CN202823987U - Ultrasonic cleaning device - Google Patents
Ultrasonic cleaning device Download PDFInfo
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- CN202823987U CN202823987U CN 201220481356 CN201220481356U CN202823987U CN 202823987 U CN202823987 U CN 202823987U CN 201220481356 CN201220481356 CN 201220481356 CN 201220481356 U CN201220481356 U CN 201220481356U CN 202823987 U CN202823987 U CN 202823987U
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- ultrasonic
- rinse bath
- cleaning equipment
- ultrasonic cleaning
- cleaning
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Abstract
The utility model discloses an ultrasonic cleaning device. The ultrasonic cleaning device comprises a cleaning groove which contains cleaning agent, wherein an ultrasonic wave generating device is arranged in the cleaning groove, the ultrasonic wave generating device generates spherical ultrasonic wave with a frequency larger than 40KHz, the ultrasonic cavitation effect inside the cleaning agent is enabled to be more evener and dispersed, capability of eliminating sewages and tiny particles inside narrow gaps is stronger. The ultrasonic cleaning device is capable of effectively eliminating sewages like tiny particles, organic residues, scaling powder residues and the like, being high in decontamination efficiency, shortening cleaning time, and significantly reducing risks of damaging instruments by the ultrasonic wave. And therefore the ultrasonic cleaning device lowers damage to the instruments, at the same time improves decontamination capability and cleaning efficiency.
Description
Technical field
The utility model relates to the cleaning device technical field of electronic device, especially relates to a kind of ultrasonic cleaning equipment.
Background technology
Development along with electronics and semiconductor packaging, chip and other size of electronic devices are dwindled gradually, the densification of assembling requires chip, the electronic device spacing of circuit, pin-pitch and the carrying of semiconductor packing device only to have tens microns, some molecules, organic dirt, welding assisted agent residuals, ion residues etc. all can cause device corrosion and electric leakage, affect electrical characteristics and the final reliability of product of device.In order to remove these pollutants, improve yield and the product reliability of packaging process, must clean semiconductor packing device.
The cleaning device and the method that at present are used for semiconductor packing device are continued to use electron trade more, soak as adopting, ultrasonic, spray, steam and various cleaning method combination, and that corresponding cleaning agent has is water base, half water base and organic solvent etc.Be aided with ultrasonic energy and can significantly accelerate the dissolving of device surface contaminants and the disengaging of particle in cleaning agent, simultaneously, ultrasonic cleaning equipment equipment is simple, cleaning is efficient, use cost is low, is widely used at cleaning industry.
Ultrasonic cleaning equipment of the prior art mainly comprises ultrasonic cleaning tank, the vibration plate that disposes single 28KHz or 40KHz low frequency ultrasound wave producer and match, and the ultrasonic wave of its generation is plane wave, cleans some high-density devices and needs ultrasonic about 10 minutes.According to research reports, (≤40KHz) ultrasonic wave only helps to remove bulky grain attachment more than 5 microns for single, low frequency, and the conventional planar ripple is inhomogeneous in cleaning agent cavitation effect, easily produce standing wave, the narrow slit cleansing power is poor, long-time ultrasonic have larger damage risk to semiconductor devices, is difficult to satisfy semiconductor packing device high-cleanness, high and high reliability demand.In addition, organic solvent lotion commonly used all has hypotoxicity or the characteristic that damages the ozone layer, and low emission and the long-term cleaning of controlling cleaning agent by ultrasonic cleaning equipment also are problem demanding prompt solutions in the row.
The utility model content
Main purpose of the present utility model is to provide a kind of ultrasonic cleaning equipment, improves dirt-removing power and cleaning efficiency when being intended to reduce device damage.
To achieve these objectives, the utility model proposes a kind of ultrasonic cleaning equipment, comprise the rinse bath that accommodates cleaning agent, described rinse bath is provided with ultrasonic generator, and this ultrasonic generator produces frequency more than or equal to the spherical ultrasonic of 40KHz.
Preferably, the frequency of described spherical ultrasonic is 40KHz ~ 120KHz.
