CN205642308U - Little surface morphology measuring device based on dual wavelength is interfered - Google Patents
Little surface morphology measuring device based on dual wavelength is interfered Download PDFInfo
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- CN205642308U CN205642308U CN201620294905.9U CN201620294905U CN205642308U CN 205642308 U CN205642308 U CN 205642308U CN 201620294905 U CN201620294905 U CN 201620294905U CN 205642308 U CN205642308 U CN 205642308U
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Abstract
Little surface morphology measuring device based on dual wavelength is interfered relates to the optical interferometry field. It is for the measuring range that solves the little surface morphology of traditional single light source phase -shift control method measurement element is little, and leads to system's unstability, inefficiency scheduling problem owing to generally all be through mechanical system if piezoceramics PZT produces the phase shift. The utility model discloses a light source, no. Two light sources, speculum, spectroscope, pinhole filter, lens, no. Two spectroscopes, the optical element that awaits measuring, microcobjective, no. Two lens, no. Two speculums, no. Three speculums, no. Three lens, move looks controlling means, no. Four lens, no. Three spectroscopes, no. Five lens, detecting device, data acquisition device. Wherein, detecting device needs to link to each other with the data acquisition device, utilizes the data acquisition device to show little surface morphology of the interference pattern that detecting device took, the optical element that can be awaited measuring. The utility model is suitable for a precision optics interferometry field.
Description
Technical field
This utility model relates to optical interferometry field.A kind of micro-surface figure measuring device interfered based on dual wavelength.
Background technology
The high-acruracy survey of surface topography micro-for optical element, the measurement apparatus utilizing Mach-Zehnder principle of interference to design is a kind of effective approach.This device is made up of with reference path optical path, has simple in construction, measures sensitivity high, can be used for planar optical elements, spherical optics element and the measurement of aspherical optical element surface topography.Sphere curvature radius and various optical lens, prism and optical system light wave transmissions quality can be measured by the measurement apparatus simultaneously utilizing this principle to make.In the measurement apparatus of Mach-Zehnder interference technique principle design, phase shift interferometric method is the most accurate a kind of interferometric method, the light path that this kind of method utilizes Electro-Mechanical Systems device to control reference path in the optical path, make to sense light path with reference path generation phase difference to realize phase-modulation, and utilize detection device to gather interference pattern.But traditional phase interferometric method uses the light source of single wavelength, it is little that it measures scope, and owing to typically all producing phase shift by mechanical system such as piezoelectric ceramics PZT, causes system instability, efficiency low.Therefore, it is necessary to improved by the device of traditional bit interference method measuring cell pattern, design element topography measurement device easy and simple to handle, that precision is high, measurement scope is big.
Summary of the invention
This utility model is to solve in the measurement of element pattern, and traditional phase interferometric method measures that scope is little, poor stability and the complicated problem of operation.On the basis of Mach-Zehnder principle of interference and phase-shifting interferometry, exploitation realizes the novel micro-surface figure measuring device of dual beam optical element interfered based on Mach-Zehnder.Compared with existing measurement equipment, this utility model provide a kind of easy and simple to handle, measurement scope is big, precision is high, based on Mach-Zehnder interfere the micro-surface figure measuring device of dual beam optical element.
The micro-surface figure measuring device interfered based on dual wavelength, it includes a light source (1), No. two light sources (2), a number reflecting mirror (3), a number spectroscope (4), pinhole filter (5), a number lens (6), No. two spectroscopes (7), optical element to be measured (8), microcobjective (9), No. two lens (10), No. two reflecting mirrors (11), No. three reflecting mirrors (12), No. three lens (13), phase shifting control device (14), No. four lens (15), No. three spectroscopes (16), No. five lens (17), detection device (18), data acquisition unit (19)；
nullNumber reflecting mirror (3) is positioned over a light source (1) at a distance of 300mm and orthogonal at a distance of position between 200mm and three with a spectroscope (4)，No. two light sources (2) are parallel with a light source (1) at a distance of 300mm and position with a spectroscope (4)，Pinhole filter (5) and spectroscope (4) at a distance of 200mm and with a lens (6) at a distance of 200mm，No. two spectroscopes (7) and a lens (6) at a distance of 200mm and with optical element to be measured (8) at a distance of 200mm and orthogonal at a distance of position between 750mm and three with No. three reflecting mirrors (12)，Optical element to be measured (8) and microcobjective (9) are at a distance of 200mm，Microcobjective (9) and No. two lens (10) are at a distance of 200mm，No. two lens (10) and No. two reflecting mirrors (11) 150mm apart,No. two reflecting mirrors (11) and No. two spectroscopes (7) at a distance of 750mm and with No. three lens (13) at a distance of 200mm，Phase shifting control device (14) is positioned between No. three lens (13) and No. four lens (15) and with No. three lens (13) and No. four lens respectively at a distance of 150mm and 200mm，No. three spectroscopes (16) and No. four lens (15) at a distance of 200mm and with No. two reflecting mirrors (11) at a distance of 750mm and orthogonal at a distance of position between 200mm and three with No. five lens，Detection device (18) and is connected with data acquisition unit (19) at a distance of 50mm with No. five lens (17).
