CN201250282Y - 沉积室遮挡装置及相应的沉积室壁 - Google Patents
沉积室遮挡装置及相应的沉积室壁 Download PDFInfo
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- CN201250282Y CN201250282Y CNU2008201527869U CN200820152786U CN201250282Y CN 201250282 Y CN201250282 Y CN 201250282Y CN U2008201527869 U CNU2008201527869 U CN U2008201527869U CN 200820152786 U CN200820152786 U CN 200820152786U CN 201250282 Y CN201250282 Y CN 201250282Y
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CNU2008201527869U CN201250282Y (zh) | 2008-09-05 | 2008-09-05 | 沉积室遮挡装置及相应的沉积室壁 |
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CNU2008201527869U CN201250282Y (zh) | 2008-09-05 | 2008-09-05 | 沉积室遮挡装置及相应的沉积室壁 |
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CN201250282Y true CN201250282Y (zh) | 2009-06-03 |
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Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN101949008A (zh) * | 2010-07-02 | 2011-01-19 | 北京北方微电子基地设备工艺研究中心有限责任公司 | 载板、用载板进行沉积处理方法及等离子体沉积处理设备 |
CN104576828A (zh) * | 2014-12-24 | 2015-04-29 | 新奥光伏能源有限公司 | 异质结太阳能电池的制作方法以及用于生产电池的模具 |
CN111826607A (zh) * | 2019-04-18 | 2020-10-27 | 天通(嘉兴)新材料有限公司 | 一种激光管帽镀膜遮挡治具 |
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2008
- 2008-09-05 CN CNU2008201527869U patent/CN201250282Y/zh not_active Expired - Lifetime
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN101949008A (zh) * | 2010-07-02 | 2011-01-19 | 北京北方微电子基地设备工艺研究中心有限责任公司 | 载板、用载板进行沉积处理方法及等离子体沉积处理设备 |
CN104576828A (zh) * | 2014-12-24 | 2015-04-29 | 新奥光伏能源有限公司 | 异质结太阳能电池的制作方法以及用于生产电池的模具 |
CN107275438A (zh) * | 2014-12-24 | 2017-10-20 | 新奥光伏能源有限公司 | 异质结太阳能电池的制作方法以及用于生产电池的模具 |
CN111826607A (zh) * | 2019-04-18 | 2020-10-27 | 天通(嘉兴)新材料有限公司 | 一种激光管帽镀膜遮挡治具 |
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C14 | Grant of patent or utility model | ||
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Owner name: SEMICONDUCTOR MANUFACTURING INTERNATIONAL (BEIJING Free format text: FORMER OWNER: SEMICONDUCTOR MANUFACTURING INTERNATIONAL (SHANGHAI) CORPORATION Effective date: 20130219 |
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Free format text: CORRECT: ADDRESS; FROM: 201203 PUDONG NEW AREA, SHANGHAI TO: 100176 DAXING, BEIJING |
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Effective date of registration: 20130219 Address after: 100176 No. 18 Wenchang Avenue, Beijing economic and Technological Development Zone Patentee after: Semiconductor Manufacturing International (Beijing) Corporation Address before: 201203 Shanghai City, Pudong New Area Zhangjiang Road No. 18 Patentee before: Semiconductor Manufacturing International (Shanghai) Corporation |
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CX01 | Expiry of patent term | ||
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Granted publication date: 20090603 |