CN205703715U - A kind of carborundum chemical polisher efficient and convenient for cleaning - Google Patents
A kind of carborundum chemical polisher efficient and convenient for cleaning Download PDFInfo
- Publication number
- CN205703715U CN205703715U CN201620388348.7U CN201620388348U CN205703715U CN 205703715 U CN205703715 U CN 205703715U CN 201620388348 U CN201620388348 U CN 201620388348U CN 205703715 U CN205703715 U CN 205703715U
- Authority
- CN
- China
- Prior art keywords
- polished land
- polished
- base
- carborundum
- efficient
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
Landscapes
- Grinding-Machine Dressing And Accessory Apparatuses (AREA)
Abstract
A kind of carborundum chemical polisher efficient and convenient for cleaning, including base, the upper side of described base is provided with fixed plate and the first polished land being rotated by driven by motor and the second polished land.This carborundum chemical polisher efficient and convenient for cleaning, carborundum be polished by the first polished land of being provided with and the second polished land and by sanding apparatus and burnishing device, so can there is a preliminary operation polishing corner angle for carborundum, not only facilitate following polishing process, and make to polish more thorough, can be collected for used polishing fluid by annular waste liquid tank and waste collection groove, polishing fluid will not be trickled everywhere, facilitate the cleaning after work, and polishing time and cost can also be saved to a certain extent, there is very strong practicality.
Description
Technical field
The utility model relates to silicon carbide optical polishing machine technology field, be specially a kind of efficiently and
Carborundum chemical polisher convenient for cleaning.
Background technology
As high-brightness LED is in the sharp increase of illuminating engineering domain requirement amount, drive state
The development of industry prepared by interior silicon carbide substrates material.Due to carborundum crystals (α-Al2O3) tool
Have the distinguishing features such as high temperature resistant, corrosion-resistant, transmission region width, be the first-selection of outer prolongation GaN
Backing material, but also big, stable chemical nature just because of carborundum extreme hardness, fragility
Feature, gives materials processing, and especially wafer surface nanoscale polishing brings a lot of tired technically
Difficulty, needs to be processed by shot blasting the surface of carborundum, at present in the operation of processing carborundum
Polishing technology be the processing in single face, again another side is thrown after processing one side finishes
Light process, manufacturing procedure is loaded down with trivial details, and operating efficiency is low, is unfavorable for producing, and processes general
Do not possess chemical polisher, so make to polish not thorough, and the waste liquid of chemical polisher is not
Easily collecting, to this it is proposed that a kind of carborundum chemical polisher efficient and convenient for cleaning.
Content of the invention
The purpose of this utility model is to provide a kind of carborundum chemistry efficient and convenient for cleaning to throw
Ray machine, with the problem solving to propose in above-mentioned background technology.
Design of the present utility model is: a kind of silicon carbide optical polishing efficient and convenient for cleaning
Machine, including base, the upper side of described base is provided with fixed plate and is revolved by driven by motor
The first polished land turning and the second polished land, the side of described first polished land is provided with vertical
Directly being installed on the sanding apparatus of base, described sanding apparatus includes that being positioned at the first polished land just goes up
The polishing rod of side；It is provided with containing liquid chamber and burnishing device, containing liquid chamber bottom in described fixed plate
Connection polishing fluid conveying pipe one end, polishing fluid conveying the pipe other end be connected be positioned at the second polishing put down
Shower nozzle directly over platform, is provided with annular in the second polished land bottom around the second polished land useless
Liquid bath, described annular waste liquid tank connects with waste collection groove through a guiding gutter；Described polishing dress
Put and include being positioned at the polished silicon wafer directly over the second polished land.
During work, the carborundum needing processing is placed in the first polished land and carries out preparatory processing, open
Dynamic motor and sanding apparatus, rotate the first polished land and utilize polishing rod to polish, to carbonization
On silicon, some bigger corner angle polish, and again the carborundum of preparatory processing are placed on afterwards
In two polished land, sprayed polishing fluid by shower nozzle on sic, restart motor and polishing
Device, rotates the second polished land and utilizes polished silicon wafer to be polished, carry out last to carborundum
Finishing polish works, and the polishing fluid spraying out after usage, flows back in annular waste liquid tank,
Flow in waste collection groove by guiding gutter again, be so possible not only to carborundum is carried out precisely
Perfect polishing, but also it is easy to cleaning, economical and practical.
Described base is hollow structure, and the inside of base is provided with and the first polished land and the second polishing
The corresponding rotary shaft in position of platform, described rotary shaft lower end connects motor, and base is run through in upper end
And it is connected with the first polished land and the second polished land.Motor drives first by rotary shaft
Polished land and the second polished land rotate.
