CN204855406U - Fused quartz sublayer microdefect detecting device - Google Patents

Fused quartz sublayer microdefect detecting device Download PDF

Info

Publication number
CN204855406U
CN204855406U CN201520629413.6U CN201520629413U CN204855406U CN 204855406 U CN204855406 U CN 204855406U CN 201520629413 U CN201520629413 U CN 201520629413U CN 204855406 U CN204855406 U CN 204855406U
Authority
CN
China
Prior art keywords
sample
microdefect
fused quartz
laser
subsurface stratum
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
CN201520629413.6U
Other languages
Chinese (zh)
Inventor
刘红婕
蒋晓东
黄进
王凤蕊
孙来喜
耿峰
叶鑫
李青芝
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Laser Fusion Research Center China Academy of Engineering Physics
Original Assignee
Laser Fusion Research Center China Academy of Engineering Physics
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Laser Fusion Research Center China Academy of Engineering Physics filed Critical Laser Fusion Research Center China Academy of Engineering Physics
Priority to CN201520629413.6U priority Critical patent/CN204855406U/en
Application granted granted Critical
Publication of CN204855406U publication Critical patent/CN204855406U/en
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Landscapes

  • Investigating, Analyzing Materials By Fluorescence Or Luminescence (AREA)

Abstract

The utility model provides a fused quartz sublayer microdefect detecting device relates to the optical device field. This fused quartz sublayer microdefect detecting device is used for haring the detection to placing in the sample of sample bench, and including laser instrument, imaging system, electron multiplication charge coupled cell and display, electron multiplication charge coupled cell and imaging system set up in same straight line, work as this fused quartz sublayer microdefect detecting device during operation, the laser instrument set up in laser can direct irradiation to sample the position, electron multiplication charge coupled cell with the display electricity is connected. Laser irradiation is to the sample after, and the inferior surface defect of sample can send fluorescence, fluoroscopic image that electron multiplication charge coupled cell received sample sent to show the picture transmission for the display that like this, the user just collects the fluoroscopic image of the sublayer microdefect of sample, makes the judgement to the sublayer microdefect of sample, has avoided the damage to the fused quartz component.

