CN205703679U - A kind of can the carborundum polishing machine of automated cleaning polishing block - Google Patents

A kind of can the carborundum polishing machine of automated cleaning polishing block Download PDF

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Publication number
CN205703679U
CN205703679U CN201620388317.1U CN201620388317U CN205703679U CN 205703679 U CN205703679 U CN 205703679U CN 201620388317 U CN201620388317 U CN 201620388317U CN 205703679 U CN205703679 U CN 205703679U
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China
Prior art keywords
polishing
polished land
carborundum
polished
rotary shaft
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CN201620388317.1U
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Chinese (zh)
Inventor
宗艳民
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Shandong Tianyue Advanced Technology Co Ltd
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Shandong Tianyue Crystal Material Co Ltd
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  • Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
  • Grinding Of Cylindrical And Plane Surfaces (AREA)

Abstract

A kind of can the carborundum polishing machine of automated cleaning polishing block, including base, the upper side of described base is provided with fixed plate and the first polished land being rotated by the second driven by motor and the second polished land.The carborundum polishing machine of this automated cleaning polishing block, carborundum be polished by the first polished land of being provided with and the second polished land and by sanding apparatus and burnishing device, so can there is a preliminary operation polishing corner angle for carborundum, not only facilitate following polishing process, and make to polish more thorough, used second polished land can be cleaned by watering support and wiping support, facilitate the cleaning after work, and polishing time and cost can also be saved to a certain extent, there is very strong practicality.

