CN202268337U - Loading device and plasma processing equipment with loading device - Google Patents
Loading device and plasma processing equipment with loading device Download PDFInfo
- Publication number
- CN202268337U CN202268337U CN2011203542066U CN201120354206U CN202268337U CN 202268337 U CN202268337 U CN 202268337U CN 2011203542066 U CN2011203542066 U CN 2011203542066U CN 201120354206 U CN201120354206 U CN 201120354206U CN 202268337 U CN202268337 U CN 202268337U
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- cover plate
- hole
- loading attachment
- protuberance
- loading device
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Abstract
The utility model provides a loading device and plasma processing equipment with the loading device. The loading device comprises a tray and a cover plate, wherein the cover plate comprises a first cover plate which is made of a metal material and a second cover plate which is made of an anti-etching insulating material; the first cover plate is fixed on the tray; the second cover plate covers the first cover plate; a first through hole and a second through hole which pass through the first cover plate and the second cover plate in the thickness direction are formed in the first cover plate and the second cover plate; and central lines of the first through hole and the second through hole are coincided. The loading device is difficult to damage during loading of a processed workpiece and high in installation efficiency, and cannot influence a radio frequency system and a plasma atmosphere. Moreover, a reaction chamber can be prevented from being polluted by metal ions, so that the difficulty in cleaning of the reaction chamber can be reduced, and cleaning efficiency is improved.
Description
Technical field
The utility model relates to microelectronics technology, is specifically related to a kind of loading attachment and uses the plasma processing device of this loading attachment.
Background technology
Plasma processing device is the common equipment of processing semiconductor device; It is in carrying out such as technical processs such as etching, sputter and chemical vapour deposition (CVD)s; The general loading attachment that adopts supports and workpiece to be machined such as fixed wafer, and it is transported in the reaction chamber processes.In order to improve the production efficiency of plasma processing device, reduce production costs, generally workpieces to be machined such as a plurality of wafers are fixed on large-sized loading attachment simultaneously, thereby realize workpieces to be machined such as a plurality of wafers are carried out technology simultaneously.
Fig. 1 is the profile of existing loading attachment.See also Fig. 1, loading attachment comprises pallet 1, cover plate 2 and trip bolt 4.Wherein, pallet 1 is provided with a plurality of mounting grooves 6, and wafer 3 is placed in the mounting groove 6.Be provided with sealing ring 7 in submarginal position, the bottom of mounting groove 6, sealing ring 7, pallet 1 and wafer 3 form a seal cavity 5.Be provided with the pore 8 of transmission refrigerating gas in seal cavity 5 in the bottom of each mounting groove 6, can regulate the temperature of wafer 3 through refrigerating gas.Be provided with on the cover plate 2 with pallet 1 on the corresponding through hole 9 of quantity and position of mounting groove 6.During use, wafer 3 is placed in the mounting groove 6, with trip bolt 4 cover plate 2 and pallet 1 is fixed together then, and wafer 3 is fixed between pallet 1 and the cover plate 2 by cover plate 2 parts of through hole 9 peripheries.Usually, cover plate 2 adopts metal material to make, still; Because the cover plate of metal material has good electrical conductivity, it is exposed to the stability that not only can influence radio system and plasma atmosphere in the plasma atmosphere, and easily by plasma etching; This not only reduces the useful life of cover plate 2; And can make reaction chamber by the pollution of metal ion, thus increase the difficulty of cleaning reaction chamber, and contaminant metal ions can influence the crudy of plasma processing device.
For this reason; People adopt quartz or ceramic material cover plate 2, because quartz or pottery are insulating material, cover plate 2 can not exert an influence to radio system and plasma atmosphere; But also having anti-etching preferably performance, this can be avoided reaction chamber by metal ion pollution.But in use there is following problem in this cover plate 2: promptly, with trip bolt 4 securing cover plates 2 and pallet 1 time, if active force is bigger, cover plate 2 is chipping easily; If active force is less, then can't wafer 3 be securely fixed between pallet 1 and the cover plate 2.Therefore, not only increased the installation difficulty of wafer 3, and reduced the efficiency of loading of loading attachment by the cover plate 2 of quartz or ceramic material.
The utility model content
For solving the deficiency of above-mentioned prior art; The utility model provides a kind of loading attachment and plasma processing device, and it not only can not exert an influence to radio system and plasma atmosphere, and can avoid producing metal ion pollution; And not fragile, installation effectiveness is high.
