CN207799253U - A kind of high reflection graticle - Google Patents
A kind of high reflection graticle Download PDFInfo
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- CN207799253U CN207799253U CN201721851645.1U CN201721851645U CN207799253U CN 207799253 U CN207799253 U CN 207799253U CN 201721851645 U CN201721851645 U CN 201721851645U CN 207799253 U CN207799253 U CN 207799253U
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- division line
- graticle
- supporting body
- high reflection
- protection
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Abstract
The utility model discloses a kind of high reflection graticles, which is characterized in that including：Supporting body, the supporting body include first surface and the second surface that is oppositely arranged with first surface；Division line, the division line is located at the first surface of the supporting body, and the division line consists of metal, wherein the division line height is 50nm ~ 500nm；Structure, the protection structure is protected at least to coat the division line；Wherein, the protection structural thickness is 100nm ~ 500nm.The beneficial effects of the utility model：A kind of high reflection graticle of the utility model offer and preparation method thereof forms silver using magnetron sputtering technique, and obtained two-sided high reflection silverskin increases the adhesion strength between silverskin and glass matrix while ensureing that film layer has reached two-sided high reflectance.
Description
Technical field
The utility model is related to graticle technical field more particularly to a kind of high reflection graticles.
Background technology
Graticle is typically mounted on the right eyepiece focal plane of telescope, it is that graduation dense bit is carved on the surface of one piece of pole book
The thin glass of line extends the focal length of object lens since this block thin glass has also assisted in imaging theoretically, can be to the length of right eyepiece
Degree has more or less influence.Graticle is high to purity requirements, and any small dust can all generate very big in observation
Stain, while the installation site required precision of graticle is high, therefore, tries not to dismantle, if dismounting, has to by original
Sample restores.Civilian aspect：Graticle is mainly used for the optical detections such as microscope, magnifying glass, theodolite, measurement, instrument of surveying and mapping
Middle be used as measures calibration optical component.For example the instrument of surveying and mapping in engineering project is required for using.Military aspect：Graticle is main
Applied to various gun, telescope, the pickaback optical component of the gun sight of formula guided missile etc..
In the prior art, using being electroplated or steaming chrome-plated metal, the graticle of this structure is electroplated or is deposited first graticle
The graticle of chromium is not fine for the sensibility of light, is needed by extraneous light source, in some special dimensions, in this way when use
Graticle cannot reach the set goal；Second, the requirement become reconciled cannot be reached using silver-plated graticle adhesive force, held
It is easy to fall off, and it is easy oxidation, prevent it from normal use；Third needs when large area prepares graticle by big face
Long-pending graticle cuts into independent graticle, is susceptible to and bursts apart during cutting；It is asked based on these above-mentioned technologies
Topic urgently provides a kind of high reflection（Reflectivity ＞ 90%）Graticle and preparation method thereof technical solution.
Utility model content
Based on this, it is necessary to provide a kind of high reflection graticle to solve above-mentioned technical problem.
One technical solution of the utility model is：
A kind of high reflection graticle, which is characterized in that including：
Supporting body, the supporting body include first surface and the second surface that is oppositely arranged with first surface；
Division line, the division line is located at the first surface of the supporting body, and the division line consists of metal,
In, the division line height is 50nm ~ 500nm；
Structure, the protection structure is protected at least to coat the division line；Wherein, the protection structural thickness be 100nm ~
500nm。
In a wherein embodiment, there are refringence between the supporting body and the protection structure, and the folding
It penetrates rate difference absolute value and is less than 0.5.
In a wherein embodiment, the supporting body is glass.
In a wherein embodiment, the division line is made of silver, and the silver is formed in institute using magnetron sputtering mode
State the first surface of supporting body.
In a wherein embodiment, the protection structure is ITO or AZO films；ITO the or AZO films pass through vapor deposition
Or magnetron sputtering mode is formed in the division line surface.
In a wherein embodiment, the division line height is 100nm ~ 400nm；Or the division line height is
150nm~300nm。
In a wherein embodiment, the protection structural thickness is 150nm ~ 500nm；Or the protection structural thickness is
200nm~400nm。
In a wherein embodiment, the protection structure covers the first surface that the division line is located at.
In a wherein embodiment, the transmitance of the protection structure and the bearing bed is more than 95%.
In a wherein embodiment, the transmitance of the protection structure and the bearing bed is more than or equal to 97%.
