CN109445122A - A kind of reflection-type graticle and preparation method thereof - Google Patents
A kind of reflection-type graticle and preparation method thereof Download PDFInfo
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- CN109445122A CN109445122A CN201811552972.6A CN201811552972A CN109445122A CN 109445122 A CN109445122 A CN 109445122A CN 201811552972 A CN201811552972 A CN 201811552972A CN 109445122 A CN109445122 A CN 109445122A
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- graticle
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
- G02B27/32—Fiducial marks and measuring scales within the optical system
- G02B27/34—Fiducial marks and measuring scales within the optical system illuminated
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- General Physics & Mathematics (AREA)
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Abstract
The present invention relates to a kind of reflection-type graticles and preparation method thereof; the graticle includes basal layer (1) and pattern layer (2); the second surface that the basal layer (1) has first surface and is oppositely arranged with first surface; it is characterized in that; the first surface is equipped with reflecting layer (3); the reflecting layer (3) is equipped with transparent protective layer (4), protective layer (4) with a thickness of 50-500nm, the pattern layer (2) is set on protective layer (4) outer surface or on the second surface of basal layer.The reflectivity of the reflectivity > 95% in the reflecting layer of graticle of the present invention, pattern layer can be down to 0.1%, and light, by reflection and absorption, can obtain the image of high contrast in target position in irradiation.
Description
Technical field
The present invention relates to a kind of reflection-type graticles and preparation method thereof.
Background technique
Graticle is usually used on the devices such as gun sight, telescope, instrument of surveying and mapping.Conventional graticle is generally point of infiltration type
Plate is drawn, when light enters from graph layer, the light in the area graph layer Ge Mo is absorbed that (low reflection, about 10%), graph layer without chromium film area light are saturating
It crosses substrate of glass or other transparent materials penetrates, by transmission and non-transmission, obtain the graduation figure of transmission, it is common in this way
Infiltration type graticle is relatively simple for the material requirement of matrix, generally can only be optical glass or quartz glass, and only
It can be combined in single mode.
Summary of the invention
In view of the deficiencies of the prior art, the present invention provides a kind of reflection-type graticle and preparation method thereof, the production method
The reflectivity > 95% in available reflecting layer, the reflectivity < 1% of pattern layer have high-contrast image to obtain, are simultaneously
The graticle of reflection-type.The reflection-type graticle is unrestricted for the material requirement of matrix, while can also carry out with lens
Combination.
In order to solve the above-mentioned technical problem, technical scheme is as follows:
A kind of reflection-type graticle, including basal layer and pattern layer, the basal layer have first surface and with first surface phase
To the second surface of setting, which is characterized in that the first surface is equipped with reflecting layer, and the reflecting layer is equipped with transparent protection
Layer, protective layer with a thickness of 50-500nm, the pattern layer is set on protective layer outer surface or on the second surface of basal layer.
In this way, the setting of protective layer, can protect reflecting layer in development corrosion process.Protective layer thickness is set as 50-
500nm can get good protecting effect, and meet the transmission demand of light.The setting in reflecting layer, can will be saturating from pattern lamellar spacing
The light crossed reflexes to target position, obtains the high image of contrast in target position, expands the application scenarios of graticle.
Further, the pattern layer can be made of low reflecting material, this can be realized by the prior art.
Further, the reflecting layer is chromium film or silverskin, preferably silverskin.The reflectivity of chromium is reachable in visible light wave range
60%, silver-colored reflectivity help to obtain the image of high contrast up to 95%.
Further, the protective layer with a thickness of 100-400nm, be further 150-300nm.
Further, the reflecting layer with a thickness of 50~500nm.
Further, the pattern layer consists of metal.
Further, the metal is chromium.
Further, the pattern layer with a thickness of 50-200nm.
Further, the pattern layer is made of the assembly of thin films of above three layers or three layers or more.
Further, the pattern layer includes the first CrNO layers, CrN layers, the 2nd CrNO being sequentially distributed from the bottom to top
Layer, it is preferable that the first CrNO layers with a thickness of 2~20nm, CrN layers with a thickness of 30~180nm, the 2nd CrNO layers with a thickness of
10~30nm.
Further, the basal layer is the other materials such as glass material, ceramics, metal.
The protective layer is silica membrane or UV glue film.
The production method of reflection-type graticle as described above, includes the following steps:
S1, the target surface production reflecting layer in basal layer；
S2, protective layer is made in the outer surface in the reflecting layer；
S3, as needed, in protective layer outer surface or another surface pattern-making layer of basal layer.
Further, reflecting layer and/or protective layer are made by sputtering or evaporation coating method.
Optionally, conventional semiconductor processing procedure can be selected in the production of pattern layer, is equipped with sense in the pattern layer metallic film surface
Optical cement is etched by exposure, forms figure；Wherein, the etching solution used that etches includes ammonium ceric nitrate or sodium acetate, in corruption
During erosion, it can be obtained that 1 μm of unilateral lateral erosion <, lines are steep, chromium base figure graticle of edge impulse- free robustness notch.
By a series of existing processes such as chromium plating, gluing, exposure, development, corrosion, graphic making, Ke Yiman can be completed
The production of 1 micron of foot or more line width.
Compared with prior art, beneficial effects of the present invention are as follows:
(1) reflectivity in the reflecting layer of graticle of the present invention is up to 95%, and the reflectivity of pattern layer can be down to 0.1%, and light is irradiating
When, by reflection and absorption, the image of high contrast can be obtained in target position；
(2) present invention is a kind of graticle of reflection-type, and compared with normal transmissive graticle, the requirement for basic material is not
It is confined to the transparent materials such as optical glass or quartz glass again, the planar materials such as glass, ceramics, metal can be used.