In order to ensure have certain altitude difference between annular waste liquid tank and waste collection groove, waste liquid can be suitable
Profit flows into waste collection groove, and described waste collection groove is positioned at base side, described guiding gutter
It is located on base.
Preferably, described base is connected with rotary shaft by bearing.Frictional resistance is little, reduces rotary shaft
And the frictionally damage between base, improves mechanical efficiency, it is simple to installing/dismounting, easy to maintenance.
The beneficial effects of the utility model are: this carborundum chemical polisher efficient and convenient for cleaning,
By the first polished land of being provided with and the second polished land and pass through sanding apparatus and polishing
Device is polished for carborundum, so one can be had preliminary to polish rib for carborundum
The operation at angle, not only facilitates following polishing process, and makes to polish more thorough, logical
Cross annular waste liquid tank and waste collection groove can be collected for used polishing fluid so that
Polishing fluid will not trickle everywhere, facilitates the cleaning after work, and goes back to a certain extent
Polishing time and cost can be saved, there is very strong practicality.
Brief description
Fig. 1 is the utility model structural representation；
Fig. 2 is motor schematic diagram of the present utility model.
In figure: 1 base, 2 first polished land, 3 second polished land, 4 annular waste liquid tanks, 5
Sanding apparatus, 6 burnishing devices, 7 polishing fluids conveying pipes, 8 shower nozzles, 9 waste collection grooves, 10
Polishing rod, 11 motors, 12 fixed plates, 13 containing liquid chambers, 14 guiding gutters, 15 polished silicon wafer,
16 rotary shafts.
Detailed description of the invention
Below in conjunction with the accompanying drawing in the utility model embodiment, to the skill in the utility model embodiment
Art scheme is clearly and completely described.As shown in figs. 1-2, a kind of efficient and convenient clear
Clean carborundum chemical polisher, including base 1, the upper side of described base 1 is provided with fixing
Plate 12 and motor 11 is driven the first polished land 2 of rotating and the second polished land
3, the side of described first polished land 2 is provided with the sanding apparatus 5 being installed vertically on base 1,
Described sanding apparatus 5 includes being positioned at the polishing rod 10 directly over the first polished land 2；Described
Fixed plate 12 on be provided with containing liquid chamber 13 and burnishing device 6, containing liquid chamber 13 bottom connects
Polishing fluid carry pipe 7 one end, polishing fluid conveying pipe 7 other end be connected be positioned at the second polishing put down
Shower nozzle 8 directly over platform 3, sets around the second polished land 3 in the second polished land 3 bottom
Having annular waste liquid tank 4, described annular waste liquid tank 4 is through a guiding gutter 14 and waste collection groove 9
Connection；Described burnishing device 6 includes being positioned at the polished silicon wafer directly over the second polished land 3
15.Described base 1 is hollow structure, and base 1 internal be provided with the first polished land 2 and
The second corresponding rotary shaft 16 in polished land 3 position, described rotary shaft 16 lower end connects electricity
Machine 11, upper end is run through base 1 and connects with the first polished land 2 and the second polished land 3
Connecing, described base 1 is connected with rotary shaft 16 by bearing.
Workflow: first, is placed on the carborundum needing processing in the first polished land 2,
Starting motor 11 and sanding apparatus 5, polishes in limit rotation limit, on carborundum, some are bigger
Corner angle polish, and again the carborundum of preparatory processing are placed on the second polished land 3 afterwards
On, sprayed polishing fluid by shower nozzle on sic, restart motor 11 and burnishing device 6,
Limit rotates edge polishing, carries out last finishing polish work, the polishing fluid spraying out to carborundum
After usage, flow back in annular waste liquid tank 4, receive flowing to waste liquid by guiding gutter 14
In collection groove 9.
Claims (4)
1. a carborundum chemical polisher efficient and convenient for cleaning, including base (1), it is special
Levy and be: the upper side of described base (1) is provided with fixed plate (12) and by motor (11)
Drive the first polished land (2) of rotating and the second polished land (3), described first
The side of polished land (2) is provided with the sanding apparatus (5) being installed vertically on base (1), institute
State sanding apparatus (5) to include being positioned at polishing rod (10) directly over the first polished land (2)；
It is provided with containing liquid chamber (13) and burnishing device (6), containing liquid chamber in described fixed plate (12)
(13) bottom connection polishing fluid conveying pipe (7) one end, polishing fluid conveying pipe (7) other end
It is connected with the shower nozzle (8) being positioned at directly over the second polished land (3), in the second polished land
(3) bottom is provided with annular waste liquid tank (4) around the second polished land (3), and described annular is given up
Liquid bath (4) connects with waste collection groove (9) through a guiding gutter (14)；Described polishing dress
Put (6) to include being positioned at the polished silicon wafer (15) directly over the second polished land (3).
