TWI565569B - Absorbing apparatus, absorbing system and application thereof - Google Patents

Absorbing apparatus, absorbing system and application thereof Download PDF

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TWI565569B
TWI565569B TW105104107A TW105104107A TWI565569B TW I565569 B TWI565569 B TW I565569B TW 105104107 A TW105104107 A TW 105104107A TW 105104107 A TW105104107 A TW 105104107A TW I565569 B TWI565569 B TW I565569B
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absorbing
substrate
units
sorption
unit
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TW201728421A (en
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李志偉
蔡祥裕
吳聰偉
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南京瀚宇彩欣科技有限責任公司
瀚宇彩晶股份有限公司
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Description

吸著裝置、吸著系統及其應用 Suction device, sorption system and its application

本發明係有關一種吸著裝置、吸著系統及其應用,特別是提供一種可避免被吸著物下垂變形之吸著裝置、吸著系統及其應用。 The present invention relates to a sorption device, a sorption system, and an application thereof, and more particularly to a absorbing device, a sorption system, and an application thereof that can prevent sagging deformation of a sorbent.

隨著電子用品輕薄化之發展趨勢,所使用之基板(例如玻璃基板)的厚度漸趨薄化。 As the trend of thinner and lighter electronic products, the thickness of substrates (for example, glass substrates) used has become thinner.

其次,於製造流程中,基材通常係利用吸著裝置來輸送,其中吸著裝置係利用真空所產生之吸引力吸著基材,而可將基材輸送至各個處理工作站,進而被進行相關之處理步驟,因此使基材滿足不同之應用需求。 Secondly, in the manufacturing process, the substrate is usually transported by means of a sorption device, wherein the absorbing device absorbs the substrate by the attraction generated by the vacuum, and the substrate can be transported to each processing station, thereby being correlated. The processing steps thus make the substrate suitable for different application needs.

然而,習知之吸著裝置雖可吸住薄化基材,但薄化基材因厚度較薄,被吸著時的下垂變形量會變大。且隨著基材厚度越薄,下垂程度會越來越嚴重。如此,不但會造成製程上準確度問題,過大之下垂變形量甚至會導致基材破裂。 However, the conventional absorbing device can absorb the thinned substrate, but the thinned substrate has a small thickness, and the amount of sag deformation when it is sucked becomes large. And as the thickness of the substrate is thinner, the degree of sagging becomes more and more serious. In this way, not only will the accuracy of the process be caused, but the excessive amount of sag deformation may even cause the substrate to rupture.

有鑑於此,亟須提供一種吸著裝置、吸著系統及其應用,以改進習知吸著裝置、吸著系統及其應用之缺陷。 In view of this, it is not necessary to provide a sorbent device, a sorption system, and applications thereof to improve the deficiencies of conventional sorbent devices, sorption systems, and applications thereof.

因此,本發明之一態樣是在提供一種吸著裝置,其藉由吸著單元之連結關係抑制被吸著物因習知吸著不均所產生下垂變形之缺陷。 Accordingly, an aspect of the present invention provides a absorbing apparatus which suppresses a defect of sag deformation of a sorbent due to a conventional absorbing unevenness by a connection relationship of absorbing means.

本發明之另一態樣是在提供一種吸著裝置,其結合吸著單元與靜電盤,以抑制被吸著物因吸著不均所產生下垂變形之缺陷。 Another aspect of the present invention provides a sorbent device that incorporates a sorption unit and an electrostatic disk to suppress defects in sag deformation of the sorbate due to absorbing unevenness.

本發明之又一態樣是在提供一種吸著裝置,其調整吸著單元與靜電盤之相對關係,以進一步抑制被吸著物因吸著不均所產生之下垂變形。 Still another aspect of the present invention provides a absorbing apparatus that adjusts a relative relationship between a absorbing unit and an electrostatic disk to further suppress sagging deformation of the sorbed object due to absorbing unevenness.

本發明之再一態樣是在提供一種吸著系統,其包含前述之吸著裝置。 Yet another aspect of the present invention is to provide a sorption system comprising the aforementioned sorbent device.

本發明之又另一態樣是在提供一種吸著系統,其包含前述另一態樣之吸著裝置。 Yet another aspect of the present invention is to provide a sorption system comprising the sorbent device of the other aspect described above.

本發明之再另一態樣是在提供一種貼合基板之方法,其利用前述再一態樣之吸著系統吸著基板,而可抑制基板因吸著不均所產生之下垂變形。 Still another aspect of the present invention provides a method of bonding a substrate by absorbing a substrate by the sorption system according to the above aspect, thereby suppressing sagging deformation of the substrate due to uneven absorption.

本發明之更另一態樣是在提供一種貼合基板之方法,其利用前述又另一態樣之吸著系統吸著基板,而可抑制基板因吸著不均所產生之下垂變形。 Still another aspect of the present invention provides a method of bonding a substrate which absorbs a substrate by the sorption system according to still another aspect described above, thereby suppressing sagging deformation of the substrate due to uneven absorption.

根據本發明之一態樣,提出一種吸著裝置。此吸著裝置包含複數個第一吸著單元及複數個第二吸著單元。此些第一吸著單元係間隔設置,並定義出至少一間隔區域。此些第二吸著單元設置於此些第一吸著單元之至少一者上,且衍伸至前述至少一間隔區域之至少一者上。 According to one aspect of the invention, a sorption device is proposed. The sorption device comprises a plurality of first sorption units and a plurality of second sorption units. The first sorption units are spaced apart and define at least one spaced area. The second absorbing units are disposed on at least one of the first absorbing units and are extended to at least one of the at least one spaced regions.

根據本發明之另一態樣,提出一種吸著裝置。此吸著裝置包含複數個第一吸著單元、複數個第二吸著單元及複數個靜電盤。此些第一吸著單元係間隔設置,並定義出至少一間隔區域。此些第二吸著單元係設置於第一吸著單元的至少一者上,且此些第二吸著單元延伸至至少一間隔區域的至少一者中。前述之靜電盤分別設置於間隔區域中,且每一個靜電盤具有對應第二吸著單元之複數個凹陷部。其中,每一個第二吸著單元可移動地通過所對應之凹陷部。 According to another aspect of the invention, a sorption device is provided. The absorbing device comprises a plurality of first absorbing units, a plurality of second absorbing units and a plurality of electrostatic disks. The first sorption units are spaced apart and define at least one spaced area. The second absorbing units are disposed on at least one of the first absorbing units, and the second absorbing units extend into at least one of the at least one spaced regions. The aforementioned electrostatic disks are respectively disposed in the spacing region, and each of the electrostatic disks has a plurality of recesses corresponding to the second absorbing unit. Wherein each of the second absorbing units is movably passed through the corresponding recess.

依據本發明之一實施例,前述第二吸著單元之其中至少二者互相平行。 According to an embodiment of the invention, at least two of the aforementioned second sorption units are parallel to each other.

