CN108061639A - A kind of Larger Dynamic scope of combining adaptive optical technology, high-precision phase position difference method wavefront measurement instrument - Google Patents
A kind of Larger Dynamic scope of combining adaptive optical technology, high-precision phase position difference method wavefront measurement instrument Download PDFInfo
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Abstract
The invention discloses a kind of Larger Dynamic scope of combining adaptive optical technology, high-precision phase position difference method wavefront measurement instrument, it is made of light source laser, directional light colimated light system, light beam conjugate impedance match system, wave-front corrector, phase difference Wavefront sensor and high-performance calculation processing system, the wavefront measurement instrument：Multigroup accurately known phase difference information is introduced for phase difference Wavefront sensor using wave-front corrector, multichannel phase difference wavefront distortion constraint is formed, significantly improves aberration investigative range and the sensitivity of conventional phase difference method；The closed-loop corrected measuring system of adaptive optics wave front aberration is formed using wave-front corrector, phase difference Wavefront sensor and high-performance calculation processing system, residual aberration after correction is carried out to continue detection, so that the distortion light wave after phase compensation will progressively and finally approach perfect optics plane light wave, the correcting value of wave-front corrector is the exact value of wave front aberration to be measured at this time.
Description
Technical Field
The invention belongs to the field of adaptive optics and optical detection, and particularly relates to a large-dynamic-range and high-precision phase difference wavefront measuring instrument combined with an adaptive optics technology.
Background
Optical detection based on wavefront measurement techniques is an important direction of development in modern optics. The invention of the laser in the nineteenth century and the sixties provides a good coherent illumination light source for the wavefront measurement technology, and the rapid development of the electronic technology and the computer technology promotes the new technology of multiple subjects such as light, machine, electricity and the like to be comprehensively applied to wavefront measurement, thereby greatly expanding the implementation means and the application range of the wavefront measurement technology. As a non-contact measurement method, a wavefront measurement technique has been widely used in the fields of physical experiments, optical device and system detection, beam diagnosis, adaptive optics, and the like. The current relatively mature wavefront measurement methods are mainly divided into four types: interferometry, slope measurement, curvature measurement and inversion based on intensity measurements, which correspond to wavefront sensors having their own advantages and disadvantages.
The interferometry is a direct phase measurement method, and is a typical device such as Michelson, mach-Zehnder interferometer and the like, which compares a distorted wavefront to be measured with a standard plane wavefront to obtain wavefront measurement data. The interferometer has the advantages of high spatial sampling rate, high measurement accuracy and the like, and is widely applied to the fields of optical detection, flow field optical tomography measurement and the like, and commercial interferometer products have been introduced by companies such as Wyko, zygo, precision-optical Engineering and the like at present, but the interference method wavefront measurement device has a complex structure, and large errors are brought to measurement results by external vibration, temperature change and the like, so that the application of the interference method in a severe Engineering environment is limited; on the other hand, an interference measurement method records wavefront phase information by means of an interference fringe image, the interference fringe extraction and processing method is complex and is not suitable for wavefront aberration measurement which changes drastically with time, and when the scale of the aberration to be measured is large, the phase measurement cannot be calculated due to the fact that the interference fringes are too dense, so that an infrared interferometer and a visible light interferometer are respectively applied to the environment of large dynamic range and high-precision wavefront aberration measurement, but due to the physical limitation of the measurement wavelength, the infrared interferometer and the visible light interferometer cannot have the capability of large dynamic range and high-precision aberration measurement at the same time. Aiming at the defects of the traditional interferometry, yellow epitaxy and the like provide a free-form surface precision measurement technology (Lei Huang etc. adaptive interferometric null testing for unknown free-form optics metrology, opt. Letters,2016.41 (23): 5539-5542) combining an SPGD with an interferometry, the method can improve the measurement range of the interferometry on the geometric curve aberration to a certain extent, but when the aberration to be measured contains more high-frequency components, the SPDG search algorithm is difficult to realize the effective convergence of an initial light spot, and the interferometry measurement process cannot be continued; in addition, the measurement technology based on the interferometry is only suitable for a point target measurement object at present and cannot be applied to aberration measurement of an extended target.
