CN206147187U - Graticule - Google Patents

Graticule Download PDF

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Publication number
CN206147187U
CN206147187U CN201621003345.3U CN201621003345U CN206147187U CN 206147187 U CN206147187 U CN 206147187U CN 201621003345 U CN201621003345 U CN 201621003345U CN 206147187 U CN206147187 U CN 206147187U
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CN
China
Prior art keywords
supporting body
division line
protection structure
graticle
silver
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Active
Application number
CN201621003345.3U
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Chinese (zh)
Inventor
李弋舟
陈曦
邓辉
范文海
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CHANGSHA SHAOGUANG CHROME BLANK Co Ltd
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CHANGSHA SHAOGUANG CHROME BLANK Co Ltd
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Priority to CN201621003345.3U priority Critical patent/CN206147187U/en
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Abstract

The utility model discloses a graticule, a serial communication port, include: the supporting body, the supporting body includes first surface and the relative second surface that sets up with the first surface, division line, division line is located the first surface of supporting body, just division line comprises the metal, protection architecture, the protection architecture cladding division line, wherein, the supporting body with there is the refringence in protection architecture, just refracting index difference absolute value is lighter than 0.7. The utility model provides a graticule adopts magnetron sputtering technology to form silver, and the two -sided high reflection silverskin that obtains when guaranteeing that the rete has reached two -sided high reflectivity, has increased the anchoring strength between silverskin and the glass base member, on the basic graticule of silver, adopt coating by vaporization or magnetron sputtering technology to plate the siO2 membrane that the system one deck has certain thickness, strengthened silver -colored basic graticule's wearability and anti oxidability, do not reduce the two -sided high reflectivity of silverskin simultaneously, avoided short shortcoming of the cycle of depositing.