依據本發明之另一實施例,此吸著裝置更包含至少一連接件,且此連接件與第一吸著單元連接。 According to another embodiment of the invention, the absorbing device further comprises at least one connecting member, and the connecting member is connected to the first absorbing unit.

依據本發明之又一實施例,前述第二吸著單元之至少一者垂直於第一吸著單元。 According to still another embodiment of the present invention, at least one of the second absorbing units is perpendicular to the first absorbing unit.

依據本發明之又另一實施例,前述此些第一吸著單元互相平行。 According to still another embodiment of the present invention, the first absorbing units are parallel to each other.

依據本發明之更另一實施例,前述第一吸著單元及第二吸著單元之至少一者具有連接元件及設置於連接元件上之吸著元件。 According to still another embodiment of the present invention, at least one of the first absorbing unit and the second absorbing unit has a connecting member and a absorbing member disposed on the connecting member.

依據本發明之更另一實施例,前述之吸著裝置更包含至少一連接件,且此至少一連接件與第一吸著單元連接。 According to still another embodiment of the present invention, the absorbing device further includes at least one connecting member, and the at least one connecting member is coupled to the first absorbing unit.

根據本發明之又一態樣,提出一種吸著裝置。此吸著裝置包含複數個第一吸著單元、複數個第二吸著單元及複數個靜電盤。此些第一吸著單元係分開設置。此些第二吸著單元之至少一者連接前述第一吸著單元之至少二者。此些靜電盤分別設置於第一吸著單元與第二吸著單元之間,而使每一個第一吸著單元和每一個第二吸著單元可移動地通過此些靜電盤。 According to still another aspect of the present invention, a sorption device is proposed. The absorbing device comprises a plurality of first absorbing units, a plurality of second absorbing units and a plurality of electrostatic disks. These first sorption units are separately provided. At least one of the second sorption units is coupled to at least two of the first sorption units. The electrostatic disks are respectively disposed between the first absorbing unit and the second absorbing unit, so that each of the first absorbing units and each of the second absorbing units movably pass through the electrostatic disks.

依據本發明之另一實施例,前述之此些第一吸著單元互相平行。 According to another embodiment of the invention, the first sorption units are parallel to each other.

根據本發明之又一態樣,提出一種吸著系統。此吸著系統設置於本體上,且吸著系統包含作動機構及前述之吸著裝置。此吸著裝置中的每一個第一吸著單元連接作動機構。 According to yet another aspect of the invention, a sorption system is presented. The sorption system is disposed on the body, and the sorption system includes an actuation mechanism and the aforementioned sorption device. Each of the first sorption units of the sorption device is coupled to the actuation mechanism.

根據本發明之再一態樣,提出一種吸著系統。此吸著系統包含作動機構及吸著裝置。連接件連接作動機構,且靜電盤設置於本體之底部上。 According to still another aspect of the present invention, a sorption system is proposed. The sorption system includes an actuation mechanism and a sorption device. The connecting member is connected to the actuating mechanism, and the electrostatic disk is disposed on the bottom of the body.

根據本發明之又另一態樣,提出一種貼合基板之方法。此方法先提供第一基板與第二基板,以及前述之吸著系統。然後,藉由吸著系統之吸著裝置吸著第一基板,並以作動機構上提吸著裝置。接著,移動吸著基板,以對準第 一基板與第二基板。之後,下移吸著裝置,以貼合第一基板與第二基板。 According to still another aspect of the present invention, a method of bonding a substrate is provided. The method first provides a first substrate and a second substrate, as well as the aforementioned sorption system. Then, the first substrate is sucked by the absorbing device of the sorption system, and the absorbing device is lifted by the actuating mechanism. Next, move the absorbing substrate to align A substrate and a second substrate. Thereafter, the absorbing device is moved down to fit the first substrate and the second substrate.

根據本發明之再另一態樣,提出一種貼合基板之方法。此方法先提供第一基板與第二基板,以及前述之吸著系統。然後,藉由第一吸著單元與第二吸著單元吸著第一基板。接著,以第一吸著單元及第二吸著單元上提第一基板。當第一吸著單元及第二吸著單元與靜電盤共平面時,以前述之靜電盤吸著第一基板。其中,第一吸著單元及第二吸著單元可移動地通過靜電盤,並移動至本體之容置部中。之後,移動靜電盤,以對準第一基板與第二基板。而後,下移靜電盤,以貼合第一基板及第二基板。 According to still another aspect of the present invention, a method of bonding a substrate is provided. The method first provides a first substrate and a second substrate, as well as the aforementioned sorption system. Then, the first substrate is sucked by the first absorbing unit and the second absorbing unit. Next, the first substrate is lifted by the first absorbing unit and the second absorbing unit. When the first absorbing unit and the second absorbing unit are coplanar with the electrostatic disk, the first substrate is sorbed by the electrostatic disk. The first absorbing unit and the second absorbing unit are movably passed through the electrostatic disk and moved into the receiving portion of the body. Thereafter, the electrostatic disk is moved to align the first substrate with the second substrate. Then, the electrostatic disk is moved down to bond the first substrate and the second substrate.

應用本發明之吸著裝置、吸著系統及其應用,其係藉由設計吸著裝置之吸著單元間的連結關係,以避免被吸著物下垂變形,而可提升吸著裝置之吸著功效。 The absorbing device, the sorption system and the application thereof of the present invention are designed to improve the sorption of the absorbing device by designing the connection relationship between the absorbing units of the absorbing device to avoid sagging deformation of the absorbing material. efficacy.

100/200‧‧‧吸著系統 100/200‧‧‧Sucking system

100a/200a/300a/300b/400a/500a‧‧‧吸著裝置 100a/200a/300a/300b/400a/500a‧‧‧ sorption device

101/201‧‧‧本體 101/201‧‧‧ Ontology

101a/201a‧‧‧底部 101a/201a‧‧‧ bottom

101b/201b‧‧‧容置部 101b/201b‧‧‧Receipt Department

110/210/310/410/510‧‧‧第一吸著單元 110/210/310/410/510‧‧‧ first sorption unit

120/220/320/420/520‧‧‧第二吸著單元 120/220/320/420/520‧‧‧second sorption unit

110a/120a/210a/220a/410a/420a/510a/520a‧‧‧連接元件 110a/120a/210a/220a/410a/420a/510a/520a‧‧‧ Connection elements

110b/120b/210b/220b/410b/420b/510b/520b‧‧‧吸著元件 110b/120b/210b/220b/410b/420b/510b/520b‧‧‧ sorption elements

130/230/430/530‧‧‧連接件 130/230/430/530‧‧‧Connectors

130a/230a/430a/530a‧‧‧作動機構 130a/230a/430a/530a‧‧‧ actuation agency

140/240/540‧‧‧間隔區域 140/240/540‧‧‧ interval area

250/550‧‧‧靜電盤 250/550‧‧‧Electric disk

250a‧‧‧凹陷部 250a‧‧‧Depression

600/700‧‧‧方法 600/700‧‧‧ method

601‧‧‧提供第一基板、第二基板及吸著系統之步驟 601‧‧‧Provide steps for providing the first substrate, the second substrate, and the sorption system

