CN201301339Y - High-power planar magnetic control spluttering cathode - Google Patents
High-power planar magnetic control spluttering cathode Download PDFInfo
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- CN201301339Y CN201301339Y CNU2008201588025U CN200820158802U CN201301339Y CN 201301339 Y CN201301339 Y CN 201301339Y CN U2008201588025 U CNU2008201588025 U CN U2008201588025U CN 200820158802 U CN200820158802 U CN 200820158802U CN 201301339 Y CN201301339 Y CN 201301339Y
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- cathode
- cooling channel
- magnet
- target
- spluttering
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Abstract
The utility model relates to a high-power planar magnetic control spluttering cathode belonging to a double-silver layer low-emissivity film. The high-power planar magnetic control spluttering cathode mainly solves the technical problem that the magnet of the prior planar magnetic control spluttering cathode is soaked in the water to lead to demagnetization for long-term use. The utility model adopts the technical scheme that the high-power planar magnetic control spluttering cathode comprises a cathode body (4), a target (1) and a magnet, wherein, the target (1) is installed at the upper part of the cathode body (4), a closed cooling channel (2) is arranged in the inner cavity of the cathode body (4), a magnetic boot (5) is arranged between the bottom in the inner cavity of the cathode body (4) and the cooling channel (2), and a magnet (3) is arranged between the cooling channel (2) and the magnetic boot (5). Since the independent cooling channel is arranged inside the cathode body, the magnet is not in contact with the cooling medium, and the permanent magnet is avoided from being corroded by the cooling medium; and the heat transfer guide plate made of a high heat-conductivity material is designed and is in contact with the target at a large area, therefore, the target is fully cooled, and the cathode can bear higher power. The utility model can be widely applied to vacuum magnetic control spluttering coating devices.
Description
Technical field
The utility model relates to a kind of high-capacity planar magnetron sputtering cathode that is used for the vacuum magnetic-control sputtering filming equipment.
Background technology
At present, the vacuum magnetic-control sputtering method is that substrate to be plated is placed vacuum chamber, and feeding working gas (argon gas, oxygen and nitrogen etc.), when between sputter cathode, anode, switching on, allow the negative electrode be negative potential, because the effect of high-voltage electric field makes gas (argon gas) molecular ionization, form plasma body, the argon particle of positively charged will be under the acceleration of electric field, at a high speed to cathode targets surface bump, the metal ion of target material surface is hit, and the movement locus of ion in crossed electric and magnetic field is cycloid, is deposited on glass surface gradually and forms film.The principle of work of planar magnetic control sputtering cathode is consulted Fig. 2.Its magnet of existing planar magnetic control sputtering cathode is immersed in the water, and having used of a specified duration can demagnetization.
Summary of the invention
But the purpose of this utility model provides a kind of director simple in structure high-capacity planar magnetron sputtering cathode in work-ing life.
The technical scheme that its technical problem that solves the utility model adopts is: it is by comprising that cathode 4, target 1 and magnet constitute, in the inner chamber of cathode 4, magnet is installed, target 1 is installed in the top of cathode 4, the utility model is provided with airtight cooling channel 2 in the inner chamber of cathode 4, in cathode 4 inner chambers, be provided with magnetic boots 5 between its bottom and the cooling channel 2, between cooling channel 2 and magnetic boots 5, be provided with magnet 3.Described cooling channel 2 can be made of cooling channel shell 6 and thermal transfer plate 7, and cooling channel shell 6 is the groove shape structure of open topped, is equipped with thermal transfer plate 7 on cooling channel shell 6 tops.The cross section of described cooling channel shell 6 can be trapezoidal shape cooling tank wide at the top and narrow at the bottom, and 2 arranged outside has the bar magnet 3 that matches with cooling channel shell 6 in the cooling channel.The cross section of described cooling channel shell 6 also can be the trapezoidal shape cooling tank wide at the top and narrow at the bottom more than 2 or 2,2 arranged outside has the bar magnet 3 that matches with cooling channel shell 6 in the cooling channel, and is provided with taper or halfpace shape magnet 8 between 2 trapezoidal shape cooling tanks of cooling channel shell 6.
The beneficial effects of the utility model are: it is by being provided with an independently cooling channel in cathode inside, thereby magnet is not contacted with cooling media, avoids the permanent magnet media corrosion that is cooled; And have the thermal transfer plate that the high thermal conductivity material makes by design and contact with the target big area, thereby target is cooled off fully, make negative electrode can bear higher power.It can be widely used on the vacuum magnetic-control sputtering filming equipment.
