CN1898313A - 用于水输送氟化低聚硅烷的组合物 - Google Patents
用于水输送氟化低聚硅烷的组合物 Download PDFInfo
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- CN1898313A CN1898313A CNA2004800388562A CN200480038856A CN1898313A CN 1898313 A CN1898313 A CN 1898313A CN A2004800388562 A CNA2004800388562 A CN A2004800388562A CN 200480038856 A CN200480038856 A CN 200480038856A CN 1898313 A CN1898313 A CN 1898313A
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- enriched material
- water
- fluorinated
- substrate
- tensio
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- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
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- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B41/00—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone
- C04B41/45—Coating or impregnating, e.g. injection in masonry, partial coating of green or fired ceramics, organic coating compositions for adhering together two concrete elements
- C04B41/46—Coating or impregnating, e.g. injection in masonry, partial coating of green or fired ceramics, organic coating compositions for adhering together two concrete elements with organic materials
- C04B41/49—Compounds having one or more carbon-to-metal or carbon-to-silicon linkages ; Organo-clay compounds; Organo-silicates, i.e. ortho- or polysilicic acid esters ; Organo-phosphorus compounds; Organo-inorganic complexes
- C04B41/4905—Compounds having one or more carbon-to-metal or carbon-to-silicon linkages ; Organo-clay compounds; Organo-silicates, i.e. ortho- or polysilicic acid esters ; Organo-phosphorus compounds; Organo-inorganic complexes containing silicon
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- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
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- C04B41/52—Multiple coating or impregnating multiple coating or impregnating with the same composition or with compositions only differing in the concentration of the constituents, is classified as single coating or impregnation