Preferably, the power density of described spherical ultrasonic is 10W/L ~ 25W/L.
Preferably, described rinse bath comprises the first rinse bath and the second rinse bath, and the frequency of the spherical ultrasonic in described the first rinse bath is less than the frequency of the spherical ultrasonic in the second rinse bath.
Preferably, the frequency of the spherical ultrasonic in described the first rinse bath is 40KHz, and power density is 15W/L ~ 25W/L.
Preferably, the frequency of the spherical ultrasonic in described the second rinse bath is 80KHz or 120KHz, and power density is 10W/L ~ 20W/L.
Preferably, described ultrasonic cleaning equipment comprises that also one accommodates the soaking compartment of cleaning agent, and this soaking compartment is provided with calandria.
Preferably, described ultrasonic cleaning equipment also comprises separating tank, be provided with the distillation tank of calandria and the cleaning agent condensation of evaporation is recycled to the condensing unit of described separating tank, and described separating tank, the second rinse bath, the first rinse bath, soaking compartment and distillation tank are communicated with successively.
Preferably, described ultrasonic cleaning equipment also comprises the cavity of accommodating described separating tank, rinse bath, soaking compartment and distillation tank, and this cavity sidewalls is provided with the liquid collection trough that is communicated with described separating tank, and described condensing unit is located at this liquid collection trough top.
Preferably, the liquid level of described separating tank, the second rinse bath, the first rinse bath, soaking compartment and distillation tank reduces successively.
Preferably, described soaking compartment is or/and rinse bath is provided with filtration system.
A kind of ultrasonic cleaning equipment provided by the utility model, because its ultrasonic generator can produce the spherical ultrasonic more than or equal to 40KHz, make more even, the dispersion of ultrasonic cavitation effect in the cleaning agent, the ability of removing the interior dirt of narrow slit and fine particle is stronger, effective dirts such as the molecule on the removal devices, organic residue, welding assisted agent residuals, detersive efficiency is high and shortened scavenging period, has significantly reduced the damage risk of ultrasonic wave to device.Thereby dirt-removing power and cleaning efficiency when reducing device damage, have been improved.
Description of drawings
Fig. 1 is the schematic diagram of ultrasonic cleaning equipment of the present utility model.
The realization of the utility model purpose, functional characteristics and advantage are described further with reference to accompanying drawing in connection with embodiment.
The specific embodiment
Should be appreciated that specific embodiment described herein only in order to explaining the utility model, and be not used in restriction the utility model.
Referring to ultrasonic cleaning equipment one preferred embodiment of the present utility model shown in Figure 1, described ultrasonic cleaning equipment comprises the rinse bath 10 that accommodates cleaning agent, its bottom is provided with ultrasonic generator 50, and this ultrasonic generator 50 comprises supersonic generator and the vibration plate that matches.Device, particularly semiconductor packing device that needs clean are put into rinse bath 10 and immersed cleaning agent, and supersonic generator excites vibration plate to produce ultrasonic wave, and vibration plate is passed to the cleaning agent in the rinse bath 10 with ultrasonic wave and wherein device cleaned.The ultrasonic generator 50 of present embodiment produces is spherical ultrasonic more than or equal to 40KHz, it makes more even, the dispersion of ultrasonic cavitation effect in the cleaning agent, the ability of removing the interior dirt of narrow slit and fine particle is stronger, effective dirts such as the fine particle on the removal devices, organic residue, welding assisted agent residuals, detersive efficiency is high and shortened scavenging period, has significantly reduced the damage risk of ultrasonic wave to device.Therefore dirt-removing power and cleaning efficiency when reducing device damage, have been improved.
Further, the frequency of described spherical ultrasonic is 40KHz ~ 120KHz, and the spherical ultrasonic in this frequency range had both had stronger dirt-removing power and efficient, can reduce to greatest extent again the damage of device.The power density of the spherical ultrasonic of present embodiment is controllable adjustable also, and its optimum range is 10W/L ~ 25W/L, can guarantee undamaged dirt-removing power and the cleaning efficiency of improving simultaneously of device.
Further, the rinse bath 10 of present embodiment comprises the first rinse bath 11 and the second rinse bath 12, and the frequency of the spherical ultrasonic in the first rinse bath 11 is less than the frequency of the spherical ultrasonic in the second rinse bath 12.Concrete, the frequency of the spherical ultrasonic in the first rinse bath 11 is 40KHz, power density can be regulated in the scope between 15W/L ~ 25W/L; The frequency of the spherical ultrasonic in the second rinse bath 12 is 80KHz or 120HKz, power density can be regulated in the scope between 10W/L ~ 20W/L, thereby realize that 11 pairs of semiconductor devices of the first rinse bath carry out ultrasonic gross rinse, 12 pairs of semiconductor devices of the second rinse bath carry out the ultrasonic wave fine purifiation.Can only carry out ultrasonic gross rinse or ultrasonic wave fine purifiation to device according to actual conditions, perhaps first device be carried out ultrasonic gross rinse and again device is carried out the ultrasonic wave fine purifiation, thereby multiple choices are provided and have improved cleaning efficiency and dirt-removing power.
Further, described ultrasonic cleaning equipment comprises that also one accommodates the soaking compartment 20 of cleaning agent, and its bottom is provided with the cleaning agent heating in 60 pairs of grooves of calandria.Before the Ultrasonic Cleaning, can first device be put into soaking compartment 20 and soak a period of time, so that the heated cleaning agent decomposed of the dirt on the device, put into again rinse bath 10 and carry out ultrasonic cleaning, can further shorten the ultrasonic cleaning time reducing the damage to device, and the dirt on the removal devices more thoroughly.
Further, in order to reduce the volatilizing loss of cleaning agent, and evaporate into outside after to the pollution of environment, the ultrasonic cleaning equipment of present embodiment also is provided with separating tank 40, is provided with the distillation tank 30 of calandria 60, the cavity of condensing unit 70 and accommodating above-mentioned soaking compartment 20, rinse bath 10, distillation tank 30 and separating tank 40, this cavity is preferably airtight, and its sidewall is provided with the liquid collection trough 80 that is communicated with separating tank 40; Condensing unit 70 is comprised of condenser pipe and the refrigeration system that matches, it is arranged on the sidewall of liquid collection trough 80 tops, the cleaning agent that evaporates in distillation tank 30, soaking compartment 20 and the rinse bath 10 or volatilize is condensed into the liquid runs down sidewall flows into or drop onto in the liquid collection trough 80, liquid flows into separating tanks 40 along liquid collection trough 80 again; Because cleaning agent is organic solvent, and its density is greater than water, thus water with after cleaning agent separates automatically then water float in separating tank 40 tops, cleaning agent is deposited on separating tank 40 bottoms, can easily water be discharged.And separating tank 40, the second rinse bath 12, the first rinse bath 11, soaking compartment 20 and distillation tank 30 are communicated with successively, and the above-mentioned cell body so that cleaning agent is flowed through successively is the cleaning agent flow direction shown in the arrow among the figure.As a kind of optimal way, the liquid level of the separating tank 40 of present embodiment, the second rinse bath 12, the first rinse bath 11, soaking compartment 20 and distillation tank 30 reduces successively, thereby so that cleaning agent flows through above-mentioned cell body automatically successively under Action of Gravity Field, thereby the purification of realization cleaning agent in ultrasonic cleaning equipment reclaimed and is recycling, reduce the volatilizing loss of cleaning agent and reduced cost, and reduced the pollution to environment.
Further, the soaking compartment 20 in the present embodiment is or/and rinse bath 10 also is provided with filtration system 90, and it can filter the particulate dirt that breaks away from from device in the cleaning agent, purifies cleaning agent.