Description

A kind of graticle
Technical field
This utility model is related to graticle technical field, more particularly to a kind of graticle.
Background technology
Graticle is typically mounted on the right eyepiece focal plane of telescope, and it is that graduation mil is carved with the surface of one piece of pole book The thin glass of line, because the thin glass of this block has also assisted in theoretically imaging, extends the focal length of object lens, can be to the length of right eyepiece Degree has more or less impact.Graticle is high to purity requirements, and any small dust all can produce very big in observation Stain, while the installation site required precision of graticle is high, therefore, dismounting of trying not, if dismounting, must be by original Sample restores.Civilian aspect:Graticle is mainly used for the optical detections such as microscope, magnifier, theodolite, measurement, instrument of surveying and mapping It is middle to calibrate opticses as measurement.Instrument of surveying and mapping in such as engineering project is required for using.
In prior art, then graticle is had being sticked on its surface by tack coat using electroplating or steaming chrome-plated metal The graticle of chromium is electroplated first or be deposited with to protective layer, the graticle of this structure for the sensitivity of light is not fine, when using Need by extraneous light source, in some special dimensions, such graticle can not reach the set goal;Second, adopt The graticle adhesive force of plating or evaporation chromium can not reach the requirement become reconciled, and easily come off, and easily aoxidize so as to Bu Nengzheng Often use;3rd, by the way of bonding protective layer, so due to there is certain refractive index using tack coat and protective layer Difference, so makes graticle not accurate;A kind of graticle and preparation method thereof skill is urgently provided based on above-mentioned these technical problems Art scheme.
Utility model content
Based on this, it is necessary to provide a kind of graticle to solve above-mentioned technical problem.
A technical scheme of the present utility model is:
A kind of graticle, it is characterised in that include:
Supporting body, the supporting body includes first surface and the second surface being oppositely arranged with first surface;
Division line, the division line is located at the first surface of the supporting body, and the division line is made up of metal;
Protection structure, the protection structure coats the division line;
Wherein, with the protection structure there is refractivity in the supporting body, and the refractive index difference absolute value is less than 0.7。
Wherein in an embodiment, the transmitance of the supporting body and protection structure is more than 90%.
Wherein in an embodiment, the supporting body is glass.
Wherein in an embodiment, the division line is made up of silver, and the silver is formed at institute using magnetron sputtering mode State the first surface of supporting body.
Wherein in an embodiment, the protection structure is silicon dioxide, and the silicon dioxide is splashed by evaporation or magnetic control The mode of penetrating is formed at the division line surface.
Wherein in an embodiment, the thickness of the protection structure is more than the thickness of the division line.
Wherein in an embodiment, the reflectance of the division line wherein one side is more than or equal to 90%, the reflectance of another side More than or equal to 90%.
Wherein in an embodiment, there is refractivity, and the refractivity in the supporting body with the protection structure Value absolute value is less than or equal to 0.4.
Wherein in an embodiment, there is refractivity, and the refractivity in the supporting body with the protection structure Value absolute value is less than or equal to 0.3.
Wherein in an embodiment, the transmitance of the supporting body and protection structure is more than 95%.
The beneficial effects of the utility model:This utility model provides a kind of graticle and forms silver using magnetron sputtering technique, The two-sided high reflection silverskin for obtaining, while ensureing that film layer has reached two-sided high reflectance, increased silverskin and glass basis Between adhesion, the compactness and decay resistance of film layer itself during corrosion, are obtained the monolateral μ of lateral erosion < 1 M, lines are steep, the silver-based figure graticle of edge impulse- free robustness breach;On silver-based graticle, using evaporation or magnetron sputtering skill Art is coated with one layer and has certain thickness SiO2 films, the wearability and oxidation resistance of silver-based graticle is enhanced, while not having Reduce the two-sided high reflectance of silverskin, it is to avoid the short shortcoming of resting period.
Description of the drawings
Fig. 1 is a kind of structural representation of graticle of this utility model;
Fig. 2 is a kind of alternative structural representation of graticle of this utility model;
Fig. 3 is a kind of another structural representation of graticle of this utility model;
Fig. 4 is a kind of another structural representation of graticle of this utility model;
Fig. 5 is a kind of another structural representation of graticle of this utility model.
Specific embodiment
For the ease of understanding this utility model, this utility model is more fully retouched below with reference to relevant drawings State.Better embodiment of the present utility model is given in accompanying drawing.But, this utility model can be by many different forms To realize, however it is not limited to embodiment disclosed below.On the contrary, the purpose for providing these embodiments is made to this practicality It is more thorough comprehensive that new disclosure understands.
It should be noted that when element is referred to as " being arranged at " another element, it can directly on another element Or can also there is element placed in the middle.When an element is considered as " connection " another element, it can be directly connected to To another element or may be simultaneously present centering elements.Term as used herein " vertical ", " level ", " left side ", For illustrative purposes only, it is unique embodiment to be not offered as " right side " and similar statement.
Unless otherwise defined, all of technology used herein and scientific terminology are led with technology of the present utility model is belonged to The implication that the technical staff in domain is generally understood that is identical.It is simply in term used in the description of the present utility model herein The purpose of description specific embodiment, it is not intended that in limiting this utility model.Term as used herein "and/or" bag Include the arbitrary and all of combination of one or more related Listed Items.
Refer to Fig. 1, a kind of graticle, including:Supporting body 10, the supporting body 10 includes first surface and with first The second surface that surface is oppositely arranged;Division line 20, the division line 20 is located at the first surface of the supporting body 10, and described Division line 20 is made up of metal;Protection structure 30, the protection structure 30 coats the division line 20;Wherein, the supporting body 10 and protection structure 30 transmitance be more than 90%, or the transmitance of the supporting body and protection structure be more than 95%;By In graticle practicality in some precision instruments, and for transmitance has the high requirement of comparison, for example:Telescope, microscope Deng.
