CN203782226U - Gas pipeline structure used for magnetron sputtering coating - Google Patents
Gas pipeline structure used for magnetron sputtering coating Download PDFInfo
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- CN203782226U CN203782226U CN201420024684.4U CN201420024684U CN203782226U CN 203782226 U CN203782226 U CN 203782226U CN 201420024684 U CN201420024684 U CN 201420024684U CN 203782226 U CN203782226 U CN 203782226U
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- micro
- magnetron sputtering
- gas
- inlet end
- delivery outlet
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- 238000001755 magnetron sputter deposition Methods 0.000 title claims abstract description 17
- 238000000576 coating method Methods 0.000 title claims abstract description 13
- 239000011248 coating agent Substances 0.000 title claims abstract description 11
- 238000013461 design Methods 0.000 description 3
- 238000005516 engineering process Methods 0.000 description 3
- 239000007888 film coating Substances 0.000 description 3
- 238000009501 film coating Methods 0.000 description 3
- 238000000034 method Methods 0.000 description 3
- 238000007747 plating Methods 0.000 description 3
- 239000000758 substrate Substances 0.000 description 3
- 230000008859 change Effects 0.000 description 2
- 230000005684 electric field Effects 0.000 description 2
- 238000002474 experimental method Methods 0.000 description 2
- 230000009471 action Effects 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 230000007935 neutral effect Effects 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 230000008569 process Effects 0.000 description 1
- 230000001737 promoting effect Effects 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
- 230000000007 visual effect Effects 0.000 description 1
Abstract
The utility model discloses a gas pipeline structure used for magnetron sputtering coating. The structure comprises a pipeline body, wherein one end of the pipeline body is a gas inlet end, and a plurality of output holes are equidistantly formed in the pipeline body. The structure is characterized in that a plurality of micro output holes are formed in the section between two adjacent output holes, and the diameters of the micro output holes are gradually increased along the direction far away from the gas inlet end. The structure has the advantages that the micro output holes are formed between the adjacent output holes and the diameters of the micro output holes are gradually increased along the direction far away from the gas inlet end, thus solving the problem of non-uniform output flow caused by reduction of the power of the gas along with flow distance increase and improving the uniformity of coated products.
Description
Technical field
the utility model relates to a kind of magnetron sputtering plating field, is specifically related to a kind of gas pipe line structure of use in magnetron sputtering coating.
Background technology
At present, magnetron sputtering plating is a kind of common technology, and the principle of work of magnetron sputtering refers to that electronics, under the effect of electric field E, bumps with ar atmo in flying to substrate process, makes its ionization produce Ar positive ion and new electronics; New electronics flies to substrate, and Ar ion accelerates to fly to cathode target under electric field action, and with high-energy bombardment target surface, makes target generation sputter, and in sputtering particle, neutral target atom or molecule deposition form film on substrate, are magnetron sputtering plating.
Magnetic control film coating machine is the visual plant in magnetron sputtering technology, in order to enhance productivity and industrialization cost, and the more and more large-scale change of magnetic control film coating machine, the length of target also increases thereupon, has so just increased the difficulty of coating process.In order to guarantee the homogeneity of whole coated product, except to the performance requriements of equipment of itself, in coating process, gas uniform output is also to affect the inhomogeneity important factor of coated product.Magnetic control film coating machine adopts the pipeline structure of one end input gas substantially at present, specifically shown in Figure 1, wherein on pipeline 1, designs N equally spaced delivery outlet 2, and then gas carry out plated film from delivery outlet output.
Above-mentioned structure design has certain drawback, according to hydrodynamic force, gain knowledge research while finding that gas flows in pipeline, growth along with pipeline, aerodynamic force can weaken gradually, will be greater than the gas flow of exporting in the delivery outlet away from gas pipeline input terminus like this near the gas flow of exporting in the delivery outlet of gas pipeline input terminus.In magnetron sputtering film test, if the gas flow of input is more sufficient, adopt the pipeline of said structure design little on the homogeneity impact of coated product.But for micro-gas doping experiment, in experiment, the flow of required gas is smaller, the output gas flow of gas otherness of each equally spaced delivery outlet is just obvious like this, near the gas flow of exporting in the delivery outlet of pipeline input terminus, will be greater than the gas flow of exporting in the delivery outlet away from pipeline input terminus, gas in output procedure along with the increase of distance, power weakens gradually and causes that gas output flow is inhomogeneous, and then causes the homogeneity of whole coated product just poor.
Summary of the invention
The utility model object is to provide a kind of gas pipe line structure of use in magnetron sputtering coating, by the improvement to structure, solved gas along with the distance that flows increases that power weakens and the inhomogeneous problem of output flow that causes, improved the homogeneity of coated product.
The technical solution of the utility model is: a kind of gas pipe line structure of use in magnetron sputtering coating, comprise pipeline body, described pipeline body one end is inlet end, described pipeline body equal intervals offers some delivery outlets, in described adjacent two delivery outlet sections, all offer some micro-delivery outlets, the aperture of described micro-delivery outlet increases gradually along the direction away from inlet end.
Further technical scheme, the aperture of micro-delivery outlet that is positioned at same adjacent two delivery outlet sections is identical, and the aperture of the micro-delivery outlet in different sections increases gradually along the direction away from inlet end.
Further technical scheme, equidistantly offers four micro-delivery outlets in described adjacent two delivery outlet sections.
