CN106066318A - A kind of method and device of on-line testing optical element laser damage - Google Patents
A kind of method and device of on-line testing optical element laser damage Download PDFInfo
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- CN106066318A CN106066318A CN201610423298.6A CN201610423298A CN106066318A CN 106066318 A CN106066318 A CN 106066318A CN 201610423298 A CN201610423298 A CN 201610423298A CN 106066318 A CN106066318 A CN 106066318A
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/62—Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light
- G01N21/63—Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light optically excited
- G01N21/64—Fluorescence; Phosphorescence
- G01N21/6402—Atomic fluorescence; Laser induced fluorescence
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/62—Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light
- G01N21/63—Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light optically excited
- G01N21/64—Fluorescence; Phosphorescence
- G01N2021/6417—Spectrofluorimetric devices
Abstract
The invention discloses the square law device of a kind of on-line testing optical element laser damage.The method comprises the following steps: produce laser, and irradiation is to the surface of optical element；Fluorescence imaging is carried out to the fluorescence signal inspiring after laser irradiation to the surface of optical element, the fluorescence signal being excited during to form fluoroscopic image, and to collect the surface of laser illuminated optical element；Obtain the change of fluorescence intensity according to fluoroscopic image, and then judge the damage field of optical element according to the change of fluorescence intensity, further the spectrum of fluorescence signal is analyzed, and then the change according to spectrum judges the damage of optical element further.By the way, the real-time online that the present invention is capable of the irradiation zone to optical element is monitored continuously, improve the Damage Evolution of optical element under laser irradiation and the efficiency of study mechanism, contribute to the Damage Evolution to optical element and mechanism is studied effectively.
Description
Technical field
The present invention relates to damage from laser and the life test field of optical element, especially relate to a kind of on-line testing optics
The square law device of element damage from laser.
Background technology
In recent years, the ArF PRK of 193nm wavelength is including at the fine micro Process of material, deep-UV lithography, material
Reason, laser marking etc. all obtain more next at numerous areas such as interior commercial Application, PRK medical treatment and scientific researches
More extensive application, especially in great scale integrated circuit photoetching preparation field, have very great society and economy
It is worth.It is contemplated that, with the development of correlation technique, ArF PRK will obtain bigger application.
Owing to 193nm is near the forbidden band of most dielectric materials, Intrinsic Gettering, Impurity Absorption and defect absorption etc.
Existing makes the dielectric materials such as only a small amount of oxide and fluoride disclosure satisfy that the needs that ArF laser optical element is applied.
Even these dielectric materials, however it remains the series of problems that Intrinsic Gettering, Impurity Absorption and defect absorption etc. cause, only
It is that influence degree is relatively smaller.Therefore, the damage from laser of optical element and life problems are always restriction ArF laser instrument to higher
Energy and power development, affect one of principal element of laser application system service life and cost.With ArF PRK
The development of application, the especially fast development of great scale integrated circuit photoetching technology of preparing, to ArF PRK light
Learning element function and long-time stability requiring to propose lasting challenge, the damage of ArF PRK optical element is with for a long time
Service life, problem seemed more prominent.
At present, can be as the only SiO of ArF laser optical element substrate2And CaF2Bi-material.Wherein SiO2Mainly
For in the relatively low application of laser energy density, for higher laser energy density and require the long life application in
CaF must be used2Optical element.Therefore, CaF2Optical element is applied for the ArF laser of high-energy-density and long service live
Particularly significant.Although CaF in theory2Optical element can meet well ArF laser application needs, but in practice
CaF2The damage of optical element and life-span are still that one of subject matter that current and following restriction ArF laser applies.From reality
Border situation is analyzed, and causes CaF2The factor of optic element damage is extremely complex, including the factor of three aspects: it is first CaF2
The trace impurity introducing in optical crystal material growth course and defect；Next to that CaF2Optical substrate cutting, grinding, surface essence
The impurity introducing in surface and sub-surface layer during throwing and cleaning etc. and defect；Finally, the tool also with optical element application
There is significantly association in body environment.Three kinds of factors recited above often mix so that cause the reason that damage seeming wrong
Combining complexity, this greatly constrains CaF2Optic element damage threshold value and the raising in life-span.
