CN201713600U - Heat shield capable of eliminating deposition of volatile matter at outer side of heat shield - Google Patents

Heat shield capable of eliminating deposition of volatile matter at outer side of heat shield Download PDF

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Publication number
CN201713600U
CN201713600U CN201020265727XU CN201020265727U CN201713600U CN 201713600 U CN201713600 U CN 201713600U CN 201020265727X U CN201020265727X U CN 201020265727XU CN 201020265727 U CN201020265727 U CN 201020265727U CN 201713600 U CN201713600 U CN 201713600U
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CN
China
Prior art keywords
heat shielding
heat shield
heat
gas port
volatile matter
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
CN201020265727XU
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Chinese (zh)
Inventor
张志强
黄振飞
黄强
袁为进
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Trina Solar Co Ltd
Original Assignee
Changzhou Trina Solar Energy Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Changzhou Trina Solar Energy Co Ltd filed Critical Changzhou Trina Solar Energy Co Ltd
Priority to CN201020265727XU priority Critical patent/CN201713600U/en
Application granted granted Critical
Publication of CN201713600U publication Critical patent/CN201713600U/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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Abstract

The utility model relates to the technical field of silicon single-crystal furnace equipment, in particular to a heat shield capable of eliminating deposition of a volatile matter at the outer side of the heat shield. The heat shield is provided with an air vent to lead little protection gas to enter the top space between the heat shield and a thermostat container, improving the air flow structure in the gap between the heat shield and the thermostat container, avoiding gas containing the volatile matter to detain in the position and avoiding deposition of the volatile matter in the position.

Description

Can eliminate fugitive constituent in the sedimentary heat shielding in the heat shielding outside
Technical field
The utility model relates to the monocrystal stove equipment technical field, and particularly a kind of fugitive constituent of eliminating is in the sedimentary heat shielding in the heat shielding outside.
Background technology
Czochralski method is a CZ pulling of crystals method; pass through resistive heating; with the unmelted polycrystalline silicon that is contained in the quartz crucible; and maintenance is a little more than the temperature of silicon fusing point; under the protection of rare gas element; through steps such as seeding, shouldering, commentaries on classics shoulder, isodiametric growth, ending, taking-up crystal, finish the growth of silicon single crystal.Higher because of the fusing point of silicon, in stretching monocrystalline process, need to expend a large amount of electric energy.Therefore, from cutting down the consumption of energy and organizing the consideration of gas flowfield in the single crystal growing furnace, now, the monocrystalline thermal field has been introduced the heat shielding device substantially.The open thermal field of comparing, energy consumption is reduced greatly, and the life-span of thermal field component also is improved.Simultaneously,, increased pulling rate to a certain extent, improved production capacity, shortened the cycle because the introducing of heat shielding device has increased the crystal longitudinal temperature gradient.
But because the problem of moving towards of air-flow, air-flow is along flowing on the heat shielding lateral, turns back downwards after walking around the quartz crucible wall, along in the gap between crucible and the heat-preservation cylinder, flows downward.Thereby near the headspace between heat shielding and the heat-preservation cylinder, owing to there is not the air outlet, form one or more air-flow whirlpools, the gas that causes carrying volatile matter was detained in this director's phase, can not in time drain.Thereby make fugitive constituent be deposited on the heat shielding outside, during reality was produced, when tearing the stove cleaning open, the top section outside the heat shielding of being everlasting was seen pale yellow powder more or less, was the result of the oxidate of silicon in the heat shielding outside.
The utility model content
Technical problem to be solved in the utility model is: improve the air current flow form in the space between heat shielding and the last heat-preservation cylinder, the gas of avoiding being rich in fugitive constituent is detained at this place.
The technical scheme that its technical problem that solves the utility model adopts is: a kind of fugitive constituent of eliminating is offered gas port in the sedimentary heat shielding in the heat shielding outside on the top of heat shielding.
Gas port is along heat shielding circumference uniform distribution, and gas port equates with the distance of heat shielding upper edge.
The distance of gas port and heat shielding upper edge is 30~50mm; Gas port is circle or Polygons, and circulation area is 20-5Qmm 2The number of gas port is 6~36.
The beneficial effects of the utility model are: by offer gas port on heat shielding; guiding small portion shielding gas enters the headspace between heat shielding and the heat-preservation cylinder; improve the air flow structure in heat shielding and the heat-preservation cylinder gap, the gas of avoiding being rich in fugitive constituent is in this place is detained and fugitive constituent is avoided at this place deposition.
Description of drawings
Below in conjunction with drawings and Examples the utility model is further specified;
The structure vertical view of heat shielding in Fig. 1 the utility model;
The sectional view of heat shielding in Fig. 2 the utility model;
Fig. 3 tradition heat shielding and the utility model Flow Field Distribution in use;
Wherein: 1, furnace chamber, 2, heat-preservation cylinder, 3, crucible, 3-1. plumbago crucible, 3-2. quartz crucible, 4, gas port, 5, the heat shielding back up pad, 6 heat shieldings, 6-1. heat shielding skin, 6-2. heat shielding internal layer, 6-3. lagging material.
Embodiment
A kind of fugitive constituent of eliminating is as illustrated in fig. 1 and 2 offered gas port 4 in the sedimentary heat shielding in the heat shielding outside on the top of heat shielding.
A kind of single crystal growing furnace that adopts this heat shielding; comprise furnace chamber 1; has heat-preservation cylinder 2 in the furnace chamber 1; heat shielding device and crucible 3; heat-preservation cylinder 2 is enclosed in crucible 1 outside; the heat shielding appliance cover is located at and forms closed thermal field on the heat-preservation cylinder 2; the shielding gas that feeds furnace chamber 1 top enters crucible 3 downwards by the heat shielding device; upwards flow into the incubation cavity of heat shielding device and formation that heat-preservation cylinder 2 encloses then by the gap between heat shielding device and the crucible 3; on heat shielding 6, offer gas port 4; shielding gas directly enters incubation cavity top by gas port 4, and the both ends open of gas port 4 is higher than crucible 3 upper edges.
As shown in Figure 1, 2, the heat shielding device comprises heat shielding back up pad 5 and the heat shielding 6 that is erected on the heat shielding back up pad 5.Heat shielding 6 is made of the lagging material 6-3 between heat shielding internal layer 6-2, the outer 6-1 of heat shielding and the heat shielding ectonexine.Gas port 4 is along heat shielding 6 circumference uniform distribution.Gas port 4 is 30~50mm with the distance of heat shielding 6 upper edges; Gas port 4 is circle or Polygons, and circulation area is 20-50mm 2The number of gas port 4 is 6~36.
Crucible 3 is divided into plumbago crucible 3-1 and sits the quartz crucible 3-2 that is located in the plumbago crucible 3-1, and the silicon material is placed in the quartz crucible 3-2.
Because shielding gas is subjected to the effect of frictional force when the space of outer 6-1 of the heat shielding of flowing through and quartz crucible 3-2, pressure reduces, so there is gas pressure difference in gas port 4 two ends.Under the effect of pressure reduction, the small portion shielding gas directly enters top, space between outer 6-1 of heat shielding and the heat-preservation cylinder 2 by gas port 4, flows downward by the gap between plumbago crucible 3-1 and the heat-preservation cylinder 2 then.Thereby improved the air flow structure at this place, the gas of avoiding being rich in fugitive constituent is detained at this place.
Fig. 3 has provided the comparison of using the flow field structure simulation analysis in traditional heat shielding and the two kinds of monocrystalline thermal fields of the present utility model, and the left side is traditional heat shielding, and the right side is the utility model heat shielding.Use the thermal field of traditional heat shielding, have tangible air-flow vortex in the space between heat shielding 6 and heat-preservation cylinder 2.And use thermal field of the present utility model, the air-flow between heat shielding 6 and the heat-preservation cylinder 2 not to have vortex, flow downward with the gap through plumbago crucible 3-1 and heat-preservation cylinder 2 after gas from quartz crucible 3-2 and the outer 6-1 of heat shielding gap mixes from the gas of gas port 4.

