CN206733378U - Wafer adsorption carrying disc - Google Patents
Wafer adsorption carrying disc Download PDFInfo
- Publication number
- CN206733378U CN206733378U CN201720396061.3U CN201720396061U CN206733378U CN 206733378 U CN206733378 U CN 206733378U CN 201720396061 U CN201720396061 U CN 201720396061U CN 206733378 U CN206733378 U CN 206733378U
- Authority
- CN
- China
- Prior art keywords
- wafer
- disk body
- groove
- top surface
- load plate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 238000001179 sorption measurement Methods 0.000 title claims abstract description 24
- 241000252254 Catostomidae Species 0.000 claims description 4
- 229920000297 Rayon Polymers 0.000 abstract description 12
- 230000000903 blocking effect Effects 0.000 abstract 1
- 238000005336 cracking Methods 0.000 abstract 1
- 230000000149 penetrating effect Effects 0.000 abstract 1
- 238000010521 absorption reaction Methods 0.000 description 7
- 230000007423 decrease Effects 0.000 description 2
- 230000007812 deficiency Effects 0.000 description 2
- 239000003292 glue Substances 0.000 description 2
- 238000009434 installation Methods 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 239000011435 rock Substances 0.000 description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical group [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 229910002804 graphite Inorganic materials 0.000 description 1
- 239000010439 graphite Substances 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000010422 painting Methods 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
Landscapes
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
Abstract
The utility model provides a wafer adsorbs and carries dish for adsorb the wafer, the wafer adsorbs and carries the dish and contains: the tray body comprises a bottom surface and a top surface which are opposite, a surrounding surface which extends from the periphery of the bottom surface to the periphery of the top surface, and a groove which is formed on one side of the surrounding surface and extends to the top surface so as to form a notch on the top surface; and a plurality of suction holes penetrating through the bottom surface and the top surface of the tray body. The utility model discloses at least, have following advantage: the grooves of the tray body can be used for overflowing viscose to flow in, so that the viscose is prevented from leaking between the wafer and the tray body and blocking the suction holes of the tray body to cause the reduction of the adsorption force, and the wafer is prevented from shaking and cracking due to insufficient adsorption force.
Description
Technical field
The utility model relates to a kind of device for manufacture of semiconductor, particularly relates to a kind of for adsorbing wafer
Wafer adsorption load plate.
Background technology
The electronic installation such as intelligent mobile phone designs towards compact direction now, above-mentioned in order to adapt to this trend
Chip also the more is made the more thin used in electronic installation.Wafer obtained by after crystal bar is cut is carried out accurate cutting again
The thinner wafer of two panels can be obtained, to meet thinness demanding criteria of the current industry for wafer.
Wafer must be firmly secured to when carrying out accurate cutting to wafer on a platform, in order to avoid during cutting
Wafer causes to rupture because of rocking.During wafer cutting is carried out, in order to avoid unadsorbed another on sucker
Wafer drops rupture, so wafer can be typically fixed on a support member with viscose in wafer side.However, wafer side
Viscose often leaks out between wafer and platform and causes platform can not firmly fix wafer, and then causes wafer because shaking
Move and rupture.
Utility model content
Therefore, the purpose of this utility model is, there is provided one kind is avoided that by viscose during wafer accurate cutting
Influence the wafer adsorption load plate of absorption affinity.
Therefore, the utility model wafer adsorption load plate in certain embodiments, sticks suitable for adsorbing a wafer, and with unification
The support member use in the part-skirt of the wafer, the wafer adsorption load plate includes a disk body and multiple suckers.Institute
Stating disk body includes an opposite bottom surface and a top surface, a periphery from the bottom surface and extends to the periphery of the top surface surrounding
Face, and a depression are formed in the groove around face side.The groove extends to the top surface to be formed in the top surface
One breach, the top surface is placed for the wafer, and the breach of the groove is covered by the wafer and makes the portion of wafer
Divide lateral margin adjacent to the groove.The sucker is through the bottom surface of disk body and the top surface.
In certain embodiments, the section of the groove of the disk body is semicircle.
In certain embodiments, also comprising one radially protruded out from the bottom surface of the disk body chassis, one through described
Disk body and first locking hole on the chassis, and multiple the second locking holes through the chassis, the sucker run through the disk
The groove of body and the chassis and the disk body is to extend to the chassis from the top surface.
In certain embodiments, the disk body and the chassis roughly circular.
In certain embodiments, the disk body is also formed at described around face and respectively from the both sides of the groove including two
The oppositely extending flat mouth portion of edge, the part-skirt of wafer protrude the flat mouth portion.
In certain embodiments, the sectional area of the groove accounts for the 4% to 6% of the disk body gross area.
