CN204198843U - Vacuum sputtering coating device - Google Patents
Vacuum sputtering coating device Download PDFInfo
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- CN204198843U CN204198843U CN201420564414.2U CN201420564414U CN204198843U CN 204198843 U CN204198843 U CN 204198843U CN 201420564414 U CN201420564414 U CN 201420564414U CN 204198843 U CN204198843 U CN 204198843U
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- baffle plate
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- coating device
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Abstract
A kind of vacuum sputtering coating device, comprise cavity, the target be located in cavity, multiple delivery roll and multiple baffle plate assembly, described cavity bottom is anode, described target is negative electrode, described delivery roll is for transmitting plated body, each baffle plate assembly is arranged between two adjacent delivery rolls, and insulate with cavity bottom and be connected, this baffle plate assembly comprises retaining plate, insulating part and baffle plate, described retaining plate is fixedly connected with cavity bottom, and described insulating part connects and to be arranged between retaining plate and baffle plate and baffle plate and retaining plate, cavity bottom are insulated.The utility model by doing modularized design to baffle plate assembly, and by the setting of insulating part, not only can ensure the insulating property of baffle plate and cavity, can also optimize the packaging efficiency of baffle plate assembly, make baffle plate assembly dismounting more convenient.
Description
Technical field
The utility model relates to a kind of film coating apparatus, particularly relates to a kind of splash effect that utilizes under vacuum conditions and carries out the vacuum sputtering coating device of plated film to plated body.
Background technology
Sputter coating is widely used in the fields such as glass, pottery, semi-conductor.Existing have a sputtering cavity to the vacuum sputtering coating device that glass carries out plated film processing, is arranged on the delivery roll in cavity, is arranged on the baffle plate be connected between delivery roll and with cavity bottom, and is arranged on the cathode targets in cavity.Cavity bottom is as anode, and under the effect of impact of discharge gas, the atom in cathode targets splashes out towards anode and is deposited on the glass on delivery roll, to complete the plated film processing of glass.The baffle plate be arranged between delivery roll is metal material, can tackle atom or molecule that cathode targets spills, the atom preventing cathode targets from spilling or molecule deposit to from the space between delivery roll or the space between two glass and transmit roll surface or on other devices.The cross section of this baffle plate takes the shape of the letter U and needs to arrange in insulating with cavity bottom, otherwise easily causes cathode targets generation electric discharge to beat the phenomenons such as arc, thus badly influences glass coating quality and production efficiency.Existing way is that this baffle plate is fixed on cavity bottom by employing one L shaped plate, but this mode still easily causes the conducting of baffle plate and cavity.
Utility model content
Based on this, be necessary to provide a kind of vacuum sputtering coating device that can overcome above-mentioned defect.
A kind of vacuum sputtering coating device, comprise cavity, the target be located in cavity, multiple delivery roll and multiple baffle plate assembly, described cavity bottom is anode, described target is negative electrode, described delivery roll is for transmitting plated body, each baffle plate assembly is arranged between two adjacent delivery rolls, and insulate with cavity bottom and be connected, this baffle plate assembly comprises retaining plate, insulating part and baffle plate, described retaining plate is fixedly connected with cavity bottom, and described insulating part connects and to be arranged between retaining plate and baffle plate and baffle plate and retaining plate, cavity bottom are insulated.
Wherein in an embodiment, the anode sheet frame that described cavity comprises negative electrode lid and is oppositely arranged, the bottom of described anode sheet frame is as anode, described target is arranged in negative electrode lid, described delivery roll, baffle plate assembly are arranged in anode sheet frame, described anode sheet frame are arranged import and pass in and out this cavity with outlet for plated body.
Wherein in an embodiment, between described negative electrode lid and anode sheet frame, sealing member is set.
Wherein in an embodiment, described retaining plate arranges fixed orifices, and described retaining plate is fixed on cavity bottom by mounting block.
Wherein in an embodiment, described baffle plate comprises substrate and is arranged on the side plate of substrate both sides, and described insulating part is positioned at the space that biside plate and substrate surround, and described side plate and retaining plate interval are arranged.
Wherein in an embodiment, the spacing between described side plate and retaining plate is 2-5mm, and described substrate is lower than the vertex 5-7mm of described delivery roll.
Wherein in an embodiment, the cross section of described baffle plate takes the shape of the letter U or Π shape.