602‧‧‧藉由吸著系統之吸著裝置吸著第一基板之步驟 602‧‧‧Steps of absorbing the first substrate by the sorption device of the sorption system

603‧‧‧利用作動機構上提吸著裝置之步驟 603‧‧‧Steps of using the actuation mechanism to lift the suction device

604‧‧‧移動吸著裝置,以對準第一基板與第二基板之步驟 604‧‧‧ Moving the absorbing device to align the first substrate with the second substrate

605‧‧‧下移吸著裝置之步驟 605‧‧‧Steps for moving the sorption device down

606‧‧‧貼合第一基板及第二基板之步驟 606‧‧‧Steps of bonding the first substrate and the second substrate

701‧‧‧提供第一基板、第二基板及吸著系統之步驟 701‧‧‧Procedure for providing the first substrate, the second substrate and the sorption system

702‧‧‧藉由第一吸著單元及第二吸著單元吸著第一基板之步驟 702‧‧‧Step of absorbing the first substrate by the first absorbing unit and the second absorbing unit

703‧‧‧利用作動機構上提第一吸著單元及第二吸著單元,並利用靜電盤吸著第一基板之步驟 703‧‧‧Steps of lifting the first absorbing unit and the second absorbing unit by using the actuating mechanism and absorbing the first substrate by using the electrostatic disk

704‧‧‧移動靜電盤,以對準第一基板及第二基板之步驟 704‧‧‧ Moving the electrostatic disk to align the first substrate and the second substrate

705‧‧‧下移靜電盤之步驟 705‧‧‧Steps for moving the electrostatic disk down

706‧‧‧貼合第一基板及第二基板之步驟 706‧‧‧Steps of bonding the first substrate and the second substrate

C-C’/D-D’‧‧‧剖切線 C-C’/D-D’‧‧‧ cut line

D1/D2/D3/D4‧‧‧距離 D 1 /D 2 /D 3 /D 4 ‧‧‧Distance

為了對本發明之實施例及其優點有更完整之理解,現請參照以下之說明並配合相應之圖式。必須強調的是,各種特徵並非依比例描繪且僅係為了圖解目的。相關圖式內容說明如下:〔圖1〕係繪示依照本發明之一實施例之吸著系統之仰視立體圖。 For a more complete understanding of the embodiments of the invention and the advantages thereof, reference should be made to the description below and the accompanying drawings. It must be emphasized that the various features are not drawn to scale and are for illustrative purposes only. The related drawings are described as follows: [Fig. 1] is a bottom perspective view showing a sorption system according to an embodiment of the present invention.

〔圖1a〕係繪示沿著圖1之C-C’剖切線剖切之本發明之一實施例的吸著系統之側視圖。 Fig. 1a is a side elevational view of the sorption system of one embodiment of the invention taken along line C-C' of Fig. 1.

〔圖1b〕係繪示依照本發明之一實施例之吸著裝置之仰視圖。 Fig. 1b is a bottom plan view of a sorption device in accordance with an embodiment of the present invention.

〔圖1c〕係繪示依照本發明之一實施例之貼合基板的方法之流程圖。 FIG. 1c is a flow chart showing a method of bonding a substrate according to an embodiment of the present invention.

〔圖2〕係繪示依照本發明之另一實施例之吸著系統之仰視立體圖。 2 is a bottom perspective view of a sorption system in accordance with another embodiment of the present invention.

〔圖2a〕係繪示沿著圖2之D-D’剖切線剖切之本發明之另一實施例的吸著系統之側視圖。 Fig. 2a is a side elevational view of the sorption system of another embodiment of the present invention taken along line D-D' of Fig. 2.

〔圖2b〕係繪示依照本發明之另一實施例之吸著裝置之仰視圖。 Figure 2b is a bottom plan view of a sorption device in accordance with another embodiment of the present invention.

〔圖2c〕係繪示依照圖2b之A部分放大之本發明之另一實施例的吸著裝置之仰視圖。 Fig. 2c is a bottom plan view showing a sorption device according to another embodiment of the present invention enlarged in accordance with a portion A of Fig. 2b.

〔圖2d〕係繪示依照本發明之另一實施例之貼合基板的方法之流程圖。 FIG. 2d is a flow chart showing a method of bonding a substrate according to another embodiment of the present invention.

〔圖3a〕係繪示依照本發明之又一實施例之吸著裝置之仰視圖。 Figure 3a is a bottom plan view of a sorption device in accordance with yet another embodiment of the present invention.

〔圖3b〕係繪示依照本發明之再一實施例之吸著裝置之仰視圖。 Fig. 3b is a bottom plan view showing a absorbing device according to still another embodiment of the present invention.

〔圖4〕係繪示依照本發明之又另一實施例之吸著裝置之仰視圖。 Fig. 4 is a bottom plan view showing a sorption device according to still another embodiment of the present invention.

〔圖5〕係繪示依照本發明之再另一實施例之吸著裝置之仰視圖。 Fig. 5 is a bottom plan view showing a sorption device according to still another embodiment of the present invention.

〔圖5a〕係繪示依照圖5之B部分放大之本發明之再另一實施例的吸著裝置之仰視圖。 Fig. 5a is a bottom plan view showing a sorption device according to still another embodiment of the present invention enlarged in part B of Fig. 5.

以下仔細討論本發明實施例之製造和使用。然而,可以理解的是,實施例提供許多可應用的發明概念,其可實施於各式各樣的特定內容中。所討論之特定實施例僅供說明,並非用以限定本發明之範圍。 The making and using of the embodiments of the invention are discussed in detail below. However, it will be appreciated that the embodiments provide many applicable inventive concepts that can be implemented in a wide variety of specific content. The specific embodiments discussed are illustrative only and are not intended to limit the scope of the invention.

請同時參照圖1、圖1a及圖1b,其中圖1係繪示依照本發明之一實施例之吸著系統之仰視立體圖,圖1a係繪示沿著圖1之C-C’剖切線剖切之本發明之一實施例的吸著系統之側視圖,且圖1b係繪示依照本發明之一實施例之吸著裝置之仰視圖。在一實施例中,吸著系統100設置於本體101上,且吸著系統100包含作動機構130a及吸著裝置100a。其中,本體101可進行水平移動,以調整位置,而可達到水平移動物體之功效。 1 and FIG. 1b, FIG. 1 is a bottom perspective view of a sorption system according to an embodiment of the present invention, and FIG. 1a is a cross-sectional view taken along line C-C' of FIG. A side view of a sorption system in accordance with an embodiment of the present invention is shown, and Figure 1b is a bottom plan view of a sorption device in accordance with an embodiment of the present invention. In one embodiment, the sorption system 100 is disposed on the body 101, and the sorption system 100 includes an actuation mechanism 130a and a sorption device 100a. Wherein, the body 101 can be horizontally moved to adjust the position, and the effect of horizontally moving the object can be achieved.

