CN101935822A - Rectangular planar magnetic control target with alternate electromagnetic field - Google Patents
Rectangular planar magnetic control target with alternate electromagnetic field Download PDFInfo
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- CN101935822A CN101935822A CN 201010168812 CN201010168812A CN101935822A CN 101935822 A CN101935822 A CN 101935822A CN 201010168812 CN201010168812 CN 201010168812 CN 201010168812 A CN201010168812 A CN 201010168812A CN 101935822 A CN101935822 A CN 101935822A
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- magnetic control
- control target
- rectangular planar
- electromagnetic field
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Abstract
The invention discloses a rectangular planar magnetic control target with alternate electromagnetic field, relating to the technical field of a sputtering coating device. The rectangular planar magnetic control target comprises a target body, and is characterized by further comprising a magnetic body. The magnetic body is arranged on the upper part of the target body, the magnetic body comprises two sets of electromagnets which are arranged in cross mutually. The invention solves the problems that the limitations of the magnetic field distribution and the horizontal field limitation of the permanent magnet in the rectangular planar magnetic control target of the prior art cause the lower target use ratio as much as about 30%, and the stability of the permanent magnet is poor. The invention provides a rectangular planar magnetic control target having alternate electromagnetic field with simple structure, convenient use and increased use ratio of the target. The use ratio of the target can be enhanced to about 65%, the target cost is reduced, the service life of the target is prolonged and the halt time is shortened. The electromagnet used in the invention can not generate the demagnetization in use, thereby stabilizing the product quality and saving the cost.
Description
Technical field
The present invention relates to the sputtering coating equipment technical field, particularly relate to a kind of alternately rectangular plane magnetic control target structure of electromagnetic field that has.
Background technology
Modern thin film technique is through semicentennial development, and it is used and has spreaded all over the national economy every field.The widespread use in industry-by-industry of the sputtering coating equipment of high-speed low temperature, it can deposit the film of any plating material on any base material.The rectangle plane target that existing market is used, as shown in Figure 1, the magnet of this target adopts permanent magnet (strontium ferrites or aluminium nickel cobalt etc.), and the rectangle plane target structure is simple, highly versatile.But because of the limitation of Distribution of Magnetic Field and horizontal field intensity, shown in Fig. 2 and 3, target utilization is extremely low to be had only about 30%, has wasted cost greatly, and consume a large amount of labor costs and equipment cost in changing maintenance process in the actual use.Permanent magnet in use can produce a kind of degaussing process of gradual change simultaneously, and the quality of product is subjected to the influence of this changes of magnetic field, poor stability in process of production.
Summary of the invention
In order to solve in the prior art limitation of permanent magnet magnetic field distribution and horizontal field intensity in the rectangular plane magnetic control target, cause target utilization lower, the problem of while permanent magnet magnetic less stable, the invention provides a kind of simple in structure, easy to use, can increase the alternately rectangular plane magnetic control target of electromagnetic field that has of target utilization.
In order to achieve the above object, the technical solution adopted in the present invention is:
A kind of have an alternately rectangular plane magnetic control target of electromagnetic field, comprises the target body, and it is characterized in that: also comprise magnet, described magnet is arranged on the target upper part of body, and described magnet comprises two groups of electro-magnet, and two groups of electro-magnet are arranged in a crossed manner mutually.
The invention has the beneficial effects as follows: the present invention is provided with two groups of alternative electro-magnet; start one of them or two electro-magnet by having or not of the sense of current and energising; make the target mean consumption that can interlock; target utilization can rise to about 65%; reduced the target cost, prolongation is changed the target cycle and is reduced stop time.And can change the power in magnetic field according to the size that the difference of product changes electric current, to reach the optimized cost performance of production capacity.Electro-magnet in use can not produce the demagnetization phenomenon, and quality that can stable prod has been saved cost.
Description of drawings
Fig. 1 is the structural representation of permanent magnet in the prior art rectangular plane magnetic control target;
Fig. 2 is a prior art rectangular plane magnetic control target target body construction synoptic diagram;
Fig. 3 is a target body construction synoptic diagram after the consumption of prior art rectangular plane magnetic control target;
Fig. 4 is that rectangular plane magnetic control target of the present invention replaces the electromagnetic field distribution structural representation;
Fig. 5 is that the present invention has the alternately rectangular plane magnetic control target structural representation of electromagnetic field;
Fig. 6 is a target body construction synoptic diagram after the rectangular plane magnetic control target consumption of the present invention.
