CN204065661U - Large area is without the device of mask plate instantaneous exposure - Google Patents
Large area is without the device of mask plate instantaneous exposure Download PDFInfo
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- CN204065661U CN204065661U CN201420546310.9U CN201420546310U CN204065661U CN 204065661 U CN204065661 U CN 204065661U CN 201420546310 U CN201420546310 U CN 201420546310U CN 204065661 U CN204065661 U CN 204065661U
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Abstract
The utility model relates to the device of large area without mask plate instantaneous exposure, light source, collimating mirror, completely reflecting mirror and spatial light modulator DMD is set gradually along light path, the light path output terminal of spatial light modulator DMD is furnished with total reflective mirror, the light path output terminal of total reflective mirror is connected two heart high-velocity scanning system far away, and the light path output terminal of two heart high-velocity scanning system far away is right against article carrying platform; Spatial light modulator DMD, two heart high-velocity scanning system far away, article carrying platform and kinetic control system control linkage.Adopt digital spatial light modulation device DMD unit, the figure needing exposure can be obtained flexibly; Use two telecentric scanning field lens, the figure of DMD is exposed on photosensitive base material by field lens with the form of rapid scanning; Platform coordinates field mirror to link simultaneously, significantly improves efficiency.The utility model large area is without the device of mask plate instantaneous exposure, and exposure flexibly, efficiency is high, consumptive material is few.
Description
Technical field
The utility model relates to the device of a kind of large area without mask plate instantaneous exposure, belongs to semiconductor, meticulous micro-processing technology field.
Background technology
At present, the method for carrying out exposing has multiple, and wherein great majority are all first make mask plate, then by mask plate by Graphic transitions on other photosensitive materials.There is the shortcomings such as mask plate price is high, fabrication cycle is long in this technique, dirigibility is poor, needs expensive specific manufacture equipment and consumptive material.Greatly hinder the application development of this technology.In recent years, computer technology especially image input, process and the develop rapidly of export technique are that computing machine compound stereoscopic picture provides conveniently.
Utility model content
The purpose of this utility model is the deficiency overcoming prior art existence, provides a kind of large area without the device of mask plate instantaneous exposure.
The purpose of this utility model is achieved through the following technical solutions:
Large area is without the device of mask plate instantaneous exposure, feature is: comprise the light source, collimating mirror, completely reflecting mirror and the spatial light modulator DMD that set gradually along light path, the light path output terminal of spatial light modulator DMD is furnished with total reflective mirror, the light path output terminal of total reflective mirror is connected two heart high-velocity scanning system far away, and the light path output terminal of two heart high-velocity scanning system far away is right against article carrying platform; Described spatial light modulator DMD, two heart high-velocity scanning system far away, article carrying platform and kinetic control system control linkage.
Further, above-mentioned large area is without the device of mask plate instantaneous exposure, and between described light source and collimating mirror, light path is provided with optical gate.
Further, above-mentioned large area without the device of mask plate instantaneous exposure, the monochromatic LD light source of described light source to be optical wavelength be 266nm ~ 450nm.
Further, above-mentioned large area is without the device of mask plate instantaneous exposure, and described article carrying platform is provided with substrate, and the material of substrate is acryl resin MMA resin material or glass.
Further, above-mentioned large area is without the device of mask plate instantaneous exposure, and the light path output terminal of described spatial light modulator DMD is furnished with absorber.
The substantive distinguishing features that technical solutions of the utility model are outstanding and significant progress are mainly reflected in:
The utility model adopts digital spatial light modulation device DMD unit, can obtain the figure needing exposure flexibly; Use two telecentric scanning field lens, the figure of DMD is exposed on photosensitive base material by field lens with the form of rapid scanning; Platform coordinates field mirror to link simultaneously, significantly improves efficiency.The utility model large area is without the device of mask plate instantaneous exposure, and exposure flexibly, efficiency is high, consumptive material is few, adopts short wavelength LD light source to focus of the light beam into micron level, meets the high-resolution demand in market; Use high-velocity scanning system can improve view picture face exposure rate.
Accompanying drawing explanation
Below in conjunction with accompanying drawing, technical solutions of the utility model are described further:
Fig. 1: light channel structure schematic diagram of the present utility model.
Embodiment
As shown in Figure 1, large area is without the device of mask plate instantaneous exposure, comprise the light source 1 set gradually along light path, optical gate 2, collimating mirror 3, completely reflecting mirror 4 and spatial light modulator DMD5, the monochromatic LD light source of light source 1 to be optical wavelength be 266nm ~ 450nm, the light path output terminal of spatial light modulator DMD5 is furnished with total reflective mirror 6 and absorber 7, the light path output terminal of total reflective mirror 6 is connected two heart high-velocity scanning system 8 far away, the light path output terminal of two heart high-velocity scanning system 8 far away is right against article carrying platform 11, article carrying platform 11 is provided with substrate, the material of substrate is acryl resin MMA resin material or glass, spatial light modulator DMD5, two heart high-velocity scanning system 8 far away, article carrying platform 11 and kinetic control system 9 control linkage.