請參照圖1b。吸著裝置100a包含複數個第一吸著單元110及複數個第二吸著單元120,以及至少一連接件130,其中至少一連接件130分別連接於該些第一吸著單元110的兩端。此些第一吸著單元110與第二吸著單元120至少一者分別具有一連接元件110a與120a及複數個分別設置於連接元件110a與120a上的吸著元件110b與120b,且吸著元件110b與120b具有一氣體流入口。其中,第一吸著單元110的連接元件110a連接對應的第二吸著單元120的連接元件120a。 Please refer to Figure 1b. The squeezing device 100a includes a plurality of first absorbing units 110 and a plurality of second absorbing units 120, and at least one connecting member 130. At least one connecting member 130 is respectively connected to the two ends of the first absorbing units 110. . At least one of the first absorbing unit 110 and the second absorbing unit 120 respectively has a connecting element 110a and 120a and a plurality of absorbing elements 110b and 120b respectively disposed on the connecting elements 110a and 120a, and the absorbing element 110b and 120b have a gas flow inlet. The connecting element 110a of the first absorbing unit 110 is connected to the connecting element 120a of the corresponding second absorbing unit 120.

此些第一吸著單元110彼此間隔設置,並定義出至少一間隔區域140。換言之,兩個間隔設置之第一吸著單元110可定義出一間隔區域140。 The first absorbing units 110 are spaced apart from each other and define at least one spacing region 140. In other words, the two spaced apart first absorbing units 110 can define a spacing region 140.

第一吸著單元110與第二吸著單元120之連接元件110a與120a分別具有一管路(圖未示),可供氣體流動。每一吸著元件110b與120b分別連接對應的管路,管路可直接或間接連接負壓裝置,例如第一連接元件110a的管路可直接連接負壓裝置,第二連接元件120a的管路再和第一連接元件110a的管路相連接,以間接連接負壓裝置。第一吸著單元110及第二吸著單元120的吸著元件110b及120b即可藉由管路連結負壓裝置,而使氣體經由氣體流入口被抽入管路中,使吸著元件110b與120b和欲吸著物件間的氣壓成為負壓,進而使吸著元件110b與120b具有吸著功效。 The connecting elements 110a and 120a of the first absorbing unit 110 and the second absorbing unit 120 respectively have a conduit (not shown) for gas flow. Each of the absorbing members 110b and 120b is respectively connected to a corresponding pipeline, and the pipeline can be directly or indirectly connected to the negative pressure device. For example, the pipeline of the first connecting component 110a can be directly connected to the negative pressure device, and the pipeline of the second connecting component 120a. It is connected to the pipeline of the first connecting element 110a to indirectly connect the vacuum device. The absorbing elements 110b and 120b of the first absorbing unit 110 and the second absorbing unit 120 can be connected to the negative pressure device by a pipeline, so that the gas is drawn into the pipeline through the gas inlet, so that the absorbing member 110b and the absorbing member 110b The air pressure between 120b and the object to be sucked becomes a negative pressure, thereby making the absorbing members 110b and 120b have a sorption effect.

在一實施例中,亦可於連接件130設置管路及吸著元件,讓連接件亦有吸著之能力。 In an embodiment, the connecting member 130 can also be provided with a pipe and a absorbing member, so that the connecting member can also have the ability to suck.

第一吸著單元110與第二吸著單元120的吸著元件110b與120b可均勻地或不均勻地分別分佈於第一吸著單元110與第二吸著單元120的連接元件110a與120a上。在此實施例中,第一吸著單元110更可包含複數個遮蓋,以調整並封閉部份之吸著元件110b與120b,而符合欲吸著物件之形狀或面積,並調整各個吸著元件110b與120b之吸著力。進一步而言,當所述負壓裝置連結複數個吸著裝 置時,依據操作之需求,前述之遮蓋亦可封閉至少一個吸著裝置中全部的吸著元件,而藉由其餘之吸著裝置吸著物體。 The absorbing elements 110b and 120b of the first absorbing unit 110 and the second absorbing unit 120 may be uniformly or unevenly distributed on the connecting elements 110a and 120a of the first absorbing unit 110 and the second absorbing unit 120, respectively. . In this embodiment, the first absorbing unit 110 may further include a plurality of covers to adjust and close the partial absorbing members 110b and 120b, in accordance with the shape or area of the object to be sucked, and adjust the absorbing members. The attraction of 110b and 120b. Further, when the vacuum device is connected to a plurality of absorbing devices At the time of the operation, according to the operation requirement, the cover can also close all the absorbing elements in the at least one absorbing device, and the objects are sucked by the remaining absorbing devices.

在一實施例中,此些第一吸著單元110可彼此平行或不平行。 In an embodiment, the first sorption units 110 may be parallel or non-parallel to each other.

前述之第二吸著單元120設置於第一吸著單元110的至少一者上,並衍伸至間隔區域140之至少一者中。如圖1b所示,第二吸著單元120之至少一者垂直於第一吸著單元110,第二吸著單元120之至少二者係互相平行,且第二吸著單元120之至少二者於第一吸著單元110之至少一者上等距分佈。 The second absorbing unit 120 is disposed on at least one of the first absorbing units 110 and is extended into at least one of the spacing regions 140. As shown in FIG. 1b, at least one of the second absorbing units 120 is perpendicular to the first absorbing unit 110, at least two of the second absorbing units 120 are parallel to each other, and at least two of the second absorbing units 120 are Is equidistantly distributed on at least one of the first sorption units 110.

在一實施例中,第一吸著單元110與第二吸著單元120可為一體成型。在另一實施例中,第一吸著單元110與第二吸著單元120係組裝而成。在此實施例中,第二吸著單元120可藉由卡固、鎖固、緊配合、螺設、其他適當之方法或前述方法之任意組合與第一吸著單元110結合。須特別說明的是,當第二吸著單元120與第一吸著單元110結合時,第一吸著單元110與第二吸著單元120之間可具有一密合元件,以防止吸著裝置100a吸著物體時,外界氣體由第一吸著單元110與第二吸著單元120之結合處被吸入,而降低吸著效果,甚至使吸著裝置100a失去吸著效果。 In an embodiment, the first absorbing unit 110 and the second absorbing unit 120 may be integrally formed. In another embodiment, the first absorbing unit 110 and the second absorbing unit 120 are assembled. In this embodiment, the second absorbing unit 120 can be coupled to the first absorbing unit 110 by snapping, locking, tight fitting, screwing, other suitable methods, or any combination of the foregoing. It should be particularly noted that when the second absorbing unit 120 is combined with the first absorbing unit 110, the first absorbing unit 110 and the second absorbing unit 120 may have a sealing element to prevent the absorbing device. When the object 100a sucks the object, the outside air is sucked by the combination of the first absorbing unit 110 and the second absorbing unit 120, thereby reducing the absorbing effect and even causing the absorbing device 100a to lose the absorbing effect.

