CN1960982A - 制备1,3-二氧戊环-4,6-二酮化合物的方法 - Google Patents
制备1,3-二氧戊环-4,6-二酮化合物的方法 Download PDFInfo
- Publication number
- CN1960982A CN1960982A CNA2005800174002A CN200580017400A CN1960982A CN 1960982 A CN1960982 A CN 1960982A CN A2005800174002 A CNA2005800174002 A CN A2005800174002A CN 200580017400 A CN200580017400 A CN 200580017400A CN 1960982 A CN1960982 A CN 1960982A
- Authority
- CN
- China
- Prior art keywords
- dioxolane
- organic solvent
- dione compounds
- propyl alcohol
- compound
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D491/00—Heterocyclic compounds containing in the condensed ring system both one or more rings having oxygen atoms as the only ring hetero atoms and one or more rings having nitrogen atoms as the only ring hetero atoms, not provided for by groups C07D451/00 - C07D459/00, C07D463/00, C07D477/00 or C07D489/00
- C07D491/02—Heterocyclic compounds containing in the condensed ring system both one or more rings having oxygen atoms as the only ring hetero atoms and one or more rings having nitrogen atoms as the only ring hetero atoms, not provided for by groups C07D451/00 - C07D459/00, C07D463/00, C07D477/00 or C07D489/00 in which the condensed system contains two hetero rings
- C07D491/10—Spiro-condensed systems
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Heterocyclic Carbon Compounds Containing A Hetero Ring Having Oxygen Or Sulfur (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
- Heterocyclic Compounds That Contain Two Or More Ring Oxygen Atoms (AREA)
Abstract
Description
Claims (4)
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP166665/2004 | 2004-06-04 | ||
JP2004166665A JP2005343837A (ja) | 2004-06-04 | 2004-06-04 | 1,3−ジオキソラン−4,6−ジオン化合物の製造方法 |
PCT/JP2005/010302 WO2005118566A1 (en) | 2004-06-04 | 2005-05-31 | Method for producing 1,3-dioxolan-4,6-dione compound |
Publications (2)
Publication Number | Publication Date |
---|---|
CN1960982A true CN1960982A (zh) | 2007-05-09 |
CN1960982B CN1960982B (zh) | 2010-05-05 |
Family
ID=35462870
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN2005800174002A Expired - Fee Related CN1960982B (zh) | 2004-06-04 | 2005-05-31 | 分离1,3-二氧杂环己烷-4,6-二酮化合物的方法 |
Country Status (6)
Country | Link |
---|---|
US (1) | US7442809B2 (zh) |
EP (1) | EP1751129A4 (zh) |
JP (1) | JP2005343837A (zh) |
CN (1) | CN1960982B (zh) |
TW (1) | TWI316936B (zh) |
WO (1) | WO2005118566A1 (zh) |
Families Citing this family (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US9825331B2 (en) * | 2011-11-30 | 2017-11-21 | Solvay Sa | Fluorinated derivatives of meldrum's acid, a method for the preparation of the same, and their use as a solvent additive |
JP7038474B2 (ja) * | 2014-03-07 | 2022-03-18 | ザ ジェネラル ホスピタル コーポレイション | ヨウ素(iii)を媒介とする放射性フッ素化 |
US10259800B2 (en) | 2015-10-29 | 2019-04-16 | The General Hospital Corporation | Method of fluorination using iodonium ylides |
US10633391B2 (en) * | 2016-10-18 | 2020-04-28 | Mitsubishi Gas Chemical Company, Inc. | Diol, method for manufacturing diol, di(meth)acrylate, and method for manufacturing di(meth)acrylate |
KR20200041993A (ko) * | 2017-08-31 | 2020-04-22 | 다이이찌 산쿄 가부시키가이샤 | 항체-약물 콘주게이트의 개량 제조 방법 |
JP7205493B2 (ja) * | 2017-12-15 | 2023-01-17 | 三菱瓦斯化学株式会社 | ジオールの製造方法 |
Family Cites Families (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4613671A (en) * | 1985-06-26 | 1986-09-23 | The Dow Chemical Company | Process for the preparation of Meldrum's acid |
JPH0768238B2 (ja) * | 1987-12-08 | 1995-07-26 | 松下電器産業株式会社 | 新規なメルドラム酸誘導体 |
US5250669A (en) * | 1987-12-04 | 1993-10-05 | Wako Pure Chemical Industries, Ltd. | Photosensitive compound |
JPH08176140A (ja) * | 1994-12-26 | 1996-07-09 | Toagosei Co Ltd | 5−メチレン−1,3−ジオキサン−4,6−ジオン誘導体ならびにその合成方法および安定化方法 |
JP2002249674A (ja) | 2001-02-27 | 2002-09-06 | Fuji Photo Film Co Ltd | オキソノール色素化合物、及びそれを用いた光情報記録媒体、光情報記録方法 |
JP2006052355A (ja) * | 2004-08-16 | 2006-02-23 | Fuji Photo Film Co Ltd | オキソノール化合物の製造方法 |
-
2004
- 2004-06-04 JP JP2004166665A patent/JP2005343837A/ja active Pending
-
2005
- 2005-05-31 US US11/628,338 patent/US7442809B2/en not_active Expired - Fee Related
- 2005-05-31 CN CN2005800174002A patent/CN1960982B/zh not_active Expired - Fee Related
- 2005-05-31 WO PCT/JP2005/010302 patent/WO2005118566A1/en not_active Application Discontinuation
- 2005-05-31 EP EP05745961A patent/EP1751129A4/en not_active Withdrawn
- 2005-06-02 TW TW094118100A patent/TWI316936B/zh not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
CN1960982B (zh) | 2010-05-05 |
TW200611901A (en) | 2006-04-16 |
US7442809B2 (en) | 2008-10-28 |
EP1751129A1 (en) | 2007-02-14 |
US20080015365A1 (en) | 2008-01-17 |
TWI316936B (en) | 2009-11-11 |
WO2005118566A1 (en) | 2005-12-15 |
EP1751129A4 (en) | 2010-07-07 |
JP2005343837A (ja) | 2005-12-15 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
C06 | Publication | ||
PB01 | Publication | ||
C10 | Entry into substantive examination | ||
SE01 | Entry into force of request for substantive examination | ||
ASS | Succession or assignment of patent right |
Owner name: FUJI PHOTO FILM CO., LTD. Free format text: FORMER OWNER: FUJIFILM HOLDINGS CORP. Effective date: 20070914 |
|
C41 | Transfer of patent application or patent right or utility model | ||
TA01 | Transfer of patent application right |
Effective date of registration: 20070914 Address after: Tokyo, Japan Applicant after: Fuji Film Corp. Address before: Tokyo, Japan Applicant before: Fuji Photo Film Co., Ltd. |
|
C14 | Grant of patent or utility model | ||
GR01 | Patent grant | ||
C17 | Cessation of patent right | ||
CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20100505 Termination date: 20120531 |