Wherein in an embodiment, the side that described insulating part is connected with substrate arranges the first threaded hole, the side that described insulating part is connected with retaining plate arranges the second threaded hole, described substrate, is connected by screw between insulating part and retaining plate, described first threaded hole and the second threaded hole not conducting.
Wherein in an embodiment, between described insulating part and substrate, also screw plate is set.
Wherein in an embodiment, described side plate at least partly and insulating part interval.
The vacuum sputtering coating device that the utility model provides is by doing modularized design to baffle plate assembly, and by the setting of insulating part, not only can ensure the insulating property of baffle plate and cavity, the packaging efficiency of baffle plate assembly can also be optimized, make baffle plate assembly dismounting more convenient.
The vacuum sputtering coating device that the utility model provides can carry out plated film processing to objects such as glass.
Accompanying drawing explanation
The structural representation of the vacuum sputtering coating device that Fig. 1 provides for the utility model one embodiment.
Fig. 2 is the structural representation of the baffle plate assembly in the device of vacuum sputtering coating shown in Fig. 1.
Embodiment
For enabling above-mentioned purpose of the present utility model, feature and advantage become apparent more, are described in detail embodiment of the present utility model below in conjunction with accompanying drawing.Set forth a lot of detail in the following description so that fully understand the utility model.But the utility model can be much different from alternate manner described here to implement, those skilled in the art can when doing similar improvement without prejudice to when the utility model intension, and therefore the utility model is by the restriction of following public concrete enforcement.
It should be noted that, when element is called as " being fixed on " another element, directly can there is element placed in the middle in it on another element or also.When an element is considered to " connection " another element, it can be directly connected to another element or may there is centering elements simultaneously.
Unless otherwise defined, all technology used herein and scientific terminology are identical with belonging to the implication that those skilled in the art of the present utility model understand usually.The object of the term used in specification sheets of the present utility model herein just in order to describe specific embodiment, is not intended to be restriction the utility model.Term as used herein " and/or " comprise arbitrary and all combinations of one or more relevant Listed Items.
Please refer to Fig. 1 and Fig. 2, the vacuum sputtering coating device that the utility model one embodiment provides is processed as example is described for glass being carried out plated film, is appreciated that this vacuum sputtering coating device can be used for the plated film processing of other plated bodies.This vacuum sputtering coating device comprises cavity 10, the target 20 be located in cavity 10, multiple delivery roll 30 and multiple baffle plate assembly 40.
Establish sputtering chamber in cavity 10, glass completes plated film processing in this cavity 10.The anode sheet frame 12 that this cavity 10 comprises negative electrode lid 11 and is oppositely arranged.In diagram illustrated embodiment, negative electrode lid 11 is positioned at top, and anode sheet frame 12 is positioned at below, and negative electrode lid 11 and negative electrode sheet frame 12 jointly enclose and form described cavity 10.
This anode sheet frame 12 is arranged on the bottom of cavity 10, and delivery roll 30 and baffle plate assembly 40 are arranged in this anode sheet frame 12.This negative electrode lid 11 is arranged on the top of cavity 10, and this target 20 is arranged in negative electrode lid 11.When this vacuum sputtering coating device works, the bottom of this anode sheet frame 12 is as anode, this target 20 is as negative electrode, vacuum environment is kept in cavity 10, and by the anticathode shock of discharge gas, cathode atoms is spilt and towards anode movement, thus be deposited on the glass surface be positioned on delivery roll 30, to complete the plated film processing of glass.
This target 20 can be arranged to the form of rotating cathode, to improve coating performance.
Between described negative electrode lid 11 and anode sheet frame 12, sealing member 13 is set, can vacuum environment be kept to make cavity 10.
Further, described anode sheet frame 12 is arranged import 14 and pass in and out this cavity 10 with outlet 15 for glass.Be appreciated that import 14 also should arrange corresponding sealing member, can keep the vacuum environment of this cavity 10 to outlet 15 places.
Described delivery roll 30 is for transmitting glass, and as shown in fig. 1, glass enters in cavity 10 from the import 14 of cavity 10, and run on delivery roll 30, in the process passing through cavity 10, glass surface, by plated film, then arrives cavity 10 outside to enter subsequent processing from the outlet 15 of cavity 10.