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Abstract
本发明涉及一种可稀释的非水浓缩物和一种用于将氟化低聚硅烷水传递到基底的水稀释物,一种用水稀释组合物处理基底使其具有斥油和斥水性能的方法,以及具有由水稀释物形成的涂层的制品。
Description
技术领域
本发明涉及将氟化低聚硅烷水输送到基底上。更特别地,本发明是一种可稀释的非水浓缩物,其包含至少一种氟化低聚硅烷和至少一种表面活性剂,其与水或水溶剂混合物一起形成水稀释物,其可被涂覆和固化在基底上。
背景技术
通过将熔融态或溶解在挥发性有机溶剂中的氟化硅烷涂覆到基底上,可在某些基底上提供良好斥油性和斥水性的涂层。通过使用催化剂经加热将涂覆的氟化硅烷固化,从而将氟化硅烷化学固定到基底上。(例如参见美国专利3012006(Holbrook等))。然而,挥发性有机溶剂的使用通常对环境是有害的,并且由于溶剂的易燃性这也是很危险的。因此,开发了一种将氟化硅烷涂覆到基底上的替代方法,其使用了水输送。(参见,例如美国专利No.5274159(Pellerite等)、美国专利No.5702509(Pellerite等)和美国专利No.5550184(Halling))。
用于将氟化硅烷水输送到基底上的公知组合物的一个问题在于它们的保存期不长。另一个问题在于在将它们涂覆到基底上之前可能需要高剪切的混合。公知组合物具有高的固体含量,这导致产生了厚的涂层。
尽管将氟化硅烷水输送到基底上在本领域是公知的,但是却已知持续需要可提供具有下述性质的用于水输送氟化硅烷的组合物:1)可储存相对长的时间;2)不需要高剪切混合或输入其它的机械能量;3)具有相对低的固体含量,使其更易于在玻璃或其它基底上较薄地涂覆;和4)同时,一旦涂覆到基底上并固化后,能够提供耐久的涂层。这种组合物目前用氟化硅烷和氟化表面活性剂来描述。参见,例如WO03/044075和WO 03/046056。US 5739369、US 5527931、EP 222157、EP 225187和EP 225188中描述了包括氟化低聚硅烷的涂料组合物。
发明概述
本发明提供用于水输送氟化低聚硅烷的组合物。一种实施方式是可稀释的非水浓缩物,另一种实施方式是使用该可稀释的非水浓缩物和一种包含水或水溶剂混合物的稀释剂的水稀释物。该组合物可长期保存,并易于通过简单的混合进行制备,而不需要高剪切的乳化。该组合物形成的涂层为硬的或软的基底提供了斥油性和斥水性,以及易于清洁性。
本发明提供一种可稀释的非水浓缩物,其包含一种非水均相混合物,包括:
(a)至少一种如通式I的氟化低聚硅烷:
A-Mn fMm hMr a-G
其中:A是氢或引发物质的残基;Mf表示一种或多种氟化单体的衍生单元;Mh表示一种或多种非氟化单体的衍生单元;Ma表示一种或多种包含甲硅烷基SiY3的非氟化单体的衍生单元,其中Y是可水解的基团;G是具有如下通式的链转移剂的残基:
-S-Q-Y3
其中Y是可水解的基团,Q是有机二价连接基团;n是1~100的整数;m是0~100的整数;和r是0~100的整数;和
(b)至少一种表面活性剂。
可稀释的非水浓缩物在被涂覆到基底上之前必须用水或水溶剂混合物进行稀释。有利地,可稀释的非水浓缩物在适当的保存条件下具有相对长的保存期,即,大于约1天,优选大于约14天,最优选大于约6个月。可稀释的非水浓缩物比稀释形式可更经济地运输和保存。可稀释的非水浓缩物可在其涂覆地点进行稀释,这有利于在选择稀释液以及因此涂覆的涂层的厚度上具有更高的灵活性。仅通过用手摇动可稀释的非水浓缩物和水或水溶剂混合物所组成的混合物就可将可稀释的非水浓缩物分散在水或水溶剂混合物中(形成水稀释物)。不需要另外的机械处理,例如高剪切混合或超声作用。
在另一方面,本发明提供一种水稀释组合物,包括:(a)稀释介质,包括水、或含水和至少一种水可混溶性共溶剂的水溶剂混合物;和(b)可稀释的非水浓缩物,其包含一种包括以下物质的非水均相混合物:(i)至少一种如上所述的氟化低聚硅烷;和(ii)至少一种表面活性剂。
