CN205703565U - A kind of carborundum chemical polisher - Google Patents

A kind of carborundum chemical polisher Download PDF

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Publication number
CN205703565U
CN205703565U CN201620387061.2U CN201620387061U CN205703565U CN 205703565 U CN205703565 U CN 205703565U CN 201620387061 U CN201620387061 U CN 201620387061U CN 205703565 U CN205703565 U CN 205703565U
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China
Prior art keywords
base
guide rail
polished land
polished
slide block
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Active
Application number
CN201620387061.2U
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Chinese (zh)
Inventor
宗艳民
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Shandong Tianyue Advanced Technology Co Ltd
Original Assignee
Shandong Tianyue Crystal Material Co Ltd
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Publication date
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Priority to CN201620387061.2U priority Critical patent/CN205703565U/en
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Publication of CN205703565U publication Critical patent/CN205703565U/en
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Abstract

A kind of carborundum chemical polisher, including base, it is characterized in that: the upper side of described base is provided with fixed plate and is carried out the polished land rotated by driven by motor, the side of described polished land is provided with the sanding apparatus being installed vertically on base, described sanding apparatus includes polishing rod and the guide rail slide block of bottom being positioned at upper end, and described guide rail slide block coordinates the movement realizing sanding apparatus with the guide rail being arranged at base;Described burnishing device includes polished silicon wafer and the guide rail slide block of the other end being fixed on the one end near polished land, and described guide rail slide block coordinates the movement realizing burnishing device with the guide rail being arranged at fixed plate side;Sanding apparatus and burnishing device are located at the side of same polished land by this utility model, can be polished after polishing, save room and time, and be provided with hair drier can by polishing after dust clean out, conveniently carry out next step polishing.