Baffle plate assembly 40 is arranged between two adjacent delivery rolls 30.Baffle plate assembly 40 is for blocking the bottom of cavity 10, and the sidepiece of delivery roll 30, can in sputter process, the atomic deposition preventing negative electrode from spilling is on delivery roll 30 or the bottom of cavity 10, avoid the object such as sediment pollution anode or delivery roll 30, ensure plated film efficiency and the yield of glass thus.
As shown in Figure 2, this baffle plate assembly 40 comprises retaining plate 41, insulating part 42 and baffle plate 43, described baffle plate 43 is for stopping and receive the atom that negative electrode spills, described retaining plate 41 is for being fixedly connected with baffle plate assembly 40 with bottom cavity 10, and described insulating part 42 connects and to be arranged between retaining plate 41 and baffle plate 43 and to make baffle plate 43 and retaining plate 41, cavity 10 bottom insulation.In coating process, this baffle plate 43 need ensure with the bottom of cavity 10 also namely anode be electrically insulated and arrange, otherwise cathodic discharge will be caused to beat arc phenomenon, have a strong impact on plated film yield.The utility model by doing modularized design to baffle plate assembly 40, and by the setting of insulating part 42, not only can ensure baffle plate 43 and the insulating property of cavity 10, can also optimize the packaging efficiency of baffle plate assembly 40, make baffle plate assembly 40 dismounting more convenient.
Particularly, described retaining plate 41 arranges fixed orifices 410, described retaining plate 41 is fixed on bottom cavity 10 by mounting block.Such as, by mounting blocks such as screws, retaining plate 41 can be fixed on the anode sheet frame 12 of cavity 10.This retaining plate 41 also offers open holes 413, and this open holes 413 passes for fastening pieces such as screws to be fixedly connected with retaining plate 41 and insulating part 42.
Described baffle plate 43 comprises substrate 431 and is arranged on the side plate 432 of substrate 431 both sides, and described insulating part 42 is positioned at the space that biside plate 432 and substrate 431 surround.In one embodiment, this baffle plate 43 cross section be Π shape, understandably, in other embodiments, this baffle plate 43 can also take the shape of the letter U or other shapes, the atom that can stop and receive negative electrode to make this baffle plate 43 and spill, prevent delivery roll 30 and other components contaminated.
Described side plate 432 and retaining plate 41 interval are arranged, and arrange to make baffle plate 43 and retaining plate 41 insulate, and also namely make baffle plate 43 and cavity 10 insulate and arrange.In one embodiment, the spacing d between this side plate 432 and retaining plate 41 is 2-5mm, if this spacing d is too small, then easily because of the atomic deposition spilt, conducting occurs, if excessive, then can not play effect that the atom preventing negative electrode from spilling pollutes other components well.
Further, the side that described insulating part 42 is connected with substrate 431 arranges the first threaded hole 420, the side that described insulating part 42 is connected with retaining plate 41 arranges the second threaded hole 422, described substrate 431, to be connected by screw between insulating part 42 and retaining plate 41, described first threaded hole 420 and the second threaded hole 422 not conducting.Setting like this, ensure that the insulation between baffle plate 43 and retaining plate 41 is arranged, and also namely ensure that the insulation between baffle plate 43 and cavity 10 is arranged.
Further, by rationally arranging the height of insulating part 42, the height H of this baffle plate assembly 40 accurately can be controlled.Usually, for making substrate 431 have certain altitude and good barrier effect can being played, unlikely too high and negative electrode is spilt atomic deposition scratches glass on this substrate 431 again, the vertex 5-7mm of described substrate 431 lower than described delivery roll 30 should be controlled.
The material that described insulating part 42 adopts can be the tetrafluoroethylene (PTFE) that quality is light, be easy to processing, excellent insulation performance, and described baffle plate 43 generally adopts aluminium section bar.,
Further, in certain embodiments, also can arrange screw plate 44 between described insulating part 42 and substrate 431, screw plate 44 or can adopt other molding modes to be embedded in insulating part 42 by screw plate 44 together with insulating part 42 injection moulding.Baffle plate 43 and insulating part 42 can be made to form more firm connection by screw plate 44.Corresponding, substrate 431 also forms open holes 433, is fixedly connected with this substrate 431 and screw plate 44, insulating part 42 for screw passes.
Further, in certain embodiments, described side plate 432 at least partly and insulating part 42 interval.In the embodiment shown in Figure 2, the setting that described insulating part 42 is big up and small down, makes lower end and side plate 432 interval of insulating part 42.It is more convenient when setting like this can make baffle plate 43 and insulating part 42 dismantle.
