CN1943016A - 用于半导体晶圆的化学机械抛光机的装载装置 - Google Patents
用于半导体晶圆的化学机械抛光机的装载装置 Download PDFInfo
- Publication number
- CN1943016A CN1943016A CNA2005800109268A CN200580010926A CN1943016A CN 1943016 A CN1943016 A CN 1943016A CN A2005800109268 A CNA2005800109268 A CN A2005800109268A CN 200580010926 A CN200580010926 A CN 200580010926A CN 1943016 A CN1943016 A CN 1943016A
- Authority
- CN
- China
- Prior art keywords
- loading
- plate
- cup
- wafer
- carrier head
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000011068 loading method Methods 0.000 title claims abstract description 179
- 239000004065 semiconductor Substances 0.000 title claims abstract description 14
- 239000000126 substance Substances 0.000 title abstract 3
- 238000005498 polishing Methods 0.000 claims abstract description 74
- 238000013016 damping Methods 0.000 claims abstract description 43
- 239000011521 glass Substances 0.000 claims description 21
- 239000013078 crystal Substances 0.000 claims description 12
- 238000007598 dipping method Methods 0.000 claims description 3
- 230000002093 peripheral effect Effects 0.000 claims description 3
- 238000000034 method Methods 0.000 abstract description 7
- 235000012431 wafers Nutrition 0.000 abstract 4
- 230000001174 ascending effect Effects 0.000 abstract 1
- 230000006835 compression Effects 0.000 description 7
- 238000007906 compression Methods 0.000 description 7
- 238000000227 grinding Methods 0.000 description 4
- 238000010586 diagram Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 230000000630 rising effect Effects 0.000 description 2
- 238000000926 separation method Methods 0.000 description 2
- 239000002002 slurry Substances 0.000 description 2
- 230000032258 transport Effects 0.000 description 2
- 230000006978 adaptation Effects 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 238000010276 construction Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 238000009434 installation Methods 0.000 description 1
- 230000001788 irregular Effects 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 230000003252 repetitive effect Effects 0.000 description 1
- 238000007789 sealing Methods 0.000 description 1
Images
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
- H01L21/304—Mechanical treatment, e.g. grinding, polishing, cutting
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B37/00—Lapping machines or devices; Accessories
- B24B37/34—Accessories
- B24B37/345—Feeding, loading or unloading work specially adapted to lapping
Landscapes
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
- Mechanical Treatment Of Semiconductor (AREA)
Abstract
Description
Claims (7)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR10-2004-0025588A KR100536175B1 (ko) | 2004-04-14 | 2004-04-14 | 반도체 웨이퍼의 화학기계적 연마장치용 로딩디바이스 |
KR1020040025588 | 2004-04-14 |
Publications (2)
Publication Number | Publication Date |
---|---|
CN1943016A true CN1943016A (zh) | 2007-04-04 |
CN100447958C CN100447958C (zh) | 2008-12-31 |
Family
ID=36148524
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CNB2005800109268A Active CN100447958C (zh) | 2004-04-14 | 2005-04-08 | 用于半导体晶圆的化学机械抛光机的装载装置 |
Country Status (7)
Country | Link |
---|---|
US (1) | US7338353B2 (zh) |
EP (1) | EP1743362A1 (zh) |
JP (1) | JP2007533154A (zh) |
KR (1) | KR100536175B1 (zh) |
CN (1) | CN100447958C (zh) |
TW (1) | TW200539283A (zh) |
WO (1) | WO2006041248A1 (zh) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN102747341A (zh) * | 2012-08-01 | 2012-10-24 | 沈阳拓荆科技有限公司 | 一种安装晶圆托架的专用工具及其安装方法 |
CN113053714A (zh) * | 2019-12-27 | 2021-06-29 | 中微半导体设备(上海)股份有限公司 | 真空处理系统、基台的驱动装置及其控制方法 |
Families Citing this family (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100716935B1 (ko) * | 2005-11-25 | 2007-05-14 | 두산디앤디 주식회사 | 반도체 웨이퍼의 화학기계적 연마장치용 로딩디바이스 |
KR100744036B1 (ko) * | 2006-06-29 | 2007-07-30 | 두산메카텍 주식회사 | 화학적 기계적 연마장비의 로딩유니트 및 이를 이용한웨이퍼 정위치 감지방법 |
JP5303491B2 (ja) * | 2010-02-19 | 2013-10-02 | 信越半導体株式会社 | 研磨ヘッド及び研磨装置 |
