CN203462121U - Magnetic boot for vacuum magnetron sputtering equipment - Google Patents
Magnetic boot for vacuum magnetron sputtering equipment Download PDFInfo
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- CN203462121U CN203462121U CN201320543767.XU CN201320543767U CN203462121U CN 203462121 U CN203462121 U CN 203462121U CN 201320543767 U CN201320543767 U CN 201320543767U CN 203462121 U CN203462121 U CN 203462121U
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- sputtering equipment
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Abstract
The utility model relates to production equipment, and particularly relates to vacuum magnetron sputtering equipment applied to a touch screen glass film coating operation. A magnetic boot for vacuum magnetron sputtering equipment comprises a magnetic-conducting substrate and a plurality of permanent magnets, wherein each permanent magnet comprises a first magnetic pole and a second magnetic pole; the appearance of the substrate is a rectangle; the plurality of permanent magnets are arranged into a circle along the rectangular outer perimeter of the substrate and fixedly adsorbed on the substrate; the permanent magnets arranged into a circle are arranged outward with respect to the first magnetic poles; the plurality of permanent magnets are arranged into a column along the rectangular middle axis of the substrate and fixedly adsorbed on the substrate; the permanent magnets arranged into a column are arranged outward with respect to the second magnetic poles. The magnetic boot provided by the utility model is applicable to the touch screen glass film coating operation when being applied to the vacuum magnetron sputtering equipment.
Description
Technical field
The utility model relates to production unit, vacuum magnetic-control sputtering equipment used while relating in particular to for the operation of touch screen glass coating.
Background technology
Vacuum magnetic-control sputtering equipment is exactly under a relatively stable vacuum state, by producing glow discharge between anode and cathode, interpolar gas molecule is ionized and produces charged particles, wherein positive ion is subject to the negative potential accelerated motion of negative electrode and clashes into the target on negative electrode, the particles such as its atom are spilt, this atom spilling is deposited on the substrate of anode and forms film, thereby completes vacuum splashing and plating operation.In touch screen is produced, need to by vacuum magnetic-control sputtering operation, form one deck ITO film on glass.
Consult described in Fig. 1, it is the concise and to the point model of a kind of vacuum magnetic-control sputtering equipment, electronics will clash into ITO target material surface under mutual electric field and magnetic field E * B effect after ionization of gas, target atom or molecule etc. are sputtered out and at pipe face through adsorb, condense, surface diffusion migration, collision stablize nucleus in conjunction with formation, and then make nuclei growth become island by absorption, island connects mutually coalescent after growing up, finally form continuous shape film.The parts that wherein produce magnetic field are magnetic boots, are generally arranged on the behind of the vacuum chamber of equipment.Existing magnetic boots have portable magnetic boots and fixed magnetic boots, existing portable magnetic boots are by the position of the permanent magnet on screw rod moving track, thereby it is adjustable to realize Distribution of Magnetic Field, advantage is to improve the utilization ratio of target, but shortcoming is to cause plated film inhomogeneous because Distribution of Magnetic Field is inhomogeneous; Existing fixed magnetic boots cause the utilization ratio of target low because of the Position Design irrational distribution of permanent magnet.
Urgent need is designed a kind of magnetic boots for vacuum magnetic-control sputtering equipment, makes it not only can guarantee the utilization ratio height of target but also can guarantee that plated film is even.
Utility model content
Therefore, the purpose of this utility model is to propose a kind ofly not only can guarantee the utilization ratio height of target but also can guarantee that plated film is uniformly for the magnetic boots of vacuum magnetic-control sputtering equipment.
The utility model adopts following technical scheme to realize:
For the magnetic boots of vacuum magnetic-control sputtering equipment, comprise substrate and a plurality of permanent magnet of a magnetic conduction, permanent magnet all has the first magnetic pole and the second magnetic pole.The profile of this substrate is a rectangle, the plurality of permanent magnet is arranged in a circle and is fixedly adsorbed on this substrate along the neighboring of this substrate rectangle, and the permanent magnet that this circle is arranged all outwards arranges with the first magnetic pole, the plurality of permanent magnet is arranged in row and is fixedly adsorbed on this substrate along the axis of this substrate rectangle, and the permanent magnet that these row are arranged all outwards arranges with the second magnetic pole.
Wherein preferred, the both sides of the plurality of permanent magnet are all auxiliary fixing by " L " type fixed plate.
Preferred, " L " type fixed plate is magnetically permeable material.
Wherein, the first magnetic pole is that the N utmost point, the second magnetic pole are the S utmost points, or the first magnetic pole is that the S utmost point, the second magnetic pole are the N utmost points.
Improved magnetic boots of the present utility model are for vacuum magnetic-control sputtering equipment, adopt fixed distribution and by Distribution of Magnetic Field preferably, not only can guarantee the utilization ratio height of target but also can guarantee that plated film is even.
