CN204417584U - A kind of magnetron sputtering plating magnet steel - Google Patents
A kind of magnetron sputtering plating magnet steel Download PDFInfo
- Publication number
- CN204417584U CN204417584U CN201520047210.6U CN201520047210U CN204417584U CN 204417584 U CN204417584 U CN 204417584U CN 201520047210 U CN201520047210 U CN 201520047210U CN 204417584 U CN204417584 U CN 204417584U
- Authority
- CN
- China
- Prior art keywords
- pole
- section
- width
- pole portion
- tilting section
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Landscapes
- Physical Vapour Deposition (AREA)
Abstract
The utility model discloses a kind of magnetron sputtering plating magnet steel, comprise yoke, the magnet be arranged in yoke, magnet comprises a S pole portion and the S pole portion N pole portion in the 2nd S pole portion be arranged side by side, between the first S pole portion and the 2nd S pole portion; One S pole portion and the 2nd S pole portion are identical structure, and it includes S pole body, is positioned at the section of reducing at body two ends, S pole, and the section of reducing comprises first section of reducing be connected with S pole body, second section of reducing be connected with first section of reducing; N pole portion comprises N pole body, is positioned at the tilting section at body two ends, N pole, and tilting section comprises the first tilting section, the second tilting section and the 3rd tilting section.Magnet steel end can be added up effect and offset by the utility model, a nonpitting flat zone is formed at target-end, effectively can solve target two ends and consume fast problem, can prevent target-end from forming the phenomenon of groove preferably, significantly improve the utilization ratio of target.
Description
Technical field
The utility model relates to a kind of magnet steel, is specifically related to a kind of magnetron sputtering plating magnet steel coordinating target to use.
Background technology
At present, in the industries such as LOW-E coating wire, ITO coating wire, solar film plating line, toy five metals, winding, all magnetic-controlled sputtering coating equipment is related to.
Existing magnetron sputtering plating line join the magnet steel of negative electrode structure be: middle is N pole, periphery is S pole, these magnet are all arranged in yoke, and S pole and N pole form closed magnetic line of force, and these magnet steel are in the back of planar targets or the target pipe inside of rotary target material.Operation instruction is carried out for the magnet steel coordinating rotary target material to use, under vacuum conditions, electronics is under the effect of electric field, collide with process gas, make it ionize and produce positive ion and new electronics, new electronics flies to substrate, and positive ion accelerates to fly to target under electric field action, and with high-energy bombardment target surface, target is sputtered.In sputtering particle, neutral target atom or molecule deposition form film on substrate.
But there is accumulative effect in the end of magnet steel, the end sputtering rate being embodied in target two ends is fast, middle slow, end and middle target can not synchronous consumptions, form groove, have a strong impact on the utilization ratio of target in end.
Utility model content
For the deficiencies in the prior art, the utility model object is intended to provide a kind of magnetron sputtering plating magnet steel, can prevent target-end from forming the phenomenon of groove preferably, significantly improve the utilization ratio of target.
For achieving the above object, the utility model adopts following technical scheme:
A kind of magnetron sputtering plating magnet steel, comprises yoke, the magnet be arranged in yoke, and described magnet comprises a S pole portion and the S pole portion N pole portion in the 2nd S pole portion be arranged side by side, between the first S pole portion and the 2nd S pole portion;
A described S pole portion and the 2nd S pole portion are identical structure, and it includes S pole body, is positioned at the section of reducing at body two ends, S pole, described in the section of reducing comprise first section of reducing be connected with S pole body, second section of reducing be connected with first section of reducing;
Described N pole portion comprises N pole body, is positioned at the tilting section at body two ends, N pole, and described tilting section comprises the first tilting section be connected with N pole body, the second tilting section be connected with the first tilting section, the 3rd tilting section that is connected with the second tilting section.
Preferably, the width of the head end of described first tilting section is identical with the width of N pole body, and the width of the end of described first tilting section is 5/6 of the width of N pole body; The width of the head end of described second tilting section is identical with the width of the end of the first tilting section, and the width of the end of described second tilting section is 2/3 of the width of N pole body; The width of the head end of described 3rd tilting section is identical with the width of the end of the second tilting section, and the width of the end of described 3rd tilting section is 1/2 of the width of N pole body.
Preferably, the width of described first section of reducing is 4/5 of the width of S pole body, and the width of described second section of reducing is 1/2 of the width of S pole body.
Preferably, the length value in described N pole portion is less 10 millimeters than the length value in a S pole portion.