The typical device of the slope measurement method is a Hartmann-Shark wave front sensor (HS-WFS), which consists of a microlens array and a centroid detector, the basic principle is that a wave surface to be measured is divided into a plurality of sampling units through the microlens array, the light waves in the sampling units are assumed to be approximate to planar light waves, the light waves of the sampling units are converged to the centroid detector at a focal plane through independent microlenses respectively to form discrete Hartmann light spot images, the wavefront inclination in each sub-aperture causes the deviation of the centroid of the light spots in the horizontal and vertical directions, and the wavefront slopes of the light waves of the corresponding sampling units in the two directions are combined with a recovery algorithm to obtain the wavefront aberration to be measured. The Hartmann wavefront sensor has been widely applied to the aspects of adaptive optics, mirror surface detection, laser parameter measurement, human eye aberration measurement, light path collimation and the like due to higher measurement real-time performance and proper measurement precision. However, the Hartmann wavefront sensor performs discrete sampling on the wavefront to be detected through the micro-lens array, the spatial sampling rate is usually low, and the Hartmann wavefront sensor is only suitable for geometric aberration detection at present and is difficult to apply to high-precision and discontinuous wavefront aberration measurement.
The curvature wavefront sensor is firstly proposed by Roddier in 1988, the measuring process is to acquire the light intensity distribution on two equidistant-defocusing surfaces of a light wave to be measured, which is converged by a lens, and obtain the phase distribution of the wave surface to be measured by solving a corresponding Poisson equation, the basic idea is derived from geometric optics, if the wave surface to be measured has phase distortion, namely the curvatures of points of a wave front phase are different, the light intensity distribution on the two defocusing surfaces is different, the light intensity at a certain position of one defocusing surface is increased, and the light intensity at a corresponding position of the other defocusing surface is weakened. The curvature wavefront sensor is used in an adaptive optical system of an astronomical telescope at present, and has the advantages of simple structure and good real-time performance, but the measurement precision of high spatial frequency aberration is lower, and the curvature wavefront sensor cannot be applied to high-precision wavefront aberration measurement.
Phase inversion (PD), the intensity measurement inversion technique, was first proposed in 1979 by gonsalaves and Chidlaw, and it was pointed out in subsequent studies that it can be used not only for wavefront detection of point source imaging systems, but also for wavefront detection and image restoration of extended target imaging systems, and has been widely studied and paid attention at home and abroad (wangxin et al, brief introduction to Phase modification methods [ J ] development]Optical technology, 2009, 35 (3): 454 to 460). The essence of the phase difference wavefront measurement technology is that two or more far field images with phase difference of incident light waves are collected simultaneously, and wavefront phase information and unknown target images are obtained through calculation of light intensity distribution of the images under the condition that the known phase difference is utilized to restrain wavefront distortion. Compared with the traditional wave-front detection technology, the phase difference wave-front sensor has the advantages of simple optical structure, no special requirements on devices, suitability for the aberration measurement of point targets and extended targets, and the like, and can be used for the discontinuous aberration detection of continuous aberration, splicing telescopes, sparse aperture telescopes and the like (etc.A phase diversity experiment to measure piston misalignment of the segmented primary mirror of the Keck II telescope[C].Proc.SPIE,1998,3356:190201). The far-field light spot image acquired by the phase difference wavefront detection method contains more high-frequency information, so that the detection sensitivity and the detection precision are high, but the traditional phase difference method only adopts defocusing aberration which is easy to obtain in an optical path as known phase difference information to carry out iterative operation (in the study of rigid, the design of a phase difference wavefront detector [ M)]The university paper of graduate institute of science, china, 2008; chinese patent, a phase difference-based human eye phase difference measurement system, xuan et al, publication No.: CN20205027561U,2011.11; chinese patent, a phase difference wavefront sensor based on a combined prism, rochon, etc., application No.: 201210027766.x,2012.02; chinese patent, a phase difference wavefront measurement imaging device based on differential optics, bauhua, etc., publication No.: ZL201210180083.8, 2012.04), the constraint on the optimization algorithm is far from sufficient, and if the scale of the aberration to be measured is large, the algorithm is extremely easy to fall into a local optimal solution or even cannot converge in the solving process, so that the phase difference wavefront sensor technology currently used cannot realize the large dynamic range and high-precision wavefront aberration measurement.
Disclosure of Invention
The technical problem solved by the invention is as follows: aiming at the defect that the existing various wave front aberration measurement technologies can not realize the large dynamic range and high precision wave front aberration measurement at the same time, the invention provides a novel wave front measuring instrument combining the self-adaptive optics technology and the phase difference wave front sensor for the first time.
