CN101226148B - Method and device for detecting laser damage threshold of ultraviolet optical element - Google Patents
Method and device for detecting laser damage threshold of ultraviolet optical element Download PDFInfo
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Abstract
The invention provides a method and a device for detecting laser damage threshold of an ultraviolet optical element. The detection method and the device can visually observe the generation and development processes of the damage, are suitable for online testing of surface damage of various ultraviolet optical elements, and have high sensitivity.
Description
Technical field
The invention belongs to the method for surveying optic element damage, be specifically related to a kind of method and device thereof with KrF laser illumination ultraviolet optics element surface excited fluorescent imaging detection ultraviolet optics element laser damage threshold.
Background technology
In high power laser system, there is a large amount of optical elements, the photo-damage resistance of these optical elements closely related with system normal operation.The generation of damage can cause beam quality to descend, and the thermal effect that produces at impaired loci may cause the blast of optical element, because light beam causes the damage of other optical element at the diffraction of impaired loci.The irradiation damage of optical element is element and light laser results of interaction, passes judgment on a laser damage threshold that important indicator is exactly an optical element of optical element quality good or not, and the size of threshold value has just directly reflected the quality height of optical element.
In the prior art, mainly be damage and the damage threshold that utilizes the various effects detection optical elements of laser and optical element interaction generation.For example: method one, plasma flash of light diagnostic method, when the laser power that acts on the optical element surface that is coated with film is big, the absorption coefficient of film no longer is a constant, and is simultaneously very short because of pulse operating time, has little time to take place heat conduction, thereby heat up rapidly in the irradiation position, produce vaporization, and then the atom in the material steam is excited or ionization the flash of light of formation plasma.Plasma glistens and takes away the coating materials material while of vaporization in outside splash, also produces shock wave rete is imposed mechanical effect, finally causes the permanent damage of rete.When the spectral line that application point is produced is diagnosed, produced the laser plasma flash of light if find the place of being applied, damage has also just produced.Yet in fact before producing the plasma flash of light, rete may produce certain damage, thus adopt the detection sensitivity of this method lower, nor can online damage process and the shape characteristic that intuitively observes damage field.Method two, laser-transmitting reflective scan method, the damaging action point of continuous laser oblique fire in the pulse light laser, measure the reflected energy and the transmission potential of the continuous laser that is subjected to the pulse laser irradiation front and back respectively, when reflection luminous energy or transmission luminous energy appearance change, because transmittance and reflectance can reflect the transmission performance of optical element film to laser, whether differentiate optical element surface with this damages, though this method is applicable to on-the-spot test, but, be difficult to the shape characteristic of damage field is intuitively observed because of object of observation is a feature of surveying light.Method three, scattering method, with the tested optical element of active light illumination, if there is damage in optical element, then impaired loci can produce scattered light, utilizes optical detection system to survey the rear orientation light that impaired loci produces, and then may detect the parasitic light signal, if detected optics element not damaged is then surveyed less than scattered light.This method is similar to method two, though be suitable for on-the-spot test, because of object of observation is a feature of surveying light, is difficult to the shape characteristic of damage field is intuitively observed.Method four, the photo-thermal method, because laser action causes that the structure of optical element surface film and performance change, the photo-thermal signal is also along with variation.When observing photo-thermal signal generation irreversible change, irreversible variation also takes place in the thermal behavior of film, and at this moment damage has taken place film, can differentiate damage threshold thus.This method can not intuitively be observed the shape characteristic of damage field.Method five, the optoacoustic method, the optical element surface film is after damaged, the waveform of the photoacoustic waves in its rete deforms, wave amplitude sharply increases, variation by optoacoustic detector observation photoacoustic signal, can differentiate the damage threshold of optical element, the precision of this method test relies on and absorption coefficient and the optoacoustic conversion efficiency of optical material to laser, optical element Effect on Detecting to plating ultraviolet high-reflecting film is better, test result to the ultraviolet transmission element is undesirable, can not be used for the observation directly perceived of irradiation zone shape characteristic simultaneously.
More than five kinds of methods of differentiating damage, standard of each damage method of discrimination has some differences, for this reason, international standard ISO11254 definition damage is meant with the inspection technology of stipulating and can observes any variation that laser causes the optical element surface feature.Therefore, as long as can distinguish the consistance of 100～150 x magnification Normaski microscope inspection examining systems of the detection system that adopted and ISO11254 regulation, it all is suitable adopting other identical or better any detection system of sensitivity to carry out the optical element test.More than five kinds of methods of differentiating damage all exist can not online observation irradiation zone pattern directly perceived shortcoming.At Liu Qiang, Lin Libin, Zu Xiaotao, Gan Rongbing, Irradiation of High damage method of discrimination, the laser magazine, 2002,23 (4), mention when element is opaque in the literary composition, whether produce fluorescence at the unilateral observation element surface of laser incident and can differentiate optic element damage, but in this article and undeclared concrete method of discrimination and device.