Accordingly, filtration system 90 is filtered the particulate dirt in the cleaning agent and is discharged, 60 pairs of cleaning agent heating evaporations wherein of calandria in the distillation tank 30 are also discharged remaining dirt, cleaning agent after the evaporation flows into separating tank 40 after condensing unit 70 condensations, discharge the water on top separating tank 40 separates water with cleaning agent after, the cleaning agent that the bottom is cleaned replenishes in the second rinse bath 12.Cleaning agent after waste liquid in the second rinse bath 12, dirt and the pollution floats on liquid level top and automatically flow through successively the first rinse bath 11, soaking compartment 20, enters at last distillation tank 30 again by its evaporation.Thereby realized that the purification of cleaning agent in ultrasonic cleaning equipment reclaimed and recycling, reduced the loss of cleaning agent and the discharging of waste liquid and waste gas.
In addition, freeze drying district 100 can also be set in liquid collection trough 80 tops so that the device after cleaning is carried out freeze drying, steaming district 200 be set to utilize clean cleaning agent steam that device is carried out the steam rinsing in rinse bath 10 and soaking compartment 20 tops.
Accordingly, the ultrasonic cleaning equipment of present embodiment can be realized heat soaking prewashing, ultrasonic gross rinse, ultrasonic wave fine purifiation, steam rinsing and freeze drying to device, can select wherein one or more operations during cleaning, also can select successively above-mentioned all process steps, specific as follows:
Heat soaking prewashing: the device immersion is equipped with in the soaking compartment 20 of cleaning agent, and the heating-up temperature that calandria 60 is set is higher than the boiling point of cleaning agent, and device is carried out heat soaking prewashing;
The ultrasonic wave thickness: the device immersion is accommodated in the first rinse bath 11 of cleaning agent, and the spherical ultrasonic frequency that setting ultrasonic generator 50 sends is that 40KHz, power density are 15W/L～25W/L, and device is carried out ultrasonic gross rinse;
Ultrasonic wave is meticulous: device immersed accommodate in the second rinse bath 12 of cleaning agent, set the spherical ultrasonic frequency and be 80 or 120KHz, power density be 10W/L～20W/L, device is carried out the ultrasonic wave fine purifiation;
Steam rinsing: product is placed the steam lotion district 200 of ultrasonic cleaning equipment, utilize clean cleaning agent steam that product is carried out the steam rinsing;
Freeze drying: product is placed the freeze drying district 100 of ultrasonic cleaning equipment, device is carried out freeze drying.
As seen, the ultrasonic cleaning equipment dirt-removing power of present embodiment is strong, cleaning efficiency is high and to the device that cleans not damaged almost, and the purification that can also realize cleaning agent is reclaimed and recycling, reduce the loss of cleaning agent and reduced cost, reduced the discharging of waste gas and waste liquid and reduced pollution to environment, be a kind of environmental protection, efficiently reach the ultrasonic cleaning equipment of function admirable.
Should be understood that; it below only is preferred embodiment of the present utility model; can not therefore limit claim of the present utility model; every equivalent structure or equivalent flow process conversion that utilizes the utility model specification and accompanying drawing content to do; or directly or indirectly be used in other relevant technical fields, all in like manner be included in the scope of patent protection of the present utility model.
Claims (11)
1. a ultrasonic cleaning equipment comprises the rinse bath that accommodates cleaning agent, it is characterized in that: described rinse bath is provided with ultrasonic generator, and this ultrasonic generator produces frequency more than or equal to the spherical ultrasonic of 40KHz.
2. ultrasonic cleaning equipment according to claim 1, it is characterized in that: the frequency of described spherical ultrasonic is 40KHz ~ 120KHz.
3. ultrasonic cleaning equipment according to claim 1, it is characterized in that: the power density of described spherical ultrasonic is 10W/L ~ 25W/L.
4. each described ultrasonic cleaning equipment according to claim 1-3, it is characterized in that: described rinse bath comprises the first rinse bath and the second rinse bath, and the frequency of the spherical ultrasonic in described the first rinse bath is less than the frequency of the spherical ultrasonic in the second rinse bath.
5. ultrasonic cleaning equipment according to claim 4 is characterized in that: the frequency of the spherical ultrasonic in described the first rinse bath is 40KHz, and power density is 15W/L ~ 25W/L.
6. ultrasonic cleaning equipment according to claim 4 is characterized in that: the frequency of the spherical ultrasonic in described the second rinse bath is 80KHz or 120KHz, and power density is 10W/L ~ 20W/L.