Description

A kind of carborundum chemical polisher
Technical field
This utility model relates to a kind of buffing machine, is specifically related to a kind of carborundum chemical polisher.
Background technology
General need some procedures time carborundum is processed, entering the most step by step OK, every procedure is designed with instrument, and the space occupied is big, and it also requires by carborundum from upper One procedure moves on to next process, wastes time and energy.Further, the polished land after polishing Needs are cleared up, to ensure follow-up crudy.
Summary of the invention
For the problems referred to above, the utility model proposes a kind of grinding and buffing in the silicon carbide of one Optical polishing machine, is provided with sanding apparatus and burnishing device in polished land, carries out first post-treatment, Save space, and in polished land, be provided with hair drier, by the polished land after polishing Dust is cleaned out.
For solving the problems referred to above, design of the present utility model is: a kind of carborundum chemical polisher, Including base, the upper side of described base is provided with fixed plate and is carried out rotating by driven by motor Polished land, the side of described polished land is provided with the sanding apparatus being installed vertically on base, institute Stating sanding apparatus and include being positioned at polishing rod and the guide rail slide block of bottom of upper end, described guide rail is sliding Block coordinates the movement realizing sanding apparatus with the guide rail being arranged at base;Set in described fixed plate It is equipped with containing liquid chamber and burnishing device, containing liquid chamber bottom connection polishing fluid conveying pipe one end, polishing fluid The conveying pipe other end connects the shower nozzle being positioned at directly over polished land;At polished land bottom ring Being provided with annular waste liquid tank around polished land, described annular waste liquid tank is through a mozzle and waste collection Groove connects, and described mozzle is threadeded with waste collection groove;Described burnishing device includes solid Due to polished silicon wafer and the guide rail slide block of the other end of the one end near polished land, described leads Rail slide block coordinates the movement realizing burnishing device with the guide rail being arranged at fixed plate side;In polishing Liquid conveying pipe connects one end of shower nozzle and is additionally provided with the air outlet hair drier just to polished land. Described base is hollow structure, and chassis interior is provided with the rotation corresponding with polished land position Axle, described rotary shaft lower end connects motor, and upper end is run through base and is connected with polished land. Motor drives polished land to rotate by rotary shaft.
Described waste collection groove is positioned at base side, and described mozzle is located on base.Ensure ring Having certain altitude between shape waste liquid tank and waste collection groove poor, waste liquid can be suitable by mozzle Profit flows into waste collection groove, and is prevented from polishing fluid and flows on base or splash ground. Described base is connected with rotary shaft by bearing.Frictional resistance is little, reduce rotary shaft and base it Between frictionally damage, improve mechanical efficiency, it is simple to installing/dismounting, easy to maintenance.
During work, the carborundum needing processing is placed in polished land and carries out initial processing, will polishing Device moves to the position away from polished land, starts motor and sanding apparatus, rotates polishing flat Platform utilizes polishing rod to polish, and polishes some bigger corner angle on carborundum, opens Dust in polished land is cleared up by hair drier, is polished work afterwards, by sanding apparatus Mobile to the position away from polished land, sprayed polishing fluid by shower nozzle on sic, then open Dynamic burnishing device, rotates polished land and utilizes polished silicon wafer to be polished, and carborundum carries out essence throwing Light works, and the polishing fluid sprayed out after usage, flows back in annular waste liquid tank, then leads to Crossing mozzle and flow in waste collection groove, replaceable waste collection groove is to ensure that waste liquid does not spills over Come, keep the cleaning of working environment, not only save room and time in the work of same polished land, But also it is easy to cleaning, economical and practical.
Beneficial effect: sanding apparatus and burnishing device are located at the one of same polished land by this utility model Side, can be polished after polishing, saves room and time, and be provided with hair drier can be by Dust after polishing is cleaned out, and conveniently carries out next step polishing.
Accompanying drawing explanation
Fig. 1 is structural representation of the present utility model;
Fig. 2 is motor schematic diagram of the present utility model;
In figure: 1 base, 2 polished land, 3 polishing rod, 4 annular waste liquid tanks, 5 sanding apparatus, 6 burnishing devices, 7 polished silicon wafer, 8 polishing fluids conveying pipes, 9 shower nozzles, 10 hair driers, 11 Motor, 12 fixed plates, 13 containing liquid chambers, 14 mozzles, 15 waste collection grooves, 16 rotations Axle, 17 guide rails.
Detailed description of the invention
A kind of carborundum chemical polisher, including base 1, the upper side of described base 1 is provided with solid Determine plate 12 and driven the polished land 2 carrying out rotating, described polished land 2 by motor 11 Side be provided with the sanding apparatus 5 being installed vertically on base 1, described sanding apparatus 5 includes position In the polishing the rod 3 and guide rail slide block of bottom of upper end, described guide rail slide block be arranged at base The guide rail 17 of 1 coordinates the movement realizing sanding apparatus 5;It is provided with in described fixed plate 12 Containing liquid chamber 13 and burnishing device 6, containing liquid chamber 13 bottom connection polishing fluid conveying pipe 8 one end, Polishing fluid conveying pipe 8 other end connects the shower nozzle 9 being positioned at directly over polished land 2;Throwing Optical platform 2 bottom is provided with annular waste liquid tank 4, described annular waste liquid tank 4 around polished land 2 Connect with waste collection groove 15 through a mozzle 14, described mozzle 14 and waste collection groove 15 is threaded;Described waste collection groove 15 is positioned at base 1 side, described mozzle 14 are located on base 1.Described burnishing device 6 includes being fixed near polished land 2 The polished silicon wafer 7 of one end and the guide rail slide block of the other end, described guide rail slide block is consolidated with being arranged at The guide rail determining plate 12 side coordinates the movement realizing burnishing device 6;Pipe 8 is carried at polishing fluid The one end connecting shower nozzle 9 is additionally provided with the air outlet hair drier 10 just to polished land.Base 1 For being provided with the rotary shaft 16 corresponding with polished land 2 position inside hollow structure, and base 1, Described rotary shaft 16 lower end connects motor 11, and base 1 and and polished land are run through in upper end 2 connect.
During work, the carborundum needing processing is placed in polished land 2 and carries out initial processing, Burnishing device 6 is moved to the position away from polished land 2, start motor 11 and polishing dress Put 5, rotate polished land 2 and utilize polishing rod 3 to polish, on carborundum some are bigger Corner angle polish, open hair drier 10 by polished land 2 dust clear up, it After carry out polishing, sanding apparatus 5 is moved to the position away from polished land 2, passes through Shower nozzle 9 sprays polishing fluid on sic, restarts burnishing device 6, rotates polished land 2 Utilize polished silicon wafer 7 to be polished, carborundum is carried out finishing polish work, the polishing sprayed out Liquid after usage, flows back in annular waste liquid tank 15, then flows to waste liquid by mozzle 14 In collecting tank 15.