於前述之實施例中,當第二吸著單元120與第一吸著單元110結合時,倘若第一吸著單元110與第二吸著單元120之間已具有良好之氣密效果,第一吸著單元110與第二吸著單元120之間即不須具有密合元件。 In the foregoing embodiment, when the second absorbing unit 120 is combined with the first absorbing unit 110, if the first absorbing unit 110 and the second absorbing unit 120 have a good airtight effect, the first There is no need to have a sealing element between the absorbing unit 110 and the second absorbing unit 120.

在又一實施例中,第二吸著單元120可樞設於第一吸著單元110上,而使第二吸著單元120以設置於第一吸著單元110上之軸心為中心來進行旋轉,進而可改變第二吸著單元120之吸著位置,以配合欲吸著物件之形狀。 In another embodiment, the second absorbing unit 120 is pivotally disposed on the first absorbing unit 110, and the second absorbing unit 120 is centered on the axis disposed on the first absorbing unit 110. Rotation, in turn, can change the absorbing position of the second sorption unit 120 to match the shape of the object to be sucked.

請參照圖1、圖1a及圖1b。前述之作動機構130a透過與該吸著裝置100a的連接件130連接,而可帶動吸著裝置100a移動。在一實施例中,作動機構130a可帶動吸著裝置100a上下移動(以圖1b仰視圖而言,坐動機構130a係沿著垂直於圖式頁面的方向移動),並藉此調整吸著裝置100a之高度,而使吸著裝置100a可吸著物體,進而提升物體之高度。接著,藉由本體101之水平移動,物體即可被移動至另一位置。在一實施例中,作動機構130a為可伸縮之桿件結構,但並不限於此。 Please refer to FIG. 1, FIG. 1a and FIG. 1b. The actuating mechanism 130a is connected to the connecting member 130 of the absorbing device 100a to move the absorbing device 100a. In an embodiment, the actuating mechanism 130a can drive the absorbing device 100a to move up and down (in the bottom view of FIG. 1b, the sitting mechanism 130a moves in a direction perpendicular to the page of the drawing), and thereby adjust the absorbing device The height of 100a allows the absorbing device 100a to suck the object, thereby raising the height of the object. Then, by the horizontal movement of the body 101, the object can be moved to another position. In an embodiment, the actuating mechanism 130a is a telescopic rod structure, but is not limited thereto.

在一實施例中,吸著裝置100a亦可容置於本體101之容置部101b中。在此實施例中,第一吸著單元110之底面(亦即吸著裝置100a之底面)與本體101之底部101a共平面。 In an embodiment, the absorbing device 100a can also be received in the accommodating portion 101b of the body 101. In this embodiment, the bottom surface of the first sorption unit 110 (i.e., the bottom surface of the absorbing device 100a) is coplanar with the bottom portion 101a of the body 101.

請同時參照圖1a、圖1b及圖1c,其中圖1c係繪示依照本發明之一實施例之貼合基板的方法之流程圖。在一實施例中,方法600係先提供第一基板(未繪示)、第二基板(未繪示)及前述之吸著系統100,並藉由吸著系統100之吸著裝置100a吸著第一基板,如步驟601及602所示。其中,吸著裝置100a藉由第一吸著單元110與第二吸著單元120吸著第一基板。 Referring to FIG. 1a, FIG. 1b and FIG. 1c, FIG. 1c is a flow chart of a method for bonding a substrate according to an embodiment of the invention. In one embodiment, the method 600 first provides a first substrate (not shown), a second substrate (not shown), and the aforementioned sorption system 100, and is sorbed by the sorption device 100a of the sorption system 100. The first substrate is as shown in steps 601 and 602. The absorbing device 100a sucks the first substrate by the first absorbing unit 110 and the second absorbing unit 120.

然後,利用吸著系統100之作動機構130a上提吸著裝置100a,並移動本體101之水平位置,以對準被吸著之第一基板與第二基板,如步驟603及604所示。 Then, the absorbing device 100a is lifted by the actuating mechanism 130a of the sorption system 100, and the horizontal position of the body 101 is moved to align the smoked first substrate and the second substrate, as shown in steps 603 and 604.

在一實施例中,前述之作動機構130a係可任意活動之作動機構。因此,前述之本體101可固定不動,而藉由任意活動之作動機構130a來調整第一基板之水平位置及/或水平高度。 In an embodiment, the actuating mechanism 130a is an actuating mechanism that can be arbitrarily moved. Therefore, the body 101 can be fixed, and the horizontal position and/or the level of the first substrate can be adjusted by any active actuation mechanism 130a.

接著,藉由前述之作動機構130a下移吸著裝置100a,以貼合第一基板及第二基板,如步驟605及606所示。 Next, the absorbing device 100a is moved downward by the actuating mechanism 130a to bond the first substrate and the second substrate, as shown in steps 605 and 606.

請同時參照圖2、圖2a及圖2b,其中圖2係繪示依照本發明之另一實施例之吸著系統之仰視立體圖,圖2a係繪示沿著圖2之D-D’剖切線剖切之本發明之另一實施例的吸著系統之側視圖,且圖2b係繪示依照本發明之另一實施例之吸著裝置之仰視圖。吸著系統200之配置及其結構大致上與吸著系統100之配置及其結構相同,兩者之差異在於吸著系統200之吸著裝置200a更包含靜電盤250,且靜電盤250設置於本體201之底部201a上。 Please refer to FIG. 2, FIG. 2a and FIG. 2b, wherein FIG. 2 is a bottom perspective view of the sorption system according to another embodiment of the present invention, and FIG. 2a is a cross-sectional view taken along line DD' of FIG. A side view of a sorption system of another embodiment of the present invention is cut away, and Fig. 2b is a bottom plan view of the absorbing device in accordance with another embodiment of the present invention. The configuration of the sorption system 200 and its structure are substantially the same as those of the sorption system 100, and the difference is that the absorbing device 200a of the sorption system 200 further includes an electrostatic disk 250, and the electrostatic disk 250 is disposed on the body. On the bottom 201a of 201.

請參照圖2b及圖2c,圖2c係繪示依照圖2b之A部分放大之本發明之另一實施例的吸著裝置之仰視圖。如前所述,吸著裝置200a更包含複數個靜電盤250。此些靜電盤250分別設置於第一吸著單元210所定義之間隔區域240中,且每一個靜電盤250具有對應第二吸著單元220之凹陷部250a,而使每一個第二吸著單元220可移動地通過所對應之凹陷部250a。 Referring to FIG. 2b and FIG. 2c, FIG. 2c is a bottom view of the absorbing device according to another embodiment of the present invention enlarged in part A of FIG. 2b. As previously mentioned, the sorbent device 200a further includes a plurality of electrostatic disks 250. The electrostatic disks 250 are respectively disposed in the spacing regions 240 defined by the first absorbing unit 210, and each of the electrostatic disks 250 has a recess 250a corresponding to the second absorbing unit 220, so that each of the second absorbing units 220 movably passes through the corresponding recess 250a.