The beneficial effects of the utility model：A kind of high reflection graticle of the utility model offer uses magnetron sputtering technique shape
Cheng Yin, obtained two-sided high reflection silverskin increase silverskin and glass while ensureing that film layer has reached two-sided high reflectance
Unilateral lateral erosion can be obtained during corrosion in adhesion strength between matrix, the compactness and corrosion resistance of film layer itself
1 μm of ＜, lines are steep, edge impulse- free robustness notch silver-based figure graticle；On silver-based graticle, splashed using vapor deposition or magnetic control
It penetrates technology and forms one layer with certain thickness AZO films, enhance the wearability and oxidation resistance of silver-based graticle, together
When do not have to reduce the two-sided high reflectance of silverskin, and more low using the AZO films cost, thermal stability is good, right
It is more preferable in graticle；Furthermore the AZO film surfaces are equipped with UV glue-lines, and the UV glue passes through ultra-violet curing, and transmitance reaches
90% or more, in this way without reducing the high reflectance of silverskin, while being not easy to burst apart during large area is cut.
Description of the drawings
Fig. 1 is a kind of structural schematic diagram of large area high reflection graticle of the utility model；
Fig. 2 is a kind of structural schematic diagram of high reflection graticle another kind of the utility model；
Fig. 3 is a kind of another structural schematic diagram of high reflection graticle of the utility model；
Fig. 4 is a kind of another structural schematic diagram of high reflection graticle of the utility model；
Fig. 5 is a kind of another structural schematic diagram of high reflection graticle of the utility model；
Fig. 6 is a kind of another structural schematic diagram of high reflection graticle of the utility model；
Fig. 7 is a kind of high reflection graticle preparation method flow diagram of the utility model.
Specific implementation mode
The utility model is more fully retouched below with reference to relevant drawings for the ease of understanding the utility model,
It states.The better embodiment of the utility model is given in attached drawing.But the utility model can pass through many different forms
To realize, however it is not limited to embodiment disclosed below.On the contrary, the purpose of providing these embodiments is that making to this practicality
Novel disclosure understands more thorough and comprehensive.
It should be noted that when element is referred to as " being set to " another element, it can be directly on another element
Or there may also be elements placed in the middle.When an element is considered as " connection " another element, it can be directly connected to
To another element or it may be simultaneously present centering elements.Term as used herein " vertical ", " horizontal ", " left side ",
" right side " and similar statement for illustrative purposes only, are not offered as being unique embodiment.
Unless otherwise defined, all of technologies and scientific terms used here by the article is led with the technology for belonging to the utility model
The normally understood meaning of technical staff in domain is identical.Terminology used in the description of the utility model herein only be
The purpose of description specific embodiment, it is not intended that in limitation the utility model.Term as used herein "and/or" packet
Include any and all combinations of one or more relevant Listed Items.
A kind of high reflection graticle provided by the utility model, which is characterized in that including：
Supporting body, the supporting body include first surface and the second surface that is oppositely arranged with first surface；It is described to hold
Carrier first choice glass, glass can preferably use on high-end instrument；
Division line, the division line is located at the first surface of the supporting body, and the division line consists of metal, described
Metal can be formed in the supporting body surface by way of magnetron sputtering, and metal and glass are made by the way of magnetron sputtering
The contact of glass more securely；The division line height is 50nm ~ 500nm, and the preferably described division line height is 100nm ~ 400nm；
Further, the division line height is 150nm ~ 300nm, and the division line for being prepared out both can guarantee that reflectivity was enough
Height, and can ensure the straightness of division line, to improve the precision of division line.
Structure, the protection structure is protected at least to coat the division line, certainly, the protection structure covers the graduation
The first surface that line is located at.Since graticle is more used for precision instrument or high end instrument, so division line is held using metal
It is easily aoxidized, protection structure is formed on division line surface by way of vapor deposition or magnetron sputtering, to prevent division line by oxygen
Change；Wherein, in order to ensure the good transmitance of the graticle, the supporting body and the transmitance of structure is protected to be more than 95%,
The protection structure and the transmitance of the bearing bed are more than or equal to 97%；Wherein, the protection structural thickness be 100nm ~
500nm；Preferred embodiment, the protection structural thickness are 150nm ~ 500nm；Further, the protection structural thickness is 200nm
~400nm。
In another embodiment, the high reflection graticle further includes coating, and the coating is set to the protection structure
Surface, and the coating is made of polymer, is prepared graticle in large area, single graticle is finally cut into, at it
Surface is equipped with coating, and such cut surface can be very neat, and the case where will not bursting apart, and the coating uses
Flexible polymer layer can more preferably prevent from bursting apart.
