CN201670872U - Rectangular plane magnetic control target - Google Patents
Rectangular plane magnetic control target Download PDFInfo
- Publication number
- CN201670872U CN201670872U CN2010201863513U CN201020186351U CN201670872U CN 201670872 U CN201670872 U CN 201670872U CN 2010201863513 U CN2010201863513 U CN 2010201863513U CN 201020186351 U CN201020186351 U CN 201020186351U CN 201670872 U CN201670872 U CN 201670872U
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- CN
- China
- Prior art keywords
- magnetic control
- rectangular plane
- target
- plane magnetic
- control target
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
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Abstract
The utility model discloses a rectangular plane magnetic control target, which comprises a target material body, and is characterized in that the two ends of the target material body are indented inward to form an avoidance step. The utility model relates to the technical field of a sputter coating device, in particular to an improved rectangular plane magnetic control target structure. The utility model solves the problem that during the existing magnetic control process of the sputter coating film, neutral target atom (or molecule) is easy to deposit between the cathode and the anode of the rectangular plane magnetic control target to cause the short circuit. The utility model effectively increases the distance between the cathode and the anode of the rectangular plane magnetic control target through the avoidance step formed by the inward indenting in the target, can avoid that a conductive film is formed between the cathode and the anode of the rectangular plane magnetic control target, saves the power cost and the device downtime caused by frequent maintenance of the target material and improves production efficiency.
Description
Technical field
The utility model relates to the sputtering coating equipment technical field, particularly relates to a kind of follow-on rectangular plane magnetic control target structure.
Background technology
At present, the application of thin film technique has spreaded all over the national economy every field.Prepare at home in the plated film field, usually the main flow of magnetron sputtering as sputtering technology, its major cause is exactly " at a high speed ", " low temperature " characteristics of magnetron sputtering, and it can deposit the film of any plating material on any base material.The rectangular plane magnetic control target that existing market is used, as depicted in figs. 1 and 2, the target surface of rectangular plane magnetic control target is in the orthogonal magnetic field, and field direction is parallel with target surface, forms the toroidal magnetic field.After loading certain volts DS between anode and the negative electrode, just produce discharge, the negative electrode of the target body 1 of discharge generation argon ion bombardment rectangular plane magnetic control target, the target of sputter deposits on the substrate, forms film.But in actual use; target generation sputter; in sputtering particle; neutral target atom (or molecule) is being deposited on the film forming while on the substrate; also very easily be deposited between the anode of rectangular plane magnetic control target and negative electrode and form conductive film; cause the generation of short circuit phenomenon, cause unnecessary shutdown maintenance in process of production, and in maintenance process, consume a large amount of labour costs and equipment cost.
The utility model content
In order to solve in the existing magnetron sputtering thin-film process, neutral target atom (or molecule) is deposited on easily simultaneously between the anode of rectangular plane magnetic control target and negative electrode and forms conductive film, the problem that causes short circuit phenomenon to take place, it is a kind of simple in structure that the utility model provides, can increase target and anode spacing from rectangular plane magnetic control target.
In order to achieve the above object, the technical scheme that the utility model adopted is:
A kind of rectangular plane magnetic control target comprises the target body, it is characterized in that: be recessed to form in the inward at both ends of target body and dodge step.
The beneficial effects of the utility model are: rectangular plane magnetic control target sunken inside of the present utility model forms dodges step; rectangular plane magnetic control target target cathode and positive interpolar distance have effectively been increased; can avoid forming conductive film between rectangular plane magnetic control target anode and negative electrode; save power cost and the equipment downtime paid because of the frequent maintenance target, improved production efficiency.
Description of drawings
Fig. 1 is the structural representation of prior art rectangular plane magnetic control target;
Fig. 2 is the structural representation of prior art magnetic control sputtering device;
Fig. 3 is the structural representation of the utility model rectangular plane magnetic control target;
Fig. 4 is the structural representation of the utility model magnetic control sputtering device.
Embodiment
Below in conjunction with accompanying drawing the utility model is further described.
Shown in Fig. 3 and 4, a kind of rectangular plane magnetic control target comprises target body 2, is recessed to form in the inward at both ends of target body 2 and dodges step 3, effectively increased rectangular plane magnetic control target target cathode and positive interpolar distance, avoided forming conductive film between rectangular plane magnetic control target anode and negative electrode.
Show and described ultimate principle of the present utility model and principal character and advantage of the present utility model.The technician of the industry should understand; the utility model is not restricted to the described embodiments; that describes in the foregoing description and the specification sheets just illustrates principle of the present utility model; under the prerequisite that does not break away from the utility model spirit and scope; the utility model also has various changes and modifications, and these changes and improvements all fall in claimed the utility model scope.The claimed scope of the utility model is defined by appending claims and equivalent thereof.
Claims (1)
1. a rectangular plane magnetic control target comprises the target body, it is characterized in that: be recessed to form in the inward at both ends of target body and dodge step.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2010201863513U CN201670872U (en) | 2010-05-11 | 2010-05-11 | Rectangular plane magnetic control target |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2010201863513U CN201670872U (en) | 2010-05-11 | 2010-05-11 | Rectangular plane magnetic control target |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN201670872U true CN201670872U (en) | 2010-12-15 |
Family
ID=43328284
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN2010201863513U Expired - Fee Related CN201670872U (en) | 2010-05-11 | 2010-05-11 | Rectangular plane magnetic control target |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN201670872U (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101928925A (en) * | 2010-05-11 | 2010-12-29 | 赫得纳米科技(昆山)有限公司 | Rectangular plane magnetic control target |
-
2010
- 2010-05-11 CN CN2010201863513U patent/CN201670872U/en not_active Expired - Fee Related
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101928925A (en) * | 2010-05-11 | 2010-12-29 | 赫得纳米科技(昆山)有限公司 | Rectangular plane magnetic control target |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| CF01 | Termination of patent right due to non-payment of annual fee | ||
| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20101215 Termination date: 20180511 |