Further technical scheme, described gas pipe line structure comprises symmetrically arranged two pipeline bodies.
The utility model has the advantages that:
1. the utility model is by offering some delivery outlets in pipeline body equal intervals, in two adjacent delivery outlet sections, offer micro-delivery outlet, the aperture of micro-delivery outlet increases gradually along the direction away from inlet end, thereby solved gas along with the distance of pipeline increases that power weakens and the inhomogeneous problem of gas output flow that causes, improved the homogeneity of coated product;
2. the utility model, without existing structure is changed on a large scale, is easy to realize, and is applicable to promoting the use of.
Accompanying drawing explanation
Below in conjunction with drawings and Examples, the utility model is further described:
Fig. 1 is the structural representation of prior art;
Fig. 2 is the structural representation of the utility model embodiment mono-.
Wherein: 1, pipeline; 2, delivery outlet; 3, pipeline body; 4, delivery outlet; 5, micro-delivery outlet.
Embodiment
Embodiment mono-: shown in Figure 2, a kind of gas pipe line structure of use in magnetron sputtering coating, comprise symmetrically arranged two pipeline bodies 3, described pipeline body 3 one end are inlet end, described pipeline body 3 equal intervals offer some delivery outlets 4, in described adjacent two delivery outlet 4 sections, all offer four micro-delivery outlets 5, the aperture of micro-delivery outlet 5 that is positioned at same adjacent two delivery outlet 4 sections is identical, and the aperture of the micro-delivery outlet in different sections increases gradually along the direction away from inlet end.
Gas pipe line structure in use, in target zygomorphy, two pipeline bodies are set, gas enters from the inlet end of pipeline body one end, then along flowing in pipeline body, delivery outlet output from pipeline body, along with the elongated of gas flow distance, corresponding change is large in the aperture of micro-delivery outlet, so just can make up in gas output procedure and weaken because the distance that flows increases power the problem that causes that mass flow discrepancy is even, has improved the homogeneity of coated product.
Certainly above-described embodiment is only explanation technical conceive of the present utility model and feature, and its object is to allow person skilled in the art can understand content of the present utility model and implement according to this, can not limit protection domain of the present utility model with this.All modifications of doing according to the spirit of the utility model main technical schemes, within all should being encompassed in protection domain of the present utility model.
Claims (4)
1. the gas pipe line structure of a use in magnetron sputtering coating, comprise pipeline body (3), described pipeline body (3) one end is inlet end, described pipeline body (3) equal intervals offers some delivery outlets (4), it is characterized in that: in described adjacent two delivery outlets (4) section, all offer some micro-delivery outlets (5), the aperture of described micro-delivery outlet (5) increases gradually along the direction away from inlet end.
2. the gas pipe line structure of a kind of use in magnetron sputtering coating according to claim 1, it is characterized in that: the aperture of micro-delivery outlet (5) that is positioned at same adjacent two delivery outlets (4) section is identical, the aperture of the micro-delivery outlet (5) in different sections increases gradually along the direction away from inlet end.
3. the gas pipe line structure of a kind of use in magnetron sputtering coating according to claim 1, is characterized in that: in described adjacent two delivery outlets (4) section, equidistantly offer four micro-delivery outlets (5).
4. the gas pipe line structure of a kind of use in magnetron sputtering coating according to claim 1, is characterized in that: described gas pipe line structure comprises symmetrically arranged two pipeline bodies.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201420024684.4U CN203782226U (en) | 2014-01-15 | 2014-01-15 | Gas pipeline structure used for magnetron sputtering coating |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201420024684.4U CN203782226U (en) | 2014-01-15 | 2014-01-15 | Gas pipeline structure used for magnetron sputtering coating |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN203782226U true CN203782226U (en) | 2014-08-20 |
Family
ID=51318431
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201420024684.4U Expired - Lifetime CN203782226U (en) | 2014-01-15 | 2014-01-15 | Gas pipeline structure used for magnetron sputtering coating |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN203782226U (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN108542043A (en) * | 2018-07-23 | 2018-09-18 | 张新举 | A kind of Ventilated shoe-pad |
-
2014
- 2014-01-15 CN CN201420024684.4U patent/CN203782226U/en not_active Expired - Lifetime
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN108542043A (en) * | 2018-07-23 | 2018-09-18 | 张新举 | A kind of Ventilated shoe-pad |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| C56 | Change in the name or address of the patentee |
Owner name: JIANGSU RIJIU OPTOELECTRONICS JOINTSTOCK CO., LTD. Free format text: FORMER NAME: KUNSHAN RIJIU NEW ENERGY APPLIED MATERIALS CO., LTD. |
|
| CP01 | Change in the name or title of a patent holder |
Address after: 215000 No. 509 Jin Zhou highway, Zhouzhuang Town, Suzhou, Jiangsu, Kunshan Patentee after: JIANGSU RIJIU OPTOELECTRONICS JOINT STOCK Co.,Ltd. Address before: 215000 No. 509 Jin Zhou highway, Zhouzhuang Town, Suzhou, Jiangsu, Kunshan Patentee before: KUNSHAN RIJIU NEW ENERGY APPLIED MATERIALS CO.,LTD. |
|
| CX01 | Expiry of patent term | ||
| CX01 | Expiry of patent term |
Granted publication date: 20140820 |