In a wherein embodiment, there are refractive index between the supporting body, the protection structure and the coating
Difference, and the refringence absolute value is less than 0.5 between arbitrary two kinds, can be very good the transmitance of guarantee graticle so more
It is good, and the refringence absolute value is less than 0.5 between arbitrary two kinds, ensure that be not in apparent light between layers
Learn parallax.
In a wherein embodiment, the division line is made of silver, and the silver is formed in institute using magnetron sputtering mode
The first surface for stating supporting body is used as graduation wire material, the division line reflectivity higher being prepared using silver, and uses magnetic
The mode of sputtering is controlled, more improves the reflecting effect of division line, division line is more clear such graticle during use.
In a wherein embodiment, the protection structure is AZO films, and the AZO films pass through vapor deposition or magnetron sputtering
Mode is formed in the division line surface, more preferable for division line protectiveness using AZO films, and AZO film costs are also low,
Thermal stability is good, is more in line with the protection requirement of division line, and AZO films refer to the doping Al in ZnO systems and obtain ZnO：Al is transparent
Film；It is of course possible to select materials of the ITO as protective layer.
In a wherein embodiment, due to the transmitance of graticle to be ensured, so the thickness of coating to have it is certain
Limitation, the polymer is UV glue, and the thickness is not more than 20 μm.
The invention also discloses a kind of high reflection graduation board manufacturing methods, which is characterized in that includes the following steps：
S1, a supporting body is provided, the supporting body includes first surface and the second table being oppositely arranged with first surface
Face is equipped with metal film in the supporting body first surface；
S2, the metallic film patternization in step S1 is formed into division line；
S3, in step s 2 the division line surface are equipped with protection structure；Wherein, the supporting body and protection structure
Transmitance is more than 90%；
S4, protection body structure surface is equipped with coating in the step S3, and the coating is made of polymer, and
Ultra-violet curing is used for the solidification of the polymer.
In a wherein embodiment, metal film is formed using magnetron sputtering mode in the step S1, the metal film made with
The binding force of supporting body is more preferable.
In a wherein embodiment, structure is protected to be formed using vapor deposition or magnetron sputtering mode in the step S3, wherein
The protection structure is made of AZO thin-film materials, wherein protection structure can only cover division line part, can also be covered described
Supporting body is equipped with the side of division line.
In a wherein embodiment, there are refractive index between the supporting body, the protection structure and the coating
Difference, and the refringence absolute value is less than 0.5 between arbitrary two kinds.
Referring to Fig. 1, for large area graticle, the large area graticle 100 include supporting body 10 and it is several solely
Vertical small graticle 101, the small graticle 101 are set to 10 surface of the supporting body.
Referring to Fig. 2, a kind of high reflection graticle is disclosed, including：Supporting body 10, such as glass, the supporting body 10
The second surface being oppositely arranged including first surface and with first surface；Division line 20, the division line 20 are located at described hold
The first surface of carrier 10, and the division line 20 consists of metal, such as silver, silver-colored reflectivity is higher, preferred reflectance ratio
Preferable metal；Structure 30 is protected, the protection structure 30 coats the division line 20, also, the protection structure 30 covers
The supporting body 10 is equipped with this side of division line 20；Coating 40, the coating 40 are located at 30 side of protection structure,
40 material therefor of the coating is polymer, such as UV glue, and UV glue needs to use ultra-violet curing when solidification；Its
In, the supporting body 10 and protect structure 30 transmitance be more than or equal to 90% or the supporting body 10 and protection structure
30 transmitance is more than or equal to 95%；Since graticle use is in some precision instruments, and have for transmitance relatively high
It is required that such as：Telescope, microscope etc..
The protection structure 30 coats the division line 20, and " cladding " here makes division line 20 is not exposed to prevent outside point
The oxidation of scribing line 20, influences the normal use of graticle.