水稀释组合物可涂覆在基底上提供耐久的涂层。有利的是,本发明的水稀释组合物具有相对低的固体含量,这使得它们在玻璃或其它硅质基底上更易于较薄地涂覆,所述的其它硅质基底,例如可能具有对厚度敏感的光学性质。本发明的水稀释物在处理中没有使用有机溶剂或基本上减少有机溶剂的使用,而有机溶剂可能是易燃的和/或对环境有害的。水稀释物组合物在适当的保存条件下也具有至少数小时的保存期。
本发明的其它实施方式包括一种处理基底的方法,和一种制品,其包含基底和通过涂覆并固化水稀释组合物而形成的涂层。
本发明示例性实施方式的详述
可稀释的非水浓缩物
本发明的可稀释的非水浓缩物含有非水均相混合物,该混合物含有至少一种氟化低聚硅烷和至少一种表面活性剂。可稀释的非水浓缩物任选进一步包含至少一种有机共溶剂和/或至少一种添加剂。
“均相混合物”,当指代可稀释的非水浓缩物时,定义为稳定的可稀释的非水浓缩物,即:至少在从可稀释的非水浓缩物制备水稀释物所需的时间内基本没有沉淀或基本上没有发生相分离。然而,优选地和为了商业实施的目的,可稀释的浓缩物在适当的保存条件下(密封容器、无水、室温)至少在约1天内是稳定的,优选多达约6个月或更久。可稀释的非水浓缩物可为透明的或有些浑浊。
术语“非水”指没有添加水作为可稀释非水浓缩物的组分。然而,可以有从组合物的其它组分中外来的水,但是水的总量对可稀释非水浓缩物的保存期或稳定性没有不利的影响(即,优选为小于可稀释非水浓缩物的约0.1wt.%)。
氟化低聚硅烷
可稀释非水浓缩物的氟化低聚硅烷具有如下通式:
A-Mn fMm hMr a-G (I)
其中A表示氢或引发物质的残基,该引发物质例如带有衍生于自由基引发剂的分解或衍生于链转移剂的基团的有机化合物,和;
Mf表示如上所述的一种或多种氟化单体的衍生单元;
Mh表示一种或多种非氟化单体的衍生单元;
Ma表示带有通式为SiY3的甲硅烷基的单元;
其中Y独立地表示烷基、芳基或如下所述的可水解基团;和
G是包含链转移剂残基的单价有机基团,具有如下通式:-S-Q-Y3;
其中Q是如下所述的有机二价连接基团,和
Y独立地表示可水解的基团。
由n、m和r表示的单元总数通常至少为2,优选地至少为3,以得到低聚化合物。在含氟低聚体中n的值在1~100之间,优选在1~20之间。m和r值在0~100之间,优选在0~20之间。依照一个优选的实施方式,m值低于n值,且n+m+r值至少为2。
该含氟低聚体的平均分子量通常在400~100000之间,优选在600~20000之间,更优选在1000~10000之间。该含氟低聚体通常优选包含至少5摩尔%(基于Mf、Mh和Ma单元的总摩尔数)的可水解基团。
本领域的技术人员可进一步理解本发明所用的含氟低聚体会产生化合物的混合物,因此,通式I应当理解为表示化合物的混合物,通式I中的数字n、m和r表示了在该混合物中各对应单元的摩尔数。因此,显然n、m和r可以是分数值。
含氟低聚体中的单元Mf n衍生自氟化单体,优选衍生自含氟丙烯酸酯和甲基丙烯酸酯。
用于制备含氟低聚体的氟化单体的实例包括可表示为如下通式的那些:
Rf-Q-E (II)
其中:Rf表示含至少3个碳原子的部分或完全氟化的脂族基,Q表示有机二价连接基团;和E表示烯不饱和基团。该烯不饱和基团E可以是氟代或非氟代的。
氟化单体中的氟代脂族基Rf可以是氟化的、稳定的、惰性的,优选为饱和的、非极性的、单价脂族基。其可以是直链、支链或环状或其组合。其可以包含杂原子,例如氧、二价或六价硫、或氮。Rf优选为全氟化基团。Rf基含有至少2~多达18个碳原子,优选为3~14个,更优选为2~8个,特别是4个。Rf基的末端部分是全氟部分,其优选包含至少5个氟原子,例如CF3CF2-、CF3CF2CF2-和(CF3)2CF-。优选的Rf基是全氟化或大量氟化的,优选那些式为CnF2n+1-的全氟脂族基,其中n为2~6,特别为3~5。其中Rf基为C4F9-的化合物通常比那些由带有更多碳原子的全氟基团构成的Rf基更具有环境友好性。令人惊讶的是,尽管C4全氟基团很短,但由其制备的含氟低聚化合物是非常有效的。
上述式(II)中的连接基团Q将氟代脂族或氟化聚醚基Rf与可自由基聚合的基团E连接起来,其通常是非氟化的有机连接基团。该连接基团可以是化学键,但优选地包含1~约20个碳原子,可任选包括含氧、氮或硫的基团或其组合。该连接基团优选地不含实质上阻碍自由基低聚反应的官能团(即可聚合的烯双键、硫醇和本领域技术人员已知的其它这类官能物)。适用的有机双键连接基团的实例包括:*-COQ’-R1-Q”-CO-、*-COO-CH2-CH(OH)-R1-Q’-CO-、*-L1-Q’-CONH-L2-、*-R1-Q’-CO-、*-COQ’-R1-、-R1、*-COQ’-R1-Q’、*-SO2NRa-R1-Q’-、*-SO2NRa-R1-和*-SO2NRa-R1-Q’-CO-,