Detailed description of the invention
Fig. 1 is a kind of sectional view of existing graticle.
Fig. 2 is the sectional view of the graticle of the embodiment of the present invention 1.
Fig. 3 is the sectional view of the graticle of the embodiment of the present invention 2.
Specific embodiment
Below with reference to embodiment, the present invention will be described in detail.It should be noted that in the absence of conflict, the present invention
In embodiment and embodiment in feature can be combined with each other.For sake of convenience, hereinafter such as occur "upper", "lower", " left side ",
" right side " printed words only indicate consistent with the upper and lower, left and right direction of attached drawing itself, do not play restriction effect to structure.
Embodiment 1
As shown in Fig. 2, a kind of reflection-type graticle, including basal layer 1 and pattern layer 2, the basal layer 1 have first surface and
The second surface being oppositely arranged with first surface, the first surface are equipped with reflecting layer 3, and the reflecting layer 3 is equipped with transparent
Protective layer 4, protective layer 4 with a thickness of 200nm, the pattern layer 2 is set on protective layer outer surface.
The reflecting layer 3 is chromium film or silverskin.The reflecting layer 3 with a thickness of 200nm.
The pattern layer 2 is made of crome metal.
The pattern layer 2 with a thickness of 100nm.
The basal layer 1 is glass material.
The production method of reflection-type graticle as described above, includes the following steps:
S1, the target surface production reflecting layer in basal layer；
S2, protective layer is made in the outer surface in the reflecting layer；
S3, using conventional semiconductor processing procedure, in protective layer outer surface pattern-making layer.
Reflecting layer and protective layer are made by magnetron sputtering method.
Embodiment 2
Embodiment 1 is repeated, as shown in figure 3, difference is that pattern layer is set on the second surface of basal layer in the present embodiment,
In this way, can also obtain reflecting effect, after light enters above pattern layer, base layer is passed through, reflecting layer is reached and is reflected back pattern layer
When, can slightly have ghost phenomena appearance.
The content that above-described embodiment illustrates should be understood as that these embodiments are only used for being illustrated more clearly that the present invention, without
For limiting the scope of the invention, after the present invention has been read, those skilled in the art are to various equivalent forms of the invention
Modification each fall within the application range as defined in the appended claims.
Claims (10)
1. a kind of reflection-type graticle, including basal layer (1) and pattern layer (2), the basal layer (1) have first surface and with
The second surface that first surface is oppositely arranged, which is characterized in that the first surface is equipped with reflecting layer (3), the reflecting layer (3)
Be equipped with transparent protective layer (4), protective layer (4) with a thickness of 50-500nm, the pattern layer (2) is set to protective layer (4) outside
On surface or on the second surface of basal layer.
2. reflection-type graticle according to claim 1, which is characterized in that the reflecting layer (3) is chromium film or silverskin.
3. reflection-type graticle according to claim 1, which is characterized in that the reflecting layer (3) with a thickness of 50-
500nm。
4. reflection-type graticle according to claim 1, which is characterized in that the pattern layer (2) consists of metal.
5. reflection-type graticle according to claim 4, which is characterized in that the metal is chromium.
6. reflection-type graticle according to claim 1, which is characterized in that the pattern layer (2) with a thickness of 50-
200nm。
7. reflection-type graticle according to claim 1, which is characterized in that the protective layer is silica membrane.
8. reflection-type graticle according to claim 1, which is characterized in that the basal layer (1) is glass material, pottery
One of porcelain, metal material.
9. such as the production method of the described in any item reflection-type graticles of claim 1-8, which is characterized in that including walking as follows
It is rapid:
S1, the target surface production reflecting layer in basal layer；
S2, protective layer is made in the outer surface in the reflecting layer；
S3, as needed, in protective layer outer surface or another surface pattern-making layer of basal layer.
10. the production method of reflection-type graticle according to claim 9, which is characterized in that pass through vacuum coating method
Make reflecting layer and/or protective layer.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201811552972.6A CN109445122A (en) | 2018-12-18 | 2018-12-18 | A kind of reflection-type graticle and preparation method thereof |
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| CN201811552972.6A CN109445122A (en) | 2018-12-18 | 2018-12-18 | A kind of reflection-type graticle and preparation method thereof |
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| CN109445122A true CN109445122A (en) | 2019-03-08 |
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| CN201811552972.6A Pending CN109445122A (en) | 2018-12-18 | 2018-12-18 | A kind of reflection-type graticle and preparation method thereof |
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Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN114488509A (en) * | 2021-12-27 | 2022-05-13 | 湖北华中光电科技有限公司 | Prism reticle and preparation method thereof |
| CN115369356A (en) * | 2022-08-15 | 2022-11-22 | 河南平原光电有限公司 | Manufacturing method of laser transmission and reflection dual-purpose reticle |
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Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN114488509A (en) * | 2021-12-27 | 2022-05-13 | 湖北华中光电科技有限公司 | Prism reticle and preparation method thereof |
| CN114488509B (en) * | 2021-12-27 | 2023-08-18 | 湖北华中长江光电科技有限公司 | Prism reticle and preparation method thereof |
| CN115369356A (en) * | 2022-08-15 | 2022-11-22 | 河南平原光电有限公司 | Manufacturing method of laser transmission and reflection dual-purpose reticle |
| CN115369356B (en) * | 2022-08-15 | 2023-10-24 | 河南平原光电有限公司 | Manufacturing method of laser transmission and reflection dual-purpose reticle |
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Application publication date: 20190308 |