Referring to Fig. 2, the external morphology of protection structure 30 in Fig. 2 and division line 20 are similar, continuous risen there are one
Volt；Referring to Fig. 3, the protection structure 31 in Fig. 3 only coats division line 20, division line 20 is protected just, and the protection is tied
The pattern of structure 31 and division line 20 are similar, in 31 side of protection structure equipped with coating 41；Referring to Fig. 4, the protection in Fig. 4
Side of the structure 32 far from division line 20 is a flat surface, and the thickness of the protection structure 32 is more than the thickness of the division line 20
Degree, is embedded in inside equal to the division line 20 by protection structure 32 in this way, in 32 side of protection structure equipped with coating 42；
Fig. 5 and Fig. 6 is please referred to, structure 33 and protection structure 34 is protected to form certain arc on the basis of Fig. 2 and Fig. 3
Degree, in protection structure 33,34 sides equipped with coating 43,44.
In a wherein embodiment, the field used due to graticle is all high-precision optical apparatus measures, it is described in this way
It is required that supporting body 10, protection structure 30 and 40 optical difference of coating cannot be too big, thus the supporting body 10 with it is described
Protecting structure 30, there are refringences, and the refringence is less than 0.7, is further less than equal to 0.5, or be less than or equal to
0.4。
In a wherein embodiment, the supporting body 10 can select glass or the modeling of high transmittance hard of high transmittance
Material, such as PMMA.
In a wherein embodiment, 20 reflectivity of division line on graticle is higher so when in use will be more apparent,
More recognizable, so the division line 20 is made of silver, and the silver is formed in the supporting body using magnetron sputtering mode
10 first surface, silver-colored reflectivity is relatively high, silver-colored and supporting body 10 the bonding for using magnetron sputtering mode to make so here
Power is more secured, and the double-sided reflecting rate of silver can reach more than or equal to 90% or the double-sided reflecting rate of silver can reach and be more than or equal to
95%, so during use, the requirement for ambient light is not that very high, applicable environment is broader.
In a wherein embodiment, in order to reduce supporting body and protect the optical difference between structure, when supporting body 10 selects
When with glass, the protection structure 30 is AZO films or silica membrane, and the AZO films or silica membrane pass through
Vapor deposition or magnetron sputtering mode are formed in 20 surface of the division line, and difference so between the two is very small, and performance is more excellent
More, it in addition, forming the adhesive force increased between supporting body using vapor deposition or magnetron sputtering mode, is allowed to more securely.
Referring to Fig. 7, a kind of high reflection graduation board manufacturing method, which is characterized in that include the following steps：
S1, provide one carrying, 10, the supporting body 10 include first surface and be oppositely arranged with first surface second
Surface is equipped with metal film in 10 first surface of the supporting body；
S2, the metallic film patternization in step S1 is formed into division line 20；
S3, in step s 2 the division line surface are equipped with protection structure 30 or 31 or 32 or 33 or 34；Wherein, described to hold
The transmitance of carrier and protection structure is more than 90%；
S4, protection body structure surface is equipped with coating in the step S3, and the coating is made of polymer, and
Ultra-violet curing is used for the solidification of the polymer.
In a wherein embodiment, in order to increase the adhesive force of metal and supporting body 10, metal film is adopted in the step S1
It is formed with magnetron sputtering mode.
In a wherein embodiment, patterned way is in the step S2：Photoresists are equipped in the metallic film surface,
The metal film can select Ag films, be etched by exposing, and form division line 20；Wherein, described to etch the etching solution used
Including ammonium ceric nitrate or sodium acetates, during corrosion, can be obtained 1 μm of unilateral lateral erosion ＜, lines are steep, edge impulse- free robustness lack
The silver-based figure graticle of mouth.
In a wherein embodiment, structure is protected to be formed using vapor deposition or magnetron sputtering mode in the step S3.It is described
There are refringences with the protection structure for supporting body, and the refringence is less than 0.5.Wherein, the supporting body 10 can be with
Select high permeability glass or high transmittance rigid plastics, protection structure that can select material similar with supporting body optical effect
Material then protects structure to select silica for example, supporting body 10 selects glass.
Structure 30 is protected to be intended merely to the convenience in narration to protection structure 34, coating 40 ~ 44 in the application, in fact institute
The purpose for playing the role of and reaching is identical.
A kind of high reflection graticle of the utility model offer and preparation method thereof forms silver using magnetron sputtering technique, obtains
Two-sided high reflection silverskin increased between silverskin and glass matrix while ensureing that film layer has reached two-sided high reflectance
Adhesion strength, 1 μm of unilateral lateral erosion ＜, line can be obtained during corrosion in the compactness and corrosion resistance of film layer itself
Item is steep, edge impulse- free robustness notch silver-based figure graticle；On silver-based graticle, using vapor deposition or magnetron sputtering technique shape
There is certain thickness AZO films at one layer, enhance the wearability and oxidation resistance of silver-based graticle, while not dropping
The two-sided high reflectance of low silverskin, and it is more low using the AZO films cost, and thermal stability is good, for graticle
More preferably；Furthermore the AZO films film surface is equipped with UV glue-lines, is not easy to burst apart during large area produces cutting in this way, and
And the UV carries out ultra-violet curing.