At a high speed two telecentric scanning system is provided with two telecentric scanning object lens, can ensure that focal plane and exposure object surface overlap in whole sweep limit, image deformation is within 0.1%.
When large area is without mask plate instantaneous exposure, workpiece to be processed 10 is fixed on article carrying platform 11, and the monochromatic light that light source 1 sends, through optical gate 2 gauge tap light, is coaxially expanded by collimating mirror 3 pairs of light beams after optical gate 2 controls light beam, improve the angle of divergence of beam propagation, make beam path alignment, light beam after expanding arrives completely reflecting mirror 4, and light path changes direction, and light beam injects on spatial light modulator DMD5, light beam carries out shape modulation through spatial light modulator DMD5, modulate the light beam of figure, then output beam directive total reflective mirror 6, after spatial light modulator DMD5 modulation, useless light is absorbed by absorber 7, output beam enters two heart high-velocity scanning system 8 far away through total reflective mirror 6, the light beam directive sent via two heart high-velocity scanning system 8 far away is positioned at the workpiece to be processed 10 on article carrying platform 11, the surface that light focuses on workpiece to be processed 10 is sent by two heart high-velocity scanning system 8 far away, the light beam of modulation enters two heart high-velocity scanning system 8 pairs of processing work surface scans far away, during scanning, platform links, after kinetic control system 9 calculates, spatial light modulator DMD5 is mail in instruction, according to position of platform and scanning position, real-time update is carried out to DMD modulation pattern, thus carry out the rapid scanning exposure of full width face.
In sum, the utility model adopts digital spatial light modulation device DMD unit, can obtain the figure needing exposure flexibly; Use two telecentric scanning field lens, the figure of DMD is exposed on photosensitive base material by field lens with the form of rapid scanning; Platform coordinates field mirror to link simultaneously, significantly improves efficiency.The utility model large area is without the device of mask plate instantaneous exposure, and exposure flexibly, efficiency is high, consumptive material is few, adopts short wavelength LD light source to focus of the light beam into micron level, meets the high-resolution demand in market; Use high-velocity scanning system can improve view picture face exposure rate.
It is to be understood that: the above is only preferred implementation of the present utility model; for those skilled in the art; under the prerequisite not departing from the utility model principle; can also make some improvements and modifications, these improvements and modifications also should be considered as protection domain of the present utility model.
Claims (5)
1. large area is without the device of mask plate instantaneous exposure, it is characterized in that: comprise the light source (1), collimating mirror (3), completely reflecting mirror (4) and the spatial light modulator DMD (5) that set gradually along light path, the light path output terminal of spatial light modulator DMD (5) is furnished with total reflective mirror (6), the light path output terminal of total reflective mirror (6) is connected two heart high-velocity scanning system (8) far away, and the light path output terminal of two heart high-velocity scanning system (8) far away is right against article carrying platform (11); Described spatial light modulator DMD (5), two heart high-velocity scanning system (8) far away, article carrying platform (11) and kinetic control system (9) control linkage.
2. large area according to claim 1 is without the device of mask plate instantaneous exposure, it is characterized in that: between described light source (1) and collimating mirror (3), light path is provided with optical gate (2).
3. large area according to claim 1 is without the device of mask plate instantaneous exposure, it is characterized in that: the monochromatic LD light source of described light source (1) to be optical wavelength be 266nm ~ 450nm.
4. large area according to claim 1 is without the device of mask plate instantaneous exposure, it is characterized in that: described article carrying platform (11) is provided with substrate, and the material of substrate is acryl resin MMA resin material or glass.
5. large area according to claim 1 is without the device of mask plate instantaneous exposure, it is characterized in that: the light path output terminal of described spatial light modulator DMD (5) is furnished with absorber (7).
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201420546310.9U CN204065661U (en) | 2014-09-22 | 2014-09-22 | Large area is without the device of mask plate instantaneous exposure |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201420546310.9U CN204065661U (en) | 2014-09-22 | 2014-09-22 | Large area is without the device of mask plate instantaneous exposure |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN204065661U true CN204065661U (en) | 2014-12-31 |
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201420546310.9U Active CN204065661U (en) | 2014-09-22 | 2014-09-22 | Large area is without the device of mask plate instantaneous exposure |
Country Status (1)
| Country | Link |
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| CN (1) | CN204065661U (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN104199259A (en) * | 2014-09-22 | 2014-12-10 | 苏州德龙激光股份有限公司 | Large-area mask-plate-free rapid exposure device and method |
| CN105116693A (en) * | 2015-09-25 | 2015-12-02 | 武汉先河激光技术有限公司 | Large-breadth maskless exposure device and large-breadth maskless exposure method |
-
2014
- 2014-09-22 CN CN201420546310.9U patent/CN204065661U/en active Active
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN104199259A (en) * | 2014-09-22 | 2014-12-10 | 苏州德龙激光股份有限公司 | Large-area mask-plate-free rapid exposure device and method |
| CN105116693A (en) * | 2015-09-25 | 2015-12-02 | 武汉先河激光技术有限公司 | Large-breadth maskless exposure device and large-breadth maskless exposure method |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant |