CN207352983U - A kind of equipment of assemble nanometer bead - Google Patents
A kind of equipment of assemble nanometer bead Download PDFInfo
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- CN207352983U CN207352983U CN201721291784.3U CN201721291784U CN207352983U CN 207352983 U CN207352983 U CN 207352983U CN 201721291784 U CN201721291784 U CN 201721291784U CN 207352983 U CN207352983 U CN 207352983U
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- equipment
- nanometer bead
- assemble
- assemble nanometer
- flexible substrate
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Abstract
The utility model discloses a kind of equipment of assemble nanometer bead, including unwinding system, membrane immersion plating groove, heating evaporation plate, plasma etching machine, winding system and some live-rollers set along conveying direction set gradually, regulate and control the uniformity that nanometer bead assembles on flexible substrates by controlling the transmission speed of live-roller, the density of the nanometer bead of the flexible substrate over-assemble is controlled using plasma etching machine, large area and continuous production can be realized at the same time, and production efficiency is high.
Description
Technical field
It the utility model is related to metal net shaped conducting film field, more particularly to a kind of equipment of assemble nanometer bead.
Background technology
Nesa coating plays an important role in fields such as FPD, photovoltaic cells, is indispensable photoelectricity work(
Can component.As the leading transparent conductive membrane material of Vehicles Collected from Market, it is withered that tin indium oxide (ITO) has suffered from indium resource
Exhaust, the severe challenge that the energy consumption of material cost and vacuum magnetic-control sputtering is expensive, on the other hand, current component is just by traditional hard
Matter chip is to flexible wearable mode transition, and the market of this respect is just in explosive growth.Flexible metal net shaped electrically conducting transparent
Film breaches the electro-conductive glass such as traditional ITO flexible, saturating because its transmissivity is high, resistance is low, the excellent photoelectric properties such as flexible
The limitation of bright, bent, weight etc., can substitute ITO, save production cost.Prepare the metal net shaped of flexibility
Usually require to assemble polystyrene or silica nanometer bead first on flexible substrate during bright conducting film, then
One layer of metal layer is being covered above again, and metal net shaped nesa coating is formed subsequently through the mode for removing nanometer bead.
The uniformity and density that nanometer bead assembles during preparation can influence the quality of the grid of metal mesh being subsequently formed from
And the performance of conducting film is influenced, in addition tend not to realize large area and continuous production in existing preparation process, therefore need
There is provided a kind of can realize that large area and continuous production, the assembling that production efficiency is high, nanometer bead assembling uniformity is good are received
Nano-sphere equipment.
Utility model content
The purpose of this utility model is to provide a kind of equipment of assemble nanometer bead, can control and assemble on flexible substrates
Nanometer bead uniformity and density, production efficiency is high, can realize large area and continuous production.
Technical solution adopted in the utility model is：
The utility model provides a kind of equipment of assemble nanometer bead, including set gradually unwinding system, cleaning system,
Membrane immersion plating groove, heating evaporation plate, plasma etching machine, winding system and some live-rollers set along conveying direction.Institute
Unwinding system is stated to continuous conveying flexible substrate, the membrane immersion plating groove is to small in the flexible substrate over-assemble nanometer
Ball, the heating plate is to remove the solvent of the nanometer bead surface, and the plasma etching machine is etching to pull open
Spacing between the nanometer bead, the winding system is winding the flexible substrate after assemble nanometer bead.
Preferably, cleaning system is further included, the cleaning system is arranged between unwinding system and membrane immersion plating groove.It is described
Cleaning system is cleaning the flexible substrate.
Further, ultrasonic cleaning equipment, drying device and the plasma that the cleaning system includes setting gradually are clear
Cleaning device, the plasma washing equipment is cleaning and activate the flexible substrate.
Further, the drying device is air knife or air-dry machine.
Preferably, correcting device and magnetic powder tension control system are provided with the winding system, on the correcting device
Photoelectric sensor is provided with, to track the flexible substrate and signal is fed back to winding system makes winding neat, the magnetic
Tension sensor is provided with powder tension control system, to measure the Tensity size of the flexible substrate and opening according to feedback
Force signal adjusts the tension force and conveying speed of the flexible substrate.
Preferably, the panel material of the heating evaporation plate is stainless steel.
The beneficial effects of the utility model are：
The utility model provides a kind of equipment of assemble nanometer bead, including set gradually unwinding system, membrane immersion plating
Groove, heating evaporation plate, plasma etching machine, winding system and some live-rollers set along conveying direction, are passed by controlling
The transmission speed of dynamic roller regulates and controls the uniformity that nanometer bead assembles on flexible substrates, controls the power control of plasma etching machine
The density of the nanometer bead of the flexible substrate over-assemble is made, while can realize large area and continuous production, production efficiency
It is high.
Brief description of the drawings
Fig. 1 is the structure diagram of the equipment of self-assembled nanometer bead.
Embodiment
Carried out below with reference to the technique effect of the design of embodiment and attached drawing to the utility model, concrete structure and generation
Clearly and completely describe, to be completely understood by the purpose of this utility model, feature and effect.Obviously, described embodiment
It is the part of the embodiment of the utility model, rather than whole embodiments, the embodiment based on the utility model, the skill of this area
The other embodiment that art personnel are obtained without creative efforts, belongs to the model of the utility model protection
Enclose.In addition, all connection/connection relations arrived involved in patent, not singly refer to component and directly connect, and refer to can be according to specific
Performance, by adding or reducing couple auxiliary, to form more preferably draw bail.Each skill in the utility model creation
Art feature, can be with combination of interactions on the premise of not conflicting conflict.