For the purpose that realizes the utility model provides a kind of loading attachment; Comprise pallet and cover plate; Said cover plate comprises first cover plate of being processed by metal material and second cover plate of being processed by anti-etching insulating material, and said first cover plate is fixed on the said pallet, and said second cover plate covers said first cover plate; On said first cover plate and second cover plate, be respectively equipped with first through hole and second through hole that run through its thickness, and the central lines of said first through hole and second through hole.
Preferably, on said second cover plate face relative, be provided with the positioning unit that is used to locate said second cover plate with said first cover plate.
Preferably, said positioning unit comprises and is arranged on said second cover plate and the recess on the face relative with said first cover plate, and is arranged on said first cover plate and the protuberance on the face relative with said second cover plate, and said recess matches with said protuberance.
Preferably, said protuberance is the securing member of fixing said pallet and said first cover plate, and the top of said securing member is higher than the upper surface of said first cover plate.
Preferably; Said positioning unit comprises and is arranged on said second cover plate and the protuberance on the face relative with said first cover plate; And be arranged on said first cover plate and the recess on the face relative with said second cover plate, and said recess matches with said protuberance.
Preferably, said second through hole is coaxial with said first through hole.
Preferably, the aperture of said first through hole increases from the bottom to top gradually.
Preferably, on the hole wall of said first through hole, be provided with resistant layer.
Preferably, the aperture of said second through hole increases from the bottom to top gradually.
The utility model also provides a kind of plasma processing device, comprises reaction chamber and is used for the loading attachment to reaction chamber indoor transmissions workpiece to be machined, the said loading attachment that said loading attachment adopts the utility model to provide.
The utlity model has following beneficial effect:
The loading attachment that the utility model provides; Its cover plate comprises first cover plate and second cover plate; First cover plate of making by metal material can be fixed on workpiece to be machined between the pallet and first cover plate easily; And first cover plate is not fragile in the process of fixing workpiece to be machined, thus raising installation effectiveness that can loading attachment.And; Second cover plate of processing by the insulating material that covers the first cover plate upper surface by anti-etching; Can avoid first cover plate to be directly exposed in the plasma atmosphere, this has not only guaranteed the stability of radio system and plasma atmosphere, and can avoid the metal ion pollution reaction chamber; Thereby reduced the cleaning difficulty of reaction chamber, improved the efficient of cleaning.
The plasma processing device that the utility model provides; First cover plate that its above-mentioned loading attachment that adopts is made by metal material; Can easily workpiece to be machined be fixed between the pallet and first cover plate; And first cover plate is not fragile in the process of fixing workpiece to be machined, thereby improved installation effectiveness.And; Second cover plate of processing by the insulating material that covers the first cover plate upper surface by anti-etching; Can avoid first cover plate to be directly exposed in the plasma atmosphere, this has not only guaranteed the stability of radio system and plasma atmosphere, and can avoid the metal ion pollution reaction chamber; Thereby reduced the cleaning difficulty of reaction chamber, improved the efficient of cleaning.
Description of drawings
Fig. 1 is the profile of existing loading attachment;
The part sectioned view of the loading attachment that Fig. 2 provides for the utility model; And
The part sectioned view of the loading attachment of the variant embodiment that Fig. 3 provides for the utility model.
Embodiment
For making those skilled in the art understand the technical scheme of the utility model better, the loading attachment and the plasma processing device that come the utility model is provided below in conjunction with accompanying drawing carry out sets forth in detail.
For the ease of describing, present embodiment be pallet horizontal positioned with loading attachment as datum level, the upper surface of first cover plate is meant the face that first cover plate makes progress.The aperture of first through hole increases gradually from the bottom to top and is meant when being positioned over loading attachment on the horizontal plane that the aperture of first through hole is increased to its upper surface by the lower surface of first cover plate gradually.Similarly, the aperture of second through hole increases gradually from the bottom to top and is meant when being positioned over loading attachment on the horizontal plane that the aperture of second through hole is increased to its upper surface by the lower surface of second cover plate gradually.
The part sectioned view of the loading attachment that Fig. 2 provides for the utility model.See also Fig. 2, loading attachment comprises pallet 10 and cover plate, and cover plate comprises first cover plate 20 and second cover plate 30, and wherein, first cover plate 20 is connected with pallet 10, and second cover plate 30 covers the upper surface of first cover plate 20.
Preferably, the aperture of first through hole 21 increases from the bottom to top gradually, can reduce the influence of first through hole, 21 peripheral part article on plasma bodies like this, thereby can improve the processing uniformity of workpiece to be machined marginal portion.