For threshold for resisting laser damage and the life-span of Study of Laser optical element, researcher carries out substantial amounts of theory and reality
Test research, and define the test of laser optical element damage threshold and international standard ISO 21254 evaluated.In order to more fully
Meeting the complicated demand of laser optical element damage and life test, this standard pin is to different testing requirements, it is proposed that 4 kinds are not
Same test pattern, respectively 1-on-1 pattern, S-on-1 pattern, R-on-1 pattern and N-on-1 pattern.Evaluation of classification pattern
Significant portion solves problem encountered in the laser optical element damage measure work of different demand.In above-mentioned four kinds of tests
Damage in pattern, when 1-on-1, R-on-1 and N-on-1 these three pattern lays particular emphasis on irradiation energy density height, irradiance pulse number lacks
Hinder behavior evaluation, and the derogatory behaviour evaluation that S-on-1 pattern stresses relatively when irradiation energy density is low, irradiance pulse number is big.?
Carrying out in Damage Evaluation test, international standard ISO 21254 recommends off-line and online damage evaluation method respectively.Wherein use
Differential interference microscope method, as the standard method of optical element laser damage offline inspection, uses light scattering method as optics unit
The standard method of part damage from laser on-line checking.In reality test, it is not enough to there is following two in differential interference microscope method: when
When the exposure spots damage of sample is inconspicuous, its damage morphologies is difficult to be accurately positioned in off-line microscope；Owing to its illumination is strong
Spending relatively weak and sightingpiston focusing problem, when enlargement ratio is more than 200 times, the definition of micro-imaging will be degenerated, and make
Obtain the observation of surface topography and accurate judgement has difficulties, it is difficult to observe the smaller or faint damage morphologies of differentiation.And light
Electrically amplified etc. by during the stability of light beam, the uniformity of sample surfaces and infant laser signal detection of scattering method result of detection
The impact of factor is bigger.
ISO 21254 international standard obtains the absolute damage threshold of different optical element by the method for statistics.Although it is logical
Cross analyze above-mentioned standard obtain damage threshold change contribute to being analyzed the injuring rule of optical element, but this side
Owned by France in the method for only phase, lack intuitive and continuity, for the Damage Evolution furtheing investigate optical element and mechanism side
Face exists substantially not enough.
Content of the invention
The technical problem that present invention mainly solves is to provide the square law device of a kind of on-line testing optical element laser damage,
The real-time online being capable of the irradiation zone to optical element is monitored continuously, and the damage improving optical element under laser irradiation is drilled
Change and the efficiency of study mechanism, contribute to the Damage Evolution to optical element and mechanism studied effectively.
For solving above-mentioned technical problem, one aspect of the present invention is: provide a kind of on-line testing optics unit
The method of part damage from laser, the method comprises the following steps: produce laser, and irradiation is to the surface of optical element；To laser spoke
The fluorescence signal inspiring behind the surface of the optical element shining carries out fluorescence imaging, forming fluoroscopic image, and collects and swashs
The fluorescence signal being excited during the surface of light illuminated optical element；Obtain the change of fluorescence intensity according to described fluoroscopic image, enter
And the damage field of described optical element is judged according to the change of described fluorescence intensity, further the spectrum of fluorescence signal is carried out
Analyze, and then the change according to spectrum judges the damage of optical element further.
Wherein, irradiation farther included before the step on the surface of optical element: carry out shaping and focusing to laser.
