CN210657127U - Gas distribution device of chemical vapor deposition coating equipment - Google Patents
Gas distribution device of chemical vapor deposition coating equipment Download PDFInfo
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- CN210657127U CN210657127U CN201921758194.6U CN201921758194U CN210657127U CN 210657127 U CN210657127 U CN 210657127U CN 201921758194 U CN201921758194 U CN 201921758194U CN 210657127 U CN210657127 U CN 210657127U
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Abstract
The utility model discloses a chemical vapor deposition coating equipment gas distribution device, including the gas distribution box, upper cloth trachea, lower floor's gas distribution pipe, the gas distribution box is by the vacuum chamber apron, a closed box body that the gas distribution frame and the gas distribution board that is close to the substrate side are constituteed, upper cloth trachea, lower floor's gas distribution pipe is by the intake pipe, the square tube, the water conservancy diversion pipeline is constituteed, the intake pipe passes one side gas distribution frame and sets up the square tube intercommunication in the gas distribution box, water conservancy diversion pipeline equipartition is between two pipelines that the square tube is parallel to each other, water conservancy diversion pipeline both ends and square tube intercommunication, evenly distributed has a plurality of gas distribution micropores on the water conservancy diversion pipeline, upper cloth trachea's water conservancy diversion pipeline and lower floor's water conservancy diversion pipeline staggered arrangement, it has a plurality of air nozzles to distribute on the gas distribution board. The utility model discloses can be with the even surface that sprays the substrate after multiple process gas mixes, accomplish the large tracts of land and evenly spray the gas distribution, realize that chemical vapor deposition equipment obtains the rete coating film of large tracts of land, homogeneity, uniformity.
Description
Technical Field
The utility model relates to the field of vacuum coating, in particular to a gas distribution device of chemical vapor deposition coating equipment.
Background
The gas distribution module of the chemical vapor deposition coating equipment is used in the vacuum coating industry and is matched with the chemical vapor deposition coating equipment, such as PECVD equipment and LPCVD equipment. The large-area planar reaction deposition coating equipment requires that a substrate and a gas distribution device are static in the coating process, two or more process gases which are uniformly mixed in a certain proportion and distributed uniformly are filled on the surface of a rectangular substrate above the substrate, a functional film layer is formed on the surface of the substrate after reaction at a proper process temperature, and the uniformity of the gas distribution has great influence on the uniformity and quality of the film layer.
The existing gas distribution pipeline for vacuum equipment has single-pipe multi-stage gas supply, and a binary gas supply mode is formed by covering a cover plate after grooving on a solid material plane, but the gas distribution uniformity and the mixing performance are not good enough, or the existing gas distribution pipeline can only be used for magnetron sputtering production line type production, namely, the gas distribution unit is linearly arranged in the direction vertical to the substrate transmission direction, the substrate passes through the gas distribution unit in a uniform-speed linear transmission mode, and the spraying of process gas sprayed from a gas discharge nozzle crossing the vertical direction is obtained.
Disclosure of Invention
An object of the utility model is to provide a chemical vapor deposition coating equipment gas distribution device, with the even surface that sprays the substrate behind the multiple process gas mixture, accomplish and take place chemical reaction and deposit the coating film process flow on substrate surface with the substrate, realize that chemical vapor deposition equipment obtains the rete coating film of large tracts of land, homogeneity, uniformity.
The utility model adopts the technical scheme as follows: chemical vapor deposition coating equipment gas distribution device, including gas distribution box, upper gas distribution pipe, lower floor's gas distribution pipe, gas distribution box is for the closed box body that comprises the gas distribution plate of vacuum chamber apron, gas distribution frame and being close to the substrate side, upper gas distribution pipe, lower floor's gas distribution pipe comprise intake pipe, square siphunculus, water conservancy diversion pipeline, the intake pipe passes one side gas distribution frame and sets up the square siphunculus intercommunication in gas distribution box, water conservancy diversion pipeline equipartition is between two pipelines that the square siphunculus is parallel to each other, water conservancy diversion pipeline both ends and square siphunculus intercommunication, and evenly distributed has a plurality of gas distribution micropores on the water conservancy diversion pipeline, and the water conservancy diversion pipeline of upper gas distribution pipe and the water conservancy diversion pipeline staggered arrangement of lower floor's gas distribution pipe have a plurality of air nozzles on gas distribution plate.
Furthermore, the diversion pipeline is arranged between a pipeline on one side of the square pipe, which is connected with the air inlet pipe, and a pipeline on the other side, which is parallel to the pipeline on the side.
Further, the pipe diameter of diversion pipeline is less than the pipe diameter of square tube.