To keep the above objects, features, and advantages of the utility model more obvious and easy to understand, above in conjunction with attached drawing to this
The specific implementation mode of utility model is described in detail.Elaborate many details in order to abundant in the above description
Understand the utility model.But the utility model can be much to implement different from other manner described above, this field
Technical staff can do similar improvement without prejudice to the utility model connotation, therefore the utility model is not by public above
The limitation for the specific embodiment opened.Also, each technical characteristic of embodiment described above can be combined arbitrarily, to make to retouch
It states succinctly, combination not all possible to each technical characteristic in above-described embodiment is all described, as long as however, these skills
Contradiction is not present in the combination of art feature, is all considered to be the range of this specification record.
Above-described embodiments merely represent several embodiments of the utility model, the description thereof is more specific and detailed,
But it should not be understood as limiting the scope of the patent of the utility model.It should be pointed out that for the common of this field
For technical staff, without departing from the concept of the premise utility, various modifications and improvements can be made, these all belong to
In the scope of protection of the utility model.Therefore, the protection domain of the utility model patent should be determined by the appended claims.
Claims (10)
1. a kind of high reflection graticle, which is characterized in that including：
Supporting body, the supporting body include first surface and the second surface that is oppositely arranged with first surface；
Division line, the division line is located at the first surface of the supporting body, and the division line consists of metal, wherein institute
It is 50nm ~ 500nm to state division line height；
Structure, the protection structure is protected at least to coat the division line；Wherein, the protection structural thickness be 100nm ~
500nm。
2. a kind of high reflection graticle according to claim 1, which is characterized in that the supporting body and protection knot
There are refringences between structure, and the refringence absolute value is less than 0.5.
3. a kind of high reflection graticle according to claim 1, which is characterized in that the supporting body is glass.
4. a kind of high reflection graticle according to claim 1, which is characterized in that the division line is made of silver, and institute
State the first surface that silver is formed in the supporting body using magnetron sputtering mode.
5. a kind of high reflection graticle according to claim 1, which is characterized in that the protection structure is that ITO or AZO is thin
Film；ITO the or AZO films are formed in the division line surface by vapor deposition or magnetron sputtering mode.
6. according to a kind of any high reflection graticle of claim 1 ~ 5, which is characterized in that the division line height is
100nm~400nm；Or the division line height is 150nm ~ 300nm.
7. according to a kind of any high reflection graticle of claim 1 ~ 5, which is characterized in that the protection structural thickness is
150nm~500nm；Or the protection structural thickness is 200nm ~ 400nm.
8. according to a kind of any high reflection graticle of claim 1 ~ 5, which is characterized in that the protection structure covers institute
State the first surface that division line is located at.
9. a kind of high reflection graticle according to claim 1, which is characterized in that the protection structure and the carrying
The transmitance of layer is more than 95%.
10. a kind of high reflection graticle according to claim 9, which is characterized in that the protection structure and described hold
The transmitance of carrier layer is more than or equal to 97%.
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| CN201721851645.1U CN207799253U (en) | 2017-12-27 | 2017-12-27 | A kind of high reflection graticle |
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| Application Number | Priority Date | Filing Date | Title |
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| CN201721851645.1U CN207799253U (en) | 2017-12-27 | 2017-12-27 | A kind of high reflection graticle |
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Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN109445122A (en) * | 2018-12-18 | 2019-03-08 | 长沙韶光铬版有限公司 | A kind of reflection-type graticle and preparation method thereof |
| CN109459866A (en) * | 2018-12-18 | 2019-03-12 | 长沙韶光铬版有限公司 | A kind of integration graticle and preparation method thereof |
-
2017
- 2017-12-27 CN CN201721851645.1U patent/CN207799253U/en active Active
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN109445122A (en) * | 2018-12-18 | 2019-03-08 | 长沙韶光铬版有限公司 | A kind of reflection-type graticle and preparation method thereof |
| CN109459866A (en) * | 2018-12-18 | 2019-03-12 | 长沙韶光铬版有限公司 | A kind of integration graticle and preparation method thereof |
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