Wherein, to laser irradiation to optical element surface after the fluorescence signal that the inspires step that carries out fluorescence imaging
Include: carry out decaying and filtering to described laser before；
Include before the step of the described change obtaining fluorescence intensity according to described fluoroscopic image: described fluoroscopic image is entered
The micro-amplification of row.
Wherein, the step carrying out decaying and filtering to described laser includes: carries out three grades of decay to described laser and filters.
Wherein, the step of the fluorescence signal being excited during the surface collecting optical element described in laser irradiation includes: to institute
State fluorescence signal to be focused, collimate and transmit.
For solving above-mentioned technical problem, one aspect of the present invention is: provide a kind of on-line testing optics unit
The device of part damage from laser, this device includes: laser instrument, is used for producing laser, and irradiation is to the surface of optical element；Image passes
Sensor, for laser irradiation to optical element surface after the fluorescence signal that inspires carry out fluorescence imaging, glimmering to be formed
Light image；Signal collection system, is used for the fluorescence signal being excited during the surface collecting laser illuminated optical element；Central authorities are processed
Device, for the change according to described fluoroscopic image acquisition fluorescence intensity, and then according to the change of described fluorescence intensity judges
The damage field of optical element；Spectrometer, is used for being analyzed the spectrum of described fluorescence signal, and then according to described spectrum
Change determines the damage field of described optical element.
Wherein, device also includes: shaping and focus module, for before laser irradiation to optical element, to laser instrument
Produced laser is through shaping and focusing.
Wherein, device also includes: decay and filter set, for carrying out decaying and filtering to laser；Microcobjective, is used for
Micro-amplification is carried out to described fluoroscopic image.
Wherein, decay and filter set include highly reflecting films, the long wave pass filter of high OD and short wave pass filter, use
Decay in carrying out three grades respectively to described laser and filter.
Wherein, laser collection system includes: phosphor collection mirror, for being focused described fluorescence signal；Collimation lens,
For receiving the fluorescence signal that described phosphor collection mirror focuses on, and described fluorescence signal is coupled to ultraviolet multimode fibre；Ultraviolet
Multimode fibre, is used for transmitting described fluorescence signal in described spectrometer.
The invention has the beneficial effects as follows: be different from the situation of prior art, the present invention provides a kind of on-line testing optics unit
The square law device of part damage from laser.Wherein, first method comprises the following steps: produce laser, and irradiation is to the table of optical element
Face, then to laser irradiation to optical element surface after the fluorescence signal that inspires carry out fluorescence imaging, to form fluorescence
Image, and the fluorescence signal being excited when collecting the surface of laser illuminated optical element, then then obtain according to fluoroscopic image
Take the change of fluorescence intensity, and then judge the damage field of optical element according to the change of fluorescence intensity, further fluorescence is believed
Number spectrum be analyzed, and then the change according to spectrum judges the damage of optical element further.Therefore, the present invention can be real
Now the real-time online of the irradiation zone of optical element is monitored continuously, improve Damage Evolution and the machine of optical element under laser irradiation
The efficiency of reason research, contributes to the Damage Evolution to optical element and mechanism is studied effectively.
Brief description
Fig. 1 is the flow chart of the method for a kind of on-line testing optical element laser damage that the embodiment of the present invention provides；
Fig. 2 is the structural representation of the device of a kind of on-line testing optical element laser damage that the embodiment of the present invention provides
Figure.
Detailed description of the invention
Referring to Fig. 1, Fig. 1 is the method for a kind of on-line testing optical element laser damage that the embodiment of the present invention provides
Flow chart.As it is shown in figure 1, the method for the present embodiment comprises the following steps:
Step S1: produce laser, and irradiation is to the surface of optical element.
Step S2: to laser irradiation to optical element surface after the fluorescence signal that inspires carry out fluorescence imaging, with
Form fluoroscopic image.
Step S3: fluorescence imaging is carried out to the fluorescence signal inspiring after laser irradiation to the surface of optical element, with shape
Become fluoroscopic image, and the fluorescence signal being excited when collecting the surface of laser illuminated optical element.