Claims (4)

1. a carborundum chemical polisher, including base (1), it is characterised in that: described base (1) upper side is provided with fixed plate (12) and is driven by motor (11) and to carry out rotating Polished land (2), the side of described polished land (2) is provided with and is installed vertically on base (1) Sanding apparatus (5), described sanding apparatus (5) include being positioned at upper end polishing rod (3) and The guide rail slide block of bottom, described guide rail slide block and the guide rail (17) being arranged at base (1) Coordinate the movement realizing sanding apparatus (5);It is provided with liquid storage in described fixed plate (12) Storehouse (13) and burnishing device, containing liquid chamber (13) bottom connection polishing fluid conveying pipe (8) End, polishing fluid conveying pipe (8) other end connects the spray being positioned at directly over polished land (2) Head (9);It is provided with annular waste liquid tank (4) around polished land (2) in polished land (2) bottom, Described annular waste liquid tank (4) connects with waste collection groove (15) through a mozzle (14), Described mozzle (14) is threadeded with waste collection groove (15);Described burnishing device (6) Including the polished silicon wafer (7) of one end being fixed near polished land (2) and leading of the other end Rail slide block, described guide rail slide block coordinates realization with the guide rail being arranged at fixed plate (12) side The movement of burnishing device (6);One end of shower nozzle (9) is connected at polishing fluid conveying pipe (8) It is additionally provided with the air outlet hair drier (10) just to polished land.
Carborundum chemical polisher the most according to claim 1, it is characterised in that: the described end Seat (1) is hollow structure, and base (1) inside is provided with and polished land (2) position pair The rotary shaft (16) answered, described rotary shaft (16) lower end connects motor (11), and upper end is passed through Wear base (1) and be connected with polished land (2).
Carborundum chemical polisher the most according to claim 1, it is characterised in that: described Waste collection groove (15) is positioned at base (1) side, and described mozzle (14) is located at the end On seat (1).
Carborundum chemical polisher the most according to claim 1, it is characterised in that: the described end Seat (1) is connected with rotary shaft (16) by bearing.
CN201620387061.2U 2016-04-29 2016-04-29 A kind of carborundum chemical polisher Active CN205703565U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN201620387061.2U CN205703565U (en) 2016-04-29 2016-04-29 A kind of carborundum chemical polisher

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN201620387061.2U CN205703565U (en) 2016-04-29 2016-04-29 A kind of carborundum chemical polisher

Publications (1)

Publication Number Publication Date
CN205703565U true CN205703565U (en) 2016-11-23

Family

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Family Applications (1)

Application Number Title Priority Date Filing Date
CN201620387061.2U Active CN205703565U (en) 2016-04-29 2016-04-29 A kind of carborundum chemical polisher

Country Status (1)

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CN (1) CN205703565U (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN106378693A (en) * 2016-11-29 2017-02-08 德米特(苏州)电子环保材料有限公司 Polishing machine
CN106425868A (en) * 2016-11-29 2017-02-22 德米特(苏州)电子环保材料有限公司 Grinding device
CN106425803A (en) * 2016-11-29 2017-02-22 德米特(苏州)电子环保材料有限公司 Polishing assembly
CN106425826A (en) * 2016-11-30 2017-02-22 德米特(苏州)电子环保材料有限公司 Part processing machine

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN106378693A (en) * 2016-11-29 2017-02-08 德米特(苏州)电子环保材料有限公司 Polishing machine
CN106425868A (en) * 2016-11-29 2017-02-22 德米特(苏州)电子环保材料有限公司 Grinding device
CN106425803A (en) * 2016-11-29 2017-02-22 德米特(苏州)电子环保材料有限公司 Polishing assembly
CN106425803B (en) * 2016-11-29 2018-09-11 德米特(苏州)电子环保材料有限公司 Polish external member
CN106425868B (en) * 2016-11-29 2018-09-11 德米特(苏州)电子环保材料有限公司 Grinding apparatus
CN106425826A (en) * 2016-11-30 2017-02-22 德米特(苏州)电子环保材料有限公司 Part processing machine

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Date Code Title Description
C14 Grant of patent or utility model
GR01 Patent grant
TR01 Transfer of patent right
TR01 Transfer of patent right

Effective date of registration: 20190320

Address after: 250100 AB Block 1106-6-01, Century Fortune Center, West Side of Xinyu Road, Jinan High-tech Zone, Shandong Province

Patentee after: Shandong Tianyue Advanced Material Technology Co., Ltd.

Address before: 250118 the middle part of Mei Li Lake, Huaiyin District, Ji'nan, Shandong

Patentee before: Shandong Tianyue Crystal Material Co., Ltd.

CP03 Change of name, title or address
CP03 Change of name, title or address

Address after: No.99, Tianyue South Road, Huaiyin District, Jinan City, Shandong Province

Patentee after: Shandong Tianyue advanced technology Co., Ltd

Address before: 250100 AB Block 1106-6-01, Century Fortune Center, West Side of Xinyu Road, Jinan High-tech Zone, Shandong Province

Patentee before: Shandong Tianyue Advanced Materials Technology Co.,Ltd.