The optical wavelength of a number light source (1) is 632.8nm, and the optical wavelength of No. two light sources (2) is 543nm.
Number spectroscope (4), No. two spectroscopes (7), the splitting ratio of No. three spectroscopes (16) is 1:1 and material is BK7 glass.
Number lens (6), No. two lens (10), the focal length of No. four lens (15) are 200mm and thickness is 2mm and a diameter of 30mm and material are K9 glass.
The focal length of No. three lens (13) is 150mm and thickness is 3mm and a diameter of 34mm and material are K9 glass.
The focal length of No. five lens (17) is 150mm and thickness is 3mm and a diameter of 34mm and material are K9 glass.
Phase shifting control device (14) is electromotion focusing eyeglass ETL.
Detection device (18) is CCD.
Data acquisition unit (19) includes image pick-up card and computer.
The beneficial effects of the utility model are: this utility model, by double light sources of two different wave lengths replacing single light source and improving on the basis of the phase shift interference device of Mach-Zehnder interferometer and tradition single wavelength light source, designs the novel Mach-Zehnder interferometer micro-surface figure measuring device of dual beam optical element.This measurement apparatus comprises the light source of two different wave lengths, and it so can be made to measure expanded range, and owing to measuring tested unit by two prescriptions to the interference fringe intersected
Part pattern, can extract more data point effectively from interference image, thus improve measurement walk crosswise resolution.Meanwhile, this device based on principle of interference ensure that the highly sensitive advantage measured, and introduce and a kind of use electromotion focusing eyeglass to the method realizing phase shift, make system have more stability, resistance transsexual.The micro-surface figure measuring device of double passive optical element that this Mach-Zehnder interferes is compared tradition single light source measurement apparatus and is had the advantages such as highly sensitive, measurement scope is big, stability is strong.
Accompanying drawing explanation
Fig. 1 is the micro-surface figure measuring device interfered based on dual wavelength.
Detailed description of the invention
Detailed description of the invention of the present utility model is further illustrated below in conjunction with Figure of description.
Such as Fig. 1, the micro-surface figure measuring device interfered based on dual wavelength described in present embodiment, it includes a light source (1), No. two light sources (2), a number reflecting mirror (3), a number spectroscope (4), pinhole filter (5), a number lens (6), No. two spectroscopes (7), optical element to be measured (8), microcobjective (9), No. two lens (10), No. two reflecting mirrors (11), No. three reflecting mirrors (12), No. three lens (13), phase shifting control device (14), No. four lens (15), No. three spectroscopes (16), No. five lens (17), detection device (18), data acquisition unit (19)；nullNumber reflecting mirror (3) is positioned over a light source (1) at a distance of 300mm and orthogonal at a distance of position between 200mm and three with a spectroscope (4)，No. two light sources (2) are parallel with a light source (1) at a distance of 300mm and position with a spectroscope (4)，Pinhole filter (5) and spectroscope (4) at a distance of 200mm and with a lens (6) at a distance of 200mm，No. two spectroscopes (7) and a lens (6) at a distance of 200mm and with optical element to be measured (8) at a distance of 200mm and orthogonal at a distance of position between 750mm and three with No. three reflecting mirrors (12)，Optical element to be measured (8) and microcobjective (9) are at a distance of 200mm，Microcobjective (9) and No. two lens (10) are at a distance of 200mm，No. two lens (10) and No. two reflecting mirrors (11) 150mm apart,No. two reflecting mirrors (11) and No. two spectroscopes (7) at a distance of 750mm and with No. three lens (13) at a distance of 200mm，Phase shifting control device (14) is positioned between No. three lens (13) and No. four lens (15) and with No. three lens (13) and No. four lens respectively at a distance of 150mm and 200mm，No. three spectroscopes (16) and No. four lens (15) at a distance of 200mm and with No. two reflecting mirrors (11) at a distance of 750mm and orthogonal at a distance of position between 200mm and three with No. five lens，Detection device (18) and is connected with data acquisition unit (19) at a distance of 50mm with No. five lens (17).