Step S4: obtain the change of fluorescence intensity according to fluoroscopic image, and then judge optics according to the change of fluorescence intensity
The damage field of element, is analyzed to the spectrum of fluorescence signal further, and then judges light according to the change of spectrum further
Learn the damage of element.
In the present embodiment, the characteristic of the fluorescence signal inspiring when obtaining laser illuminated optical element in real time, to fluorescence
The spectrum of the image of signal and fluorescence signal is analyzed, such that it is able to monitor irradiation sample, i.e. optical element efficiently
Surface damage initial with develop.
In the present embodiment, laser is preferably ArF laser, and the present embodiment be preferably applied in low energy densities irradiation
Under, optical element is preferably CaF2Optical element.
ArF laser irradiation is to CaF2After optical element, ArF laser is by CaF2Optical element surface and the impurity of inside
Or defect interacts, thus exciting the fluorescence comprising ultraviolet and visible waveband, therefore, the present embodiment is preferably to ArF
The CaF that laser irradiation arrives2The Ultraluminescence signal exciting behind the surface of optical element carries out fluorescence imaging.
Before laser illuminated optical element, further shaping and focusing are carried out to laser beam.Owing to ArF laser passes through
CaF2After optical element, its intensity is still very strong, not only can affect the imaging of Ultraluminescence signal, and after damaging
Tester.Therefore, before imaging, carry out decaying and filtering to laser.Specifically, have employed three grades of decay and filter
Light, the first order uses 45 degree of highly reflecting films of 193nm, and substrate uses CaF2Or fused quartz, ArF laser is decayed；Second
Level then uses the long wave pass filter of high OD, and cutoff wavelength is 250nm；Third level decay have employed a short wave pass filter,
Its cutoff wavelength is 380nm, for filtering visible light signal.Therefore, the present embodiment can be to ArF laser and visible waveband
Fluorescence and veiling glare carry out effective attenuation and optical filtering.
Further, ultraviolet microcobjective is used to carry out micro-amplification to by the fluoroscopic image of laser irradiation region.It amplifies
Optional 10-20 times of multiplying power, is preferably amplified to ultraviolet band.
In the present embodiment, due at ArF laser irradiation CaF2During optical element, by detecting the ultraviolet on irradiation zone surface
Fluorescence signal, it is possible to achieve to the real time imagery being illuminated region, when change occurs in the regional area being illuminated region, such as damage
When, the intensity of its fluorescence signal will change, and will reflect in fluoroscopic image, thus may determine that damage occur
Region.
In order to increase the accuracy of test further, the present embodiment is swashed when also collecting the surface of laser illuminated optical element
The fluorescence signal sent out, and the spectrum of fluorescence signal is analyzed, and then the damage of optical element is determined according to the change of spectrum
Region.Thus can be with real-time detection ArF laser irradiation CaF2The spectrum occurring during optical element, real-time to spectral component
Monitoring is analyzed, when the spectral content being detected and power change, it is judged that optical element has occurred in that damage, by dividing
The change of analysis spectrum and reason thereof, can study the mechanism of optic element damage further.
Wherein, the step of the fluorescence signal being excited during the surface collecting laser illuminated optical element is specially to be believed to fluorescence
It number is focused, collimates and transmits.
Described in brought forward, the present embodiment is based on ArF laser irradiation CaF2Inspire the characteristic of fluorescence during optical element, obtain in real time
Take and damage the fluorescent characteristics signal of direct correlation.By being illuminated the glimmering in real time of region in laser illuminated optical element process
Photoimaging detects, can be with the gradually differentiation of the initiation region to damage for the Real Time Observation and damage field.Further, by right
In laser illuminated optical element process, fluorescence excitation spectrum carries out real-time detection analysis, can accurately be judged to damage by the change of spectrum
The generation of wound, and by the reason that to spectrum change being analyzed, the possible mechanism of damage can be analyzed further.By above-mentioned two
Individual aspect combines, and is possible not only to accurately judge the damage of optical element, it is often more important that can be by the generation to damage
And differentiation carries out continuous real time on-line monitoring, provide comprehensive information by the damage inherent mechanism analysis for optical element, from
And it is remarkably contributing to the in-depth analysis research to damage inherent mechanism.
