CN204407298U - A kind of covering plate structure improving etching groove dropping liquid - Google Patents
A kind of covering plate structure improving etching groove dropping liquid Download PDFInfo
- Publication number
- CN204407298U CN204407298U CN201420746356.5U CN201420746356U CN204407298U CN 204407298 U CN204407298 U CN 204407298U CN 201420746356 U CN201420746356 U CN 201420746356U CN 204407298 U CN204407298 U CN 204407298U
- Authority
- CN
- China
- Prior art keywords
- cover plate
- heater
- dropping liquid
- temperature
- etching groove
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
Landscapes
- Drying Of Semiconductors (AREA)
- Weting (AREA)
Abstract
The utility model discloses a kind of covering plate structure improving etching groove dropping liquid.Comprise cover plate top layer, cover plate bottom, cover sidewall; heater, heater protecting material, temperature sensor; temperature controller, is characterized in that, deck design is hollow structure; and heater is installed therein; this structure effectively can control the temperature of cover plate, steam can be prevented in the condensation of cover plate lower surface, thus avoid doing over again of causing on silicon chip due to drips; reduce cost waste, improve economic benefit.
Description
Technical field
The utility model relates to a kind of covering plate structure improving etching groove dropping liquid, belongs to solar-photovoltaic technology field.
Background technology
In recent years, the constantly progress of solar battery sheet production technology, production cost constantly reduces, and conversion efficiency improves constantly, and makes the application of photovoltaic generation day by day universal and fast development, becomes the important sources of supply of electric power gradually.
The production technology of solar battery sheet mainly comprises: making herbs into wool, diffusion, etching, plated film, printing and sintering etc.Wherein, the PN junction of silicon chip back side and silicon chip side is removed in the effect of etching procedure, reaches the object of front and insulating backside.At present, RENA equipment is a kind of conventional wet-method etching equipment.This equipment basic structure is: etching groove-Water spray groove-alkali groove-Water spray groove-go PSG groove-Water spray groove-dry up.This equipment in use shows the performance of many excellences.But current RENA etching apparatus, in production application, often there will be the phenomenon that condensation vapor appears in etching slot cover plate, it can form a large amount of steam mainly due to the Water spray groove after etching groove in spray process, enters into etching groove.And the temperature of cell body cover plate is temperature controlled by workshop, lower than the temperature of the steam entered in cell body, just condense when steam runs into the lower cover plate of temperature.The drop of condensation can be dropped in be produced on the silicon chip surface of circulation, with on silicon chip, corrosion reaction occurs, and causes the bad order even PN junction of slice, thin piece of silicon chip destroyed, causes production declining and cost waste.
Summary of the invention
The purpose of this utility model is to provide a kind of covering plate structure improving etching groove dropping liquid, deck design is hollow structure, and heater is installed therein, this structure effectively can control the temperature of cover plate, can prevent steam from condensing at cover plate lower surface, thus avoid doing over again of causing on silicon chip due to drips, reduce cost waste, improve economic benefit.
Improve a covering plate structure for etching groove dropping liquid, comprise cover plate top layer, cover plate bottom, cover sidewall, heater, heater protecting material, temperature sensor, temperature controller; Cover plate top layer, cover plate bottom and cover sidewall are combined into hollow cover plate structure; heater is arranged on cover plate hollow position; heater periphery is enclosed with heater protecting material, and cover plate central is provided with temperature sensor, and heater and temperature sensor are connected to temperature controller by wire.
Improve a covering plate structure for etching groove dropping liquid, heater is wrapped with high temperature resistant and corrosion-resistant protective material, and material is polytetrafluoroethylene.
Improve a covering plate structure for etching groove dropping liquid, described temperature sensor is thermocouple, is arranged on the center of cover plate bottom, and its thermocouple temperature measurement point position is from cover plate bottom 0.5-1cm.
Improve a covering plate structure for etching groove dropping liquid, temperature controller controllable temperature scope 0-100 DEG C.
The beneficial effects of the utility model are: steam can be prevented in the condensation of cover plate lower surface, thus avoid doing over again of causing on silicon chip due to drips, decrease the waste of cost, it designs economic environmental protection, and is easy to realize.
Accompanying drawing explanation
Fig. 1: the front view of the utility model covering plate structure.
Fig. 2: a kind of vertical view of the utility model covering plate structure.
Fig. 3: the another kind of vertical view of the utility model covering plate structure.
Reference numeral: cover plate top layer 1, cover plate bottom 2, cover sidewall 3, heater 4, heater protecting material 5, temperature sensor 6, temperature controller 7.
Embodiment
Embodiment 1:
Improve a covering plate structure for etching groove dropping liquid, it is characterized in that, comprise cover plate top layer 1, cover plate bottom 2, cover sidewall 3, heater 4, heater protecting material 5, temperature sensor 6, temperature controller 7; Cover plate top layer 1, cover plate bottom 2 and cover sidewall 3 are combined into hollow cover plate structure; heater 4 is arranged on cover plate hollow position; heater periphery is enclosed with heater protecting material 5, and cover plate central is provided with temperature sensor 6, and heater 4 and temperature sensor 6 are connected to temperature controller 7 by wire.
Embodiment 2:
Heater is wrapped with high temperature resistant and corrosion-resistant protective material 5, and material is polytetrafluoroethylene.
All the other are with embodiment 1.
Embodiment 3:
Temperature sensor 6 is thermocouple, is arranged on the center of cover plate bottom 2, and its thermocouple temperature measurement point position is from cover plate bottom 0.5-1cm.
All the other are with embodiment 1 or 2.
Embodiment 4:
Temperature controller 7 controllable temperature scope 0-100 DEG C.
All the other are with embodiment 1 or 2 or 3.
The above embodiment only have expressed several execution mode of the present utility model, and it describes comparatively concrete and detailed, but therefore can not be interpreted as the restriction to the utility model the scope of the claims.It should be pointed out that for the person of ordinary skill of the art, without departing from the concept of the premise utility, can also make some distortion and improvement, these all belong to protection range of the present utility model.Therefore, the protection range of the utility model patent should be as the criterion with claims.
Claims (4)
1. improve a covering plate structure for etching groove dropping liquid, it is characterized in that: comprise cover plate top layer (1), cover plate bottom (2), cover sidewall (3), heater (4), heater protecting material (5), temperature sensor (6), temperature controller (7); Cover plate top layer (1), cover plate bottom (2) and cover sidewall (3) are combined into hollow cover plate structure; heater (4) is arranged on cover plate hollow position; heater periphery is enclosed with heater protecting material (5); cover plate central is provided with temperature sensor (6), and heater (4) and temperature sensor (6) are connected to temperature controller (7) by wire.
2. a kind of covering plate structure improving etching groove dropping liquid according to claim 1, is characterized in that: heater is wrapped with high temperature resistant and corrosion-resistant protective material (5), and material is polytetrafluoroethylene.
3. a kind of covering plate structure improving etching groove dropping liquid according to claim 1 and 2, it is characterized in that: described temperature sensor (6) is thermocouple, be arranged on the center of cover plate bottom (2), its thermocouple temperature measurement point position is from cover plate bottom 0.5-1cm.