The protection structure 30 coats the division line 20, and " cladding " here makes that division line 20 is not exposed to be prevented outside point The oxidation of line 20, affects normally using for graticle.
Fig. 1 is referred to, the external morphology of the protection structure 30 in Fig. 1 and division line 20 are similar, there is one continuous Volt;Fig. 2 is referred to, the protection structure 31 in Fig. 2 only coats division line 20, just protection division line 20, and the protection knot The pattern of structure 31 and division line 20 are similar;Fig. 3 is referred to, the protection structure 32 in Fig. 3 is one flat away from the side of division line 20 Face, and the thickness of the protection structure 32 is more than the thickness of the division line 20, so equal to the division line 20 by protection knot Structure 32 is embedded in inside;Fig. 4 and Fig. 5 is referred to, protection structure 33 and protection structure 34 are on the basis of Fig. 1 and Fig. 2 Define certain radian.
Wherein in an embodiment, the field used due to graticle is all high-precision optical apparatus measures, it is described so It is required that supporting body 10 and the optical difference of protection structure 30 can not be too big, so the supporting body 10 and the protection structure 30 There is refractivity, and the refractivity is less than 0.7, further less than equal to 0.5, or less than or equal to 0.4, Huo Zhe little In equal to 0.3.
Wherein in an embodiment, the supporting body 10 can select the glass or high permeability hard modeling of high permeability Material.
Wherein in an embodiment, the reflectance of division line 20 on graticle is higher so when in use will be more obvious, More it is easily discernible, so the division line 20 is made up of silver, and the silver is formed at the supporting body using magnetron sputtering mode 10 first surface, the luminance factor of silver is higher, the bonding of the silver and supporting body 10 that are so made using magnetron sputtering mode here Power is more firm, and the double-sided reflecting rate of silver can reach more than or equal to 90% or double-sided reflecting rate can be reached more than or equal to 95%, So during use, for the requirement of ambient light is not that very high, applicable environment is broader.
Wherein in an embodiment, in order to reduce the optical difference between supporting body and protection structure, when supporting body 10 is selected When using glass, the protection structure 30 is silicon dioxide, and the silicon dioxide is formed at institute by evaporation or magnetron sputtering mode The surface of division line 20 is stated, because the main component of glass is exactly silicon dioxide, difference so between the two is very little, performance It is more superior, in addition, forming the adhesive force that increased between supporting body using evaporation or magnetron sputtering mode, it is allowed to more firm Gu, so there is refractivity with the protection structure 30 in the supporting body 10, and less than or equal to 0.3.
A kind of graduation board manufacturing method, it is characterised in that comprise the following steps:
S1, offer one are carried, and 10, the supporting body 10 includes first surface and be oppositely arranged with first surface second Surface, in the first surface of the supporting body 10 metal film is provided with;
S2, by step S1 metallic film patternization formed division line 20;
S3, in step s 2 the division line surface are provided with protection structure 30 or 31 or 32 or 33 or 34;
Wherein, the transmitance of the supporting body and protection structure is more than 90%.
Wherein in an embodiment, in order to increase the adhesive force of metal and supporting body 10, metal film is adopted in step S1 Formed with magnetron sputtering mode.
Wherein in an embodiment, patterned way is in step S2:Photoresists are provided with the metallic film surface, The metal film can select Ag films, by exposing etching, form division line 20;Wherein, it is described to etch the etching solution for using Including ammonium ceric nitrate or sodium acetates, during corrosion, it is obtained that 1 μm of monolateral lateral erosion <, lines are steep, edge impulse- free robustness lacks The silver-based figure graticle of mouth.
Wherein in an embodiment, protection structure is formed using evaporation or magnetron sputtering mode in step S3.It is described There is refractivity in supporting body, and the refractivity is less than 0.5 with the protection structure.Wherein, the supporting body 10 can be with High permeability glass or high permeability rigid plastics, protection structure are selected to select the material similar to supporting body optical effect Material, for example, supporting body 10 selects glass, then protection structure selects silicon dioxide.
In the application protection structure 30 to protection structure 34 be intended merely to describe on convenience, played a part of in fact with And the purpose for reaching is identical.
This utility model provides a kind of graticle and forms silver using magnetron sputtering technique, the two-sided high reflection silverskin for obtaining, While ensureing that film layer has reached two-sided high reflectance, the adhesion between silverskin and glass basis, film layer itself are increased Compactness and decay resistance, during corrosion, be obtained that 1 μm of monolateral lateral erosion <, lines are steep, edge impulse- free robustness The silver-based figure graticle of breach;On silver-based graticle, it is coated with one layer using evaporation or magnetron sputtering technique and there is certain thickness The SiO2 films of degree, enhance the wearability and oxidation resistance of silver-based graticle, while not reducing the two-sided high reflection of silverskin Rate, it is to avoid resting period short shortcoming.
It is understandable to enable above-mentioned purpose of the present utility model, feature and advantage to become apparent from, above in conjunction with accompanying drawing to this The specific embodiment of utility model is described in detail.Elaborate many details in order to abundant in superincumbent description Understand this utility model.But this utility model can be implemented with being much different from alternate manner described above, this area Technical staff can do similar improvement, therefore this utility model not by public above in the case of without prejudice to this utility model intension The restriction of the specific embodiment opened.Also, each technical characteristic of embodiment described above can be combined arbitrarily, to make to retouch State succinctly, combination not all possible to each technical characteristic in above-described embodiment is all described, as long as however, these skills There is no contradiction in the combination of art feature, be all considered to be the scope of this specification record.
Embodiment described above only expresses several embodiments of the present utility model, and its description is more concrete and detailed, But therefore can not be interpreted as the restriction to this utility model the scope of the claims.It should be pointed out that common for this area For technical staff, without departing from the concept of the premise utility, some deformations and improvement can also be made, these all belong to In protection domain of the present utility model.Therefore, the protection domain of this utility model patent should be defined by claims.