Description

Fused quartz subsurface stratum microdefect sniffer
Technical field
The utility model relates to optical device field, in particular to a kind of fused quartz subsurface stratum microdefect sniffer.
Background technology
In fused quartz element load capability improving system, need to carry out the work of a large amount of element damage Performance Evaluation.Document shows, fused quartz optical component subsurface stratum microdefect causes the basic reason of damage from laser, therefore by the meticulous detection and characterization to fused quartz subsurface stratum microdefect, can evaluate the damage performance of optical element equally.Before, the mode of conventional fused quartz element subsurface stratum microdefect detection as, angle polishing method, chemical corrosion method, cross section microscopy etc., all by removal superficial layer in layer, recycling optical microscope carries out detecting and obtaining sub-surface layer microdefect, these modes can affect fused quartz Sub-surface defect self character on the one hand, be not non-destructive testing in addition, fused quartz optical component can be destroyed, and these elements are mostly very worthy, this method for control scientific research and operating cost obviously very unfavorable.
Utility model content
In view of this, the utility model provides a kind of fused quartz subsurface stratum microdefect sniffer, to improve in prior art the quality passing judgment on element quality, processing and pretreating process, be all by directly carrying out damage measure to element, and cause the flimsy problem of fused quartz element.
For achieving the above object, the utility model provides following technical scheme:
A kind of fused quartz subsurface stratum microdefect sniffer, for evaluating and testing the damage from laser performance being positioned over sample on sample stage, comprise laser instrument, imaging system, electron multiplying charge coupling element, display, described electron multiplying charge coupling element and described imaging system are arranged at same straight line, when this fused quartz subsurface stratum microdefect sniffer works, the laser that described laser instrument sends directly exposes to the sample on described sample stage, the subsurface stratum microdefect of sample sends the fluorescence that described electron multiplying charge coupling element can be made to gather, described electron multiplying charge coupling element is electrically connected with described display.
When this fused quartz subsurface stratum microdefect sniffer works, the laser that laser instrument sends directly exposes to the sample on described sample stage, Electron absorption photon energy in the subsurface stratum microdefect of sample transits to energy level state, the electronics being in energy level state is unstable, photon is sent through radiation transistion, i.e. fluorescence, the fluorescence that sample sends is transferred to electron multiplying charge coupling element through imaging system, electron multiplying charge coupling element receives the fluoroscopic image that sample sends, image is sent to display display, like this, user just collects the fluoroscopic image of the subsurface stratum microdefect of the sample from display, the subsurface stratum microdefect of sample is judged.
Preferably, in above-mentioned fused quartz subsurface stratum microdefect sniffer, also comprise described sample stage, described sample stage, described electron multiplying charge coupling element and described imaging system are positioned at same straight line, and described imaging system is between described sample stage and described electron multiplying charge coupling element.After this fused quartz subsurface stratum microdefect sniffer includes sample stage, place sample convenient.
Preferably, in above-mentioned fused quartz subsurface stratum microdefect sniffer, described imaging system comprises object lens and eyepiece, and described object lens are arranged on the one end near sample stage, described eyepiece is arranged on the one end near described electron multiplying charge coupling element, and described object lens and described eyepiece are positioned at same straight line.Object lens and eyepiece group are the major parts of imaging system, the unitized construction of object lens and eyepiece, can by the amplification of the clear picture in region to be measured for sample, with satisfied measurement requirement.
Preferably, in above-mentioned fused quartz subsurface stratum microdefect sniffer, described imaging system also comprises the absorption color filter of the scattered light for absorbing described laser instrument, and described absorption color filter is arranged between described endoscope objective lens and described eyepiece.Absorb the stray light effects that color filter can reduce excitation source.
Preferably, in above-mentioned fused quartz subsurface stratum microdefect sniffer, the white light source for direct irradiation sample is also comprised.White light source is irradiated to sample, and electron multiplying charge coupling element can photograph the bright field image of sample surfaces, for contrasting with above-mentioned fluoroscopic image, analyzes fused quartz subsurface stratum microdefect.
Preferably, in above-mentioned fused quartz subsurface stratum microdefect sniffer, described laser instrument is ultraviolet laser.In order to the specific excitation wavelength for fused quartz subsurface stratum microdefect, select ultraviolet laser.
Preferably, in above-mentioned fused quartz subsurface stratum microdefect sniffer, described ultraviolet laser to sample light path between be also provided with focus lens group.Focus lens group can make sample place laser power higher, and stronger fluorescence signal, is easy to the detection of Sub-surface defect, and the collimation of laser system is also better simultaneously.
Preferably, in above-mentioned fused quartz subsurface stratum microdefect sniffer, also comprise the choking device preventing laser from entering human eye or skin ambustion, described choking device is positioned on the reflected light path after the sample that laser is irradiated on sample stage.The laser that this choking device can prevent laser instrument from launching, after the sample reflection on sample stage, enters human eye or skin ambustion.
Relative to prior art, the utility model comprises following beneficial effect:
A kind of fused quartz subsurface stratum microdefect sniffer that the utility model provides, for evaluating and testing the damage from laser performance being positioned over sample on sample stage, comprise laser instrument, imaging system, electron multiplying charge coupling element and display, described electron multiplying charge coupling element and described imaging system are arranged at same straight line, to ensure that gathering light path can arrive electron multiplying charge coupling element smoothly, when this fused quartz subsurface stratum microdefect sniffer works, the laser that laser instrument sends directly exposes to the sample on described sample stage, Electron absorption photon energy in the subsurface stratum microdefect of sample transits to energy level state, the electronics being in energy level state is unstable, photon is sent through radiation transistion, i.e. fluorescence, so the subsurface stratum microdefect of sample sends the fluorescence that electron multiplying charge coupling element can be made to gather, the fluorescence that sample sends is transferred to electron multiplying charge coupling element through imaging system, the fluoroscopic image that the sample that electron multiplying charge coupling element receives sends, image is sent to display display, like this, user just collects the fluoroscopic image of the subsurface stratum microdefect of sample, the subsurface stratum microdefect of sample is judged.
Moreover, because laser shines directly on sample, after the subsurface stratum microdefect of sample receives laser, the subsurface stratum microdefect of sample sends fluorescence again to electron multiplying charge coupling element, namely excitation light path is separated with collection light path, so, object lens can be avoided to inspire the effect of fluorescence impact test sample.
Use fused quartz subsurface stratum microdefect sniffer of the present utility model, can under the condition not damaging fused quartz sample, assessment is made to the damage from laser performance of fused quartz optical component, solve by directly carrying out to fused quartz element the quality that damage measure passes judgment on element quality, processing technology in prior art, and cause the flimsy problem of fused quartz element.
Accompanying drawing explanation
In order to clearer explanation the utility model embodiment or technical scheme of the prior art, be briefly described to the accompanying drawing used required in embodiment or description of the prior art below, apparently, accompanying drawing in the following describes is only embodiments more of the present utility model, for those of ordinary skill in the art, under the prerequisite not paying creative work, other accompanying drawing can also be obtained according to these accompanying drawings.
Fig. 1 is the fused quartz subsurface stratum microdefect sniffer structural representation that the utility model embodiment provides;
Fig. 2 is the imaging system structural representation of the fused quartz subsurface stratum microdefect sniffer that the utility model embodiment provides.
Wherein Reference numeral gathers as follows:
Laser instrument 101; Electron multiplying charge coupling element 102; Display 103; Sample stage 104; Object lens 105; Absorb color filter 106; Eyepiece 107; Choking device 108; Focus lens group 109.
Embodiment
Optics scientific research field often uses fused quartz element, in fused quartz element load capability improving system, needs to carry out the work of a large amount of element damage Performance Evaluation.Document shows, fused quartz optical component subsurface stratum microdefect causes the basic reason of damage from laser, therefore by the meticulous detection and characterization to fused quartz subsurface stratum microdefect, can evaluate the damage performance of optical element equally.Before, the mode of conventional fused quartz element subsurface stratum microdefect detection as, angle polishing method, chemical corrosion method, cross section microscopy etc., all by removal superficial layer in layer, recycling optical microscope carries out detecting and obtaining sub-surface layer microdefect, these modes can affect fused quartz Sub-surface defect self character on the one hand, be not non-destructive testing in addition, fused quartz optical component can be destroyed, and these elements are mostly very worthy, this method for control scientific research and operating cost obviously very unfavorable.
In view of the foregoing, the utility model provides a kind of fused quartz subsurface stratum microdefect sniffer, to improve in prior art, passes judgment on the quality of element quality, processing and pretreating process, be all by directly carrying out damage measure to element, and cause the flimsy problem of fused quartz element.
Also by reference to the accompanying drawings the utility model is described in further detail below by specific embodiment.
Please refer to Fig. 1 and Fig. 2, the fused quartz subsurface stratum microdefect sniffer that the present embodiment provides, comprise laser instrument 101, imaging system, electron multiplying charge coupling element 102, display 103 and sample stage 104, electron multiplying charge coupling element 102, imaging system and sample stage 103 are set in turn on same straight line, electron multiplying charge coupling element 102 is electrically connected with 103 displays, when this fused quartz subsurface stratum microdefect sniffer works, the laser that laser instrument 101 sends directly exposes to the sample on described sample stage 104, namely laser instrument 101 is arranged on the position that laser that laser instrument 101 sends can shine directly into sample, in order to reach the better Detection results of sample, between laser instrument 101 and sample stage 104, focus lens group 109 can be set, focus lens group 109 can improve laser instrument 101 further and send laser at the power of sample surfaces and alignment precision.
After sample is subject to the direct irradiation of laser, Electron absorption photon energy in the subsurface stratum microdefect of sample transits to energy level state, the electronics being in energy level state is unstable, photon is sent through radiation transistion, i.e. fluorescence, so the subsurface stratum microdefect of sample sends the fluorescence that electron multiplying charge coupling element 102 can be made to gather, the fluorescence that sample sends is transferred to electron multiplying charge coupling element 102 through imaging system, the fluoroscopic image that the sample that electron multiplying charge coupling element 102 receives sends, electron multiplying charge coupling element 102 can by the electrical connection with display 103, send the image of collection to display 103 to show, like this, the fluoroscopic image of the subsurface stratum microdefect that the naked eyes that user just collects sample can not be differentiated, the subsurface stratum microdefect of sample is judged.