In certain embodiments, the which part sucker in the sucker adjacent to the groove and using the ditch groove center as
Benchmark is into annular arrangement at equal intervals.
The utility model at least has advantages below:The viscose that the groove of the disk body is available for overflowing flows into, to avoid sticking
Glue leaks out between wafer and the disk body and blocks the sucker of disk body and cause absorption affinity to decline, with prevent wafer because
Absorption affinity deficiency causes to rock and rupture.
Brief description of the drawings
The utility model others feature and advantage, will clearly it be presented in the embodiment with reference to schema, wherein:
Fig. 1 is a top view of an embodiment of the utility model wafer adsorption load plate;
Fig. 2 is the side view diagram of the embodiment;
Fig. 3 is top view, illustrates the state when embodiment adsorbs a wafer.
Symbol description
1st, disk body;
11st, bottom surface;
12nd, top surface;
13rd, around face;
14th, groove;
141st, breach;
15th, flat mouth portion;
2nd, chassis;
3rd, sucker;
4th, the first locking hole;
5th, the second locking hole;
8th, wafer;
9th, support member;
91st, cambered surface.
Embodiment
Refering to Fig. 1 and Fig. 2, for an embodiment of the utility model wafer adsorption load plate, the wafer adsorption load plate is applicable
A wafer 8 is adsorbed in a manner of by vacuum suction in connecting an air extractor (not shown) (see Fig. 3).The wafer adsorption load plate
The chassis 2 of the disk body 1 is connected comprising a disk body 1, one, multiple is run through through the disk body 1 and the sucker 3, one on the chassis 2
The disk body 1 and first locking hole 4 on the chassis 2, and three the second locking holes 5 for running through the chassis 2.The disk body
1 roughly circular and extend to the top surface from the periphery of the bottom surface 11 including an opposite bottom surface 11 and a top surface 12, one
12 periphery is formed in the groove 14 around the side in face 13 around the depression of face 13, one, and two be formed at described in
The flat mouth portion 15 oppositely extending from the both side edges of the groove 14 around face 13 and respectively.The cross sectional shape of the groove 14 is half
It is circular and extend to the top surface 12 to form a breach 141 in the top surface 12.The chassis 2 connects the bottom of the disk body 1
Face 11 and radially protruded out from the bottom surface 11, and the groove 14 of the disk body 1 be extended to from the top surface 12 it is described
Chassis 2, the sucker 3 is through the disk body 1 and the chassis 2.
Refering to Fig. 3, the wafer adsorption load plate can be locked by first locking hole 4 and second locking hole 5
In the air extractor, the air extractor can pass through side of the sucker 3 from the top surface 12 of disk body 1 to the bottom surface 11
To being evacuated, the wafer 8 is adsorbed in the top surface 12 of the disk body 1.When 8 thickness to be carried out of wafer cuts open half essence
Closely when cutting, part-skirt in the wafer 8 need to be sticked together by a support member 9 in order to avoid the unadsorbed top surface in the disk body 1
12 wafer 8 drops rupture.The support member 9 of the present embodiment is a graphite bar with cambered surface 91, and by the support
The mode of painting viscose sticks the support member 9 part-skirt in the wafer 8 in the cambered surface 91 of part 9.The wafer 8 is adsorbed in
During the top surface 12 of the disk body 1, the breach 141 of the groove 14 of the disk body 1 is covered by the wafer 8 and the wafer 8 is glutinous has
The part-skirt of the support member 9 is adjacent to the groove 14.Can be from shape when the viscose in the cambered surface 91 of the support member 9 overflows
The groove 14 of the disk body 1 is flowed into the breach 141 in the top surface 12 of disk body 1, can without leaking out on the disk body 1
Viscose is avoided to block the sucker 3 and influence the absorption affinity of the air extractor.In the present embodiment, the groove of the disk body 1
14 sectional area is preferably the 4% to 6% of the gross area of top surface 12 for occupying the disk body 1, has been easier to less than this number range
Viscose leaks out to the situation (that is, producing excessive glue phenomenon) of the disk body 1;More than this number range then the wafer 8 contact it is described
The area of disk body 1 is smaller and the wafer 8 can not be adsorbed in well on the wafer adsorption load plate.In addition, disk body 1 is flat
Oral area 15 can coordinate the wafer 8 by lateral margin grinding to use, and wherein three suckers of multiple suckers 3 of the present embodiment are neighbouring
The groove 14 of the disk body 1 and with the center of the groove 14 as benchmark into annular arrangement at equal intervals, to strengthen the disk
Absorption affinity of the body 1 at the groove 14.