Description

A kind of can the carborundum polishing machine of automated cleaning polishing block
Technical field
The utility model relates to carborundum polishing machine technical field, and specially one can automated cleaning The carborundum polishing machine of polishing block.
Background technology
As high-brightness LED is in the sharp increase of illuminating engineering domain requirement amount, drive state The development of industry prepared by interior silicon carbide substrates material.Due to carborundum crystals (α-Al2O3) tool Have the distinguishing features such as high temperature resistant, corrosion-resistant, transmission region width, be the first-selection of outer prolongation GaN Backing material, but also big, stable chemical nature just because of carborundum extreme hardness, fragility Feature, gives materials processing, and especially wafer surface nanoscale polishing brings a lot of tired technically Difficulty, needs to be processed by shot blasting the surface of carborundum, at present in the operation of processing carborundum Polishing technology be the processing in single face, again another side is thrown after processing one side finishes Light process, manufacturing procedure is loaded down with trivial details, and operating efficiency is low, is unfavorable for producing, and processes general Do not possess chemical polisher, so make to polish not thorough, and the waste liquid of chemical polisher is attached And forming dirt in polished land, manual scouring is wasted time and energy, to this it is proposed that one can be certainly The carborundum polishing machine of dynamic cleaning polishing block.
Content of the invention
The purpose of this utility model is to provide a kind of can throw the carborundum of automated cleaning polishing block Ray machine, with the problem solving to propose in above-mentioned background technology.
A kind of can the carborundum polishing machine of automated cleaning polishing block, including base, the upside of described base Face is provided with fixed plate and the first polished land and second being rotated by the second driven by motor Polished land, the side of described first polished land is provided with the polishing dress being installed vertically on base Putting, described sanding apparatus includes being positioned at the polishing rod directly over the first polished land;Described consolidates Determine on plate, to be provided with containing liquid chamber and burnishing device, containing liquid chamber bottom connection polishing fluid conveying pipe one End, the polishing fluid conveying pipe other end is connected with the shower nozzle being positioned at directly over the second polished land;Institute The burnishing device stated includes being positioned at the polished silicon wafer directly over the second polished land;Flat in the second polishing Platform is provided with cleaning device, and described cleaning device includes being parallel to the second polished land central shaft And telescopic first rotary shaft being passed by the second polished land center, described first Rotary shaft lower end is connected to the output shaft of the first motor, the first rotary shaft upper end be connected with Its vertical watering support and wiping support, described wiping support length is not less than the second polishing Platform center is fixed with bristle in the ultimate range and wiping support of side.
During work, the first rotary shaft compression is entered the second polished land, the carborundum needing processing It is placed in the first polished land and carries out preparatory processing, start the second motor and sanding apparatus, rotate First polished land utilizes polishing rod to polish, and carries out some bigger corner angle on carborundum Polish, again the carborundum of preparatory processing is placed in the second polished land afterwards, passes through shower nozzle Spray polishing fluid on sic, restart the second motor and burnishing device, rotate the second polishing Platform utilizes polished silicon wafer to be polished, and carries out last finishing polish work to carborundum.Buffer After making to terminate, taking off carborundum, stretching the first rotary shaft makes it pass table in the second polished land Face simultaneously starts the first motor, and watering support and wiping support circle, and wipes polishing waste liquid Wipe clean.It is so possible not only to precisely perfect polishing is carried out for carborundum, but also be easy to Cleaning, economical and practical.
Described base is hollow structure, and chassis interior is provided with flat with the first polished land and the second polishing Corresponding second rotary shaft in platform position, the second described rotary shaft lower end connects the second motor, on End runs through base and is connected with the first polished land and the second polished land.Second motor passes through Second rotary shaft drives the first polished land and the second polished land to rotate.
The first described motor is positioned at chassis interior, is connected to the first rotary shaft lower end through its output shaft. After polishing terminates, stretching the first rotary shaft, starting the first motor, the first rotary shaft drives watering Support and wiping support circle, will polishing waste liquid wiped clean.
Described base passes through bearing and the second rotary shaft connects.Frictional resistance is little, reduces rotary shaft and the end Frictionally damage between Zuo, improves mechanical efficiency, it is simple to installing/dismounting, easy to maintenance.
Described watering support is fixed with standpipe, and the length direction of described standpipe is provided with watering Hole.Watering support, when circling, is sprinkled upon water in ground two polished land by water sprayering hole. The beneficial effects of the utility model are: the carborundum polishing machine of this automated cleaning polishing block, pass through The first polished land being provided with and the second polished land and pass through sanding apparatus and burnishing device Carborundum is polished, so can have the preliminary corner angle that polish for carborundum Operation, not only facilitates following polishing process, and makes to polish more thorough, by spilling Used second polished land can be cleaned by water support and wiping support, facilitates work Cleaning after work, and polishing time and cost can also be saved to a certain extent, have Very strong practicality.
Brief description
Fig. 1 is the utility model structural representation;
Fig. 2 is the connection diagram of the first motor and cleaning device;
Fig. 3 is the second motor and the connection diagram of the first polished land;
In figure: 1 base, 2 first polished land, 3 second polished land, 4 first motors, 5 dozens Mill apparatus, 6 burnishing devices, 7 polishing fluids conveying pipes, 8 shower nozzles, 9 first rotary shafts, 10 Polishing rod, 11 motors, 12 fixed plates, 13 containing liquid chambers, 14 sprinkle water supports, 15 polished silicon wafer, 16 second rotary shafts, 17 wiping supports.
Detailed description of the invention
A kind of can the carborundum polishing machine of automated cleaning polishing block, including base 1, described base The upper side of 1 is provided with fixed plate 12 and is driven the first throwing rotating by the second motor 11 Optical platform 2 and the second polished land 3, the side of described first polished land 2 is provided with vertical peace Being loaded on the sanding apparatus 5 of base 1, described sanding apparatus 5 includes being positioned at the first polished land 2 The polishing rod 10 of surface;It is provided with containing liquid chamber 13 and polishing dress in described fixed plate 12 Putting 6, containing liquid chamber 13 bottom connection polishing fluid conveying pipe 7 one end, polishing fluid conveying pipe 7 is another One end is connected with the shower nozzle 8 being positioned at directly over the second polished land 3;Described burnishing device 6 Including be positioned at the polished silicon wafer 15 directly over the second polished land 3;In the second polished land 3 Be provided with cleaning device, described cleaning device include being parallel to the second polished land 3 central shaft and Telescopic first rotary shaft 9 being passed by the second polished land 3 center, described One rotary shaft 9 lower end is connected to the output shaft of the first motor 4, the first rotary shaft 9 upper end activity It is connected with perpendicular watering support 14 and wiping support 17, described watering support 14 It is fixed with standpipe, the length direction of described standpipe is provided with water sprayering hole.Described wiping Support 17 length is propped up not less than ultimate range and the wiping at the second polished land 3 center to side It is fixed with bristle on frame 17.Described base 1 is hollow structure, and base 1 internal be provided with First corresponding second rotary shaft 16 of polished land 2 and the second polished land 3 position, described Second rotary shaft 16 lower end connect the second motor 11, upper end is connected with base 1 by bearing, Run through base and be connected with the first polished land 2 and the second polished land 3.Described first It is internal that motor 4 is positioned at base 1, is connected to the first rotary shaft 9 lower end through its output shaft.

Claims (5)