The technical scheme adopted by the invention for solving the technical problems is as follows: a large dynamic range and high precision phase difference method wavefront measuring instrument combined with adaptive optics technology comprises a light source laser, a parallel light collimation system, a first spectroscope, a sample to be measured, a light beam conjugation-matching system, a second spectroscope, a wavefront corrector, a phase difference wavefront sensor and a high-performance computing processing system; light source laser emitting illumination beam and parallel light collimation systemCollimating the illuminating light beam into parallel light waves, illuminating a sample to be detected after the parallel light waves are reflected by a first beam splitter, reflecting the sample to be detected back to distorted light waves containing aberration to be detected, enabling the distorted light waves to enter a light beam conjugation-matching system through the first beam splitter, enabling a wavefront corrector, a phase difference wavefront sensor and the sample to be detected to be in an optical conjugation position through the light beam conjugation-matching system, enabling the distorted light waves to enter the wavefront corrector through a second beam splitter, and enabling the wavefront corrector to introduce accurately known phase difference delta phi to the distorted light waves k And the modulated distorted light wave is reflected to the phase difference wavefront sensor by the second beam splitter, and the high-performance calculation processing system utilizes the far-field light spot image acquired by the phase difference wavefront sensor and the known phase difference delta phi introduced by the wavefront corrector k Calculating to obtain distorted wavefront phase distribution, performing iterative calculation on the formulas (1) and (2) by adopting an optimization algorithm in the solving process, driving a wavefront corrector to perform phase compensation on distorted light waves, gradually and finally approaching the distorted light waves to ideal optical plane light waves after iterative correction, wherein the correction value loaded by the wavefront corrector at the moment is the numerical value of the wavefront aberration to be measured;
equation (1) is an optimized objective function to be solved, K is the total frame number of the far-field spot image with known phase difference modulated by the wave-front corrector, D k Is the k frame far field spot image; phi in the formula (2) is the phase distribution of the distorted light wave to be measured, and delta phi k Is and D k The phase difference is known for the corresponding kth frame, FFT (·) is a fast fourier transform.
The wavefront corrector in the technical scheme of the invention can provide a plurality of groups of dynamic accurate known phase differences with different spatial frequencies and scales for the phase difference wavefront sensor, and compared with the traditional phase difference wavefront measurement technology which only depends on fixed and low-order defocused aberration to restrict the wavefront distortion to be solved, the invention can effectively solve the problem of convergence of an optimized algorithm under the condition of large-dynamic-range wavefront aberration measurement, thereby greatly improving the detection range and success rate of the phase difference wavefront measurement technology.
In the technical scheme of the invention, the wavefront corrector, the phase difference wavefront sensor and the high-performance calculation processing system form an adaptive optics closed-loop correction system, and can carry out multiple closed-loop correction-iterative measurement on residual aberration after phase compensation is completed on distorted light waves.
The principle of the invention is as follows:
(1) The wave-front corrector provides a plurality of groups of accurate known phase differences with dynamic and different spatial frequencies and scales for the phase difference wave-front sensor, and according to the mathematical principle of the optimization algorithm, the more sufficient the constraint of the multi-channel known phase difference on wave-front distortion is, the stronger the solving capability of the phase difference algorithm is, so that the problem of convergence of the phase difference method under the condition of large-dynamic-range wave-front aberration measurement is effectively solved.
(2) The wavefront corrector, the phase difference wavefront sensor and the high-performance calculation processing system form an adaptive optics closed-loop correction-measurement system, the phase difference wavefront sensor continuously measures residual aberration after adaptive optics correction in an iteration process, and on the basis that the residual aberration is gradually reduced, distorted light waves finally approach ideal optical plane light waves, so that a high-precision wavefront aberration measurement result is obtained.
(3) In the self-adaptive optical closed loop correction-measurement process, the wavefront corrector continuously accumulates the phase compensation of the distorted light wave to be measured, and when the corrected distorted light wave approaches to the ideal optical plane light wave, the correction value loaded by the wavefront corrector is the accurate numerical value of the wavefront aberration to be measured.