Present invention also offers the device of a kind of on-line testing optical element laser damage, this device is used for previously described
In method.Specifically refer to Fig. 2, as in figure 2 it is shown, the device 20 of the present embodiment includes that laser instrument the 1st, imageing sensor the 6th, signal is received
Collecting system the 21st, spectrometer 10 and central processing unit 11.
Wherein, laser instrument 1 is used for producing laser, and irradiation is to the surface of optical element 7.Wherein, device 20 also includes electricity
Move sample stage 3, be test for optical element 7 and be arranged on electromigration sample stage 3.In the present embodiment, laser is preferably ArF laser,
Laser instrument 1 is preferably ArF laser instrument, and the present embodiment is preferably applied under low energy densities irradiation, and optical element 7 is preferably CaF2
Optical element.
Imageing sensor 6 for laser irradiation to optical element 7 surface after the fluorescence signal that inspires carry out glimmering
Photoimaging, to form fluoroscopic image.
ArF laser irradiation is to CaF2After optical element, ArF laser is by CaF2Optical element surface and the impurity of inside
Or defect interacts, thus exciting the fluorescence comprising ultraviolet and visible waveband, therefore, the present embodiment is preferably to ArF
The CaF that laser irradiation arrives2The Ultraluminescence signal exciting behind the surface of optical element carries out fluorescence imaging.
CaF for high-quality level2Optical element, its internal impurity is very faint, and excitation spectrum mostlys come from material
Material internal flaw, its dominant spectral peak is positioned at about 300-380nm, and nonetheless, its spectral intensity is also relatively weak, therefore,
In order to realize being illuminated the clear observation of region surface, it is necessary to select high-sensitive imageing sensor 6, this enforcement to ultraviolet band
The imageing sensor 6 of example is the highly sensitive CCD camera of ultraviolet, and its response wave length covers ultraviolet 200nm, uses the detection that backboard is thinning
Chip, has very high sensitivity for ultraviolet light, such that it is able to guarantee also in the case of exciting fluorescence signal more weak
Realize to the blur-free imaging being illuminated region.
Central processing unit 11 is used for obtaining the change of fluorescence intensity according to fluoroscopic image, and then according to the change of fluorescence intensity
Judge the damage field of optical element 7.
Wherein, device 20 also includes shaping and focus module 2, before laser irradiation to optical element 7, to ArF laser
The laser beam that device 1 is sent is through shaping and focusing.
Owing to ArF laser is through CaF2After optical element, its intensity is still very strong, not only can affect Ultraluminescence letter
Number imaging, and tester below can be damaged.Therefore, before imaging, device 20 also includes decay and filter set
4, carry out decaying and filtering to the intensity of laser.Simultaneously in order to avoid the damage of attenuator, decay and filter set 4 have employed three
Level decay.Specifically, the first order uses 45 degree of highly reflecting films of 193nm, decays ArF laser, and its substrate uses
CaF2Or fused quartz；The second level then uses the long wave pass filter of high OD, and cutoff wavelength is 250nm；In addition decay and optical filter
Group 4 additionally uses a short wave pass filter and decays as the third level, and its cutoff wavelength is 380nm, for by visible light signal
Filter.Therefore, the present embodiment can carry out effective attenuation and optical filtering to the fluorescence of ArF laser and visible waveband and veiling glare.