Embodiment 1
The utility model provides a kind of equipment of assemble nanometer bead, its structure diagram as shown in Figure 1, including setting successively
The unwinding system 1 put, membrane immersion plating groove 2, heating evaporation plate 3, plasma etching machine 4, winding system 5 and set along conveying direction
Some live-rollers 6 put, the unwinding system 1 is to continuous conveying flexible substrate, and the membrane immersion plating groove 2 is to described soft
Property substrate over-assemble nanometer bead, the heating evaporation plate 3 is removing the solvent of the nanometer bead surface, the present embodiment institute
The panel material for stating heating evaporation plate 3 selects stainless steel material, there is superior corrosion resistance, can be at high operating temperatures without sticking up
Song deformation, the plasma etching machine 4 is etching the spacing to pull open between the nanometer bead, the winding system 5
It is small by controlling the transfer rate of the live-roller 6 to regulate and control nanometer to wind the flexible substrate after assemble nanometer bead
The uniformity that ball assembles on flexible substrates, can be etched using plasma etching machine 4 to pull open the spacing between nanometer bead
So as to control the coverage density of nanometer bead on flexible substrates, the equipment of whole assemble nanometer bead can realize large area and
Continuous production, production efficiency are high.
Preferably, the equipment of the assemble nanometer bead of the utility model further includes cleaning system 7, and the cleaning system includes
Ultrasonic cleaning equipment 71, drying device 72 and the plasma body cleaning device 73 set gradually, the ultrasonic cleaning equipment
Hydrogen peroxide or alcohol can be filled in 71 to clean the impurity such as the dust on flexible substrate surface, particle, the drying device 72
Can be air knife or air-dry machine to air-dry the flexible substrate after cleaning, the plasma body cleaning device 73 is cleaning and live
Change the flexible substrate.
Preferably, it is provided with 8 He of correcting device on the winding system 5 in the equipment of the assemble nanometer bead of the utility model
Magnetic powder tension control system 9, is provided with photoelectric sensor on the correcting device 8, being capable of Tracking Flexible substrate and signal is anti-
Winding system of feeding makes winding neat, is provided with tension sensor on the magnetic powder tension control system 9, can measure flexible liner
The Tensity size at bottom and the tension force and conveying speed that the flexible substrate is adjusted according to the tension signal of feedback.
Above is the preferred embodiment to the utility model is illustrated, but the utility model be not limited to it is described
Embodiment, those skilled in the art can also make a variety of equivalent changes on the premise of without prejudice to the utility model spirit
Shape or replacement, these equivalent deformations or replacement are all contained in the application claim limited range.
Claims (6)
- A kind of 1. equipment of assemble nanometer bead, it is characterised in that including set gradually unwinding system, membrane immersion plating groove, plus Thermal evaporation plate, plasma etching machine, winding system and some live-rollers set along conveying direction.
- 2. the equipment of assemble nanometer bead according to claim 1, it is characterised in that cleaning system is further included, it is described clear The system of washing is arranged between unwinding system and membrane immersion plating groove.
- 3. the equipment of assemble nanometer bead according to claim 2, it is characterised in that the cleaning system includes setting successively Ultrasonic cleaning equipment, drying device and the plasma body cleaning device put.
- 4. the equipment of assemble nanometer bead according to claim 3, it is characterised in that the drying device is air knife or wind Dry machine.
- 5. according to the equipment of claim 1-4 any one of them assemble nanometer beads, it is characterised in that on the winding system Correcting device and magnetic powder tension control system are provided with, photoelectric sensor is provided with the correcting device, to Tracking Flexible Substrate and signal is fed back to winding system makes winding neat, tension sensor is provided with the magnetic powder tension control system, To measure the Tensity size of the flexible substrate and adjust the tension force of the flexible substrate and defeated according to the tension signal of feedback Send speed.
- 6. according to the equipment of claim 1-4 any one of them assemble nanometer beads, it is characterised in that the heating evaporation plate Panel material be stainless steel.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201721291784.3U CN207352983U (en) | 2017-10-09 | 2017-10-09 | A kind of equipment of assemble nanometer bead |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201721291784.3U CN207352983U (en) | 2017-10-09 | 2017-10-09 | A kind of equipment of assemble nanometer bead |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN207352983U true CN207352983U (en) | 2018-05-11 |
Family
ID=62358409
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201721291784.3U Active CN207352983U (en) | 2017-10-09 | 2017-10-09 | A kind of equipment of assemble nanometer bead |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN207352983U (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN109847684A (en) * | 2019-04-23 | 2019-06-07 | 福建龙新三维阵列科技有限公司 | The equipment for preparing the micro-nano array of metal oxide |
| CN109911857A (en) * | 2019-04-23 | 2019-06-21 | 福建龙新三维阵列科技有限公司 | The method for continuously preparing the micro-nano array of metal oxide |
-
2017
- 2017-10-09 CN CN201721291784.3U patent/CN207352983U/en active Active
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN109847684A (en) * | 2019-04-23 | 2019-06-07 | 福建龙新三维阵列科技有限公司 | The equipment for preparing the micro-nano array of metal oxide |
| CN109911857A (en) * | 2019-04-23 | 2019-06-21 | 福建龙新三维阵列科技有限公司 | The method for continuously preparing the micro-nano array of metal oxide |
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