CN104199259A - Large-area mask-plate-free rapid exposure device and method - Google Patents
Large-area mask-plate-free rapid exposure device and method Download PDFInfo
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- CN104199259A CN104199259A CN201410487260.6A CN201410487260A CN104199259A CN 104199259 A CN104199259 A CN 104199259A CN 201410487260 A CN201410487260 A CN 201410487260A CN 104199259 A CN104199259 A CN 104199259A
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- light
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- spatial light
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Abstract
The invention relates to a large-area mask-plate-free rapid exposure device and method. A light source, a collimating mirror, a total reflection mirror and a spatial light modulator DMD are arranged on a light path sequentially; the total reflection mirror is arranged at a light path output end of the spatial light modulator DMD, a light path output end of the total reflection mirror is connected with a high-speed double-telecentric scanning system, and a light path output end of the high-speed double-telecentric scanning system is aligned to a carrying platform; and the spatial light modulator DMD, the high-speed double-telecentric scanning system, the carrying platform and a motion control system are in control connection. With adoption of a digital spatial light modulator DMD unit, a graph required to be exposed can be flexibly obtained; the DMD graph is exposed to a photosensitive substrate by a double-telecentric scanning field lens in a fast scanning manner; and meanwhile, the platform is matched with the scanning field lens for linkage, and the efficiency is remarkably improved. The large-area mask-plate-free rapid exposure device is flexible in exposure and high in efficiency, and consumes few materials.
Description
Technical field
The present invention relates to a kind of large area without the devices and methods therefor of mask plate instantaneous exposure, belong to semiconductor, meticulous micro-processing technology field.
Background technology
At present, the method for exposing has multiple, and wherein great majority are all first to make mask plate, then by mask plate, figure are transferred on other photosensitive materials.There is the shortcomings such as mask plate price is high, fabrication cycle is long in this technique, dirigibility is poor, needs expensive specific manufacture equipment and consumptive material.Greatly hindered the application development of this technology.The develop rapidly of especially image input of computer technology in recent years,, processing and export technique provides convenience for computing machine compound stereoscopic picture.
Summary of the invention
The object of the invention is to overcome the deficiency that prior art exists, the devices and methods therefor of a kind of large area without mask plate instantaneous exposure is provided.
Object of the present invention is achieved through the following technical solutions:
Large area is without the device of mask plate instantaneous exposure, feature is: comprise the light source, collimating mirror, completely reflecting mirror and the spatial light modulator DMD that along light path, set gradually, the light path output terminal of spatial light modulator DMD is furnished with total reflective mirror, the light path output terminal of total reflective mirror is connected two heart high-velocity scanning systems far away, and the light path output terminal of two heart high-velocity scanning systems far away is right against article carrying platform; Described spatial light modulator DMD, two heart high-velocity scanning system far away, article carrying platform and kinetic control system control linkage.
Further, above-mentioned large area is without the device of mask plate instantaneous exposure, and between described light source and collimating mirror, light path is provided with optical gate.
Further, above-mentioned large area is without the device of mask plate instantaneous exposure, and described light source is that optical wavelength is the monochromatic LD light source of 266nm～450nm.
Further, above-mentioned large area is without the device of mask plate instantaneous exposure, and described article carrying platform is provided with substrate, and the material of substrate is acryl resin MMA resin material or glass.
Further, above-mentioned large area is without the device of mask plate instantaneous exposure, and the light path output terminal of described spatial light modulator DMD is furnished with absorber.
Large area of the present invention is without the method for mask plate instantaneous exposure, and workpiece to be processed is fixed on article carrying platform, and the monochromatic light that light source sends coaxially expands light beam by collimating mirror, improves the angle of divergence of beam propagation, makes beam path alignment; Light beam after expanding arrives completely reflecting mirror, and light path changes direction, and light beam injects on spatial light modulator DMD; Light beam carries out figure modulation through spatial light modulator DMD, modulate the light beam of figure, then output beam directive total reflective mirror, output beam enters two heart high-velocity scanning systems far away through total reflective mirror, the light beam directive sending via two heart high-velocity scanning systems far away is positioned at the workpiece to be processed on article carrying platform, by two heart high-velocity scanning systems far away, send the surface that light focuses on workpiece to be processed, exposure-processed is carried out in the surface of workpiece to be processed.
Again further, above-mentioned large area is without the method for mask plate instantaneous exposure, and the monochromatic light that described light source sends is through optical gate gauge tap light, and optical gate is coaxially expanded light beam by collimating mirror after controlling light beam.
Again further, above-mentioned large area is without the method for mask plate instantaneous exposure, and after described spatial light modulator DMD modulation, useless light is absorbed device absorption.
Again further, above-mentioned large area is without the method for mask plate instantaneous exposure, the light beam of described modulation enters two heart high-velocity scanning systems far away, then to processing work surface scan, during scanning, platform interlock, after kinetic control system calculates, instruction sends to spatial light modulator DMD, according to position of platform and scanning position, DMD modulation pattern is carried out to real-time update, thereby carry out the exposure of full width face rapid scanning.