請參照圖2c,靜電盤250與第一吸著單元210及第二吸著單元220之間分別具有距離D1及D2,藉此可讓第一吸著單元210及第二吸著單元220可沿垂直於圖式頁面之方向移動,通過該些靜電盤250。 Referring to FIG. 2c, the electrostatic disk 250 has a distance D 1 and a D 2 between the first absorbing unit 210 and the second absorbing unit 220, respectively, thereby allowing the first absorbing unit 210 and the second absorbing unit 220. The electrostatic disk 250 can be moved in a direction perpendicular to the page of the drawing.

請參照圖2、2a及圖2b。作動機構230a分別連接吸著裝置200a的該些連接件230。在一實施例中,作動機構230a可調整吸著裝置200a之高度,而調整被吸著裝置吸著之物體的高度。接著,藉由本體201之移動,物體即可被移動至另一位置。在一實施例中,作動機構230a亦可選擇性地連接吸著裝置200a之每一個第一吸著單元210。 Please refer to Figures 2, 2a and 2b. The actuating mechanism 230a is connected to the connecting members 230 of the absorbing device 200a, respectively. In one embodiment, the actuation mechanism 230a adjusts the height of the sorption device 200a to adjust the height of the object being sorbed by the sorption device. Then, by the movement of the body 201, the object can be moved to another position. In an embodiment, the actuation mechanism 230a can also selectively connect each of the first sorption units 210 of the sorption device 200a.

在一實施例中,吸著裝置200a亦可容置於本體201之容置部201b中。在此實施例中,第一吸著單元210之底面(亦即吸著裝置200a之底面)與本體201之底部201a共平面。 In an embodiment, the absorbing device 200a can also be received in the accommodating portion 201b of the body 201. In this embodiment, the bottom surface of the first sorption unit 210 (i.e., the bottom surface of the absorbing device 200a) is coplanar with the bottom portion 201a of the body 201.

請參照圖2b及前述之說明,吸著裝置200a除可利用第一吸著單元210與第二吸著單元220同時吸著物體之外,吸著裝置200a更可藉由靜電盤250來吸著物體。 Referring to FIG. 2b and the foregoing description, the absorbing device 200a can be sorbed by the electrostatic disk 250 in addition to the first absorbing unit 210 and the second absorbing unit 220 simultaneously absorbing the object. object.

前述之作動機構230a可調整吸著裝置200a之高度,而使吸著裝置200a可吸著物體,進而提升物體之高度。接著,藉由本體201之移動,物體即可被移動至另一位置。 The actuating mechanism 230a can adjust the height of the absorbing device 200a, so that the absorbing device 200a can suck the object, thereby raising the height of the object. Then, by the movement of the body 201, the object can be moved to another position.

吸著裝置200a亦可容置於本體201之容置部201b中。因此,當吸著裝置200a容置於容置部201b時,如圖2a所示,第一吸著單元210及第二吸著單元220之吸著元 件210b及220b的水平高度係高於靜電盤250之底面的水平高度。 The absorbing device 200a can also be received in the accommodating portion 201b of the body 201. Therefore, when the absorbing device 200a is received in the accommodating portion 201b, as shown in FIG. 2a, the absorbing elements of the first absorbing unit 210 and the second absorbing unit 220 are as shown in FIG. 2a. The level of the pieces 210b and 220b is higher than the level of the bottom surface of the electrostatic disk 250.

故,當作動機構230a提升吸著裝置200a時,吸著裝置200a之底面會先與靜電盤250之底面共平面,而使得被吸著之物體同時被吸著裝置200a及靜電盤250吸著。然後,作動機構230a持續提升吸著裝置200a,而使得吸著裝置200a容置於本體201之容置部201b中。此時,被吸著之物體僅被靜電盤250吸著。 Therefore, when the absorbing mechanism 200a is lifted as the moving mechanism 230a, the bottom surface of the absorbing device 200a is first coplanar with the bottom surface of the electrostatic disk 250, so that the object to be sucked is simultaneously sucked by the absorbing device 200a and the electrostatic disk 250. Then, the actuating mechanism 230a continuously raises the absorbing device 200a, so that the absorbing device 200a is housed in the accommodating portion 201b of the body 201. At this time, the object to be sucked is sucked only by the electrostatic disk 250.

請參照圖2a、圖2b及圖2d,其中圖2d係繪示依照本發明之另一實施例之貼合基板的方法之流程圖。方法700之流程步驟大致上與方法600之流程步驟相同,兩者之差異在於方法700係利用包含靜電盤250之吸著系統200來吸著基板。 Please refer to FIG. 2a, FIG. 2b and FIG. 2d, wherein FIG. 2d is a flow chart of a method for bonding a substrate according to another embodiment of the present invention. The process steps of method 700 are substantially the same as the process steps of method 600, with the difference that method 700 utilizes a sorption system 200 comprising electrostatic disk 250 to sorb the substrate.

相同地,方法700先提供第一基板(未繪示)、第二基板(未繪示)及前述包含靜電盤250之吸著系統200,並利用吸著裝置200a之第一吸著單元210及第二吸著單元220吸著第一基板,如步驟701及702所示。 Similarly, the method 700 first provides a first substrate (not shown), a second substrate (not shown), and the foregoing sorption system 200 including the electrostatic disk 250, and utilizes the first absorbing unit 210 of the absorbing device 200a and The second absorbing unit 220 sucks the first substrate as shown in steps 701 and 702.

然後,利用作動機構230a上提第一吸著單元210及第二吸著單元220,並利用靜電盤250吸著第一基板,如步驟703所示。 Then, the first absorbing unit 210 and the second absorbing unit 220 are lifted up by the actuating mechanism 230a, and the first substrate is sucked by the electrostatic disk 250, as shown in step 703.

於步驟703中,當第一吸著單元210及第二吸著單元220之底面與靜電盤250之底面共平面時,第一基板同時被第一吸著單元210、第二吸著單元220及靜電盤250吸著。接著,作動機構230a持續上提第一吸著單元210及第二 吸著單元220,且第一吸著單元210及第二吸著單元220可移動地通過靜電盤250,並移動至本體201之容置部201b中,而使第一基板僅被靜電盤250吸著。 In step 703, when the bottom surfaces of the first absorbing unit 210 and the second absorbing unit 220 are coplanar with the bottom surface of the electrostatic disk 250, the first substrate is simultaneously used by the first absorbing unit 210 and the second absorbing unit 220. The electrostatic disk 250 is sucked. Then, the actuating mechanism 230a continues to lift the first absorbing unit 210 and the second The unit 420 is slid, and the first absorbing unit 210 and the second absorbing unit 220 are movably passed through the electrostatic disk 250 and moved into the accommodating portion 201b of the body 201, so that the first substrate is only sucked by the electrostatic disk 250. With.