Summary of the invention
The invention provides a kind of generation and the evolution that can intuitively observe damage, be suitable for the on-line testing of all kinds of ultraviolet optics element surface damages, and higher detection method and the device of sensitivity.
The detection method of ultraviolet optics element laser damage threshold provided by the present invention, utilize laser irradiation that laser instrument sends at tested ultraviolet optics element surface, the morphology change of observation ultraviolet optics element surface, this laser instrument is the KrF laser instrument, observes the morphology change of ultraviolet optics element surface by the distortion of observation ultraviolet optics element surface fluorescence intensity distribution.
Described laser irradiation system, its radiation mode is in the same time interval the same area irradiation of element 5～100 times with the identical energy light pulse, the exposure light spot diameter is 1～2mm, and irradiation zone is got test point centre distance 4～6mm at interval, and pulse width is 20～24ns.
The sniffer of ultraviolet optics element laser damage threshold provided by the present invention, this device comprises the laser irradiation system, exposure light parameter monitoring system, fault localization system.Described laser irradiation system includes KrF laser instrument (1), as relay len f
1, f
2, f
3, the one 45 ° of high reflective mirror (2a), the 2 45 ° of high reflective mirror (2b), energy attenuator (3), energy meter (4), light splitting piece (5), ultraviolet optics element to be measured (6), ccd array detector (8), the light path of this device is to send the uniform laser of space distribution by KrF laser instrument (1), by lens f
1, f
2Form a picture transmission laser is caused ultraviolet optics element to be measured (6), at f
1, f
2Picture is equipped with the one 45 ° of high reflective mirror (2a), the 2 45 ° of high reflective mirror (2b), energy attenuator (3), energy meter (4), light splitting piece (5) in the middle of transmitting, by f
2, f
3Form another picture and transmit, the fluorescence that ultraviolet optics element to be measured (6) is sent causes ccd array detector (8), at f
2, f
3In the middle of transmitting, the picture of forming is equipped with the 2 45 ° of high reflective mirror (2b).
Ultraviolet fluorescent effect is a kind of photoluminescence.When light beam irradiates was to optical element, three kinds of situations can take place: a part of light was reflected, and a part of light is by absorbed, and another part transmission is gone out.Because ultraviolet light quantum has bigger energy, when material absorbing after the ultraviolet ray, the energy state variation will take place and at different transition between the energy levels, launch fluorescence in inner molecule, this phenomenon is the ultraviolet fluorescent effect.When ultraviolet ray shines different material, after these materials absorb selectively, launch the visible light of different wave length and varying strength.The damage of optical element surface is that defective, impurity that is existed by element surface or the strong absorbent core be infected with etc. exposure light cause.The molecule of these lesion center in the de excitation process, sends the fluorescence of intensity much larger than intact minute surface because of a large amount of absorption of K rF laser photon energy are excited to higher energy level.Therefore, the uniform KrF laser radiation of space distribution can utilize the distortion of intensity of fluorescence distribution when optical element surface, effectively observe the formation and development process of damage field.
The detection method of ultraviolet optics element laser damage threshold provided by the present invention and device are a kind of generation and the evolutions that can intuitively observe damage, are suitable for the on-line testing of all kinds of ultraviolet optics element surface damages, and the higher detection method of sensitivity.Detecting the ultraviolet optics damage of elements with method provided by the invention can be consistent with the usefulness Normaski microscopic result that international standard requires.
Description of drawings
Fig. 1 ultraviolet optics element laser irradiation system light path synoptic diagram
The 1KrF laser instrument, the one 45 ° of high reflective mirror of 2a, the 2 45 ° of high reflective mirror of 2b, 3 energy attenuator,
4 energy meters, 5 light splitting pieces, 6 ultraviolet optics elements to be measured, 8CCD detector array.
Embodiment
Below in conjunction with accompanying drawing, the present invention will be further described.
Embodiment 1:
As shown in Figure 1, sending the laser of pulse width 24ns by KrF laser instrument (1), is the zone of 2mm with the 0 ° of even irradiation of incident angle ultraviolet optics element to be measured (6) surface diameter, by lens combination f
1, f
2Equally distributed beam cross section is looked like to be delivered to the front surface of ultraviolet optics element to be measured (6), and laser has excited the fluorescence hot spot at intact ultraviolet optics element surface, scioptics f
2, f
3Whether the fluorescent microscope of forming amplifies 3 times, and is imaged on the ccd array detector (8), to observe the variation on ultraviolet optics element to be measured (6) surface, differentiate ultraviolet optics element to be measured (6) and be damaged.The laser energy of KrF laser instrument (1) output reflects 10% to energy meter (4), as ultraviolet optics element to be measured (6) surface irradiation energy measuring by energy attenuator (3) decay back by light splitting piece (5).