The fluorescence that fused quartz subsurface stratum microdefect sends is very faint, and common charge coupled cell can not detect its fluorescence signal, so the utility model adopts highly sensitive electron multiplying charge coupling element 102.
Because laser shines directly on sample, after the subsurface stratum microdefect of sample receives laser, the subsurface stratum microdefect of sample sends fluorescence again to electron multiplying charge coupling element 102, namely excitation light path is separated with collection light path, so, object lens can be avoided to inspire the test effect of fluorescence impact to sample, improve the accuracy of test effect.
Laser instrument 101 of the present utility model is ultraviolet laser for tested fused quartz sample, and certainly according to the excitation wavelength characteristic of test sample, laser instrument also can be other laser instruments, such as, and infrared laser.
In the fused quartz subsurface stratum microdefect sniffer that the utility model embodiment provides, imaging system comprises object lens 105 and eyepiece 107, object lens 105 are arranged on the one end near sample stage 104, eyepiece 107 is arranged on the one end near electron multiplying charge coupling element 102, object lens 105 and described eyepiece 107 are positioned at same straight line, imaging system can also comprise absorption color filter 106, absorbs color filter 106 and is arranged between object lens 105 and eyepiece 107.Object lens and eyepiece group are the major parts of imaging system, the unitized construction of object lens and eyepiece, can, by the amplification of the clear picture in region to be measured for sample, also be the major parts of simple microscope.Absorbing color filter 106 can the scattered light of laser that sends of absorbing laser device 101, so absorb the stray light effects that color filter 106 can reduce excitation source.
The fused quartz subsurface stratum microdefect sniffer of the utility model embodiment, also comprise white light source (not shown), the white light that white light source is launched can shine directly into sample, sample is by after white light, electron multiplying charge coupling element 102 can photograph the bright field image of sample surfaces, bright field image is used for and the contrast of above-mentioned fluoroscopic image, and analyze fused quartz subsurface stratum microdefect, white light source can be xenon lamp.
Preferably, the laser launched to prevent laser instrument 101 is after the sample reflection on sample stage, enter human eye or skin ambustion, the fused quartz subsurface stratum microdefect sniffer of the present embodiment, also comprise choking device 108, choking device 108 is positioned on the reflected light path after the sample that laser is irradiated on sample stage.
In sum, a kind of fused quartz subsurface stratum microdefect sniffer that the utility model provides, for evaluating and testing the damage from laser performance being positioned over sample on sample stage, comprise laser instrument, imaging system, electron multiplying charge coupling element and display, described electron multiplying charge coupling element and described imaging system are arranged at same straight line, to ensure that gathering light path can arrive electron multiplying charge coupling element smoothly, when this fused quartz subsurface stratum microdefect sniffer works, the laser that laser instrument sends directly exposes to the sample on described sample stage, the subsurface stratum microdefect of sample sends the fluorescence that electron multiplying charge coupling element can be made to gather, the fluorescence that sample sends is transferred to electron multiplying charge coupling element through imaging system, the fluoroscopic image that the sample that electron multiplying charge coupling element receives sends, image is sent to display display, like this, user just collects the fluoroscopic image of the subsurface stratum microdefect of sample, the subsurface stratum microdefect of sample is judged, can under the condition not damaging fused quartz sample, assessment is made to the damage from laser performance of fused quartz optical component, solve in prior art and pass judgment on element quality by directly carrying out damage measure to fused quartz element, the quality of processing technology, and cause the flimsy problem of fused quartz element.
The foregoing is only preferred embodiment of the present utility model, be not limited to the utility model, for a person skilled in the art, the utility model can have various modifications and variations.All within spirit of the present utility model and principle, any amendment done, equivalent replacement, improvement etc., all should be included within protection domain of the present utility model.It should be noted that: represent similar terms in similar label and letter accompanying drawing below, therefore, once be defined in an a certain Xiang Yi accompanying drawing, then do not need to define further it and explain in accompanying drawing subsequently.
In description of the present utility model, it should be noted that, term " " center ", " on ", D score, " left side ", " right side ", " vertically ", " level ", " interior ", orientation or the position relationship of the instruction such as " outward " are based on orientation shown in the drawings or position relationship, or this utility model product orientation of usually putting or position relationship when using, only the utility model and simplified characterization for convenience of description, instead of indicate or imply that the device of indication or element must have specific orientation, with specific azimuth configuration and operation, therefore can not be interpreted as restriction of the present utility model.
In description of the present utility model, also it should be noted that, unless otherwise clearly defined and limited, term " setting ", " installation ", " being connected ", " connection " should be interpreted broadly, and such as, can be fixedly connected with, also can be removably connect, or connect integratedly; Can be mechanical connection, also can be electrical connection; Can be directly be connected, also indirectly can be connected by intermediary, can be the connection of two element internals.For the ordinary skill in the art, concrete condition the concrete meaning of above-mentioned term in the utility model can be understood.