進行步驟703後,移動本體201,以移動靜電盤250,而可對準第一基板及第二基板,如步驟704所示。接著,下移本體201,以下移靜電盤250,而可貼合被靜電盤250吸著之第一基板及第二基板,如步驟705及706所示。 After step 703 is performed, the body 201 is moved to move the electrostatic disk 250 to align the first substrate and the second substrate, as shown in step 704. Next, the main body 201 is moved down, and the electrostatic disk 250 is moved downward to bond the first substrate and the second substrate sucked by the electrostatic disk 250, as shown in steps 705 and 706.

請參照圖3a及3b,其分別繪示依照本發明之又一實施例與再一實施例之吸著裝置的仰視圖。吸著裝置300a及300b之配置及其結構大致上與吸著裝置200a之配置及其結構相同,其間之差異在於吸著裝置300a及300b的第二吸著單元320分別具有不同之排列方式。 Referring to Figures 3a and 3b, there are shown bottom views of a sorption device in accordance with yet another embodiment of the present invention. The arrangement of the absorbing devices 300a and 300b and the structure thereof are substantially the same as those of the absorbing device 200a, and the difference therebetween is that the second absorbing units 320 of the absorbing devices 300a and 300b have different arrangements.

於吸著裝置300a中,每一個第二吸著單元320係互相平行,且第二吸著單元320不垂直於第一吸著單元310;於吸著裝置300b中,部份之第二吸著單元320係互相不平行,且第二吸著單元320可垂直或不垂直於第一吸著單元310。在一實施例中,第二吸著單元320與第一吸著單元310可根據被吸著物之形狀、面積或重量,調整第一吸著單元310及第二吸著單元320之配置,以及其各自之吸著力,而滿足不同被吸著物之需求。 In the absorbing device 300a, each of the second absorbing units 320 is parallel to each other, and the second absorbing unit 320 is not perpendicular to the first absorbing unit 310; in the absorbing device 300b, a portion of the second absorbing unit The units 320 are not parallel to each other, and the second absorbing unit 320 may be perpendicular or non-perpendicular to the first absorbing unit 310. In an embodiment, the second absorbing unit 320 and the first absorbing unit 310 can adjust the configurations of the first absorbing unit 310 and the second absorbing unit 320 according to the shape, area or weight of the sorbed object, and Their respective absorbing forces meet the needs of different sorbents.

請參照圖4,其係繪示依照本發明之又另一實施例之吸著裝置之仰視圖。在一實施例中,吸著裝置400a之配置及其結構大致上與吸著裝置100a之配置及其結構相同,第二吸著單元420分別垂直於每一個第一吸著單元 410,且第一吸著單元410互相平行。兩者之差異在於吸著裝置400a中的第二吸著單元420連接第一吸著單元410之每一者。在另一實施例中,第二吸著單元420亦可連接第一吸著單元410的其中兩個或更多個,但並未連接第一吸著單元410的每一者。 Please refer to FIG. 4, which is a bottom view of a sorption device according to still another embodiment of the present invention. In an embodiment, the configuration of the absorbing device 400a and its structure are substantially the same as the configuration of the absorbing device 100a and its structure, and the second absorbing unit 420 is perpendicular to each of the first absorbing units. 410, and the first sorption units 410 are parallel to each other. The difference between the two is that the second sorption unit 420 in the sorption device 400a is connected to each of the first sorption units 410. In another embodiment, the second absorbing unit 420 may also connect two or more of the first absorbing units 410, but not each of the first absorbing units 410.

請參照圖5及5a,其中圖5係繪示依照本發明之再另一實施例之吸著裝置之仰視圖,且圖5a係繪示依照圖5之B部分放大之本發明之再另一實施例的吸著裝置之仰視圖。在一實施例中,吸著裝置500a之配置及其結構大致上與吸著裝置400a之配置及其結構相同,兩者之差異在於吸著裝置500a更包含靜電盤550,且靜電盤550設置於第一吸著單元510及第二吸著單元520之間,而使每一個第一吸著單元510及每一個第二吸著單元520可移動地通過靜電盤550。 5 and 5a, wherein FIG. 5 is a bottom view of the absorbing device according to still another embodiment of the present invention, and FIG. 5a is a further enlarged view of the present invention according to Part B of FIG. A bottom view of the sorption device of the embodiment. In one embodiment, the configuration of the absorbing device 500a and its structure are substantially the same as the configuration of the absorbing device 400a and its structure, the difference being that the absorbing device 500a further includes an electrostatic disk 550, and the electrostatic disk 550 is disposed at Between the first absorbing unit 510 and the second absorbing unit 520, each of the first absorbing units 510 and each of the second absorbing units 520 are movably passed through the electrostatic disc 550.

由本發明前述之實施例可知,本發明所載吸著裝置之第一吸著單元及第二吸著單元可用以吸著被吸著物,且由第一吸著單元所衍伸之第二吸著單元可有效解決習知因吸著不均所產生被吸著物下垂變形之缺陷。 According to the foregoing embodiments of the present invention, the first absorbing unit and the second absorbing unit of the absorbing device of the present invention can be used to suck the sorbed object, and the second absorbing unit is extended by the first absorbing unit. The unit can effectively solve the defects caused by the sag of the sorbent due to the uneven suction.

其次,依據被吸著物之形狀及面積,第二吸著元件之設置位置,以及吸著元件之數量及其排列位置可被調整設計,以提升吸著裝置對於被吸著物之吸著效果。 Secondly, depending on the shape and area of the sorbed object, the position of the second absorbing member, and the number of absorbing members and their arrangement positions can be adjusted to enhance the sorption effect of the absorbing device on the sorbed object. .

再者,本發明之吸著裝置利用第二吸著單元及靜電盤可有效避免習知被吸著物下垂變形之缺陷。 Furthermore, the absorbing device of the present invention can effectively avoid the defects of the conventional sag deformation by the absorbing member by using the second absorbing unit and the electrostatic disk.

雖然本發明已以實施方式揭露如上,然其並非用以限定本發明,在本發明所屬技術領域中任何具有通常知識者,在不脫離本發明之精神和範圍內,當可作各種之更動與潤飾,因此本發明之保護範圍當視後附之申請專利範圍所界定者為準。 The present invention has been disclosed in the above embodiments, and is not intended to limit the present invention. Any one of ordinary skill in the art to which the present invention pertains can make various changes without departing from the spirit and scope of the invention. The scope of protection of the present invention is therefore defined by the scope of the appended claims.