Wherein, device 20 also includes microcobjective 5.Microcobjective 5 is for carrying out micro-amplification to fluoroscopic image.Wherein,
The microcobjective 5 preferably ultraviolet band that the present embodiment is used, has enough multiplication factors, and its operating distance will be as far as possible
Long.Therefore, the microcobjective 5 of the present embodiment is preferably overlength working distance ultraviolet microcobjective.Its optical element uses fused quartz
Material, two-sided plating ultraviolet anti-reflection film, the center operating wavelength of object lens is designed as 320nm, optional 10-20 times of its enlargement ratio, work
Make distance for about 20mm.
As in figure 2 it is shown, the present embodiment is the mode using backward detection is implemented as picture, will above-mentioned involved imaging
Detecting element be placed on radiation exposed optical element 7 followed by detection.
2nd, decayed and filter set the 4th, microcobjective 5 and image pass by previously described ArF laser instrument the 1st, focus module
The groundwork flow process of real-time micro imaging system that sensor 6 is formed is as follows: the laser beam that ArF laser instrument 1 is sent is through whole
After shape and focus module 2, incide the surface being illuminated optical element 7, and will transmit through optical element 7 continuation propagation, now
ArF laser will go out comprise the fluorescence of ultraviolet band on the surface of optical element 7 and internal excitation, and this fluorescence can be as micro-
The imaging illumination light source of object lens 5.ArF laser and excite fluorescence to propagate forward, arrives first at decay and filter set 4, passes through
ArF laser is weakened by first order ArF laser attenuation piece in decay and filter set 4 significantly, passes through second level attenuator afterwards
Below the 250nm ultraviolet light complete attenuation comprising ArF laser is fallen, afterwards by third level attenuator by more than 400nm can
See that light is adequately filtered out, therefore, only comprise the purple between 250nm-350nm through the illumination light after overdamping and filter set 4
Outer fluorescence；Above-mentioned Ultraluminescence enters microcobjective 5, and the flat-field achromatic objective lens of multiplication factor 15X selected by this microcobjective 5,
The long 10mm of its focal length, operating distance 25mm, numerical aperture 0.26, resolution ratio 1 microns, the fluorescence letter of microcobjective 5 outgoing
Number incide the pixel imaging of highly sensitive ultraviolet CCD camera 6；Microcobjective 5 is fixed on highly sensitive ultraviolet CCD phase by interface
On machine 6, the spacing being illuminated surface of regulation microcobjective 5 to optical element 7, make optical element 7 is illuminated surface position
In the object plane of microcobjective 5, thus imaging in CCD camera 6, and capture CCD camera 6 imaging number with central processing unit 11 in real time
According to, and be analyzed.Damage occur when being illuminated region regional area, the intensity of its fluorescence signal will change, and will be
Imaging reflects, thus can detect the region that damage occurs.
Above-mentioned real-time micro imaging system realizes that the basic mode of optical element 7 Damage detection is as follows: based on upper
The workflow of the real-time micro-imaging stated, before optical element 7 surface is not damaged, it is by territory, ArF laser irradiation region
Imaging will be stablized constant, when being illuminated region on optical element 7 surface and starting to occur local damage, and exciting of this damage field
Spectrum will appear from change, and its absorption simultaneously quickly increase can cause weakening of excitating light strength, and now the fluorescence of this position shines
Bright intensity will change so that it presents difference with peripheral region, be may determine that whether this region is damaged by the degree of difference
Wound, can be carried out continuously irradiation test, and the change of respective record micro-imaging, just can be become by analyzing micro-imaging image
The evolution changed and reason thereof, can provide important foundation for the damage mechanism analysis of optical element 7.
Irradiation zone is also excited spectrum real-time detection by the present embodiment, for ArF laser illuminated optical element 7 surface
When the fluorescence spectrum that excited carry out real-time detection analysis.Specifically, signal collection system 21 is used for collecting laser exposure light
The fluorescence signal being excited during the surface learning element.Laser collection system 21 includes that phosphor collection mirror the 8th, collimation lens is (not shown
Go out) and ultraviolet multimode fibre 9.Phosphor collection mirror 8 is for being focused to fluorescence signal.It preferably employs plano-convex and focuses on thoroughly
Mirror, lens material uses ultraviolet fused quartz, and bore is 50.4mm, and focal length is 60mm.