Claims (8)

1. a fused quartz subsurface stratum microdefect sniffer, for evaluating and testing the damage from laser performance being positioned over sample on sample stage, it is characterized in that, comprise laser instrument, imaging system, electron multiplying charge coupling element and display, described electron multiplying charge coupling element and described imaging system are arranged at same straight line, when this fused quartz subsurface stratum microdefect sniffer works, the laser that described laser instrument sends directly exposes to the sample on described sample stage, the subsurface stratum microdefect of sample sends the fluorescence that described electron multiplying charge coupling element can be made to gather, described electron multiplying charge coupling element is electrically connected with described display.
2. fused quartz subsurface stratum microdefect sniffer according to claim 1, it is characterized in that, also comprise described sample stage, described sample stage, described electron multiplying charge coupling element and described imaging system are positioned at same straight line, and described imaging system is between described sample stage and described electron multiplying charge coupling element.
3. fused quartz subsurface stratum microdefect sniffer according to claim 1 and 2, it is characterized in that, described imaging system comprises object lens and eyepiece, described object lens are arranged on the one end near described sample stage, described eyepiece is arranged on the one end near described electron multiplying charge coupling element, and described object lens and described eyepiece are positioned at same straight line.
4. fused quartz subsurface stratum microdefect sniffer according to claim 3, it is characterized in that, described imaging system also comprises the absorption color filter of the scattered light for absorbing described laser instrument, and described absorption color filter is arranged between described object lens and described eyepiece.
5. fused quartz subsurface stratum microdefect sniffer according to claim 4, is characterized in that, also comprise the white light source for direct irradiation sample.
6. fused quartz subsurface stratum microdefect sniffer according to claim 5, it is characterized in that, described laser instrument is ultraviolet laser.
7. fused quartz subsurface stratum microdefect sniffer according to claim 6, is characterized in that, described ultraviolet laser to sample light path between be also provided with focus lens group.
8. fused quartz subsurface stratum microdefect sniffer according to claim 7, is characterized in that, also comprise the choking device preventing laser from entering human eye or skin ambustion, and described choking device is positioned on the reflected light path after the sample that laser is irradiated on sample stage.
CN201520629413.6U 2015-08-20 2015-08-20 Fused quartz sublayer microdefect detecting device Expired - Fee Related CN204855406U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN201520629413.6U CN204855406U (en) 2015-08-20 2015-08-20 Fused quartz sublayer microdefect detecting device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN201520629413.6U CN204855406U (en) 2015-08-20 2015-08-20 Fused quartz sublayer microdefect detecting device

Publications (1)

Publication Number Publication Date
CN204855406U true CN204855406U (en) 2015-12-09

Family

ID=54745944

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201520629413.6U Expired - Fee Related CN204855406U (en) 2015-08-20 2015-08-20 Fused quartz sublayer microdefect detecting device

Country Status (1)