100a‧‧‧吸著裝置 100a‧‧‧Sucking device

110‧‧‧第一吸著單元 110‧‧‧First sorption unit

120‧‧‧第二吸著單元 120‧‧‧second sorption unit

110a/120a‧‧‧連接元件 110a/120a‧‧‧Connecting components

110b/120b‧‧‧吸著元件 110b/120b‧‧‧Sucking components

130‧‧‧連接件 130‧‧‧Connecting parts

130a‧‧‧作動機構 130a‧‧‧ actuation agency

140‧‧‧間隔區域 140‧‧‧ interval area

Claims (14)

一種吸著裝置,包含:複數個第一吸著單元,其中該些第一吸著單元係間隔設置,並定義出至少一間隔區域;以及複數個第二吸著單元,設置於該些第一吸著單元的至少一者上,並延伸至該至少一間隔區域之至少一者中。 A absorbing device comprising: a plurality of first absorbing units, wherein the first absorbing units are spaced apart and defines at least one spacing area; and a plurality of second absorbing units are disposed at the first At least one of the absorbing units extends into at least one of the at least one spaced regions. 一種吸著裝置,包含:複數個第一吸著單元,其中該些第一吸著單元係間隔設置並定義出至少一間隔區域;複數個第二吸著單元,設置於該些第一吸著單元的至少一者上,並延伸至該至少一間隔區域之至少一者中;以及複數個靜電盤,分別設於該間隔區域中,且每一該些靜電盤具有對應該些第二吸著單元之複數個凹陷部,而使每一該些第二吸著單元可移動地通過所對應之該些凹陷部。 A absorbing device comprising: a plurality of first absorbing units, wherein the first absorbing units are spaced apart and define at least one spacing area; and the plurality of second absorbing units are disposed at the first absorbing units And at least one of the cells extends into at least one of the at least one spacer region; and a plurality of electrostatic disks are respectively disposed in the spacer region, and each of the plurality of electrostatic disks has a corresponding second sorption a plurality of recesses of the unit, such that each of the second absorbing units movably passes through the corresponding recesses. 如申請專利範圍第1或2項所述之吸著裝置,其中該些第二吸著單元其中至少二者互相平行。 The sorption device of claim 1 or 2, wherein at least two of the second sorption units are parallel to each other. 如申請專利範圍第1項所述之吸著裝置,還包含至少一連接件,且該至少一連接件與該第一吸著單元連接。 The absorbing device according to claim 1, further comprising at least one connecting member, and the at least one connecting member is connected to the first absorbing unit. 如申請專利範圍第1或2項所述之吸著裝置,其中該些第二吸著單元中至少一者垂直於該些第一吸著單元。 The absorbing device of claim 1 or 2, wherein at least one of the second absorbing units is perpendicular to the first absorbing units. 如申請專利範圍第1或2項所述之吸著裝置,其中該些第一吸著單元互相平行。 The sorption device of claim 1 or 2, wherein the first sorption units are parallel to each other. 如申請專利範圍第1或2項所述之吸著裝置,其中該些第一吸著單元及該些第二吸著單元之至少一者具有一連接元件及複數個設置於該連接元件上的吸著元件。 The absorbing device of claim 1 or 2, wherein at least one of the first absorbing unit and the second absorbing unit has a connecting element and a plurality of locating elements disposed on the connecting element Suck the component. 如申請專利範圍第2項所述之吸著裝置,更包含至少一連接件,且該至少一連接件與該第一吸著單元連接。 The absorbing device of claim 2, further comprising at least one connecting member, and the at least one connecting member is connected to the first absorbing unit. 一種吸著裝置,包含:複數個第一吸著單元,其中該些第一吸著單元係分開設置;複數個第二吸著單元,該些第二吸著單元之至少一者連接該些第一吸著單元之至少二者;以及 複數個靜電盤,分別設於該些第一吸著單元及該些第二吸著單元之間,而使每一該些第一吸著單元及每一該些第二吸著單元可移動地通過該些靜電盤。 A absorbing device comprising: a plurality of first absorbing units, wherein the first absorbing units are separately disposed; a plurality of second absorbing units, at least one of the second absorbing units connecting the first At least two of the absorbing units; a plurality of electrostatic disks disposed between the first absorbing unit and the second absorbing units, wherein each of the first absorbing units and each of the second absorbing units are movably Pass through the electrostatic disks. 如申請專利範圍第9項所述之吸著裝置,其中該些第一吸著單元互相平行。 The sorbent device of claim 9, wherein the first sorption units are parallel to each other. 一種吸著系統,設置於一本體上,且該吸著系統包含:一作動機構;以及如申請專利範圍第4項中所述之一吸著裝置,其中該吸著裝置的該連接件連接該作動機構。 A sorption system is disposed on a body, and the sorption system comprises: an actuating mechanism; and a absorbing device according to claim 4, wherein the connecting member of the absorbing device is connected to the absorbing device Actuation mechanism. 一種吸著系統,設置於一本體上,且該吸著系統包含:一作動機構;以及如申請專利範圍第8項所述之一吸著裝置,其中該連接件連接該作動機構,且該些靜電盤設置於該本體之一底部上。 A sorption system is disposed on a body, and the sorption system comprises: an actuating mechanism; and a absorbing device according to claim 8, wherein the connecting member is connected to the actuating mechanism, and the The electrostatic disk is disposed on a bottom of the body. 一種貼合基板之方法,包含:提供一第一基板及一第二基板;提供如申請專利範圍第11項所述之一吸著系統;藉由該吸著系統之該吸著裝置吸著該第一基板; 利用該作動機構上提該吸著裝置;移動該吸著裝置,以對準該第一基板與該第二基板;以及下移該吸著裝置,以貼合該第一基板及該第二基板。 A method of bonding a substrate, comprising: providing a first substrate and a second substrate; providing a sorption system according to claim 11; absorbing the device by the absorbing device of the sorption system First substrate; Lifting the absorbing device by the actuating mechanism; moving the absorbing device to align the first substrate and the second substrate; and moving the absorbing device downward to fit the first substrate and the second substrate . 一種貼合基板之方法,包含:提供一第一基板及一第二基板;提供如申請專利範圍第12項所述之一吸著系統;藉由該些第一吸著單元及該些第二吸著單元吸著該第一基板;以該些第一吸著單元及該些第二吸著單元上提該第一基板,當該些第一吸著單元及該些第二吸著單元與該些靜電盤共平面時,以該些靜電盤吸著該第一基板,且該些第一吸著單元及該些第二吸著單元可移動地通過該些靜電盤,並移動至該本體之一容置部中;移動該些靜電盤,以對準該第一基板與該第二基板;以及下移該些靜電盤,以貼合該第一基板及該第二基板。 A method of bonding a substrate, comprising: providing a first substrate and a second substrate; providing a sorption system according to claim 12; wherein the first absorbing unit and the second The first substrate is sucked by the absorbing unit; the first substrate is lifted by the first absorbing unit and the second absorbing units, and the first absorbing unit and the second absorbing unit are When the electrostatic disks are coplanar, the first substrate is sucked by the electrostatic disks, and the first absorbing units and the second absorbing units are movably passed through the electrostatic disks and moved to the body One of the accommodating portions; moving the electrostatic disks to align the first substrate and the second substrate; and moving the electrostatic disks downward to bond the first substrate and the second substrate.
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