The substantive distinguishing features that technical solution of the present invention is outstanding and significant progressive being mainly reflected in:
The present invention adopts digital spatial light modulation device DMD unit, can obtain flexibly needing the figure of exposure; Use two telecentric scanning field lenses, by the figure of DMD, by field lens, the form with rapid scanning is exposed on sensitization base material; Platform coordinates field mirror to link simultaneously, significantly improves efficiency.Large area of the present invention is without the device of mask plate instantaneous exposure, and exposure flexibly, efficiency is high, consumptive material is few, adopts short wavelength LD light source can focus of the light beam into micron level, meets the high-resolution demand in market; Use high-velocity scanning system can improve view picture face exposure rate.
Accompanying drawing explanation
Below in conjunction with accompanying drawing, technical solution of the present invention is described further:
Fig. 1: light channel structure schematic diagram of the present invention.
Embodiment
As shown in Figure 1, large area is without the device of mask plate instantaneous exposure, comprise the light source 1 setting gradually along light path, optical gate 2, collimating mirror 3, completely reflecting mirror 4 and spatial light modulator DMD 5, light source 1 is that optical wavelength is the monochromatic LD light source of 266nm～450nm, the light path output terminal of spatial light modulator DMD 5 is furnished with total reflective mirror 6 and absorber 7, the light path output terminal of total reflective mirror 6 is connected two heart high-velocity scanning systems 8 far away, the light path output terminal of two heart high-velocity scanning systems 8 far away is right against article carrying platform 11, article carrying platform 11 is provided with substrate, the material of substrate is acryl resin MMA resin material or glass, spatial light modulator DMD 5, two heart high-velocity scanning system 8 far away, article carrying platform 11 and kinetic control system 9 control linkages.
Two telecentric scanning object lens are installed at a high speed two telecentric scanning systems, can guarantee that focal plane overlaps with exposure object surface in whole sweep limit, image deformation is within 0.1%.
Large area is without the method for mask plate instantaneous exposure, workpiece to be processed 10 is fixed on article carrying platform 11, and the monochromatic light that light source 1 sends, through optical gate 2 gauge tap light, is coaxially expanded by 3 pairs of light beams of collimating mirror after optical gate 2 is controlled light beam, the angle of divergence of improving beam propagation, makes beam path alignment, light beam after expanding arrives completely reflecting mirror 4, and light path changes direction, and light beam injects on spatial light modulator DMD 5, light beam carries out figure modulation through spatial light modulator DMD 5, modulate the light beam of figure, then output beam directive total reflective mirror 6, after spatial light modulator DMD5 modulation, useless light is absorbed device 7 absorptions, output beam enters two heart high-velocity scanning systems 8 far away through total reflective mirror 6, the light beam directive sending via two heart high-velocity scanning systems 8 far away is positioned at the workpiece to be processed 10 on article carrying platform 11, by two heart high-velocity scanning systems 8 far away, send the surface that light focuses on workpiece to be processed 10, the light beam of modulation enters two 8 pairs of processing work surface scans of heart high-velocity scanning system far away, during scanning, platform interlock, after kinetic control system 9 calculates, spatial light modulator DMD5 is mail in instruction, according to position of platform and scanning position, DMD modulation pattern is carried out to real-time update, thereby carry out the exposure of full width face rapid scanning.
In sum, the present invention adopts digital spatial light modulation device DMD unit, can obtain flexibly needing the figure of exposure; Use two telecentric scanning field lenses, by the figure of DMD, by field lens, the form with rapid scanning is exposed on sensitization base material; Platform coordinates field mirror to link simultaneously, significantly improves efficiency.Large area of the present invention is without the device of mask plate instantaneous exposure, and exposure flexibly, efficiency is high, consumptive material is few, adopts short wavelength LD light source can focus of the light beam into micron level, meets the high-resolution demand in market; Use high-velocity scanning system can improve view picture face exposure rate.
It is to be understood that: the above is only the preferred embodiment of the present invention; for those skilled in the art; under the premise without departing from the principles of the invention, can also make some improvements and modifications, these improvements and modifications also should be considered as protection scope of the present invention.
Claims (9)
1. large area is without the device of mask plate instantaneous exposure, it is characterized in that: comprise the light source (1), collimating mirror (3), completely reflecting mirror (4) and the spatial light modulator DMD (5) that along light path, set gradually, the light path output terminal of spatial light modulator DMD (5) is furnished with total reflective mirror (6), the light path output terminal of total reflective mirror (6) is connected two heart high-velocity scanning systems (8) far away, and the light path output terminal of two heart high-velocity scanning systems far away (8) is right against article carrying platform (11); Described spatial light modulator DMD (5), two heart high-velocity scanning systems far away (8), article carrying platform (11) and kinetic control system (9) control linkage.
2. large area according to claim 1, without the device of mask plate instantaneous exposure, is characterized in that: between described light source (1) and collimating mirror (3), light path is provided with optical gate (2).