Assembling with when installing this baffle plate assembly 40, can first retaining plate 41, insulating part 42, baffle plate 43 be utilized the fastening pieces such as screw to fit together with screw plate 44, and then whole baffle plate assembly 40 is arranged on the bottom of cavity 10.So when the negative electrode spatters of depositing dosed quantities after, can baffle plate assembly 40 for convenience detach, and component such as baffle plate 43 grade is cleared up, or the baffle plate 43 directly more renewed, operation facility.
The above embodiment only have expressed several embodiment of the present utility model, and it describes comparatively concrete and detailed, but therefore can not be interpreted as the restriction to the utility model the scope of the claims.It should be pointed out that for the person of ordinary skill of the art, without departing from the concept of the premise utility, can also make some distortion and improvement, these all belong to protection domain of the present utility model.Therefore, the protection domain of the utility model patent should be as the criterion with claims.
Claims (10)
1. a vacuum sputtering coating device, comprise cavity, be located at the target in cavity, multiple delivery roll and multiple baffle plate assembly, described cavity bottom is anode, described target is negative electrode, described delivery roll is for transmitting plated body, each baffle plate assembly is arranged between two adjacent delivery rolls, and insulate with cavity bottom and be connected, it is characterized in that, this baffle plate assembly comprises retaining plate, insulating part and baffle plate, described retaining plate is fixedly connected with cavity bottom, described insulating part connects and to be arranged between retaining plate and baffle plate and to make baffle plate and retaining plate, cavity bottom insulate.
2. vacuum sputtering coating device according to claim 1, it is characterized in that, the anode sheet frame that described cavity comprises negative electrode lid and is oppositely arranged, the bottom of described anode sheet frame is as anode, described target is arranged in negative electrode lid, described delivery roll, baffle plate assembly are arranged in anode sheet frame, described anode sheet frame are arranged import and pass in and out this cavity with outlet for plated body.
3. vacuum sputtering coating device according to claim 2, is characterized in that, arranges sealing member between described negative electrode lid and anode sheet frame.
4. vacuum sputtering coating device according to claim 1, is characterized in that, described retaining plate arranges fixed orifices, and described retaining plate is fixed on cavity bottom by mounting block.
5. vacuum sputtering coating device according to claim 1, is characterized in that, described baffle plate comprises substrate and is arranged on the side plate of substrate both sides, and described insulating part is positioned at the space that biside plate and substrate surround, and described side plate and retaining plate interval are arranged.
6. vacuum sputtering coating device according to claim 5, is characterized in that, the spacing between described side plate and retaining plate is 2-5mm, and described substrate is lower than the vertex 5-7mm of described delivery roll.
7. vacuum sputtering coating device according to claim 5, is characterized in that, the cross section of described baffle plate takes the shape of the letter U or Π shape.
8. vacuum sputtering coating device according to claim 5, it is characterized in that, the side that described insulating part is connected with substrate arranges the first threaded hole, the side that described insulating part is connected with retaining plate arranges the second threaded hole, described substrate, to be connected by screw between insulating part and retaining plate, described first threaded hole and the second threaded hole not conducting.
9. vacuum sputtering coating device according to claim 8, is characterized in that, also arranges screw plate between described insulating part and substrate.
10. vacuum sputtering coating device according to claim 5, is characterized in that, described side plate at least partly and insulating part interval.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201420564414.2U CN204198843U (en) | 2014-09-28 | 2014-09-28 | Vacuum sputtering coating device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201420564414.2U CN204198843U (en) | 2014-09-28 | 2014-09-28 | Vacuum sputtering coating device |
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| Publication Number | Publication Date |
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| CN204198843U true CN204198843U (en) | 2015-03-11 |
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| Application Number | Title | Priority Date | Filing Date |
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| CN201420564414.2U Active CN204198843U (en) | 2014-09-28 | 2014-09-28 | Vacuum sputtering coating device |
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN112159961A (en) * | 2020-09-06 | 2021-01-01 | 湖北亿钧耀能新材股份公司 | Sputtering chamber of glass coating equipment |
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2014
- 2014-09-28 CN CN201420564414.2U patent/CN204198843U/en active Active
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN112159961A (en) * | 2020-09-06 | 2021-01-01 | 湖北亿钧耀能新材股份公司 | Sputtering chamber of glass coating equipment |
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