Accompanying drawing explanation
Fig. 1 is the concise and to the point model schematic diagram of vacuum magnetic-control sputtering equipment.
Fig. 2 is the structural representation of the magnetic boots of the utility model one embodiment.
Fig. 3 is the structural representation of the utility model one embodiment " L " type fixed plate.
Embodiment
Now with embodiment, the utility model is further illustrated by reference to the accompanying drawings.
Consult shown in Fig. 2, the magnetic boots for vacuum magnetic-control sputtering equipment of this embodiment, comprise substrate 1 and a plurality of permanent magnet 2 of a magnetic conduction, and permanent magnet 2 all has the first magnetic pole and the second magnetic pole.The profile of this substrate 1 is a rectangle, the plurality of permanent magnet 2 is arranged in a circle and is fixedly adsorbed on this substrate 1 along the rectangular outer perimeter of this substrate 1, and the permanent magnet 2 that this circle is arranged all outwards arranges with the first magnetic pole, the plurality of permanent magnet 2 is arranged in row and is fixedly adsorbed on this substrate 1 along the rectangle axis of this substrate 1, and the permanent magnet 2 that these row are arranged all outwards arranges with the second magnetic pole.Wherein, as shown in Figure 2, the first magnetic pole of permanent magnet 2 is that the N utmost point, the second magnetic pole are the S utmost points.Or permanent magnet 2 can be also that the first magnetic pole is that the S utmost point, the second magnetic pole are the N utmost points.
Consult shown in Fig. 3, preferred, the both sides of the plurality of permanent magnet 2 are all auxiliary fixing by " L " type fixed plate 3, are bonded in the both sides of permanent magnet 2 by modes such as viscoses.Preferred, " L " type fixed plate 3 is magnetically permeable material, can directly by magnetic force, bond, and bond without viscose.
Magnetic boots for vacuum magnetic-control sputtering equipment of the present utility model adopt the fixed structure of permanent magnet, and the arranging of permanent magnet 2 on substrate 1 is optimized, thereby optimized the distribution in this magnetic boots magnetic field, thereby make the utilization ratio of target in vacuum magnetic-control sputtering equipment higher than the target utilization of original fixed magnetic boots, can improve again this vacuum magnetic-control sputtering equipment plated film homogeneity simultaneously.
Although specifically show and introduced the utility model in conjunction with preferred embodiment; but those skilled in the art should be understood that; within not departing from the spirit and scope of the present utility model that appended claims limits; can make a variety of changes the utility model in the form and details, be protection domain of the present utility model.
Claims (4)
1. for the magnetic boots of vacuum magnetic-control sputtering equipment, the substrate and a plurality of permanent magnet that comprise a magnetic conduction, permanent magnet all has the first magnetic pole and the second magnetic pole, it is characterized in that: the profile of this substrate is a rectangle, the plurality of permanent magnet is arranged in a circle and is fixedly adsorbed on this substrate along the neighboring of this substrate rectangle, and the permanent magnet that this circle is arranged all outwards arranges with the first magnetic pole, the plurality of permanent magnet is arranged in row and is fixedly adsorbed on this substrate along the axis of this substrate rectangle, and the permanent magnet that these row are arranged all outwards arranges with the second magnetic pole.
2. the magnetic boots for vacuum magnetic-control sputtering equipment according to claim 1, is characterized in that: the both sides of the plurality of permanent magnet are all auxiliary fixing by " L " type fixed plate.
3. the magnetic boots for vacuum magnetic-control sputtering equipment according to claim 2, is characterized in that: " L " type fixed plate is magnetically permeable material.
4. according to the magnetic boots for vacuum magnetic-control sputtering equipment described in claim 1 or 2 or 3, it is characterized in that: the first magnetic pole is that the N utmost point, the second magnetic pole are the S utmost points, or the first magnetic pole is that the S utmost point, the second magnetic pole are the N utmost points.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201320543767.XU CN203462121U (en) | 2013-09-03 | 2013-09-03 | Magnetic boot for vacuum magnetron sputtering equipment |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201320543767.XU CN203462121U (en) | 2013-09-03 | 2013-09-03 | Magnetic boot for vacuum magnetron sputtering equipment |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN203462121U true CN203462121U (en) | 2014-03-05 |
Family
ID=50174496
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201320543767.XU Expired - Fee Related CN203462121U (en) | 2013-09-03 | 2013-09-03 | Magnetic boot for vacuum magnetron sputtering equipment |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN203462121U (en) |
-
2013
- 2013-09-03 CN CN201320543767.XU patent/CN203462121U/en not_active Expired - Fee Related
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| GR01 | Patent grant | ||
| GR01 | Patent grant | ||
| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20140305 Termination date: 20150903 |
|
| EXPY | Termination of patent right or utility model |