Compared with the prior art, the invention has the following advantages:
(1) The optical structure is simple and stable, no additional auxiliary device is needed, and the high-performance computing and processing system directly utilizes the acquired far-field light spot image and the known phase difference information to invert the distorted wavefront phase distribution;
(2) The invention adopts a closed-loop correction-measurement system and a multi-channel phase difference constraint method, and can simultaneously realize large dynamic range and high precision wavefront aberration measurement on a point light source system and an extended target by a set of measurement device;
(3) The invention can not only obtain the high-precision measurement result of the distorted wavefront, but also monitor the intensity distribution of the far-field light spot after aberration correction in real time, and comprehensively judge the reliability of the aberration measurement result through far-field and near-field data.
The invention has the advantages of providing a novel wavefront aberration measurement technology with large dynamic range and high precision for modern optical detection, and having obvious practical value.
Drawings
FIG. 1 is a diagram of an optical path structure of a wavefront aberrometer with a large dynamic range and high precision by combining with adaptive optics technology according to the present invention;
FIG. 2 is a flow chart of the work of a large dynamic range and high precision phase difference wavefront measuring instrument combining the adaptive optics technology;
FIG. 3 is a schematic diagram of a portion of a high-order wavefront utilizing a wavefront corrector to introduce precisely known phase difference information to a phase-difference wavefront sensor in accordance with the present invention;
fig. 4 shows the experimental results of measuring wavefront aberration by using the device of the present invention, wherein fig. 4 (a) shows a known distorted wavefront to be measured loaded by the wavefront corrector, fig. 4 (b) and fig. 4 (c) show a set of far-field spot images with known phase difference acquired by the phase difference wavefront sensor, fig. 4 (d) shows the measurement results of the device of the present invention on the known distorted aberration, fig. 4 (e) shows the residual error (rms <18.0 nm) between the measurement results and the known distorted wavefront, and fig. 4 (f) shows the far-field spot image after phase correction is performed on the distorted wavefront.
Detailed Description
The invention is further described with reference to the following figures and detailed description.
As shown in fig. 1, the large dynamic range and high precision wavefront measuring apparatus with phase difference method of the present invention, which combines with the adaptive optics technology, is composed of a light source laser 1, a parallel light collimation system 2, a first spectroscope 3, a sample 4 to be measured, a light beam conjugate-matching system 5, a second spectroscope 6, a wavefront corrector 7, a phase difference wavefront sensor 8 and a high performance computing processing system 9. The light source laser 1 emits illumination light beams, the illumination light beams are collimated into parallel light waves by the parallel light collimation system 2, the parallel light waves are reflected by the first beam splitter 3 to illuminate a sample 4 to be tested, the sample 4 to be tested is reflected back to distorted light waves containing aberration to be tested, the distorted light waves enter the light beam conjugation-matching system 5 through the first beam splitter 3, the light beam conjugation-matching system 5 ensures that the wavefront corrector 7, the phase difference wavefront sensor 8 and the sample 4 to be tested are in optical conjugation positions, the distorted light waves enter the wavefront corrector 7 through the second beam splitter 6, the wavefront corrector 7 introduces multiple groups of accurately known phase difference information into the distorted light waves to form multi-channel phase difference wavefront distortion constraint, the modulated light waves are distorted and reflected to the phase difference wavefront sensor 8 by the second beam splitter 6, corresponding far field light spot images are collected by the phase difference wavefront sensor 8, the high-performance calculation processing system 9 calculates distorted wavefront phase distribution by utilizing the multiple groups of far field light spot images and the known phase difference information, and then drives the wavefront corrector 7 to perform phase compensation on the distorted light waves; then the phase difference wavefront sensor 8 collects the far field spot image of the residual aberration after wavefront correction again, the high-performance computing and processing system 9 finishes the subsequent phase compensation work repeatedly, the process forms a self-adaptive optical wavefront aberration closed loop correction-measurement system, the distorted light wave after iterative correction finally approaches to the ideal optical plane light wave, and the correction value of the wavefront corrector 7 is the accurate numerical value of the wavefront aberration to be measured.
The working flow of the measuring instrument is shown in fig. 2, the high-performance calculation processing system 9 introduces a plurality of groups of accurately known phase difference information in the distorted light wave by using the control wavefront corrector 7, and controls the phase difference wavefront sensor 8 to acquire a corresponding far-field light spot image; in the mathematical solving process, an optimization algorithm is adopted to carry out iterative operation on the formulas (1) and (2), and after a calculation result is obtained, the high-performance calculation processing system 9 controls the wavefront corrector 7 to carry out phase compensation on the distorted light wave; and when the corrected far-field light spot meets the evaluation index, the system quits the working process, otherwise, the closed-loop correction process is executed again.