3. large area according to claim 1, without the device of mask plate instantaneous exposure, is characterized in that: described light source (1) is that optical wavelength is the monochromatic LD light source of 266nm～450nm.
4. large area according to claim 1, without the device of mask plate instantaneous exposure, is characterized in that: described article carrying platform (11) is provided with substrate, and the material of substrate is acryl resin MMA resin material or glass.
5. large area according to claim 1, without the device of mask plate instantaneous exposure, is characterized in that: the light path output terminal of described spatial light modulator DMD (5) is furnished with absorber (7).
6. utilize device described in claim 1 to realize large area without the method for mask plate instantaneous exposure, it is characterized in that: workpiece to be processed (10) is fixed on article carrying platform (11), the monochromatic light that light source (1) sends coaxially expands light beam by collimating mirror (3), the angle of divergence of improving beam propagation, makes beam path alignment; Light beam after expanding arrives completely reflecting mirror (4), and light path changes direction, and light beam injects on spatial light modulator DMD (5); Light beam carries out figure modulation through spatial light modulator DMD (5), modulate the light beam of figure, then output beam directive total reflective mirror (6), output beam enters two heart high-velocity scanning systems (8) far away through total reflective mirror (6), the light beam directive sending via two heart high-velocity scanning systems far away (8) is positioned at the workpiece to be processed (10) on article carrying platform (11), by two heart high-velocity scanning systems far away (8), send the surface that light focuses on workpiece to be processed (10), exposure-processed is carried out in the surface of workpiece to be processed (10).
7. large area according to claim 6 is without the method for mask plate instantaneous exposure, it is characterized in that: the monochromatic light that described light source (1) sends is through optical gate (2) gauge tap light, and optical gate (2) is coaxially expanded light beam by collimating mirror (3) after controlling light beam.
8. large area according to claim 6, without the method for mask plate instantaneous exposure, is characterized in that: after described spatial light modulator DMD (5) modulation, useless light is absorbed device (7) absorption.
9. large area according to claim 6 is without the method for mask plate instantaneous exposure, it is characterized in that: the light beam of described modulation enters two heart high-velocity scanning systems (8) far away, then to processing work surface scan, during scanning, platform interlock, after kinetic control system (9) calculates, spatial light modulator DMD (5) is mail in instruction, according to position of platform and scanning position, DMD modulation pattern is carried out to real-time update, thereby carry out the exposure of full width face rapid scanning.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201410487260.6A CN104199259A (en) | 2014-09-22 | 2014-09-22 | Large-area mask-plate-free rapid exposure device and method |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201410487260.6A CN104199259A (en) | 2014-09-22 | 2014-09-22 | Large-area mask-plate-free rapid exposure device and method |
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| CN104199259A true CN104199259A (en) | 2014-12-10 |
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| CN201410487260.6A Pending CN104199259A (en) | 2014-09-22 | 2014-09-22 | Large-area mask-plate-free rapid exposure device and method |
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Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN106023069A (en) * | 2016-05-31 | 2016-10-12 | 西安嵌牛电子科技有限公司 | Multi-DMD exposure method based on video streams |
| CN106933049A (en) * | 2015-12-30 | 2017-07-07 | 上海微电子装备有限公司 | A kind of exposure system and exposure method for semiconductor lithography |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103279014A (en) * | 2013-06-14 | 2013-09-04 | 苏州苏大维格光电科技股份有限公司 | Device and method for preparing nano imaged substrate |
| CN103969956A (en) * | 2013-01-25 | 2014-08-06 | 上海微电子装备有限公司 | Exposure apparatus |
| CN204065661U (en) * | 2014-09-22 | 2014-12-31 | 苏州德龙激光股份有限公司 | Large area is without the device of mask plate instantaneous exposure |
-
2014
- 2014-09-22 CN CN201410487260.6A patent/CN104199259A/en active Pending
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103969956A (en) * | 2013-01-25 | 2014-08-06 | 上海微电子装备有限公司 | Exposure apparatus |
| CN103279014A (en) * | 2013-06-14 | 2013-09-04 | 苏州苏大维格光电科技股份有限公司 | Device and method for preparing nano imaged substrate |
| CN204065661U (en) * | 2014-09-22 | 2014-12-31 | 苏州德龙激光股份有限公司 | Large area is without the device of mask plate instantaneous exposure |
Non-Patent Citations (1)
| Title |
|---|
| 陆亚聪 等: "基于DMD高分辨率激光直写系统设计与实现", 《激光杂志》, vol. 28, no. 6, 31 December 2007 (2007-12-31) * |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN106933049A (en) * | 2015-12-30 | 2017-07-07 | 上海微电子装备有限公司 | A kind of exposure system and exposure method for semiconductor lithography |
| CN106023069A (en) * | 2016-05-31 | 2016-10-12 | 西安嵌牛电子科技有限公司 | Multi-DMD exposure method based on video streams |
| CN106023069B (en) * | 2016-05-31 | 2019-04-16 | 西安嵌牛电子科技有限公司 | A kind of more DMD exposure methods based on video flowing |
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Application publication date: 20141210 |