Furthermore, the diversion pipeline is a circular pipe, a plurality of groups of gas distribution micropores are uniformly distributed on the diversion pipeline, and each group of gas distribution micropores consists of a plurality of gas distribution micropores uniformly distributed on the circumference of the diversion pipeline.
Furthermore, the air distribution micropores on the upper air distribution pipe and the air distribution micropores on the lower air distribution pipe are arranged in a staggered manner.
Furthermore, the uniform distribution area of the air nozzles on the air distribution plate is larger than the area of the substrate.
Further, the air nozzles in the four corner areas on the air distribution plate are denser than those in other positions.
Further, the aperture of the air inlet end of the air nozzle is larger than that of the air outlet end.
Furthermore, the air distribution plate is also provided with a cooling water channel distributed in a snake shape.
The utility model has the advantages as follows:
1. large-area gas distribution is uniform: the gas distribution device of the utility model can realize large-area uniform spraying gas distribution and obtain a large-area uniform film layer;
2. fully mixing the gas: the diversion pipelines of the upper layer gas distribution pipe and the lower layer gas distribution pipe are distributed in the gas distribution box at equal intervals in two layers, gas distribution micropores are processed at the staggered position of 360 ℃ on the pipeline wall, the flow directions are different in multiple directions after gas flows respectively flow out from a plurality of micropores, the gas flows are sprayed out through the gas nozzles after mutually impacting or impacting with the wall of the gas distribution box, and various gases are more fully mixed in the impacting and flow blocking processes;
3. the airflow impact is small: the air nozzles are distributed by a plurality of micropore arrays, so that almost no air flow impact exists, the loss of coating gas materials is reduced, and the deposition rate is accelerated;
4. the cooling performance is good: the gas distribution plate is internally provided with the uniformly distributed large-flow circulating water channels which are directly and uniformly cooled, so that the low-temperature state of the gas distribution plate during normal work is ensured, and the chemical reaction of mixed gas after high temperature in the gas distribution box is avoided;
5. the air nozzles at four angular positions of the air distribution plate are more densely spaced than other positions, so that air distribution is more uniform, the uniformly distributed area of the air nozzles is larger than that of the substrate, the uniformity of atmosphere around the substrate can be ensured, and the edge effect is eliminated.
Drawings
Fig. 1 is a schematic view of the overall structure of the present invention.
3 fig. 3 2 3 is 3 a 3 schematic 3 view 3 of 3 the 3 direction 3 a 3- 3 a 3 in 3 fig. 3 1 3. 3
Fig. 3 is a schematic view of direction B-B in fig. 1.
Fig. 4 is a schematic view of fig. 1 taken along direction C-C.
Fig. 5 is a partial enlarged view of W in fig. 1.
Detailed Description
To facilitate understanding of the present invention, the present invention will be described more fully and specifically with reference to the accompanying drawings and preferred embodiments, but the scope of the present invention is not limited to the specific embodiments described below.
As shown in fig. 1-5, the gas distribution device of the chemical vapor deposition coating apparatus of the present embodiment includes a gas distribution box 1, an upper gas distribution pipe 2, and a lower gas distribution pipe 3. The gas distribution box 1 is a closed box body consisting of a vacuum chamber cover plate 101, a gas distribution frame 102 and a gas distribution plate 103 close to the substrate 4 side. Upper cloth trachea 2, lower floor's cloth trachea 3 comprise intake pipe 301, square through pipe 302, diversion pipeline 303, intake pipe 301 passes one side cloth gas frame 102 and sets up the square through pipe 302 intercommunication in the cloth gas box, diversion pipeline 303 sets up between square through pipe 302 and the pipeline of one side of intake pipe 301 connection and the opposite side pipeline parallel with this side pipeline, and diversion pipeline 303 both ends and square through pipe 302 intercommunication, diversion pipeline 303 are the pipe, and diversion pipeline 303's pipe diameter is less than square through pipe 302's pipe diameter. A plurality of groups of gas distribution micropores 304 are uniformly distributed on the diversion pipeline 303, and each group of gas distribution micropores consists of a plurality of gas distribution micropores 304 uniformly distributed on the circumference of the diversion pipeline. The diversion pipeline of the upper air distribution pipe 2 and the diversion pipeline of the lower air distribution pipe 3 are arranged in a staggered mode, and the air distribution micropores on the upper air distribution pipe 2 and the air distribution micropores on the lower air distribution pipe 3 are arranged in a staggered mode. A plurality of air nozzles 105 are distributed on the air distribution plate 103, and the aperture of the air inlet end of each air nozzle 105 is larger than that of the air outlet end. The uniform distribution area of the air nozzles 105 on the air distribution plate 103 is larger than the area of the substrate 4, and the air nozzles in the four corner areas on the air distribution plate are denser than those in other positions. The gas distribution plate 103 is also provided with a cooling water channel 104 distributed in a serpentine shape.
