CN202296364U - Semiconductor wafer conveying system - Google Patents
Semiconductor wafer conveying system Download PDFInfo
- Publication number
- CN202296364U CN202296364U CN 201120361308 CN201120361308U CN202296364U CN 202296364 U CN202296364 U CN 202296364U CN 201120361308 CN201120361308 CN 201120361308 CN 201120361308 U CN201120361308 U CN 201120361308U CN 202296364 U CN202296364 U CN 202296364U
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- China
- Prior art keywords
- wafer
- semiconductor crystal
- crystal wafer
- technique
- manipulator
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Abstract
The utility model discloses a semiconductor wafer conveying system and relates to the technical field of semiconductor wafer manufacturing. The semiconductor wafer conveying system comprises at least two wafer loading ports (9) for bearing wafer storage boxes (4), at least two technique units (2) and a conveying device (3) used for picking wafers and putting the wafers in the technique units (2), wherein each technique unit (2) comprises a layered structure with at least two layers. According to the semiconductor wafer conveying system, the technique units are arranged in a layered manner, the floor area of the system is effectively reduced, a manipulator is used in conjunction with a guide rail, so that the number of manipulators is reduced, the number of internal storage cells is reduced, therefore, the cost is lowered, and meanwhile, the wafer conveying time is reduced, and the yield is improved.
Description
Technical field
The utility model relates to semiconductor crystal wafer manufacturing technology field, relates in particular to a kind of semiconductor crystal wafer and transports system.
Background technology
In the manufacturing process of semiconductor crystal wafer, need it be transported to everywhere usually.
Existing conveyer adopts a plurality of technique unit linear ranks in the equipment both sides, and a plurality of manipulators of middle employing transport wafer, thereby need a plurality of internal storage units; System equipment integral body is single layer structure, and a plurality of technique units are positioned on the same horizontal surface.This structure causes system's floor area bigger.
In addition, the quantity of system robot is many, and internal storage unit is many, thereby has increased cost, has increased and has sent the sheet time, has influenced output.
The utility model content
The technical matters that (one) will solve
The technical matters that the utility model will solve is: provide a kind of semiconductor crystal wafer to transport system, have the little characteristics of floor area, the utility model can also reduce the quantity of manipulator; Reduce the number of internal storage unit; Reduce cost, reduced and sent the sheet time, improved output.
(2) technical scheme
For addressing the above problem; The utility model provides a kind of semiconductor crystal wafer to transport system; Comprise: at least two wafer load port, at least two technique units that are used to carry wafer storage box, and be used to the conveyer that picks up wafer and put into said technique unit; Wherein, said technique unit comprises double-ply laminar texture at least.
Preferably, said conveyer comprises: at least one manipulator and at least one guide rail, said manipulator is used for through picking up wafer along said guide rail movement.
Preferably, said guide rail horizontal arrangement, and the arrangement mode at the shape of its track and said wafer load port adapts.
Preferably, said manipulator is a both arms multi freedom degree mechanical hand.Manipulator can vertically move up and down, and also can make gyroscopic movement.
Preferably, system also comprises: the wind circulation filter, be arranged in said conveyer and said technique unit top, and be used to guarantee to reach the clean environment requirement of semiconductor technology.Each technique unit is all covered by the wind circulation filter.
Preferably, said wind circulation filter comprises double-ply laminar texture at least.
Preferably, said wind circulation filter is the side air intake or goes up air intake.
Preferably, system also comprises: energy storage cabinet, comprise the technology soup, process gas and power supply power, be positioned at system the rear end or the bottom.
(3) beneficial effect
The utility model passes through the technique unit layered arrangement; Reduced the floor area of system effectively; The utility model also through use that manipulator is matched with guide rail, has reduced the quantity of manipulator and the number of internal storage unit, thereby can cost-cutting; The utility model can reduce the sheet time of sending simultaneously, improves output.
Description of drawings
Fig. 1 transports the structural representation of system for semiconductor crystal wafer described in the utility model embodiment;
Fig. 2 transports the birds-eye view of system for semiconductor crystal wafer described in the utility model embodiment;
Fig. 3 transports the inner structure scheme drawing of system for semiconductor crystal wafer described in the utility model embodiment;
Fig. 4 transports the workflow diagram of system for semiconductor crystal wafer described in the utility model embodiment.
The specific embodiment
Below in conjunction with accompanying drawing and embodiment, the specific embodiment of the utility model is described in further detail.Following examples are used to explain the utility model, but are not used for limiting the scope of the utility model.
Shown in Fig. 1-3; The described semiconductor crystal wafer of the utility model transports system; Comprise: at least two wafer load ports that are used to carry wafer storage box 41, at least two technique units 2, and be used to pick up wafer and put into the conveyer 3 of said technique unit 2; Preferably, said wafer load port 1 is arranged in a straight line.Wherein, said technique unit 2 comprises double-ply laminar texture at least.Preferably, the said technique unit 2 in each layer is arranged in a straight line, and parallel with said wafer load port 1.
Preferably, said conveyer 3 comprises: at least one manipulator 5 and at least one guide rail 6, said manipulator is used for picking up wafer through moving along said guide rail 6.For example: adopt a manipulator 5 and a guide rail 6.