The utility model beneficial effect is:
The utility model is by being provided with at the two ends of S pole body the section of reducing, the two ends of N pole body are provided with tilting section, magnet steel end can be added up effect to offset, a nonpitting flat zone is formed at target-end, effectively can solve target two ends and consume fast problem, can prevent target-end from forming the phenomenon of groove preferably, significantly improve the utilization ratio of target, simultaneously, the width of the head end of the first tilting section is identical with the width of N pole body, the width of the end of the first tilting section is 5/6 of the width of N pole body, the width of the head end of the second tilting section is identical with the width of the end of the first tilting section, the width of the end of the second tilting section is 2/3 of the width of N pole body, the width of the head end of the 3rd tilting section is identical with the width of the end of the second tilting section, the width of the end of the 3rd tilting section is 1/2 of the width of N pole body, prove through test of many times, the magnet steel of setting like this can make the utilization ratio of target be promoted significantly.
Accompanying drawing explanation
Fig. 1 is structural representation of the present utility model;
Fig. 2 is the enlarged diagram at I place in Fig. 1;
Fig. 3 is the sectional view of A-A in Fig. 2;
Fig. 4 is the sectional view of B-B in Fig. 2;
Fig. 5 is the sectional view of C-C in Fig. 2;
Fig. 6 is the sectional view of D-D in Fig. 2.
Wherein, 1, yoke; 2, a S pole portion; 21, S pole body; 22, first section of reducing; 23, second section of reducing; 3, the 2nd S pole portion; 4, N pole portion; 41, N pole body; 42, the first tilting section; 43, the second tilting section; 44, the 3rd tilting section.
Embodiment
Below, by reference to the accompanying drawings and embodiment, the utility model is described further:
As shown in Figure 1, for a kind of magnetron sputtering plating magnet steel of the present utility model, comprise yoke 1, the magnet be arranged in yoke 1, described magnet comprises a S pole portion 2 and a S pole portion 2 N pole portion 4 in the 2nd S pole portion 3 be arranged side by side, between the first S pole portion 2 and the 2nd S pole portion 3;
As shown in figures 2-6, a described S pole portion 2 is identical structure with the 2nd S pole portion 3, it includes S pole body 21, is positioned at the section of reducing at body 21 two ends, S pole, described in the section of reducing comprise the first section of reducing 22 be connected with S pole body 21, the second section of reducing 23 be connected with the first section of reducing 22;
Described N pole portion 4 comprises N pole body 41, is positioned at the tilting section at body 41 two ends, N pole, and described tilting section comprises the first tilting section 42 be connected with N pole body 41, the second tilting section 43 be connected with the first tilting section 42, the 3rd tilting section 44 that is connected with the second tilting section 43.
The one S pole portion 3 of S pole portion the 2, the 2nd of the present embodiment and N pole portion 4 can form closed magnetic line of force.By after the arranging of said structure, magnet steel end can be added up effect to offset, form a nonpitting flat zone at target-end, effectively can solve target two ends and consume fast problem, can prevent target-end from forming the phenomenon of groove preferably, significantly improve the utilization ratio of target.
Preferably, the width of the head end of described first tilting section 42 is identical with the width of N pole body 41, and the width of the end of described first tilting section 42 is 5/6 of width of N pole body 41; The width of the head end of described second tilting section 43 is identical with the width of the end of the first tilting section 42, and the width of the end of described second tilting section 43 is 2/3 of width of N pole body 41; The width of the head end of described 3rd tilting section 44 is identical with the width of the end of the second tilting section 43, and the width of the end of described 3rd tilting section 44 is 1/2 of width of N pole body 41.Prove through test of many times, the magnet steel that N pole portion 4 is so arranged can make the utilization ratio of target be promoted significantly.
Preferably, the width of described first section of reducing 22 is 4/5 of width of S pole body 21, and the width of described second section of reducing 23 is 1/2 of width of S pole body 21.One S pole portion 2 and the 2nd S pole portion 3, according to after so arranging, can further improve the utilization ratio of target.
Preferably, the length value in described N pole portion 4 is less 10 millimeters than the length value in a S pole portion 2, the two ends indentation 5 millimeters respectively in a relative S pole portion 2, the two ends by N pole portion 4, further can save the material in N pole portion 4 like this, further improve the utilization ratio of target.As shown in Figure 2, the numerical value of H1 is 3 millimeters, and the numerical value of H2 is 8 millimeters.
The utility model adds up effect according to the end of magnet steel, and change the topology layout of magnet steel, the artificial magneticstrength weakening end, makes itself and magnet end add up effect and offset, reach the uniformity of magnet, make target synchronous consumption, improves target utilising efficiency.Target utilization can be brought up to more than 80% by the utility model, has saved production cost greatly, also improves the thickness consistence of sputtered film, effectively realizes industrialized products production demand.
for a person skilled in the art, according to technical scheme described above and design, other various corresponding change and distortion can be made, and all these change and distortion all should belong within the protection domain of the utility model claim.