Claims (10)

1. a kind of graticle, it is characterised in that include:
Supporting body, the supporting body includes first surface and the second surface being oppositely arranged with first surface;
Division line, the division line is located at the first surface of the supporting body, and the division line is made up of metal;
Protection structure, the protection structure coats the division line;
Wherein, with the protection structure there is refractivity in the supporting body, and the refractive index difference absolute value is less than 0.7.
2. a kind of graticle according to claim 1, it is characterised in that the transmitance of the supporting body and protection structure More than 90%.
3. a kind of graticle according to claim 1, it is characterised in that the supporting body is glass.
4. a kind of graticle according to claim 1, it is characterised in that the division line is made up of silver, and the silver is adopted The first surface of the supporting body is formed at magnetron sputtering mode.
5. a kind of graticle according to claim 3, it is characterised in that the protection structure is silicon dioxide, described two Silicon oxide is formed at the division line surface by evaporation or magnetron sputtering mode.
6. a kind of graticle according to claim 1, it is characterised in that the thickness of the protection structure is more than the graduation The thickness of line.
7. a kind of graticle according to claim 4, it is characterised in that the reflectance of the division line wherein one side is more than Equal to 90%, the reflectance of another side is more than or equal to 90%.
8. a kind of graticle according to claim 1, it is characterised in that the supporting body and the protection structure have folding Penetrate rate poor, and the refractive index difference absolute value is less than 0.4.
9. a kind of graticle according to claim 5, it is characterised in that the supporting body and the protection structure have folding Penetrate rate poor, and the refractive index difference absolute value is less than 0.3.
10. a kind of graticle according to claim 2, it is characterised in that the transmission of the supporting body and protection structure Rate is more than 95%.
CN201621003345.3U 2016-08-31 2016-08-31 Graticule Active CN206147187U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN201621003345.3U CN206147187U (en) 2016-08-31 2016-08-31 Graticule

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN201621003345.3U CN206147187U (en) 2016-08-31 2016-08-31 Graticule

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CN206147187U true CN206147187U (en) 2017-05-03

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Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN107884949A (en) * 2017-12-27 2018-04-06 长沙韶光铬版有限公司 A kind of high reflection graticle and preparation method thereof
CN108152987A (en) * 2017-12-27 2018-06-12 长沙韶光铬版有限公司 A kind of graticle and preparation method thereof
CN109445122A (en) * 2018-12-18 2019-03-08 长沙韶光铬版有限公司 A kind of reflection-type graticle and preparation method thereof

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN107884949A (en) * 2017-12-27 2018-04-06 长沙韶光铬版有限公司 A kind of high reflection graticle and preparation method thereof
CN108152987A (en) * 2017-12-27 2018-06-12 长沙韶光铬版有限公司 A kind of graticle and preparation method thereof
CN109445122A (en) * 2018-12-18 2019-03-08 长沙韶光铬版有限公司 A kind of reflection-type graticle and preparation method thereof

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