In the present embodiment, on second cover plate 30 face relative, be provided with the positioning unit that is used to locate second cover plate 30 with first cover plate 20.Particularly; Be provided with recess 32 on second cover plate 30 and with first cover plate, 20 facing surfaces, that is, be provided with recess 32 at the lower surface of second cover plate 30; Corresponding; Be provided with the protuberance 22 that cooperates with recess 32 on first cover plate 20 and with second cover plate, 30 facing surfaces, that is, protuberance 22 be set at the upper surface of first cover plate 20; Not only can make second cover plate 30 be positioned at the upper surface of first cover plate 20 exactly through recess 32 and protuberance 22, and can prevent that second cover plate 30 from skew or landing taking place in the moving process of loading attachment.
Certainly; Positioning unit also can with recess and protuberance position transposing is set, that is, on second cover plate 30 and on the face relative recess is being set with first cover plate 20; Accordingly; On first cover plate 20 and on the face relative protuberance is being set with second cover plate 30, recess and protuberance the location that the position does not influence second cover plate 20 is set, can reach the purpose of the utility model equally.
In the present embodiment, the aperture of second through hole 31 increases from the bottom to top gradually, and promptly second through hole 31 is a bellmouth, can reduce the influence of second through hole, 31 peripheral part article on plasma bodies like this, thereby can improve the processing uniformity of workpiece to be machined marginal portion.
Need to prove, in the present embodiment, the bellmouth that second through hole, 31 employing apertures increase from the bottom to top gradually, but the utility model is not limited thereto, and the aperture of second through hole 31 also can be changeless cylindrical hole.When second through hole 31 adopted bellmouth, its minimum-value aperture equated with the maximum diameter of hole of first through hole 21, covers the upper surface of first cover plate 20 to guarantee second cover plate 30.When second through hole 31 adopted cylindrical hole, its aperture equated with the maximum diameter of hole of first through hole 21.
As a modification of present embodiment, the part sectioned view of the loading attachment of the variant embodiment that Fig. 3 provides for the utility model.See also Fig. 3; The top of the screw 51 that first cover plate 20 and pallet 10 are fixed together is than the upper surface height of first cover plate 20; That is, the part of upper surface that screw 51 is exceeded first cover plate 20 is as the protuberance in the positioning unit, and it is matched with recess 33 on second cover plate 30; Thereby make second cover plate 30 be positioned at the upper surface of first cover plate 20 exactly; To prevent that second cover plate 30 from skew or landing taking place in the moving process of loading attachment, this set mode has promptly been simplified the structure of first cover plate 20, thereby has simplified the structure of loading attachment; Reduce the processing cost of first cover plate 20 again, thereby reduced the processing cost of loading attachment.
In sum; The loading attachment that the utility model provides; Cover plate comprises first cover plate and second cover plate; First cover plate of making by metal material can be fixed on workpiece to be machined between the pallet and first cover plate easily, and first cover plate is not fragile in the process of fixing workpiece to be machined, thereby can improve installation effectiveness.And; Second cover plate of processing by the insulating material that covers the first cover plate upper surface by anti-etching; Can avoid first cover plate to be directly exposed in the plasma atmosphere, this has not only guaranteed the stability of radio system and plasma atmosphere, and can avoid the metal ion pollution reaction chamber; Thereby reduced the cleaning difficulty of reaction chamber, improved the efficient of cleaning.
Present embodiment also provides a kind of plasma processing device, comprises reaction chamber, and is used for the loading attachment to reaction chamber indoor transmissions workpiece to be machined, wherein, and the loading attachment that loading attachment has adopted the foregoing description to provide.
The plasma processing device that present embodiment provides is because its loading attachment that has adopted the foregoing description to provide not only can load, unload workpiece to be machined easily; And not fragile in the loading and unloading process, thus the efficient of loading attachment improved, and; This loading attachment has not only guaranteed the stability of radio system and plasma atmosphere; And can avoid the metal ion pollution reaction chamber, thus reduced the cleaning difficulty of reaction chamber, improved the efficient of cleaning.
It is understandable that above execution mode only is the illustrative embodiments that adopts for the principle that the utility model is described, yet the utility model is not limited thereto.For the one of ordinary skilled in the art, under the situation of spirit that does not break away from the utility model and essence, can make various modification and improvement, these modification and improvement also are regarded as the protection range of the utility model.