1. can the carborundum polishing machine of automated cleaning polishing block, including base (1), its feature It is: the upper side of described base (1) is provided with fixed plate (12) and by the second motor (11) Drive the first polished land (2) of rotating and the second polished land (3), described first The side of polished land (2) is provided with the sanding apparatus (5) being installed vertically on base (1), institute State sanding apparatus (5) to include being positioned at polishing rod (10) directly over the first polished land (2); It is provided with containing liquid chamber (13) and burnishing device (6), containing liquid chamber in described fixed plate (12) (13) bottom connection polishing fluid conveying pipe (7) one end, polishing fluid conveying pipe (7) other end It is connected with the shower nozzle (8) being positioned at directly over the second polished land (3);Described burnishing device (6) include being positioned at the polished silicon wafer (15) directly over the second polished land (3);Throw second Optical platform (3) is provided with cleaning device, and described cleaning device includes being parallel to the second polishing Platform (3) central shaft and passed by the second polished land (3) center telescopic One rotary shaft (9), described the first rotary shaft (9) lower end is connected to the first motor (4) Output shaft, the first rotary shaft (9) upper end is connected with perpendicular watering support (14) With wiping support (17), described wiping support (17) length is not less than the second polished land (3) center is fixed with bristle in the ultimate range and wiping support (17) of side.
2. according to claim 1 can the carborundum polishing machine of automated cleaning polishing block, it is special Levy and be: described base (1) is hollow structure, and internal being provided with of base (1) is thrown with first Optical platform (2) and corresponding second rotary shaft in the second polished land (3) position (16), institute The second rotary shaft (16) lower end stated connects the second motor (11), and base (1) is run through in upper end And it is connected with the first polished land (2) and the second polished land (3).
3. according to claim 2 can the carborundum polishing machine of automated cleaning polishing block, it is special Levy and be: it is internal that described the first motor (4) is positioned at base (1), connect through its output shaft To the first rotary shaft (9) lower end.
4. according to claim 1 can the carborundum polishing machine of automated cleaning polishing block, it is special Levy and be: described base (1) passes through bearing and the second rotary shaft (16) connects.
5. according to claim 1 can the carborundum polishing machine of automated cleaning polishing block, it is special Levy and be: described watering support (14) is fixed with standpipe, along the length of described standpipe Direction is provided with water sprayering hole.
CN201620388317.1U 2016-04-29 2016-04-29 A kind of can the carborundum polishing machine of automated cleaning polishing block Active CN205703679U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN201620388317.1U CN205703679U (en) 2016-04-29 2016-04-29 A kind of can the carborundum polishing machine of automated cleaning polishing block

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN201620388317.1U CN205703679U (en) 2016-04-29 2016-04-29 A kind of can the carborundum polishing machine of automated cleaning polishing block

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CN205703679U true CN205703679U (en) 2016-11-23

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Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN107363662A (en) * 2017-09-20 2017-11-21 台山市柔利特研磨科技有限公司 One kind polishing descaling machine
CN107471016A (en) * 2017-09-20 2017-12-15 台山市柔利特研磨科技有限公司 A kind of automatic reciprocating polishing device
CN107486783A (en) * 2017-09-30 2017-12-19 台山市柔利特研磨科技有限公司 A kind of reciprocal polishing machine
CN107511750A (en) * 2017-09-30 2017-12-26 台山市柔利特研磨科技有限公司 A kind of automatic cleaning polishing machine
CN107553237A (en) * 2017-09-20 2018-01-09 台山市柔利特研磨科技有限公司 A kind of automatic polishing descaling machine
CN107584423A (en) * 2017-09-30 2018-01-16 台山市柔利特研磨科技有限公司 One kind lifting polishing machine
CN108942551A (en) * 2018-09-20 2018-12-07 天津市鑫源泓达科技有限公司 A kind of Mold polishing device
CN115157107A (en) * 2022-07-14 2022-10-11 江苏晶杰光电科技有限公司 Chemical mechanical polishing machine for semiconductor polishing

Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN107363662A (en) * 2017-09-20 2017-11-21 台山市柔利特研磨科技有限公司 One kind polishing descaling machine
CN107471016A (en) * 2017-09-20 2017-12-15 台山市柔利特研磨科技有限公司 A kind of automatic reciprocating polishing device
CN107553237A (en) * 2017-09-20 2018-01-09 台山市柔利特研磨科技有限公司 A kind of automatic polishing descaling machine
CN107486783A (en) * 2017-09-30 2017-12-19 台山市柔利特研磨科技有限公司 A kind of reciprocal polishing machine
CN107511750A (en) * 2017-09-30 2017-12-26 台山市柔利特研磨科技有限公司 A kind of automatic cleaning polishing machine
CN107584423A (en) * 2017-09-30 2018-01-16 台山市柔利特研磨科技有限公司 One kind lifting polishing machine
CN108942551A (en) * 2018-09-20 2018-12-07 天津市鑫源泓达科技有限公司 A kind of Mold polishing device
CN115157107A (en) * 2022-07-14 2022-10-11 江苏晶杰光电科技有限公司 Chemical mechanical polishing machine for semiconductor polishing
CN115157107B (en) * 2022-07-14 2023-07-14 江苏晶杰光电科技有限公司 Chemical mechanical polishing machine for semiconductor polishing

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GR01 Patent grant
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Effective date of registration: 20190320

Address after: 250100 AB Block 1106-6-01, Century Fortune Center, West Side of Xinyu Road, Jinan High-tech Zone, Shandong Province

Patentee after: Shandong Tianyue Advanced Material Technology Co., Ltd.

Address before: 250118 the middle part of Mei Li Lake, Huaiyin District, Ji'nan, Shandong

Patentee before: Shandong Tianyue Crystal Material Co., Ltd.

CP03 Change of name, title or address
CP03 Change of name, title or address

Address after: No.99, Tianyue South Road, Huaiyin District, Jinan City, Shandong Province

Patentee after: Shandong Tianyue advanced technology Co., Ltd

Address before: 250100 AB Block 1106-6-01, Century Fortune Center, West Side of Xinyu Road, Jinan High-tech Zone, Shandong Province

Patentee before: Shandong Tianyue Advanced Materials Technology Co.,Ltd.