Claims (4)
1. a magnetron sputtering plating magnet steel, is characterized in that: comprise yoke, the magnet be arranged in yoke, and described magnet comprises a S pole portion and the S pole portion N pole portion in the 2nd S pole portion be arranged side by side, between the first S pole portion and the 2nd S pole portion;
A described S pole portion and the 2nd S pole portion are identical structure, and it includes S pole body, is positioned at the section of reducing at body two ends, S pole, described in the section of reducing comprise first section of reducing be connected with S pole body, second section of reducing be connected with first section of reducing;
Described N pole portion comprises N pole body, is positioned at the tilting section at body two ends, N pole, and described tilting section comprises the first tilting section be connected with N pole body, the second tilting section be connected with the first tilting section, the 3rd tilting section that is connected with the second tilting section.
2. magnetron sputtering plating magnet steel as claimed in claim 1, it is characterized in that: the width of the head end of described first tilting section is identical with the width of N pole body, the width of the end of described first tilting section is 5/6 of the width of N pole body; The width of the head end of described second tilting section is identical with the width of the end of the first tilting section, and the width of the end of described second tilting section is 2/3 of the width of N pole body; The width of the head end of described 3rd tilting section is identical with the width of the end of the second tilting section, and the width of the end of described 3rd tilting section is 1/2 of the width of N pole body.
3. magnetron sputtering plating magnet steel as claimed in claim 1, it is characterized in that: the width of described first section of reducing is 4/5 of the width of S pole body, the width of described second section of reducing is 1/2 of the width of S pole body.
4. magnetron sputtering plating magnet steel as claimed in claim 1, is characterized in that: the length value in described N pole portion is less 10 millimeters than the length value in a S pole portion.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201520047210.6U CN204417584U (en) | 2015-01-23 | 2015-01-23 | A kind of magnetron sputtering plating magnet steel |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201520047210.6U CN204417584U (en) | 2015-01-23 | 2015-01-23 | A kind of magnetron sputtering plating magnet steel |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN204417584U true CN204417584U (en) | 2015-06-24 |
Family
ID=53467971
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201520047210.6U Expired - Fee Related CN204417584U (en) | 2015-01-23 | 2015-01-23 | A kind of magnetron sputtering plating magnet steel |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN204417584U (en) |
-
2015
- 2015-01-23 CN CN201520047210.6U patent/CN204417584U/en not_active Expired - Fee Related
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN203096163U (en) | Adjusting device for uniformly coating for magnetic field | |
| WO2011056581A3 (en) | Rotary magnetron magnet bar and apparatus containing the same for high target utilization | |
| CN107523855B (en) | Double-anode electroplating device | |
| CN101285171A (en) | Rotary cylindrical magnetron sputtering target | |
| CN104878361A (en) | Magnetron sputtering coating equipment | |
| CN204417584U (en) | A kind of magnetron sputtering plating magnet steel | |
| CN204966094U (en) | Flat enamelled copper wire of ultra tiny precision | |
| CN202307784U (en) | Planar cathode used for magnetron sputtering | |
| CN210237758U (en) | Magnetron sputtering cathode with ultrahigh field intensity | |
| CN204727943U (en) | Magnetic-controlled sputtering coating equipment | |
| CN203683652U (en) | Magnetron sputtering plating device | |
| CN204779787U (en) | Magnetron sputtering target rifle | |
| CN201670872U (en) | Rectangular plane magnetic control target | |
| CN205710898U (en) | The equipment of electron beam assisted plasma sputter flexibility coat copper plate | |
| CN204597675U (en) | A kind of quartz watch movement stepping motor iron core plated film insulation system | |
| CN101935822A (en) | Rectangular planar magnetic control target with alternate electromagnetic field | |
| CN209974874U (en) | Rectangular magnetron sputtering cathode with high target material utilization rate | |
| CN203212630U (en) | Low-temperature deposition device for TCO transparent conductive film | |
| CN203782227U (en) | Cylindrical tubular magnetron sputtering cathode head in vacuum magnetron sputtering coating equipment | |
| CN204251692U (en) | A kind of target material assembly of hollow | |
| CN203320120U (en) | Rotating cathode target for vacuum magnetron sputtering | |
| CN203782226U (en) | Gas pipeline structure used for magnetron sputtering coating | |
| CN204342869U (en) | A kind of target material assembly | |
| CN101928925A (en) | Rectangular plane magnetic control target | |
| CN203937275U (en) | A kind of novel corrugated board of aluminizing |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| CF01 | Termination of patent right due to non-payment of annual fee | ||
| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20150624 Termination date: 20190123 |