Embodiment
As shown in the figure, Fig. 1 is the structural representation of permanent magnet in the prior art rectangular plane magnetic control target; Fig. 2 is a prior art rectangular plane magnetic control target target body construction synoptic diagram; Fig. 3 is a target body construction synoptic diagram after the consumption of prior art rectangular plane magnetic control target; Fig. 4 is that rectangular plane magnetic control target of the present invention replaces the electromagnetic field distribution structural representation; Fig. 5 is that the present invention has the alternately rectangular plane magnetic control target structural representation of electromagnetic field; Fig. 6 is a target body construction synoptic diagram after the rectangular plane magnetic control target consumption of the present invention.
The present invention will be further described below in conjunction with accompanying drawing.
As shown in Figure 1, a kind of have an alternately rectangular plane magnetic control target of electromagnetic field, comprise target body 1 and magnetic 2 bodies, described magnet 2 is arranged on the top of target body 1, described magnet 2 comprises electro-magnet 3 and electro-magnet 4, electro-magnet 3 and electro-magnet 4 are arranged in a crossed manner mutually, can form two groups of staggered magnetic fields, its Distribution of Magnetic Field is uniform and stable, start one of them or two electro-magnet by having or not of the sense of current and energising, and the size that can change electric current according to the difference of product changes the power in magnetic field, and target can reach higher service efficiency, and the quality of product is also comparatively stable.
Show and described ultimate principle of the present invention and principal character and advantage of the present invention.The technician of the industry should understand; the present invention is not restricted to the described embodiments; that describes in the foregoing description and the specification sheets just illustrates principle of the present invention; without departing from the spirit and scope of the present invention; the present invention also has various changes and modifications, and these changes and improvements all fall in the claimed scope of the invention.The claimed scope of the present invention is defined by appending claims and equivalent thereof.
Claims (1)
1. one kind has the alternately rectangular plane magnetic control target of electromagnetic field, comprises the target body, and it is characterized in that: also comprise magnet, described magnet is arranged on the target upper part of body, and described magnet comprises two groups of electro-magnet, and two groups of electro-magnet are arranged in a crossed manner mutually.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 201010168812 CN101935822A (en) | 2010-05-11 | 2010-05-11 | Rectangular planar magnetic control target with alternate electromagnetic field |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 201010168812 CN101935822A (en) | 2010-05-11 | 2010-05-11 | Rectangular planar magnetic control target with alternate electromagnetic field |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN101935822A true CN101935822A (en) | 2011-01-05 |
Family
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN 201010168812 Pending CN101935822A (en) | 2010-05-11 | 2010-05-11 | Rectangular planar magnetic control target with alternate electromagnetic field |
Country Status (1)
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| CN (1) | CN101935822A (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103469165A (en) * | 2013-10-10 | 2013-12-25 | 武汉大学 | Rectangular plane cathode electric arc target based on distributed electromagnets |
| CN107083537A (en) * | 2017-05-02 | 2017-08-22 | 霍尔果斯迅奇信息科技有限公司 | New high target utilization ratio planar magnetic control sputtering cathode |
| CN115386850A (en) * | 2022-08-30 | 2022-11-25 | 上海积塔半导体有限公司 | Magnetron sputtering deposition device |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1157335A (en) * | 1996-02-13 | 1997-08-20 | 王福贞 | Permanent-magnet controlled plane cathode arc source |
| CN201704401U (en) * | 2010-05-11 | 2011-01-12 | 赫得纳米科技(昆山)有限公司 | Rectangular planar magnetic control target with alternating electromagnetic field |
-
2010
- 2010-05-11 CN CN 201010168812 patent/CN101935822A/en active Pending
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1157335A (en) * | 1996-02-13 | 1997-08-20 | 王福贞 | Permanent-magnet controlled plane cathode arc source |
| CN201704401U (en) * | 2010-05-11 | 2011-01-12 | 赫得纳米科技(昆山)有限公司 | Rectangular planar magnetic control target with alternating electromagnetic field |
Non-Patent Citations (1)
| Title |
|---|
| 《强流荷电粒子束技术与应用》 19950430 唐敦乙等。 多磁极会切磁场型 电子工业出版社 第143页。 1 , 1 * |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103469165A (en) * | 2013-10-10 | 2013-12-25 | 武汉大学 | Rectangular plane cathode electric arc target based on distributed electromagnets |
| CN107083537A (en) * | 2017-05-02 | 2017-08-22 | 霍尔果斯迅奇信息科技有限公司 | New high target utilization ratio planar magnetic control sputtering cathode |
| CN115386850A (en) * | 2022-08-30 | 2022-11-25 | 上海积塔半导体有限公司 | Magnetron sputtering deposition device |
| CN115386850B (en) * | 2022-08-30 | 2023-12-29 | 上海积塔半导体有限公司 | Magnetron sputtering deposition device |
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Application publication date: 20110105 |