Country Link
CN (1) CN204855406U (en)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN107271442A (en) * 2017-07-21 2017-10-20 黄宁 A kind of medical test multipurpose test system
CN109459438A (en) * 2018-11-27 2019-03-12 中国工程物理研究院激光聚变研究中心 A kind of defect detection equipment and method
CN110686614A (en) * 2019-10-11 2020-01-14 西安工业大学 Detection device and detection method for depth information of subsurface defect of optical element
CN111007052A (en) * 2019-10-10 2020-04-14 中国科学院上海光学精密机械研究所 Measuring device and measuring method for low-damage threshold defect of large-caliber fused quartz glass
CN113720815A (en) * 2021-07-21 2021-11-30 中国工程物理研究院激光聚变研究中心 Fused quartz subsurface defect high-resolution imaging method under weak fluorescence imaging condition

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN107271442A (en) * 2017-07-21 2017-10-20 黄宁 A kind of medical test multipurpose test system
CN109459438A (en) * 2018-11-27 2019-03-12 中国工程物理研究院激光聚变研究中心 A kind of defect detection equipment and method
CN109459438B (en) * 2018-11-27 2023-06-20 中国工程物理研究院激光聚变研究中心 Defect detection equipment and method
CN111007052A (en) * 2019-10-10 2020-04-14 中国科学院上海光学精密机械研究所 Measuring device and measuring method for low-damage threshold defect of large-caliber fused quartz glass
CN110686614A (en) * 2019-10-11 2020-01-14 西安工业大学 Detection device and detection method for depth information of subsurface defect of optical element
CN113720815A (en) * 2021-07-21 2021-11-30 中国工程物理研究院激光聚变研究中心 Fused quartz subsurface defect high-resolution imaging method under weak fluorescence imaging condition
CN113720815B (en) * 2021-07-21 2024-07-12 中国工程物理研究院激光聚变研究中心 Fused quartz subsurface defect high-resolution imaging method under weak fluorescence imaging condition

Similar Documents

Publication Publication Date Title
CN204855406U (en) Fused quartz sublayer microdefect detecting device
CN109459438B (en) Defect detection equipment and method
US8207508B2 (en) Device and method for quantifying a surface's cleanliness
JP7339643B2 (en) Systems and methods for testing the refractive power and thickness of ophthalmic lenses immersed in solutions
CN109060816B (en) Device and method for rapidly detecting defects in large-caliber element body
CN105021627B (en) The highly sensitive quick on-line water flushing method of optical thin film and element surface damage from laser
CN103105400B (en) The detection sorting technique of optical elements of large caliber surface imperfection
CN106066318A (en) A kind of method and device of on-line testing optical element laser damage
CN103674903A (en) Non-contact vancometer
CN103105403A (en) Method and device for detecting surface defect of transparent optical component
CN105510347A (en) Optical material defect real-time imaging apparatus based on photothermal detection and optical microscopy
CN204495772U (en) Face of weld and sub-surperficial tiny flaw magneto-optic imaging non-destructive pick-up unit
CN107478640A (en) A kind of enhanced Portable Raman spectrometer of optical fiber probe
JP2013145236A (en) Apparatus for measuring transmittance of cover glass for photovoltaic cell
CN203069531U (en) Device for detecting surface defect of transparent optical element
CN102841102B (en) Recognition method and device for micro-scale damage point in damage threshold measurement
CN107290314B (en) Fluorescence detection method and device for unmarked micro-nano particles
CN106018432A (en) Large-size optical lens surface quality detection method and system
CN208505896U (en) Retro-reflecting coefficient tester
CN203069524U (en) Detection and classification device for surface defect of big-aperture optical element
CN210572335U (en) High-sensitivity specific protein analyzer
Gut et al. Determination of the attenuation of planar waveguides by means of detecting scattered light
CN106404746B (en) A kind of CaF2Optical substrate surface and sub-surface damage detection method
CN214583669U (en) Infrared temperature measuring equipment verification test instrument
CN218239824U (en) Haze measuring device for transparent material

Legal Events

Date Code Title Description
C14 Grant of patent or utility model
GR01 Patent grant
CF01 Termination of patent right due to non-payment of annual fee

Granted publication date: 20151209

Termination date: 20210820

CF01 Termination of patent right due to non-payment of annual fee