The working principle of the utility model is as follows: the multiple process gases are respectively filled into a square tube 302 in the gas distribution box through an air inlet pipe 301 of an upper gas distribution pipe 2 and a lower gas distribution pipe 3 in two ways, the square tube 302 is uniformly provided with a plurality of flow guide pipelines 303 communicated with the square tube 302, a plurality of groups of gas distribution micropores 304 are uniformly distributed on the flow guide pipelines 303, the process gases are filled into the flow guide pipelines 303 through the square tube 302, the gas distribution boxes are fully filled through the gas distribution micropores 304 distributed at 360 degrees on the flow guide pipelines 303, the fully mixed gases are sprayed out through the gas nozzles 105, and the fully mixed gases are deposited on the substrate 4 to form a film after chemical reaction in a process environment heated by a process chamber. The cooling water passage 104 is filled with circulating cooling water for cooling the air distribution plate 103.
Many modifications and other embodiments of the invention will come to mind to one skilled in the art to which this invention pertains having the benefit of the teachings presented in the foregoing descriptions and the associated drawings. Therefore, it is to be understood that the inventions are not to be limited to the specific embodiments disclosed and that modifications and other embodiments are intended to be included within the scope of the appended claims. Although specific terms are employed herein, they are used in a generic and descriptive sense only and not for purposes of limitation.
Claims (9)
1. Chemical vapor deposition coating equipment gas distribution device which characterized in that: including gas distribution box, upper gas distribution pipe, lower floor's gas distribution pipe, the gas distribution box is for by vacuum chamber apron, gas distribution frame and be close to a closed box body that the gas distribution plate of substrate side is constituteed, upper gas distribution pipe, lower floor's gas distribution pipe are by intake pipe, square siphunculus, diversion pipeline and constitute, the intake pipe passes one side gas distribution frame and sets up the square siphunculus intercommunication in the gas distribution box, diversion pipeline equipartition is between two pipelines that the square siphunculus is parallel to each other, diversion pipeline both ends and square siphunculus intercommunication, evenly distributed has a plurality of gas distribution micropores on the diversion pipeline, and upper gas distribution pipe's diversion pipeline and lower floor's diversion pipeline staggered arrangement have a plurality of air nozzles on the gas distribution plate.
2. The chemical vapor deposition coating apparatus of claim 1, wherein: the diversion pipeline is arranged between a pipeline on one side of the square pipe connected with the air inlet pipe and a pipeline on the other side parallel to the pipeline on the side.
3. The chemical vapor deposition coating apparatus of claim 1, wherein: the pipe diameter of diversion pipeline is less than the pipe diameter of square-tube.
4. The chemical vapor deposition coating apparatus of claim 1, wherein: the flow guide pipeline is a circular pipe, a plurality of groups of gas distribution micropores are uniformly distributed on the flow guide pipeline, and each group of gas distribution micropores consists of a plurality of gas distribution micropores uniformly distributed on the circumference of the flow guide pipeline.
5. The gas distribution device of chemical vapor deposition coating equipment according to claim 1 or 4, characterized in that: the air distribution micropores on the upper air distribution pipe and the air distribution micropores on the lower air distribution pipe are arranged in a staggered manner.
6. The chemical vapor deposition coating apparatus of claim 1, wherein: the uniform distribution area of the air nozzles on the air distribution plate is larger than the area of the substrate.
7. The chemical vapor deposition coating apparatus of claim 1, wherein: the air nozzles in four corner areas on the air distribution plate are denser than those in other positions.
8. The gas distribution device of chemical vapor deposition coating equipment according to claim 1, 6 or 7, characterized in that: the aperture of the air inlet end of the air nozzle is larger than that of the air outlet end.
9. The chemical vapor deposition coating apparatus of claim 1, wherein: the gas distribution plate is also provided with a cooling water channel distributed in a snake shape.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201921758194.6U CN210657127U (en) | 2019-10-20 | 2019-10-20 | Gas distribution device of chemical vapor deposition coating equipment |
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| Application Number | Priority Date | Filing Date | Title |
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| CN201921758194.6U CN210657127U (en) | 2019-10-20 | 2019-10-20 | Gas distribution device of chemical vapor deposition coating equipment |
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| CN210657127U true CN210657127U (en) | 2020-06-02 |
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN110565073A (en) * | 2019-10-20 | 2019-12-13 | 湖南玉丰真空科学技术有限公司 | Gas distribution device of chemical vapor deposition coating equipment |
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN110565073A (en) * | 2019-10-20 | 2019-12-13 | 湖南玉丰真空科学技术有限公司 | Gas distribution device of chemical vapor deposition coating equipment |
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