2. carborundum chemical polisher efficient and convenient for cleaning according to claim 1, its
It is characterised by: described base (1) is hollow structure, and base (1) inside is provided with and first
Polished land (2) and the corresponding rotary shaft in the second polished land (3) position (16), described
Rotary shaft (16) lower end connect motor (11), base (1) is run through and with first in upper end
Polished land (2) and the second polished land (3) connect.
3. carborundum chemical polisher efficient and convenient for cleaning according to claim 1, its
It is characterised by: described waste collection groove (9) is positioned at base (1) side, described water conservancy diversion
Groove (14) is located on base (1).
4. carborundum chemical polisher efficient and convenient for cleaning according to claim 1, its
It is characterised by: described base (1) is connected with rotary shaft (16) by bearing.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201620388348.7U CN205703715U (en) | 2016-04-29 | 2016-04-29 | A kind of carborundum chemical polisher efficient and convenient for cleaning |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201620388348.7U CN205703715U (en) | 2016-04-29 | 2016-04-29 | A kind of carborundum chemical polisher efficient and convenient for cleaning |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN205703715U true CN205703715U (en) | 2016-11-23 |
Family
ID=57331705
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201620388348.7U Active CN205703715U (en) | 2016-04-29 | 2016-04-29 | A kind of carborundum chemical polisher efficient and convenient for cleaning |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN205703715U (en) |
-
2016
- 2016-04-29 CN CN201620388348.7U patent/CN205703715U/en active Active
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN205703679U (en) | A kind of can the carborundum polishing machine of automated cleaning polishing block | |
| CN204658194U (en) | A kind of cleaning device | |
| CN111761505B (en) | Silicon wafer double-side grinding equipment and production process thereof | |
| CN206123407U (en) | Intelligent quartz stone plate burnishing machine | |
| CN108818254A (en) | A kind of sander for vehicle glass | |
| CN106890836A (en) | A kind of cleaning equipment of mobile phone camera eyeglass | |
| CN205703565U (en) | A kind of carborundum chemical polisher | |
| CN207372924U (en) | A kind of sapphire substrate sheet double-sided polisher | |
| CN203738552U (en) | Polishing machine for removing coating on surface of test piece | |
| CN208977503U (en) | A kind of polishing machine | |
| CN100593455C (en) | Hydration polisher | |
| CN108942422B (en) | Polishing method of coal brick | |
| CN205703715U (en) | A kind of carborundum chemical polisher efficient and convenient for cleaning | |
| CN207071831U (en) | A kind of artificial marble automatic polishing streamline | |
| CN211760820U (en) | Grinding machine dust recovery device | |
| CN108704891A (en) | Fine purifiation device and its operating method suitable for accurate steel balls processing | |
| CN106425882B (en) | Unidirectional automatic sand-blasting machine | |
| KR100779578B1 (en) | Apparatus for grinding surface of roll | |
| CN108161578B (en) | Processing method of end face of slender optical device | |
| CN205703774U (en) | A kind of carborundum buffing machine with cleaning device | |
| CN208527533U (en) | A kind of bonding boron carbide pipeline rotary type ultraphonic cleaning machine | |
| CN101444896B (en) | Method for removing rust on outer surface of steel pipe on line | |
| CN212762643U (en) | Automatic cleaning device for grinding optical lens | |
| CN114932500A (en) | Grinding and polishing integrated device and operation method thereof | |
| CN111136336B (en) | Fine flat grinding method for diamond saw blade |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| TR01 | Transfer of patent right |
Effective date of registration: 20190325 Address after: 250100 AB Block 1106-6-01, Century Fortune Center, West Side of Xinyu Road, Jinan High-tech Zone, Shandong Province Patentee after: Shandong Tianyue Advanced Material Technology Co., Ltd. Address before: 250118 the middle part of Mei Li Lake, Huaiyin District, Ji'nan, Shandong Patentee before: Shandong Tianyue Crystal Material Co., Ltd. |
|
| TR01 | Transfer of patent right | ||
| CP03 | Change of name, title or address |
Address after: No.99, Tianyue South Road, Huaiyin District, Jinan City, Shandong Province Patentee after: Shandong Tianyue advanced technology Co., Ltd Address before: 250100 AB Block 1106-6-01, Century Fortune Center, West Side of Xinyu Road, Jinan High-tech Zone, Shandong Province Patentee before: Shandong Tianyue Advanced Materials Technology Co.,Ltd. |
|
| CP03 | Change of name, title or address |