Claims (10)
1. loading attachment; Comprise pallet and cover plate, it is characterized in that said cover plate comprises first cover plate of being processed by metal material and second cover plate of being processed by anti-etching insulating material; Said first cover plate is fixed on the said pallet; Said second cover plate covers said first cover plate, on said first cover plate and second cover plate, is respectively equipped with first through hole and second through hole that run through its thickness, and the central lines of said first through hole and second through hole.
2. loading attachment according to claim 1 is characterized in that, on said second cover plate face relative with said first cover plate, is provided with the positioning unit that is used to locate said second cover plate.
3. loading attachment according to claim 2; It is characterized in that; Said positioning unit comprises and is arranged on said second cover plate and the recess on the face relative with said first cover plate; And being arranged on said first cover plate and the protuberance on the face relative with said second cover plate, said recess matches with said protuberance.
4. loading attachment according to claim 3 is characterized in that, said protuberance is the securing member of fixing said pallet and said first cover plate, and the top of said securing member is higher than the upper surface of said first cover plate.
5. want 2 described loading attachments according to right; It is characterized in that; Said positioning unit comprises and is arranged on said second cover plate and the protuberance on the face relative with said first cover plate; And be arranged on said first cover plate and the recess on the face relative with said second cover plate, and said recess matches with said protuberance.
6. loading attachment according to claim 1 is characterized in that, said second through hole is coaxial with said first through hole.
7. loading attachment according to claim 1 is characterized in that, the aperture of said first through hole increases from the bottom to top gradually.
8. loading attachment according to claim 1 is characterized in that, on the hole wall of said first through hole, is provided with resistant layer.
9. loading attachment according to claim 1 is characterized in that, the aperture of said second through hole increases from the bottom to top gradually.
10. a plasma processing device comprises reaction chamber and is used for the loading attachment to reaction chamber indoor transmissions workpiece to be machined, it is characterized in that, said loading attachment adopts any described loading attachment of claim 1-9.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2011203542066U CN202268337U (en) | 2011-09-20 | 2011-09-20 | Loading device and plasma processing equipment with loading device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2011203542066U CN202268337U (en) | 2011-09-20 | 2011-09-20 | Loading device and plasma processing equipment with loading device |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN202268337U true CN202268337U (en) | 2012-06-06 |
Family
ID=46159121
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN2011203542066U Expired - Lifetime CN202268337U (en) | 2011-09-20 | 2011-09-20 | Loading device and plasma processing equipment with loading device |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN202268337U (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN104752129A (en) * | 2013-12-30 | 2015-07-01 | 北京北方微电子基地设备工艺研究中心有限责任公司 | Tray assembly and etching device |
| CN105576101A (en) * | 2014-10-10 | 2016-05-11 | 北京北方微电子基地设备工艺研究中心有限责任公司 | Cover plate and carrying device |
| CN115106671A (en) * | 2022-08-22 | 2022-09-27 | 度亘激光技术（苏州）有限公司 | Packaging method and packaging clamp |
-
2011
- 2011-09-20 CN CN2011203542066U patent/CN202268337U/en not_active Expired - Lifetime
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN104752129A (en) * | 2013-12-30 | 2015-07-01 | 北京北方微电子基地设备工艺研究中心有限责任公司 | Tray assembly and etching device |
| CN104752129B (en) * | 2013-12-30 | 2018-01-19 | 北京北方华创微电子装备有限公司 | Pallet component and etching apparatus |
| CN105576101A (en) * | 2014-10-10 | 2016-05-11 | 北京北方微电子基地设备工艺研究中心有限责任公司 | Cover plate and carrying device |
| CN105576101B (en) * | 2014-10-10 | 2018-07-06 | 北京北方华创微电子装备有限公司 | A kind of cover board and bogey |
| CN115106671A (en) * | 2022-08-22 | 2022-09-27 | 度亘激光技术（苏州）有限公司 | Packaging method and packaging clamp |
| CN115106671B (en) * | 2022-08-22 | 2022-11-25 | 度亘激光技术（苏州）有限公司 | Packaging method and packaging clamp |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| CP03 | Change of name, title or address | ||
| CP03 | Change of name, title or address |
Address after: 100176 No. 8, Wenchang Avenue, Beijing economic and Technological Development Zone Patentee after: Beijing North China microelectronics equipment Co Ltd Address before: 100176 Beijing economic and Technological Development Zone, Wenchang Road, No. 8, No. Patentee before: Beifang Microelectronic Base Equipment Proces Research Center Co., Ltd., Beijing |
|
| CX01 | Expiry of patent term | ||
| CX01 | Expiry of patent term |
Granted publication date: 20120606 |