Equation (1) is the optimized objective function to be solved, K is the total frame number of the far-field spot image with known phase difference modulated by the wavefront corrector 9, D k Is the k frame far field spot image; phi in the formula (2) is the phase distribution of the distorted light wave to be measured, and delta phi k Is and D k The corresponding k frame has known phase difference, and FFT (-) is fast Fourier transform;
fig. 4 is an experimental result of measuring wavefront aberration by using the apparatus of the present invention, wherein fig. 4 (a) is a known distorted wavefront to be measured loaded by a wavefront corrector, fig. 4 (b) and fig. 4 (c) are a set of far-field spot images of known phase difference acquired by a phase difference wavefront sensor, fig. 4 (d) is a measurement result of the apparatus of the present invention on the known distorted aberration, fig. 4 (e) is a residual error (rms <18.0 nm) between the measurement result and the known distorted wavefront, fig. 4 (f) is a far-field spot image after phase correction is performed on the distorted wavefront, at this time, the far-field spot is already close to a diffraction limit eric spot, and it can be proved that the wavefront is already close to an ideal optical plane optical wave after phase compensation; experiments prove that the rms of the wave surface of the device in the measurement range is larger than 5um, and the rms of the wave surface of the device in the measurement precision is superior to 20nm.
In a word, the invention constructs a closed-loop correction-measurement system combining the adaptive optics technology and the phase difference wavefront sensor, and adopts a multi-channel phase difference constraint method to effectively improve the detection range and sensitivity of the traditional phase difference wavefront detection technology; the wavefront aberration measurement with large dynamic range and high precision can be realized simultaneously by one set of measuring device, the optical structure is simple and stable, no additional auxiliary device is needed, and the measuring object is suitable for the wavefront aberration measurement of a point light source system and an extended target; when a high-precision measurement result is obtained, the corrected far-field light spot intensity distribution can be monitored in real time through the phase difference wavefront sensor, and the reliability of the aberration measurement result can be comprehensively judged through far-field and near-field data. The invention has important significance for the field of optical detection, in particular to the processing and detection of the primary mirror of a large-caliber optical telescope.
The invention has not been described in detail and is part of the common general knowledge of a person skilled in the art.
Claims (4)
1. A large dynamic range, high accuracy phase difference method wavefront measuring apparatu that combines adaptive optics technique, its characterized in that: the device comprises a light source laser (1), a parallel light collimation system (2), a first spectroscope (3), a sample to be detected (4), a light beam conjugation-matching system (5), a second spectroscope (6), a wavefront corrector (7), a phase difference wavefront sensor (8) and a high-performance calculation processing system (9); the light source laser (1) emits illumination light beams, the illumination light beams are collimated into parallel light waves by the parallel light collimation system (2), the parallel light waves illuminate a sample (4) to be detected after being reflected by the first light splitting mirror (3), the sample (4) to be detected reflects distorted light waves containing aberration to be detected, the distorted light waves enter the light beam conjugation-matching system (5) through the first light splitting mirror (3), the light beam conjugation-matching system (5) enables the wavefront corrector (7), the phase difference wavefront sensor (8) and the sample (4) to be detected to be located at optical conjugation positions, the distorted light waves enter the wavefront corrector (7) through the second light splitting mirror (6), and the wavefront corrector (7) introduces the accurately known phase difference delta phi into the distorted light waves k And the modulated distorted light wave is reflected to the second beam splitter (6), and the second beam splitter (6) reflects the modulated distorted light wave to the phase difference wavefront sensor(8) The high-performance calculation processing system (9) utilizes a far-field light spot image acquired by the phase difference wavefront sensor (8) and a known phase difference delta phi introduced by the wavefront corrector (7) k Calculating to obtain distorted wavefront phase distribution, performing iterative calculation on formulas (1) and (2) by adopting an optimization algorithm in the solving process, driving a wavefront corrector (7) to perform phase compensation on distorted light waves, gradually and finally approaching the distorted light waves to ideal optical plane light waves after iterative correction, wherein the correction value loaded by the wavefront corrector (7) is the accurate numerical value of the wavefront aberration to be measured;
equation (1) is the optimized objective function to be solved, K is the total frame number of far-field spot images with known phase difference modulated by the wave-front corrector (7), D k Is the k frame far field spot image; phi in the formula (2) is the phase distribution of the distorted light wave to be measured, and delta phi k Is and D k The phase difference is known for the corresponding kth frame, FFT (-) is a fast fourier transform.