The optical wavelength of a number light source (1) is 632.8nm, and the optical wavelength of No. two light sources (2) is 543nm.
Number spectroscope (4), No. two spectroscopes (7), the splitting ratio of No. three spectroscopes (16) is 1:1 and material is BK7 glass.
Number lens (6), No. two lens (10), the focal length of No. four lens (15) are 200mm and thickness is 2mm and a diameter of 30mm and material are K9 glass.
The focal length of No. three lens (13) is 150mm and thickness is 3mm and a diameter of 34mm and material are K9 glass.
The focal length of No. five lens (17) is 150mm and thickness is 3mm and a diameter of 34mm and material are K9 glass.
Phase shifting control device (14) is electromotion focusing eyeglass ETL.
Detection device (18) is CCD.
Data acquisition unit (19) includes image pick-up card and computer.
When carrying out the micro-measuring surface form of optical element, first put up experiment light path, detection device (18) is connected to data acquisition unit (19).Adjust the position of two light sources, it is carried out coaxial adjustment, make the center superposition of two-beam.Through lens (6) beam-expanding collimation, and checking the light path after lens, spot size and center height keep constant.Then No. two spectroscopes (7) of adjustment are beamed into and test light and reference light, and flare and transmission hot spot holding shape, size and center height are constant.The interference pattern shot through detecting device (18) of the now upper display of data acquisition unit (19) is pattern when light occurs coupling to interfere behind two-way difference path.Phase shifting control device (14) is made up of two media, the thickness of the two media in phase shifting control device (14) can be made to change by control voltage, so that the light path of two-way light changes so that sensing light path and reference path produce phase difference to realize phase-modulation.The analogue signal utilizing detection device (18) becomes numeral letter through A/D conversion and passes to data acquisition unit (19).By the drawing information collected, and then obtain micro-surface topography of optical element to be measured (8).
Operation principle:
The micro-measuring surface form interfered based on dual wavelength:
Work process: as it is shown in figure 1, detection device (18) be connected with data acquisition unit (19), and build experiment light path.
During measuring surface form micro-to optical element, first detection device (18) is connected with data acquisition unit (19), then opens a light source (1), No. two light sources (2), detection device (18), data acquisition units (19) successively.The light sent through reflecting mirror (3) reflection and No. two light sources (2) by a light source (1) meets in a spectroscope (4), removes high-frequency noise through pinhole filter (5), a lens (6) then will be utilized its beam-expanding collimation.Light after expanding is after No. two spectroscopes (7), and light is divided into the two-beam that beam intensity ratio is 1:1 and respectively enters sensing light path and reference path.In optical path, light sequentially passes through optical element to be measured (8), microcobjective (9), No. two lens (10), No. two reflecting mirrors (11).In reference path, light sequentially passes through No. three reflecting mirrors (12), No. three lens (13), phase shifting control device (14), No. four lens (15) meeting with another road light in No. three spectroscopes (16) and couples.Control of Voltage phase-shift controller (18) makes reference path light path change, so that the optical path difference of two-way light changes.The position when change of optical path difference can cause two-beam to couple changes mutually.The two-beam that meets in No. three spectroscopes (16) can occur the redistribution of light intensity because of the superposition of the mutually different two-beam in position, produces interference.This interference light sequentially passes through lens (17) and is imaged in detection device (18).When interfering light because the light path of reference path changes, the interference pattern captured by detection device (18) can change.Can be according to the change of interference pattern and utilize corresponding algorithm to calculate micro-surface topography of optical element to be measured (8).
