrate 3 is provided between plate 2, the glass substrate 2 of first glass substrate 1 and second, first glass substrate 1 includes first
Substrate 11 and the ITO layer 12 being sequentially arranged between the first substrate 11 and dielectric substrate 3 and WO3Layer 13.Glass of the present utility model
Glass unit is composited by two pieces of different glass substrates and dielectric substrate, and the glass substrate per side is constituted by multiple film layers,
ITO layer and WO are compounded with wherein the first glass substrate3Layer, to realize the effect of passive energy-conservation.
Second glass substrate 2 includes second substrate 21 and the ITO being sequentially arranged between the second substrate 21 and dielectric substrate 3
Layer 22, AZO layers 23, Ag layers 24 and NiO layer 25.ITO layer, AZO layer, Ag layers and NiO layer are compounded with second glass substrate, with reference to
Dielectric substrate is realizing electrochromic active energy-saving effect.
120~135nm of the ITO layer thickness, sheet resistance<15 Europe.AC power magnetron sputtering tin indium oxide target In2O3：SnO2
=90：10 (wt%), prepare ITO layer film, with Ar gas as sputter gas, gas flow 800SCCM, 120~135nm of thickness,
Preferably 125nm, 1m=109nm。
The WO3500~600nm of tunic thickness.AC power magnetron sputtering tungsten target, with Ar gas, O2As sputter gas, gas
Body flow is controlled in 400~425SCCM:600~630SCCM, preferably thickness 500-600nm, 550nm.
The dielectric substrate electrical conductivity>10-6μs/cm.Dielectric substrate is made up of PVB-Li, and lithium metal exists with ionic state,
By PVB, lithium salts (lithium perchlorate, lithium tantalate etc.), auxiliary agent (injection agent, antioxidant, ultraviolet light absorption agent, stabilizer) by weight
60~70：10~20：10~30 extrusion curtain coatings are obtained conduction PVB, its electrical conductivity>10-6μs/cm。
50~100nm of the NiO layer thickness.Using AC power magnetron sputtering tungsten nickel target W：Ni=8:92, with Ar gas, O2
Used as sputter gas, gas flow is controlled in 380~400SCCM:600~625SCCM, thickness 50-100nm, preferably
100nm。
8~12nm of the Ag tunics thickness.Dc source sputter, with Ar as sputter gas gas flow 500~
550SCCM, preferably 8~12nm of thickness, 8nm.
300~400nm of the AZO tunics thickness.The zinc oxide film adulterated using aluminium, as protective layer, can further be reduced
Radiance.
The first substrate 11 and second substrate 12 are respectively the float glass of 4~8mm of thickness.Preferred first substrate and
Second substrate selects the float glass process glass of 6mm.
A kind of method for preparing high infrared reflection electrochomeric glass, comprises the following steps：
1), magnetron sputtering ITO layer, with AC power, Ar gas as protective gas, magnetron sputtering tin indium oxide target In2O3：
SnO2=90：10 (wt%), with Ar throughputs 800SCCM；
2), magnetron sputtering WO3Layer, with AC power, Ar gas, O2Gas is used as protective gas, magnetron sputtering tungsten target, argon oxygen stream
Amount is than being 400~425SCCM:600~630SCCM；
3) dielectric substrate, is prepared, by PVB, lithium salts, other auxiliary agents by weight 60~70：10~20：10~30 extrudate flows
Prolong and be made；
4), magnetron sputtering NiO layer, with AC power, Ar gas, O2Gas is used as protective gas, magnetron sputtering tungsten nickel target W：Ni
=8：92 (wt%), argon oxygen flow ratio is 380~400SCCM:600~625SCCM；
5), magnetron sputtering Ag layers, dc source sputtering, with Ar gas as protective gas, 500~550SCCM of gas flow；
6) AZO layers, the zinc oxide film of aluminium doping, are prepared；
7) piece, is closed, by first substrate, ITO layer and WO3Layer the first glass substrate of composition, by second substrate, ITO layer, AZO
Layer, Ag layers, NiO layer the second glass substrate of composition, the first glass substrate, dielectric substrate are entered with the second glass substrate by autoclave
Row closes piece, is prepared into high infrared reflection electrochomeric glass.Functional film layer is sequentially depositing on a glass substrate, and film layer has weather-proof
Property and the advantage that decay resistance is outstanding, radiance is low, sheet resistance is small, uniformity is good, adhesion is strong.
Claims (9)
1. a kind of high infrared reflection electrochomeric glass, it is characterised in that：Including the first glass substrate (1) and the second glass substrate
(2) dielectric substrate (3), first glass substrate (1), are provided between first glass substrate (1) and the second glass substrate (2)
Including first substrate (11) and the ITO layer (12) being sequentially arranged between the first substrate (11) and dielectric substrate (3) and WO3 layers
(13)。
2. a kind of high infrared reflection electrochomeric glass according to claim 1, it is characterised in that：Second glass substrate
(2) including second substrate (21) and the ITO layer (22) being sequentially arranged between the second substrate (21) and dielectric substrate (3), AZO layers
(23), Ag layers (24) and NiO layer (25).
3. a kind of high infrared reflection electrochomeric glass according to claim 1, it is characterised in that：The ITO layer thickness
120~135nm, sheet resistance<15 Europe.
4. a kind of high infrared reflection electrochomeric glass according to claim 1, it is characterised in that：The WO3 tunics are thick
500~600nm.
5. a kind of high infrared reflection electrochomeric glass according to claim 1, it is characterised in that：The dielectric substrate electricity
Conductance>10-6μs/cm。
6. a kind of high infrared reflection electrochomeric glass according to claim 2, it is characterised in that：The NiO layer thickness
50~100nm.
7. a kind of high infrared reflection electrochomeric glass according to claim 2, it is characterised in that：The Ag tunics thickness 8
~12nm.
8. a kind of high infrared reflection electrochomeric glass according to claim 2, it is characterised in that：The AZO tunics are thick
300~400nm.
9. a kind of high infrared reflection electrochomeric glass according to claim 2, it is characterised in that：The first substrate
And second substrate (2) is respectively the float glass of 4~8mm of thickness (11).
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201621391104.0U CN206301130U (en) | 2016-12-16 | 2016-12-16 | A kind of high infrared reflection electrochomeric glass |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201621391104.0U CN206301130U (en) | 2016-12-16 | 2016-12-16 | A kind of high infrared reflection electrochomeric glass |
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| Publication Number | Publication Date |
|---|---|
| CN206301130U true CN206301130U (en) | 2017-07-04 |
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ID=59214358
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| CN201621391104.0U Active CN206301130U (en) | 2016-12-16 | 2016-12-16 | A kind of high infrared reflection electrochomeric glass |
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Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN106483732A (en) * | 2016-12-16 | 2017-03-08 | 揭阳市宏光镀膜玻璃有限公司 | A kind of high infrared reflection electrochomeric glass and preparation method thereof |
| CN107604334A (en) * | 2017-09-21 | 2018-01-19 | 中国建筑材料科学研究总院 | Nickel-tungsten oxide film and preparation method thereof |
-
2016
- 2016-12-16 CN CN201621391104.0U patent/CN206301130U/en active Active
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN106483732A (en) * | 2016-12-16 | 2017-03-08 | 揭阳市宏光镀膜玻璃有限公司 | A kind of high infrared reflection electrochomeric glass and preparation method thereof |
| CN107604334A (en) * | 2017-09-21 | 2018-01-19 | 中国建筑材料科学研究总院 | Nickel-tungsten oxide film and preparation method thereof |
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