Wherein, the radiation mode of KrF laser instrument (1) is in the same time interval the same area irradiation of element 5～100 times with the identical energy light pulse, the exposure light spot diameter is 1～2mm, and irradiation zone is got test point centre distance 4～6mm at interval, and pulse width is 20～24ns.The base material of the one 45 ° of high reflective mirror (2a), the 2 45 ° of high reflective mirror (2b) is the ultraviolet quartz glass in the light path.This high reflective mirror filters the ultraviolet parasitic light of fluorescent light beam simultaneously to the ultraviolet light total reflection below the wavelength 280nm.
Under these conditions, utilize the fluorescence imaging technology to observe the generation of ultraviolet optics element to be measured (6) damage from laser, evolution.When not damaged.More even from the fluorescence that send on ultraviolet optics element to be measured (6) surface, ultraviolet optics element to be measured (6) surface is damaged behind the continuous laser pulse irradiation, the damage location emitted fluorescence obviously strengthens, continue the irradiation minute surface, damage extends to whole irradiation area so that ccd array detector (8) is saturated, the at this moment visual luminescence of plasma that can observe ultraviolet optics element to be measured (6) surface.Ultraviolet optics element to be measured (6) is after KrF laser instrument (1) irradiation, and the gained result is consistent with the result that the Normaski microscope carries out interpretation to damage from laser.
Claims (4)
1. the detection method of ultraviolet optics element laser damage threshold utilizes laser irradiation that the laser instrument in the sniffer sends at tested ultraviolet optics element surface, and the morphology change of observation ultraviolet optics element surface is characterized in that:
Described sniffer comprises the laser irradiation system, the exposure light parameter monitoring system, and the fault localization system, wherein, described laser irradiation system includes KrF laser instrument (1), as relay len f
1, f
2, f
3, the one 45 ° of high reflective mirror (2a), the 2 45 ° of high reflective mirror (2b), energy attenuator (3), energy meter (4), light splitting piece (5), ultraviolet optics element to be measured (6), ccd array detector (8), the light path of this device is to send laser by KrF laser instrument (1), by lens f
1, f
2Form a picture transmission laser is caused ultraviolet optics element to be measured (6), at f
1, f
2Picture is equipped with the one 45 ° of high reflective mirror (2a), the 2 45 ° of high reflective mirror (2b), energy attenuator (3), energy meter (4), light splitting piece (5) in the middle of transmitting, by f
2, f
3Form another picture and transmit, the fluorescence that ultraviolet optics element to be measured (6) is sent causes ccd array detector (8), at f
2, f
3In the middle of transmitting, the picture of forming is equipped with the 2 45 ° of high reflective mirror (2b);
Described laser irradiation system, its radiation mode is in the same time interval the same area irradiation of element 5～100 times with the identical energy light pulse, its exposure light spot diameter is 1～2mm, and its irradiation zone is got test point centre distance 4～6mm at interval, and pulse width is 20～24ns;
The morphology change of described observation ultraviolet optics element surface is the distortion that observation ultraviolet optics element surface fluorescence intensity distributes.
2. the detection method of ultraviolet optics element laser damage threshold according to claim 1 is characterized in that the base material of described the one 45 ° of high reflective mirror (2a) and the 2 45 ° of high reflective mirror (2b) is the ultraviolet quartz glass.
3. the sniffer of ultraviolet optics element laser damage threshold is characterized in that, this device comprises the laser irradiation system, the exposure light parameter monitoring system, and the fault localization system, described laser irradiation system includes KrF laser instrument (1), as relay len f
1, f
2, f
3, the one 45 ° of high reflective mirror (2a), the 2 45 ° of high reflective mirror (2b), energy attenuator (3), energy meter (4), light splitting piece (5), ultraviolet optics element to be measured (6), ccd array detector (8), the light path of this device is to send laser by KrF laser instrument (1), by lens f
1, f
2Form a picture transmission laser is caused ultraviolet optics element to be measured (6), at f
1, f
2Picture is equipped with the one 45 ° of high reflective mirror (2a), the 2 45 ° of high reflective mirror (2b), energy attenuator (3), energy meter (4), light splitting piece (5) in the middle of transmitting, by f
2, f
3Form another picture and transmit, the fluorescence that ultraviolet optics element to be measured (6) is sent causes ccd array detector (8), at f
2, f
3In the middle of transmitting, the picture of forming is equipped with the 2 45 ° of high reflective mirror (2b);
Described laser irradiation system, its radiation mode is in the same time interval the same area irradiation of element 5～100 times with the identical energy light pulse, its exposure light spot diameter is 1～2mm, and its irradiation zone is got test point centre distance 4～6mm at interval, and pulse width is 20～24ns;
The sniffer of described ultraviolet optics element laser damage threshold is used to observe the distortion of ultraviolet optics element surface fluorescence intensity distribution.
4. the sniffer of ultraviolet optics element laser damage threshold according to claim 3 is characterized in that the base material of described the one 45 ° of high reflective mirror (2a) and the 2 45 ° of high reflective mirror (2b) is the ultraviolet quartz glass.
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