Ultraviolet multimode fibre 9 is used for transmitting fluorescence signal in spectrometer.Ultraviolet multimode fibre 9 selects ultraviolet fused quartz material
Material, fibre diameter is between 600 μm-1500 μm, and the input at optical fiber installs fixing collimation lens, is used for receiving phosphor collection
The fluorescence signal that mirror focuses on, and couple a signal to ultraviolet multimode fibre 9 transmit, afterwards from ultraviolet multimode fibre 9 output
Spectrometer 10 is arrived in coupling output.
Spectrometer 10 is used for being analyzed the spectrum of fluorescence signal, and then determines optical element according to the change of spectrum
Damage field.Spectrometer 10 selects the thinning ccd detector of backboard as spectral detector, and it can light-metering spectral limit be 200nm-
1100nm, wherein the quantum efficiency at ultraviolet band can reach about 65%, therefore can ensure that have foot at ultraviolet band
Enough sensitivity；In order to improve spectral resolution, select 14 grades of gratings, and regulate choosing by the slit size regulating spectrometer
Select spectral resolution；The signal to noise ratio of spectrographic detection can reach 1000:1, and signal dynamics ratio can reach 7x109, spectrometer 10
Entrance install optical fiber coupling input interface.
By previously described ArF laser instrument the 1st, focus module the 2nd, phosphor collection mirror the 8th, collimation lens, ultraviolet multimode fibre 9 with
And the groundwork flow process of the spectrum real-time detection system of spectrometer 10 formation is as follows: the ArF laser that ArF laser instrument 1 is sent
Bundle, after shaping and focus module 2, incides the surface of radiation exposed optical element 7, in optical element 7 surface and inside
Excite and produce the characteristic fluorescence signal comprising ultraviolet band, rear section fluorescence signal by from the surface of optical element 7 or interior
Portion scatters out, and utilizes phosphor collection lens 8 to be collected.Phosphor collection lens 8 are placed in distance by optical element 7 front surface
100mm right position, the optical axis of phosphor collection lens 8 becomes about 45 degree with optical element 7 surface normal, is placed in collimation lens
Before and after the back focus of phosphor collection lens 8, make collimation lens and collecting lens 8 optical axis concentric as far as possible, and make collecting lens 8
Focusing on light beam and being collimated lens reception completely, fluorescence signal is collimated Lens Coupling and enters transmission in ultraviolet multimode fibre 9 afterwards,
It is coupled into spectrometer 10 from ultraviolet multimode fibre 9 output, detected by the CCD of spectrometer 10, obtain fluorescence spectrum.
Above-mentioned spectrum real-time detection system realizes that the basic mode of optical element 7 Damage detection is as follows: based on upper
The workflow of the spectrum real-time detection system stated, before optical element 7 surface is not damaged, it is by ArF laser irradiation region
The excitation spectrum in territory is stable by holding, and when being illuminated region on optical element 7 surface and local damage occur, this damage field swashs
The component of luminous spectrum or strong and weak contrast will appear from change, by the Real Time Monitoring of spectral content that irradiation zone is excited,
When institute's detecting light spectrum composition or power change, just may determine that sample has occurred in that change or damage, Ke Yilian
Continue and carry out irradiation test, and the change of respective record excitation spectrum, can be further by analyzing the evolution of detecting light spectrum change
And reason, the analysis for micromechanism of damage provides very important foundation.