US20160176014A1 (en) * | 2014-12-19 | 2016-06-23 | Applied Materials, Inc. | Systems, apparatus, and methods for an improved polishing head gimbal using a spherical ball bearing |
KR102386998B1 (ko) * | 2015-07-30 | 2022-04-15 | 엘지디스플레이 주식회사 | 서포터 핀 및 이를 포함하는 열처리장치 |
KR101693270B1 (ko) * | 2016-06-30 | 2017-01-17 | 주식회사 대원에프엔씨 | 위치결정장치 |
USD925623S1 (en) * | 2019-02-28 | 2021-07-20 | Guido Valentini | Protective cap |
CN109702638A (zh) * | 2019-03-12 | 2019-05-03 | 山东科技大学 | 一种化学机械抛光设备 |
Family Cites Families (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH09254028A (ja) * | 1996-03-25 | 1997-09-30 | Ebara Corp | ポリッシング装置のプッシャー |
JPH09277161A (ja) * | 1996-04-12 | 1997-10-28 | Ebara Corp | ポリッシング対象物搬送用ハンド |
JP3871450B2 (ja) * | 1997-10-20 | 2007-01-24 | 株式会社荏原製作所 | ポリッシング装置 |
DE69838161T2 (de) * | 1997-10-20 | 2008-04-17 | Ebara Corp. | Poliervorrichtung |
JP2999192B1 (ja) * | 1998-12-15 | 2000-01-17 | 三菱マテリアル株式会社 | ウェーハローディング装置及びウェーハの製造方法 |
KR100304706B1 (ko) * | 1999-06-16 | 2001-11-01 | 윤종용 | 화학기계적 연마장치 및 연마 헤드 내부의 오염 물질 세척방법 |
KR100470229B1 (ko) * | 2002-02-08 | 2005-02-05 | 두산디앤디 주식회사 | 화학기계적 연마장치의 로딩디바이스 |
US6755726B2 (en) * | 2002-03-25 | 2004-06-29 | United Microelectric Corp. | Polishing head with a floating knife-edge |
US7101253B2 (en) * | 2002-08-27 | 2006-09-05 | Applied Materials Inc. | Load cup for chemical mechanical polishing |
US7044832B2 (en) * | 2003-11-17 | 2006-05-16 | Applied Materials | Load cup for chemical mechanical polishing |
JP4838614B2 (ja) * | 2006-03-29 | 2011-12-14 | 株式会社岡本工作機械製作所 | 半導体基板の平坦化装置および平坦化方法 |
-
2004
- 2004-04-14 KR KR10-2004-0025588A patent/KR100536175B1/ko active IP Right Grant
-
2005
- 2005-04-08 JP JP2007508269A patent/JP2007533154A/ja active Pending
- 2005-04-08 EP EP05805012A patent/EP1743362A1/en not_active Withdrawn
- 2005-04-08 WO PCT/KR2005/001030 patent/WO2006041248A1/en active Application Filing
- 2005-04-08 CN CNB2005800109268A patent/CN100447958C/zh active Active
- 2005-04-08 US US10/599,861 patent/US7338353B2/en not_active Expired - Fee Related
- 2005-04-12 TW TW094111462A patent/TW200539283A/zh unknown
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN102747341A (zh) * | 2012-08-01 | 2012-10-24 | 沈阳拓荆科技有限公司 | 一种安装晶圆托架的专用工具及其安装方法 |
CN102747341B (zh) * | 2012-08-01 | 2013-09-18 | 沈阳拓荆科技有限公司 | 一种安装晶圆托架的专用工具及其安装方法 |
CN113053714A (zh) * | 2019-12-27 | 2021-06-29 | 中微半导体设备(上海)股份有限公司 | 真空处理系统、基台的驱动装置及其控制方法 |
CN113053714B (zh) * | 2019-12-27 | 2024-03-08 | 中微半导体设备(上海)股份有限公司 | 真空处理系统、基台的驱动装置及其控制方法 |
Also Published As
Publication number | Publication date |
---|---|
JP2007533154A (ja) | 2007-11-15 |
WO2006041248A1 (en) | 2006-04-20 |
KR20050100424A (ko) | 2005-10-19 |
CN100447958C (zh) | 2008-12-31 |
EP1743362A1 (en) | 2007-01-17 |
KR100536175B1 (ko) | 2005-12-12 |
US7338353B2 (en) | 2008-03-04 |
US20070218817A1 (en) | 2007-09-20 |
TW200539283A (en) | 2005-12-01 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
C06 | Publication | ||
PB01 | Publication | ||
C10 | Entry into substantive examination | ||
SE01 | Entry into force of request for substantive examination | ||
C14 | Grant of patent or utility model | ||
GR01 | Patent grant | ||
ASS | Succession or assignment of patent right |
Owner name: K.C. TECH CO., LTD. Free format text: FORMER OWNER: DOOSAN MECATEC CO., LTD. Effective date: 20090911 |
|
C41 | Transfer of patent application or patent right or utility model | ||
TR01 | Transfer of patent right |
Effective date of registration: 20090911 Address after: Gyeonggi Do, South Korea Patentee after: K. C. Tech Co., Ltd. Address before: Gyeongnam, South Korea Patentee before: Miyakoyama MECATEC Kabushiki Kaisha |
|
TR01 | Transfer of patent right | ||
TR01 | Transfer of patent right |
Effective date of registration: 20180426 Address after: Korea city Daoan Patentee after: Case Polytron Technologies Inc Address before: Gyeonggi Do, South Korea Patentee before: K. C. Tech Co., Ltd. |