Claims (9)
1. the micro-surface figure measuring device interfered based on dual wavelength, it is characterized in that: it includes a light source (1), No. two light sources (2), a number reflecting mirror (3), a number spectroscope (4), pinhole filter (5), a number lens (6), No. two spectroscopes (7), optical element to be measured (8), microcobjective (9), No. two lens (10), No. two reflecting mirrors (11), No. three reflecting mirrors (12), No. three lens (13), phase shifting control device (14), No. four lens (15), No. three spectroscopes (16), No. five lens (17), detection device (18), data acquisition unit (19)；
nullNumber reflecting mirror (3) is positioned over a light source (1) at a distance of 300mm and orthogonal at a distance of position between 200mm and three with a spectroscope (4)，No. two light sources (2) are parallel with a light source (1) at a distance of 300mm and position with a spectroscope (4)，Pinhole filter (5) and spectroscope (4) at a distance of 200mm and with a lens (6) at a distance of 200mm，No. two spectroscopes (7) and a lens (6) at a distance of 200mm and with optical element to be measured (8) at a distance of 200mm and orthogonal at a distance of position between 750mm and three with No. three reflecting mirrors (12)，Optical element to be measured (8) and microcobjective (9) are at a distance of 200mm，Microcobjective (9) and No. two lens (10) are at a distance of 200mm，No. two lens (10) and No. two reflecting mirrors (11) 150mm apart,No. two reflecting mirrors (11) and No. two spectroscopes (7) at a distance of 750mm and with No. three lens (13) at a distance of 200mm，Phase shifting control device (14) is positioned between No. three lens (13) and No. four lens (15) and with No. three lens (13) and No. four lens respectively at a distance of 150mm and 200mm，No. three spectroscopes (16) and No. four lens (15) at a distance of 200mm and with No. two reflecting mirrors (11) at a distance of 750mm and orthogonal at a distance of position between 200mm and three with No. five lens，Detection device (18) and is connected with data acquisition unit (19) at a distance of 50mm with No. five lens (17).
The micro-surface figure measuring device interfered based on dual wavelength the most according to claim 1, it is characterised in that: the optical wavelength of a light source (1) is 632.8nm, and the optical wavelength of No. two light sources (2) is 543nm.
The micro-surface figure measuring device interfered based on dual wavelength the most according to claim 1, it is characterised in that: spectroscope (4), No. two spectroscopes (7), the splitting ratio of No. three spectroscopes (16) is 1:1 and material is BK7 glass.
The micro-surface figure measuring device interfered based on dual wavelength the most according to claim 1, it is characterised in that: lens (6), No. two lens (10), the focal length of No. four lens (15) they are 200mm and thickness is 2mm and a diameter of 30mm and material are K9 glass.
The micro-surface figure measuring device interfered based on dual wavelength the most according to claim 1, it is characterised in that: the focal length of No. three lens (13) is 150mm and thickness is 3mm and a diameter of 34mm and material are K9 glass.
The micro-surface figure measuring device interfered based on dual wavelength the most according to claim 1, it is characterised in that: the focal length of No. five lens (17) is 150mm and thickness is 3mm and a diameter of 34mm and material are K9 glass.
The micro-surface figure measuring device interfered based on dual wavelength the most according to claim 1, it is characterised in that: phase shifting control device (14) is electromotion focusing eyeglass ETL.
The micro-surface figure measuring device interfered based on dual wavelength the most according to claim 1, it is characterised in that: detection device (18) is CCD.
The micro-surface figure measuring device interfered based on dual wavelength the most according to claim 1, it is characterised in that: data acquisition unit (19) includes image pick-up card and computer.
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Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN108132026A (en) * | 2018-01-24 | 2018-06-08 | 赵智亮 | Infrared visible ray dual wavelength transmission-type interference testing device in semiconductor |
| CN114964033A (en) * | 2022-02-14 | 2022-08-30 | 上海大学 | Method for measuring super-surface topography distribution by using wavelength phase-shifting method |
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2016
- 2016-04-11 CN CN201620294905.9U patent/CN205642308U/en not_active Expired - Fee Related
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN108132026A (en) * | 2018-01-24 | 2018-06-08 | 赵智亮 | Infrared visible ray dual wavelength transmission-type interference testing device in semiconductor |
| CN108132026B (en) * | 2018-01-24 | 2024-02-27 | 赵智亮 | Infrared and visible light dual-wavelength transmission type interference testing device in semiconductor |
| CN114964033A (en) * | 2022-02-14 | 2022-08-30 | 上海大学 | Method for measuring super-surface topography distribution by using wavelength phase-shifting method |
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Granted publication date: 20161012 Termination date: 20170411 |