Above two detection system can individually be carried out, it is also possible to combines and carries out simultaneously, is so possible not only to accurately
Judge the generation of optic element damage, it is often more important that can be tested by continuous irradiation, it is thus achieved that optic element damage occur and
Its visual information developing, and obtain the physical message such as spectrum of reflection damage inherent mechanism, these integrated informations are for light
The inherent micromechanism of damage further investigation learning element is significant, is expected to become research CaF2Optic element damage and life-span
Effective ways.
The foregoing is only embodiments of the invention, not thereby limit the scope of the claims of the present invention, every utilize this
Equivalent structure or equivalence flow process that bright specification and accompanying drawing content are made convert, or are directly or indirectly used in other related skills
Art field, all in like manner includes in the scope of patent protection of the present invention.
Claims (10)
1. the method for an on-line testing optical element laser damage, it is characterised in that said method comprising the steps of:
Produce laser, and irradiation is to the surface of described optical element；
Fluorescence imaging is carried out to the fluorescence signal inspiring after described laser irradiation to the surface of described optical element, glimmering to be formed
Light image, and the fluorescence signal being excited when collecting the surface of optical element described in laser irradiation；
Obtain the change of fluorescence intensity according to described fluoroscopic image, and then judge described optics according to the change of described fluorescence intensity
The damage field of element, is analyzed to the spectrum of described fluorescence signal further, and then the change according to described spectrum further
Change the damage judging described optical element.
2. the method for claim 1, it is characterised in that before the step on the surface to described optical element for the described irradiation
Farther include:
Shaping and focusing are carried out to described laser.
3. method as claimed in claim 2, it is characterised in that laser irradiation is inspired behind the surface of described optical element
Fluorescence signal carry out fluorescence imaging step before include:
Carry out decaying and filtering to described laser；
Include before the step of the described change obtaining fluorescence intensity according to described fluoroscopic image:
Micro-amplification is carried out to described fluoroscopic image.
4. method as claimed in claim 3, it is characterised in that the described step bag carrying out to described laser decaying and filtering
Include:
Carry out three grades of decay to described laser and filter.
5. the method for claim 1, it is characterised in that the surface when institute of optical element described in described collection laser irradiation
The step of the fluorescence signal exciting includes:
Described fluorescence signal is focused, collimates and transmits.
6. the device of an on-line testing optical element laser damage, it is characterised in that described device includes:
Laser instrument, is used for producing laser, and irradiation is to the surface of described optical element；
Imageing sensor, for carrying out fluorescence one-tenth to the fluorescence signal inspiring after laser irradiation to the surface of described optical element
Picture, to form fluoroscopic image；
Signal collection system, is used for the fluorescence signal being excited during the surface collecting optical element described in laser irradiation；
Central processing unit, for the change according to described fluoroscopic image acquisition fluorescence intensity, and then according to described fluorescence intensity
Change judges the damage field of described optical element；
Spectrometer, is used for being analyzed the spectrum of described fluorescence signal, and then determines described light according to the change of described spectrum
Learn the damage field of element.
7. device as claimed in claim 6, it is characterised in that described device also includes:
Shaping and focus module, for before described laser irradiation to described optical element, produced by described laser instrument
Laser is through shaping and focusing.
8. device as claimed in claim 7, it is characterised in that described device also includes:
Decay and filter set, for carrying out decaying and filtering to described laser；
Microcobjective, for carrying out micro-amplification to described fluoroscopic image.
9. device as claimed in claim 8, it is characterised in that described decay and filter set include highly reflecting films, high OD
Long wave pass filter and short wave pass filter, for carrying out three grades of decay respectively and filtering to described laser.
10. device as claimed in claim 9, it is characterised in that described laser collection system includes:
Phosphor collection mirror, for being focused to described fluorescence signal；
Collimation lens, is used for receiving the fluorescence signal that described phosphor collection mirror focuses on, and described fluorescence signal is coupled to ultraviolet
Multimode fibre；
Ultraviolet multimode fibre, is used for transmitting described fluorescence signal in described spectrometer.
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