Description of drawings
Fig. 1 is a structural representation of the present utility model.
Fig. 2 is the principle of work reference drawing of planar magnetic control sputtering cathode.
Among the figure: 1-target, 2-cooling channel, 3-magnet, 4-cathode, 5-magnetic boots, 6-cooling channel shell, 7-thermal transfer plate, 8-taper or halfpace shape magnet, 9-substrate.
Embodiment
That the utility model is described in further detail is as follows below in conjunction with embodiment:
Embodiment 1, and main part of the present utility model is divided into cathode body part and target part.Form by cathode 4 and magnetic boots 5, magnet 3, cooling channel 2 etc., described cooling channel shell 6 can adopt metallic substance to make, target 1 is installed in the top of cathode 4, in the inner chamber of cathode 4, be provided with airtight cooling channel 2, in cathode 4 inner chambers, be provided with magnetic boots 5 between its bottom and the cooling channel 2, be provided with magnet 3 between cooling channel 2 and magnetic boots 5, thereby be shaped an independently cooling channel in cathode 4 inside, magnet 3 can adopt permanent magnet.This structure can make the utility model that water coolant or other cooling liqs or the gas of big flow can be provided in the course of the work, thereby can guarantee that negative electrode obtains cooling.Magnetic boots 5 and magnet 3 are installed in the bottom of cathode 4, and magnetic boots 5 and magnet 3 can fixedly mount, thereby magnetic boots 5 are not contacted with cooling media with magnet 3, avoid permanent magnet 3 media that is cooled to corrode.Like this, magnet 3 can be used the ferro-aluminum boron material, can reduce the cost of manufacture of negative electrode.Consult Fig. 1 and Fig. 2.
Embodiment 2, cooling channel 2 described in the utility model can be made of cooling channel shell 6 and thermal transfer plate 7, thereby make the cathode body part by cathode 4 and magnetic boots 5, magnet 3, cooling channel 2, cooling channel shell 6, thermal transfer plate 7 formations such as grade, cooling channel shell 6 can be designed to the groove shape structure of open topped, and be equipped with thermal transfer plate 7 on cooling channel shell 6 tops, become to be sealed and matched between cooling channel shell 6 tops and the thermal transfer plate 7, thereby make cooling channel shell 6 and thermal transfer plate 7 constitute cooling channel 2 together, described thermal transfer plate 7 employing heat conductivilitys material are preferably made, and its thickness makes less as far as possible, thereby improves heat conduction and heat radiation and cooling efficiency.Be that thin thermal transfer plate 7 contacts with target, improved the cooling efficiency of target.The utility model contacts with target 1 big area by the thermal transfer plate 7 that has the high thermal conductivity material and make, and makes target 1 can access sufficient cooling, thereby can make negative electrode can bear more superpower; They are that negative electrode can carry powerful basic premise.Consult Fig. 1 and Fig. 2, all the other are with embodiment 1.
Embodiment 3, the cross section of cooling channel described in the utility model shell 6 can be trapezoidal shape cooling tank wide at the top and narrow at the bottom, 2 arranged outside has the bar magnet 3 that matches with cooling channel shell 6 in the cooling channel, the utility model passes through design cooling channel 2, thereby can change magnet shape and installation position; The magnet 3 of different sites can require to be designed to different shapes and to install by different angles or position according to working parameter.Consult Fig. 1 and Fig. 2, all the other are with above-mentioned embodiment.
Embodiment 4, the cross section of cooling channel described in the utility model shell 6 also can be the trapezoidal shape cooling tank wide at the top and narrow at the bottom more than 2 or 2,2 arranged outside has the bar magnet 3 that matches with cooling channel shell 6 in the cooling channel, and between the trapezoidal shape cooling tank of cooling channel shell 6, be provided with taper or halfpace shape magnet 8, the magnet 3 in the outside can adopt rectangular parallelepiped or bar magnet, and making the magnetizing direction of magnet and target material surface at angle, the big I of angle designs according to the width of target; Be arranged on the intermediary taper or halfpace shape magnet 8 makes its magnetizing direction vertical with target material surface as far as possible.The deflection by making setting angle and the change of magnet shape, thus the homogeneity of target material surface magneticstrength parallel component can be guaranteed, produced the benefit of three aspects thus: the one, make sputtering grooves become smooth, can improve target utilization effectively; The 2nd, dwindled the area of the non-sputtering zone of target, avoid target to poison, reduce and beat arc unusually, the stability of raising sputter procedure; The 3rd, reduced the accumulation of non-conductive, avoid particle to drop in the coated surface of substrate, form the possibility of pinprick, effectively improve the quality of plated film product.Consult Fig. 1 and Fig. 2, all the other are with above-mentioned embodiment.
