CN202558927U - Film coating air-intake uniformity lifting device for sputtering coating equipment - Google Patents
Film coating air-intake uniformity lifting device for sputtering coating equipment Download PDFInfo
- Publication number
- CN202558927U CN202558927U CN2012202400433U CN201220240043U CN202558927U CN 202558927 U CN202558927 U CN 202558927U CN 2012202400433 U CN2012202400433 U CN 2012202400433U CN 201220240043 U CN201220240043 U CN 201220240043U CN 202558927 U CN202558927 U CN 202558927U
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- inlet pipe
- lifting device
- intake uniformity
- main inlet
- air
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Abstract
The utility model aims to provide a film coating air-intake uniformity lifting device for sputtering coating equipment. The film coating air-intake uniformity lifting device for the sputtering coating equipment comprises a square main air inlet pipe and a round air inlet pipe, twenty-two gas spray nozzles are installed on the surface of the square main air inlet pipe, which faces to a target, and three hanging pieces are installed above the square main air inlet pipe and used for fixing the whole air inlet device. The film coating air-intake uniformity lifting device for the sputtering coating equipment is used for solving the problem that the sputtering coating thickness is uneven because of an uneven air supply device in the prior art.
Description
Affiliated technical field
The utility model relates to the filming equipment interior arrangement, and this device can be widely used in any processing procedure that need under vacuum splashing and plating, process, for example solar silicon wafers plated film processing.
Background technology
The diffuser of traditional vacuum filming equipment is circular stainless steel tube; Gas gets into from an end of stainless steel tube; A plurality of apertures of evenly opening from the stainless steel tube flow out and get into Vakuumkammers; Because it is gradually little from the inlet end to the end gas, to be formed pressure by the aperture outflow, the aperture effluent air also reduces gradually, forms inhomogeneous supplying gas; For the short sputtering system of target length, this phenomenon can be ignored, but along with target length increases; For example five generation glass coating size, target length is about 1.3 ~ 1.6m, this phenomenon can form coating film thickness with in gradient inhomogeneous of length; Present the pressure gradient phenomenon because supply gas, can cause plasma body to present different density, spatter establish in uneven thickness and make with pressure gradient; Therefore for diffuser further improved demand is arranged, to reduce the ununiformity of coating film thickness.
Summary of the invention
The utility model main purpose system provides a kind of sputtering equipment plated film intake uniformity lifting gear, improves the uneven problem that existing inhomogeneous air supply plant causes sputter thickness.Comprise in order to reach a kind of sputtering equipment plated film of above-mentioned utility model purpose intake uniformity lifting gear: a square main inlet pipe; One circular inlet pipe; In the face of on the target surface 22 gas spray nozzles are set in square main inlet pipe; Main inlet pipe top is provided with 3 hanging films, in order to fixing whole diffuser.
Description of drawings
Fig. 1 system is the utility model structure top view.
Fig. 2 system is the utility model gas spray nozzle synoptic diagram.
Fig. 3 system is the utility model hanging film figure.
The primary clustering nomenclature.
100... square main inlet pipe.
101... circular inlet pipe.
200... gas spray nozzle.
201... gas spray nozzle hold-doun nut.
202... spray Linkou County.
300... hanging film.
Embodiment
In order to facilitate simple understanding of the invention and other features and advantages of the content of the effect can be reached more apparent, with the utility model is hereby drawings will be described in detail as follows: See Figure 1, the utility model The main purpose of providing a sputtering apparatus to enhance the uniformity of coating an intake device, which comprises a square main inlet manifold 100, a circular gas inlet spray nozzle 101,22 200,3 sheet 300 composed of a hanger.See also Fig. 2, each gas spray nozzle 200 is provided with hold-doun nut 201, and with the fixed gas spray nozzle, each gas spray nozzle 200 is provided with spray Linkou County 202; Spray Linkou County 202 makes gas spray with sectorial area, and the sectorial area of each spray Linkou County 202 can overlap each other, and forms a microscler area and is covered in the target surface top; Form uniform plasma, see also Fig. 3, hanging film 300; In the chamber top, make device be parallel to target surface, in order to fixing inlet duct now with the action step explanation; External feed stream flows into chamber via circular tracheae 101, by circular tracheae 101 air inlet is divided into three tunnel air inlets, makes along target surface length and can both obtain uniform admission pressure; After gas flows into square main air inlet pipe 100,, make target surface be full of uniform plasma to carry out sputter process flowing into chamber via gas spray nozzle 200.
In summary, the utility model to break through previous technical structure, although it did increase has reached desired effect, and also those who are not familiar with the art of thinking and easy, it shall have the progressive, practical, significantly has meet the application requirements of the utility model, except for the above detailed description of the utility model system for one possible embodiment of specific instructions, the embodiment is not intended to limit the scope of utility model patents, utility models and who have not departing from the spirit of art The implementation of whom equivalent or change, shall be included in the case of patent scope.
Claims (5)
1. a sputtering equipment plated film intake uniformity lifting gear comprises: a square main inlet pipe; One circular inlet pipe; In the face of on the target surface 22 gas spray nozzles are set in square main inlet pipe; Main inlet pipe top is provided with 3 hanging films.
2. a kind of sputtering equipment plated film intake uniformity lifting gear according to claim 1, this square main inlet pipe width 30mm wherein, length 1520mm.
3. a kind of sputtering equipment plated film intake uniformity lifting gear of being narrated according to 1 of claim the should circle inlet pipe diameter be 3/8 cun wherein.
4. according to 2 main inlet pipe of being narrated of claim the, wherein on this main inlet pipe 22 gas spray nozzles are set.
5. according to 2 main inlet pipe of being narrated of claim the, wherein on this main inlet pipe 3 hanging films are set.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2012202400433U CN202558927U (en) | 2012-05-26 | 2012-05-26 | Film coating air-intake uniformity lifting device for sputtering coating equipment |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2012202400433U CN202558927U (en) | 2012-05-26 | 2012-05-26 | Film coating air-intake uniformity lifting device for sputtering coating equipment |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN202558927U true CN202558927U (en) | 2012-11-28 |
Family
ID=47208604
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN2012202400433U Expired - Fee Related CN202558927U (en) | 2012-05-26 | 2012-05-26 | Film coating air-intake uniformity lifting device for sputtering coating equipment |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN202558927U (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US9245735B2 (en) | 2013-06-08 | 2016-01-26 | Everdisplay Optronics (Shanghai) Limited | Upper electrode device |
| CN107574417A (en) * | 2017-09-21 | 2018-01-12 | 京东方科技集团股份有限公司 | Sputtering system |
-
2012
- 2012-05-26 CN CN2012202400433U patent/CN202558927U/en not_active Expired - Fee Related
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US9245735B2 (en) | 2013-06-08 | 2016-01-26 | Everdisplay Optronics (Shanghai) Limited | Upper electrode device |
| CN107574417A (en) * | 2017-09-21 | 2018-01-12 | 京东方科技集团股份有限公司 | Sputtering system |
| CN107574417B (en) * | 2017-09-21 | 2019-06-28 | 京东方科技集团股份有限公司 | Sputtering system |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20121128 Termination date: 20150526 |
|
| EXPY | Termination of patent right or utility model |