2. A large dynamic range, high accuracy phase difference wavefront measuring device incorporating adaptive optics technology as claimed in claim 1, wherein: the wavefront corrector (7) can provide a plurality of groups of dynamic accurate known phase difference information with different spatial frequencies and scales for the phase difference wavefront sensor (8), form multi-channel phase difference wavefront distortion constraint, remarkably improve the detection range and sensitivity of the traditional phase difference method, and effectively solve the problem of convergence of the phase difference wavefront detection technology under the condition of large dynamic range wavefront aberration measurement.
3. A large dynamic range, high accuracy phase difference wavefront measuring device incorporating adaptive optics technology as claimed in claim 1, wherein: the wavefront corrector (7), the phase difference wavefront sensor (8) and the high-performance calculation processing system (9) form an adaptive optics wavefront aberration closed-loop correction-measurement system, the phase difference wavefront sensor continuously detects residual aberration after adaptive optics correction in the measurement process, so that distorted light waves after phase compensation finally approach ideal optical plane light waves, and the correction value of the wavefront corrector (7) is the accurate numerical value of the wavefront aberration to be measured.
4. A large dynamic range, high accuracy phase difference wavefront measuring device incorporating adaptive optics technology as claimed in claim 1, wherein: the wave front corrector (7) can be other devices with wave front phase compensation functions, such as a liquid crystal spatial light modulator, a piezoelectric ceramic deformable mirror, an MEMS deformable mirror and the like.
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|---|---|---|---|---|
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Citations (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20050264779A1 (en) * | 2004-05-07 | 2005-12-01 | Takayuki Hasegawa | Assembly and adjusting method of optical system, exposure apparatus having the optical system |
| CN102331303A (en) * | 2011-08-05 | 2012-01-25 | 中国科学院光电技术研究所 | Grating-based phase difference wavefront sensor |
| CN102721477A (en) * | 2012-06-04 | 2012-10-10 | 中国科学院光电技术研究所 | Off-focus value measuring method for phase diversity wavefront sensor |
| CN102889935A (en) * | 2012-09-14 | 2013-01-23 | 中国科学院光电技术研究所 | Self-adaptation optical system near-field wave-front sensor calibration device and calibration method based on phase-diversity method |
| CN102636271B (en) * | 2012-04-19 | 2013-12-11 | 中国科学院光电技术研究所 | Phase diversity wave front measurement imaging device based on difference optics |
| CN103973263A (en) * | 2014-05-16 | 2014-08-06 | 中国科学院国家天文台 | Novel approximation filter method |
| CN104482875A (en) * | 2014-12-19 | 2015-04-01 | 合肥工业大学 | Single-slit spatial carrier shearing speckle interferometry measuring system and measuring method |
| CN107167299A (en) * | 2017-06-13 | 2017-09-15 | 中国科学院光电技术研究所 | A kind of Wave-front measurement instrument based on combined detection and phase-fitting |
-
2017
- 2017-12-13 CN CN201711324980.0A patent/CN108061639B/en active Active
Patent Citations (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20050264779A1 (en) * | 2004-05-07 | 2005-12-01 | Takayuki Hasegawa | Assembly and adjusting method of optical system, exposure apparatus having the optical system |
| CN102331303A (en) * | 2011-08-05 | 2012-01-25 | 中国科学院光电技术研究所 | Grating-based phase difference wavefront sensor |
| CN102636271B (en) * | 2012-04-19 | 2013-12-11 | 中国科学院光电技术研究所 | Phase diversity wave front measurement imaging device based on difference optics |
| CN102721477A (en) * | 2012-06-04 | 2012-10-10 | 中国科学院光电技术研究所 | Off-focus value measuring method for phase diversity wavefront sensor |
| CN102889935A (en) * | 2012-09-14 | 2013-01-23 | 中国科学院光电技术研究所 | Self-adaptation optical system near-field wave-front sensor calibration device and calibration method based on phase-diversity method |
| CN103973263A (en) * | 2014-05-16 | 2014-08-06 | 中国科学院国家天文台 | Novel approximation filter method |
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