Claims (3)

1. can eliminate fugitive constituent in the sedimentary heat shielding in the heat shielding outside for one kind, it is characterized in that: offer gas port (4) on the top of described heat shielding (6).
2. the fugitive constituent of eliminating according to claim 1 is in the sedimentary heat shielding in the heat shielding outside, and it is characterized in that: described gas port (4) is along heat shielding (6) circumference uniform distribution, and all gas ports (4) equate with the distance of heat shielding (6) upper edge.
3. the fugitive constituent of eliminating according to claim 2 is in the sedimentary heat shielding in the heat shielding outside, and it is characterized in that: described gas port (4) is 30~50mm with the distance of heat shielding (6) upper edge; Gas port (4) is circle or Polygons, and circulation area is 20-50mm 2The number of gas port (4) is 6~36.
CN201020265727XU 2010-07-19 2010-07-19 Heat shield capable of eliminating deposition of volatile matter at outer side of heat shield Expired - Fee Related CN201713600U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN201020265727XU CN201713600U (en) 2010-07-19 2010-07-19 Heat shield capable of eliminating deposition of volatile matter at outer side of heat shield

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN201020265727XU CN201713600U (en) 2010-07-19 2010-07-19 Heat shield capable of eliminating deposition of volatile matter at outer side of heat shield

Publications (1)

Publication Number Publication Date
CN201713600U true CN201713600U (en) 2011-01-19

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Family Applications (1)

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CN201020265727XU Expired - Fee Related CN201713600U (en) 2010-07-19 2010-07-19 Heat shield capable of eliminating deposition of volatile matter at outer side of heat shield

Country Status (1)

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CN (1) CN201713600U (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2012009900A1 (en) * 2010-07-19 2012-01-26 常州天合光能有限公司 Heat field structure of single crystal furnace for removing the deposition of volatile components on the exterior of heat shield

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2012009900A1 (en) * 2010-07-19 2012-01-26 常州天合光能有限公司 Heat field structure of single crystal furnace for removing the deposition of volatile components on the exterior of heat shield

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C14 Grant of patent or utility model
GR01 Patent grant
CP01 Change in the name or title of a patent holder
CP01 Change in the name or title of a patent holder

Address after: Solar photovoltaic industry park Tianhe Road 213031 north of Jiangsu Province, Changzhou City, No. 2

Patentee after: TRINA SOLAR Co.,Ltd.

Address before: Solar photovoltaic industry park Tianhe Road 213031 north of Jiangsu Province, Changzhou City, No. 2

Patentee before: trina solar Ltd.

CP03 Change of name, title or address
CP03 Change of name, title or address

Address after: Solar photovoltaic industry park Tianhe Road 213031 north of Jiangsu Province, Changzhou City, No. 2

Patentee after: trina solar Ltd.

Address before: 213031, No. 2, Tianhe Road, Xinbei Industrial Park, Jiangsu, Changzhou

Patentee before: CHANGZHOU TRINA SOLAR ENERGY Co.,Ltd.

CF01 Termination of patent right due to non-payment of annual fee
CF01 Termination of patent right due to non-payment of annual fee

Granted publication date: 20110119

Termination date: 20180719