In summary, the utility model wafer adsorption load plate, the viscose that the groove 14 of disk body 1 is available for overflowing are flowed into avoid
Viscose leaks out to disk body 1 and blocks the sucker 3 of disk body 1 and cause absorption affinity to decline, and can prevent wafer 8 because absorption affinity deficiency
Cause to rock and rupture, therefore the purpose of this utility model can be reached really.
Described above is only preferred embodiment of the present utility model, it is noted that for the common skill of the art
Art personnel, on the premise of the utility model principle is not departed from, some improvements and modifications can also be made, these improvements and modifications
Also it should be regarded as the scope of protection of the utility model.
Claims (8)
1. a kind of wafer adsorption load plate, it is characterised in that include:
One disk body, including an opposite bottom surface and a top surface, a periphery from the bottom surface extend to the periphery of the top surface
Formed around face, and a depression and extend to the top surface in the groove around face side, the groove with the top surface
Form a breach;And
Multiple suckers, through the bottom surface of disk body and the top surface.
2. wafer adsorption load plate according to claim 1, it is characterised in that the wafer adsorption load plate adsorbs a wafer
When, the breach of the groove of the disk body is covered by the wafer and makes the part-skirt of the wafer adjacent to the groove.
3. wafer adsorption load plate according to claim 1, it is characterised in that the section of the groove of the disk body is semicircle
Shape.
4. wafer adsorption load plate according to claim 1, it is characterised in that also comprising one from the bottom surface of the disk body radially
The chassis that protrudes out outwardly, one are and multiple through the second of the chassis through the disk body and first locking hole on the chassis
Locking hole, the sucker are to extend to the bottom from the top surface through the groove of the disk body and the chassis and the disk body
Disk.
5. the wafer adsorption load plate according to Claims 1 to 4 any one, it is characterised in that the disk body and the bottom
Disk is rounded.
6. wafer adsorption load plate according to claim 5, it is characterised in that the disk body is also formed at described enclose including two
The flat mouth portion oppositely extending from the both side edges of the groove around face and respectively, the part-skirt of wafer protrude the flat mouth
Portion.
7. wafer adsorption load plate according to claim 6, it is characterised in that it is total that the sectional area of the groove accounts for the disk body
The 4% to 6% of area.
8. wafer adsorption load plate according to claim 7, it is characterised in that the which part sucker in the sucker is neighbouring
The groove and on the basis of the ditch groove center into annular arrangement at equal intervals.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
TW105212927U TWM535874U (en) | 2016-08-25 | 2016-08-25 | Wafer attachment tray |
TW105212927 | 2016-08-25 |
Publications (1)
Publication Number | Publication Date |
---|---|
CN206733378U true CN206733378U (en) | 2017-12-12 |
Family
ID=58400388
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN201720396061.3U Expired - Fee Related CN206733378U (en) | 2016-08-25 | 2017-04-14 | Wafer adsorption carrying disc |
Country Status (2)
Country | Link |
---|---|
CN (1) | CN206733378U (en) |
TW (1) | TWM535874U (en) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN110571168A (en) * | 2019-08-22 | 2019-12-13 | 长江存储科技有限责任公司 | Wafer adsorption disc, wafer adsorption system and wafer bonding equipment |
CN110797294A (en) * | 2019-10-16 | 2020-02-14 | 苏师大半导体材料与设备研究院(邳州)有限公司 | Continuous extraction element of silicon wafer |
CN111308858A (en) * | 2020-04-09 | 2020-06-19 | 华天慧创科技(西安)有限公司 | Interface disc for preventing photoresist overflow |
-
2016
- 2016-08-25 TW TW105212927U patent/TWM535874U/en not_active IP Right Cessation
-
2017
- 2017-04-14 CN CN201720396061.3U patent/CN206733378U/en not_active Expired - Fee Related
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN110571168A (en) * | 2019-08-22 | 2019-12-13 | 长江存储科技有限责任公司 | Wafer adsorption disc, wafer adsorption system and wafer bonding equipment |
CN110797294A (en) * | 2019-10-16 | 2020-02-14 | 苏师大半导体材料与设备研究院(邳州)有限公司 | Continuous extraction element of silicon wafer |
CN110797294B (en) * | 2019-10-16 | 2022-02-18 | 苏师大半导体材料与设备研究院(邳州)有限公司 | Continuous extraction element of silicon wafer |
CN111308858A (en) * | 2020-04-09 | 2020-06-19 | 华天慧创科技(西安)有限公司 | Interface disc for preventing photoresist overflow |
Also Published As
Publication number | Publication date |
---|---|
TWM535874U (en) | 2017-01-21 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
GR01 | Patent grant | ||
GR01 | Patent grant | ||
CF01 | Termination of patent right due to non-payment of annual fee | ||
CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20171212 Termination date: 20200414 |