4. a kind of covering plate structure improving etching groove dropping liquid according to claim 1, is characterized in that: temperature controller (7) controllable temperature scope 0-100 DEG C.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201420746356.5U CN204407298U (en) | 2014-12-03 | 2014-12-03 | A kind of covering plate structure improving etching groove dropping liquid |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201420746356.5U CN204407298U (en) | 2014-12-03 | 2014-12-03 | A kind of covering plate structure improving etching groove dropping liquid |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN204407298U true CN204407298U (en) | 2015-06-17 |
Family
ID=53431135
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201420746356.5U Active CN204407298U (en) | 2014-12-03 | 2014-12-03 | A kind of covering plate structure improving etching groove dropping liquid |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN204407298U (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105895565A (en) * | 2016-06-12 | 2016-08-24 | 京东方科技集团股份有限公司 | Wet etching equipment |
| CN109244009A (en) * | 2018-09-03 | 2019-01-18 | 深圳市华星光电技术有限公司 | Wet-method etching device |
| CN111146125A (en) * | 2020-01-02 | 2020-05-12 | 京东方科技集团股份有限公司 | Temperature control device and etching equipment |
-
2014
- 2014-12-03 CN CN201420746356.5U patent/CN204407298U/en active Active
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105895565A (en) * | 2016-06-12 | 2016-08-24 | 京东方科技集团股份有限公司 | Wet etching equipment |
| CN109244009A (en) * | 2018-09-03 | 2019-01-18 | 深圳市华星光电技术有限公司 | Wet-method etching device |
| CN111146125A (en) * | 2020-01-02 | 2020-05-12 | 京东方科技集团股份有限公司 | Temperature control device and etching equipment |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN104733555A (en) | Efficient N-type double-sided solar cell and preparation method thereof | |
| CN204407298U (en) | A kind of covering plate structure improving etching groove dropping liquid | |
| CN201655813U (en) | Passive film for crystalline silicon solar battery | |
| CN104821345B (en) | Method for preparing anti-potential induced degradation solar cell | |
| CN204834574U (en) | Preparation HIT solar cell's support plate and heating device | |
| WO2009046352A3 (en) | Power panel | |
| JP2011519477A5 (en) | ||
| CN102194897A (en) | Silicon-carbide-doped film induced back surface field double-surface passivation solar battery and preparation method of double-surface passivation solar battery | |
| CN105489700B (en) | A kind of preparation method of the solar cell with integrated diode | |
| CN102623560A (en) | Method for realizing edge insulation of solar cell by wet process | |
| CN204857676U (en) | Antidrip liquid sculpture capping board | |
| CN204668333U (en) | A kind of production equipment of anti-potential induction attenuation solar cell | |
| CN105696083A (en) | Preparation method of solar cell textured structure | |
| CN204497251U (en) | A kind of high-efficiency N-type double-side solar cell | |
| CN104835862B (en) | High performance solar batteries and forming method thereof with lenticule | |
| CN204741023U (en) | Novel flexible solar panel | |
| CN203257618U (en) | Composite power generation device for roof | |
| CN204189775U (en) | A kind of for the chain type cleaning equipment after RIE making herbs into wool | |
| CN203957509U (en) | A kind of serigraphy screen cloth | |
| CN207149539U (en) | A kind of silicon chip cleaning gaily decorated basket | |
| CN203250760U (en) | Waterproof photovoltaics junction box | |
| CN102306684B (en) | Selective emitter of a kind of three grades of doped level and preparation method thereof | |
| CN204943639U (en) | A kind of energy-saving thermal storage formula electric heater | |
| CN204760408U (en) | RENA wet etching equipment | |
| CN203021657U (en) | Duckweed type insulating sheet of electrolytic bath |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| C56 | Change in the name or address of the patentee | ||
| CP01 | Change in the name or title of a patent holder |
Address after: 334100 Jiangxi Province, Shangrao City Economic Development Zone in the area Patentee after: JIANGXI UNIEX NEW ENERGY CO.,LTD. Address before: 334100 Jiangxi Province, Shangrao City Economic Development Zone in the area Patentee before: SRPV High-tech Co.,Ltd. |
|
| TR01 | Transfer of patent right | ||
| TR01 | Transfer of patent right |
Effective date of registration: 20200226 Address after: 334000 No.8 Xingye Avenue, Shangrao economic and Technological Development Zone, Shangrao City, Jiangxi Province Patentee after: Jiangxi Zhanyu Xinneng Technology Co.,Ltd. Address before: 334100 rising area, Shangrao Economic Development Zone, Jiangxi, China Patentee before: JIANGXI UNIEX NEW ENERGY CO.,LTD. |
|
| CP03 | Change of name, title or address | ||
| CP03 | Change of name, title or address |
Address after: No.8 Xingye Avenue, Shangrao economic and Technological Development Zone, Jiangxi Province Patentee after: Shangrao Jietai New Energy Technology Co.,Ltd. Address before: No.8 Xingye Avenue, Shangrao economic and Technological Development Zone, Shangrao City, Jiangxi Province Patentee before: Jiangxi Zhanyu Xinneng Technology Co.,Ltd. |