The utility model is except that target 1, and the rest part of cathode body can be made into an integral body, when need changing target 1, only need unclamp the mounting block of negative electrode and target 1, can take down old target, load onto new target after, fastening mounting block gets final product, and is simple to operate.
Claims (4)
1, a kind of high-capacity planar magnetron sputtering cathode, it is by comprising that cathode (4), target (1) and magnet constitute, in the inner chamber of cathode (4), magnet is installed, target (1) is installed in the top of cathode (4), it is characterized in that: in the inner chamber of cathode (4), be provided with airtight cooling channel (2), in cathode (4) inner chamber, be provided with magnetic boots (5) between its bottom and cooling channel (2), between cooling channel (2) and magnetic boots (5), be provided with magnet (3).
2, high-capacity planar magnetron sputtering cathode according to claim 1, it is characterized in that: described cooling channel (2) are made of cooling channel shell (6) and thermal transfer plate (7), cooling channel shell (6) is the groove shape structure of open topped, is equipped with thermal transfer plate (7) on cooling channel shell (6) top.
3, high-capacity planar magnetron sputtering cathode according to claim 2, it is characterized in that: the cross section of described cooling channel shell (6) is a trapezoidal shape cooling tank wide at the top and narrow at the bottom, and the arranged outside of (2) has the bar magnet (3) that matches with cooling channel shell (6) in the cooling channel.
4, high-capacity planar magnetron sputtering cathode according to claim 2, it is characterized in that: the cross section of described cooling channel shell (6) is the trapezoidal shape cooling tank wide at the top and narrow at the bottom more than 2 or 2, the arranged outside of (2) has the bar magnet (3) that matches with cooling channel shell (6) in the cooling channel, and is provided with taper or halfpace shape magnet (8) between 2 trapezoidal shape cooling tanks of cooling channel shell (6).
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CNU2008201588025U CN201301339Y (en) | 2008-10-17 | 2008-10-17 | High-power planar magnetic control spluttering cathode |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CNU2008201588025U CN201301339Y (en) | 2008-10-17 | 2008-10-17 | High-power planar magnetic control spluttering cathode |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN201301339Y true CN201301339Y (en) | 2009-09-02 |
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CNU2008201588025U Expired - Lifetime CN201301339Y (en) | 2008-10-17 | 2008-10-17 | High-power planar magnetic control spluttering cathode |
Country Status (1)
| Country | Link |
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| CN (1) | CN201301339Y (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103204637A (en) * | 2012-01-12 | 2013-07-17 | 上海北玻玻璃技术工业有限公司 | Transparent conducting oxide coated glass coating line vacuum system |
| CN104611674A (en) * | 2014-11-10 | 2015-05-13 | 芜湖真空科技有限公司 | Planar magnetron cathode |
| CN105452522B (en) * | 2013-08-14 | 2018-07-24 | 应用材料公司 | The magnetron of encapsulation |
-
2008
- 2008-10-17 CN CNU2008201588025U patent/CN201301339Y/en not_active Expired - Lifetime
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103204637A (en) * | 2012-01-12 | 2013-07-17 | 上海北玻玻璃技术工业有限公司 | Transparent conducting oxide coated glass coating line vacuum system |
| CN103204637B (en) * | 2012-01-12 | 2015-08-12 | 上海北玻玻璃技术工业有限公司 | A kind of transparent conductive oxide coated glass coating wire vacuum system |
| CN105452522B (en) * | 2013-08-14 | 2018-07-24 | 应用材料公司 | The magnetron of encapsulation |
| CN104611674A (en) * | 2014-11-10 | 2015-05-13 | 芜湖真空科技有限公司 | Planar magnetron cathode |
| CN104611674B (en) * | 2014-11-10 | 2017-08-25 | 芜湖真空科技有限公司 | Plane magnetic control negative electrode |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| AV01 | Patent right actively abandoned |
Granted publication date: 20090902 Effective date of abandoning: 20081017 |