7. ultrasonic cleaning equipment according to claim 4, it is characterized in that: described ultrasonic cleaning equipment comprises that also one accommodates the soaking compartment of cleaning agent, and this soaking compartment is provided with calandria.
8. ultrasonic cleaning equipment according to claim 7, it is characterized in that: described ultrasonic cleaning equipment also comprises separating tank, be provided with the distillation tank of calandria and the cleaning agent condensation of evaporation is recycled to the condensing unit of described separating tank, and described separating tank, the second rinse bath, the first rinse bath, soaking compartment and distillation tank are communicated with successively.
9. ultrasonic cleaning equipment according to claim 8, it is characterized in that: described ultrasonic cleaning equipment also comprises the cavity of accommodating described separating tank, rinse bath, soaking compartment and distillation tank, this cavity sidewalls is provided with the liquid collection trough that is communicated with described separating tank, and described condensing unit is located at this liquid collection trough top.
10. ultrasonic cleaning equipment according to claim 8, it is characterized in that: the liquid level of described separating tank, the second rinse bath, the first rinse bath, soaking compartment and distillation tank reduces successively.
11. ultrasonic cleaning equipment according to claim 7 is characterized in that: described soaking compartment is or/and rinse bath is provided with filtration system.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 201220481356 CN202823987U (en) | 2012-09-18 | 2012-09-18 | Ultrasonic cleaning device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 201220481356 CN202823987U (en) | 2012-09-18 | 2012-09-18 | Ultrasonic cleaning device |
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| Publication Number | Publication Date |
|---|---|
| CN202823987U true CN202823987U (en) | 2013-03-27 |
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN 201220481356 Expired - Fee Related CN202823987U (en) | 2012-09-18 | 2012-09-18 | Ultrasonic cleaning device |
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Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103808053A (en) * | 2014-01-25 | 2014-05-21 | 东莞市鑫焘机械有限公司 | Micro-channel molecule hot air cooling equipment |
| CN104174610A (en) * | 2014-08-04 | 2014-12-03 | 四川锐腾电子有限公司 | Stamping copper strip cleaning-stoving combined machine |
| CN104209289A (en) * | 2013-06-05 | 2014-12-17 | 久尹股份有限公司 | Soldering flux cleaning device and soldering flux cleaning method |
| CN109332252A (en) * | 2018-08-30 | 2019-02-15 | 扬州虹扬科技发展有限公司 | A kind of semiconductor devices cleaning process and device |
| CN109482572A (en) * | 2018-12-28 | 2019-03-19 | 北方奥钛纳米技术有限公司 | Zirconium ball cleaning device |
| CN113399358A (en) * | 2021-07-07 | 2021-09-17 | 广东汇芯半导体有限公司 | Apparatus for semiconductor circuit |
-
2012
- 2012-09-18 CN CN 201220481356 patent/CN202823987U/en not_active Expired - Fee Related
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN104209289A (en) * | 2013-06-05 | 2014-12-17 | 久尹股份有限公司 | Soldering flux cleaning device and soldering flux cleaning method |
| CN103808053A (en) * | 2014-01-25 | 2014-05-21 | 东莞市鑫焘机械有限公司 | Micro-channel molecule hot air cooling equipment |
| CN104174610A (en) * | 2014-08-04 | 2014-12-03 | 四川锐腾电子有限公司 | Stamping copper strip cleaning-stoving combined machine |
| CN109332252A (en) * | 2018-08-30 | 2019-02-15 | 扬州虹扬科技发展有限公司 | A kind of semiconductor devices cleaning process and device |
| CN109482572A (en) * | 2018-12-28 | 2019-03-19 | 北方奥钛纳米技术有限公司 | Zirconium ball cleaning device |
| CN113399358A (en) * | 2021-07-07 | 2021-09-17 | 广东汇芯半导体有限公司 | Apparatus for semiconductor circuit |
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Legal Events
| Date | Code | Title | Description |
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| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| CF01 | Termination of patent right due to non-payment of annual fee | ||
| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20130327 Termination date: 20170918 |