Preferably, said guide rail 6 horizontal arrangement, and the arrangement mode at the shape of its track and said wafer load port 1 adapts.The shape of the track of guide rail 6 is with a plurality of identical at the spread geometry with the wafer load port 1 of one deck, so that manipulator 5 picks and places wafer.
Preferably, guide rail 6 is a line slideway.And along continuous straight runs is parallel with the wafer load port 1 that is arranged in a straight line.
Preferably, said manipulator 5 is a both arms multi freedom degree mechanical hand.Manipulator 5 can vertically move up and down, and also can make gyroscopic movement.
Preferably, system also comprises: wind circulation filter 7, be arranged in said conveyer 3 and said technique unit 2 tops, and be used to guarantee to reach the clean environment requirement of semiconductor technology.Each technique unit 2 is all covered by wind circulation filter 7.
Preferably, said wind circulation filter 7 comprises double-ply laminar texture at least, and preferably, the said wind circulation filter 7 in each layer is arranged in a straight line.
Preferably, said wind circulation filter 7 is the side air intake or goes up air intake.
Preferably, system also comprises: energy storage cabinet 8, comprise technology soup, process gas and power supply power, and be positioned at the rear end or the bottom of system.
As shown in Figure 4, the working process of the utility model:
A: the wafer storage box 4 from outside factory of system end is accepted at wafer load port 1;
B: manipulator 5 is adjusted its positions along guide rail 6 as required, and its arm is stretched to 4 extractings of wafer storage box or places wafer;
C: manipulator 5 turns to technique unit 2, along guide rail 6 its positions of adjustment, then its arm is stretched to technique unit 2 and places or grasping silicon wafer as required.
Above embodiment only is used to explain the utility model; And be not the restriction to the utility model; The those of ordinary skill in relevant technologies field under the situation of spirit that does not break away from the utility model and scope, can also be made various variations and modification; Therefore all technical schemes that are equal to also belong to the category of the utility model, and the scope of patent protection of the utility model should be defined by the claims.
Claims (8)
1. a semiconductor crystal wafer transports system; It is characterized in that; Comprise: at least two wafer load port (1), at least two technique units (2) that are used to carry wafer storage box (4), and be used to pick up wafer and put into the conveyer (3) of said technique unit (2); Wherein, said technique unit (2) comprises double-ply laminar texture at least.
2. semiconductor crystal wafer as claimed in claim 1 transports system, it is characterized in that, said conveyer (3) comprising: at least one manipulator (5) and at least one guide rail (6).
3. semiconductor crystal wafer as claimed in claim 2 transports system, it is characterized in that, and said guide rail (6) horizontal arrangement, and the arrangement mode at the shape of its track and said wafer load port (1) adapts.
4. semiconductor crystal wafer as claimed in claim 2 transports system, it is characterized in that, said manipulator (5) is a both arms multi freedom degree mechanical hand.
5. according to claim 1 or claim 2 semiconductor crystal wafer transports system, it is characterized in that, also comprises: wind circulation filter (7) is arranged in said conveyer (3) and said technique unit (2) top.
6. semiconductor crystal wafer as claimed in claim 5 transports system, it is characterized in that, said wind circulation filter (7) comprises double-ply laminar texture at least.
7. semiconductor crystal wafer as claimed in claim 5 transports system, it is characterized in that, said wind circulation filter (7) is the side air intake or goes up air intake.
8. semiconductor crystal wafer as claimed in claim 1 transports system, it is characterized in that, also comprises: energy storage cabinet (8), comprise the technology soup, process gas and power supply power, be positioned at system the rear end or the bottom.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 201120361308 CN202296364U (en) | 2011-09-23 | 2011-09-23 | Semiconductor wafer conveying system |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 201120361308 CN202296364U (en) | 2011-09-23 | 2011-09-23 | Semiconductor wafer conveying system |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN202296364U true CN202296364U (en) | 2012-07-04 |
Family
ID=46365305
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN 201120361308 Expired - Lifetime CN202296364U (en) | 2011-09-23 | 2011-09-23 | Semiconductor wafer conveying system |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN202296364U (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102332418A (en) * | 2011-09-23 | 2012-01-25 | 北京七星华创电子股份有限公司 | Conveying system of semiconductor wafers |
| CN104617025A (en) * | 2015-01-12 | 2015-05-13 | 北京七星华创电子股份有限公司 | Multi-cavity stack wafer processing apparatus and wafer processing method |
| CN113257723A (en) * | 2021-07-08 | 2021-08-13 | 北京北方华创微电子装备有限公司 | Semiconductor processing equipment |
-
2011
- 2011-09-23 CN CN 201120361308 patent/CN202296364U/en not_active Expired - Lifetime
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102332418A (en) * | 2011-09-23 | 2012-01-25 | 北京七星华创电子股份有限公司 | Conveying system of semiconductor wafers |
| CN104617025A (en) * | 2015-01-12 | 2015-05-13 | 北京七星华创电子股份有限公司 | Multi-cavity stack wafer processing apparatus and wafer processing method |
| CN113257723A (en) * | 2021-07-08 | 2021-08-13 | 北京北方华创微电子装备有限公司 | Semiconductor processing equipment |
| CN113257723B (en) * | 2021-07-08 | 2022-04-22 | 北京北方华创微电子装备有限公司 | Semiconductor processing equipment |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| CX01 | Expiry of patent term |
Granted publication date: 20120704 |
|
| CX01 | Expiry of patent term |