其中Q’和Q”独立地表示O或NRa,Ra是氢或含1~4个碳原子的烷基,R1表示直链、环状或支链的亚烃基,其可被一个或多个例如O或N的杂原子间隔,L1和L2分别独立地表示非氟化的有机二价连接基团,包括例如:亚烃基、羰基、羰胺基亚烃基和/或羧基亚烃基,*表示连接基团与式(II)中的基团Rf连接的位置。优选的连接基团包括-SO2N(R1)-OC(O)-和-(CH2)d-OC(O)-,其中R1是氢或C1~C4烷基,d为1~20的整数。
美国专利2803615中已知并公开了如上所述的含氟单体Rf-Q-E及其制备方法。该化合物的实例包括如下大类:含氟丙烯酸酯、甲基丙烯酸酯、乙烯基醚、和含有氟化磺酰氨基的烯丙基化合物、由含氟调聚物醇衍生的丙烯酸酯或甲基丙烯酸酯、由含氟羧酸衍生的丙烯酸酯或甲基丙烯酸酯、和全氟烷基丙烯酸酯或甲基丙烯酸酯,如EP-A-526976中所公开。
美国专利4085137中公开了全氟聚醚丙烯酸酯或甲基丙烯酸酯。
含氟单体的优选实例包括:
CF3(CF2)2CH2OC(O)CH=CH2,
CF3(CF2)2CH2OC(O)C(CH3)=CH2,
CF3(CF2)3CH2OCOC(CH3)=CH2,
CF3(CF2)3CH2OCOCH=CH2,
其中R1表示甲基、乙基或n-丁基。
含氟低聚体的单元Mh(当存在时)通常衍生自非氟化的单体,优选衍生自由可聚合的基团和烃部分组成的单体。包含烃基团的单体是公知的,通常可商购得到。包含烃的单体的实例包括依照下式的那些:
Rh-Q-E (III)
其中:Rh表示烃基,Q表示化学键或如上所述的二价连接基团,E是如上定义的烯不饱和基团。优选地,该烃基优选选自:直链、支链或环状烷基、芳烷基、烷基芳香基和芳基。优选的烃基包含4~30个碳原子。进一步,非氟化的单体包括其中如式(III)的烃基包含氧化烯或包含一个或多个活性基团的那些,所述活性基团例如羟基、氨基、环氧基、卤素,例如氯和溴。
可衍生出单元Mh的非氟化单体的实例包括如下大类:可发生自由基聚合的烯式化合物:例如烯丙酯,例如醋酸烯丙酯和庚酸丙烯酯;烷基乙烯基醚或烷基烯丙基醚,例如十六烷基乙烯基醚、十二烷基乙烯基醚、2-氯乙基乙烯基醚、乙基乙烯基醚;不饱和酸例如丙烯酸、甲基丙烯酸、α-氯丙烯酸、巴豆酸、马来酸、富马酸或衣康酸的酸酐和酯,例如丙烯酸和甲基丙烯酸的乙烯酯、烯丙酯、甲酯、丁酯、异丁酯、己酯、庚酯、2-乙基己酯、环己酯、十二烷酯、十八烷酯、异冰片酯或烷氧基乙酯;α-β不饱和腈,例如丙烯腈、甲基丙烯腈、2-氯丙烯腈、丙烯酸2-氰乙酯、氰基丙烯酸烷基酯;乙醇酸烯丙酯、丙烯酸胺、甲基丙烯酸胺、n-二异丙基丙烯酸胺、双丙酮丙烯酸胺、甲基丙烯酸N,N-二乙基氨基乙酯、甲基丙烯酸N-叔-丁基胺基乙酯;苯乙烯及其衍生物,例如乙烯基甲苯、α-甲基苯乙烯、α-氰甲基苯乙烯;可包含卤素的低碳烯烃,例如乙烯、丙烯、异丁烯、3-氯-1-异丁烯、丁二烯、异戊二烯、氯代和二氯代丁二烯和2,5-二甲基-1,5-己二烯,和烯丙基或乙烯基卤化物,例如氯乙烯和偏二氯乙烯。优选的非氟化单体包括含烃基的单体,例如选自如下物质的那些:甲基丙烯酸十八烷酯、甲基丙烯酸十二烷酯、丙烯酸丁酯、N-羟甲基丙烯酰胺、甲基丙烯酸异丁酯、丙烯酸乙基己酯和甲基丙烯酸乙基己酯;和氯乙烯和偏二氯乙烯。
用于本发明的含氟低聚体通常进一步包含单元Ma,其具有甲硅烷基和位于衍生自一种或多种上述非氟化的单体的单元末端的可水解基团。单元Ma的实例包括对应于下述通式的那些:
RH-Q-E-G-SiY3 (IV)
该单体通常的实施例包括乙烯基三氯硅烷、乙烯基三甲氧基硅烷、乙烯基三乙氧基硅烷、甲基丙烯酸三甲氧基甲硅烷基丙酯,等等。
通常地,通过将氟化单体与任选非氟化单体和含甲硅烷基的单体在链转移剂存在下进行的自由基聚合反应,制备含氟低聚体。通常使用自由基引发剂来引发该聚合或低聚反应。可以采用通常公知的自由基引发剂,其实例包括偶氮化合物,例如偶氮二异丁腈(ABIN)、偶氮-2-氰基戊酸等等;过氧化物,例如异丙基苯、叔丁基过氧化物和叔戊基过氧化物、二烷基过氧化物,例如二-叔丁基过氧化物和二异丙苯基过氧化物、过氧化酯,例如过苯甲酸叔-丁酯、过氧邻苯二甲酸二-叔丁酯、二酰基过氧化物,例如过氧化苯甲酰和过氧化月桂酰。
低聚反应可在任何适用于有机自由基反应的溶剂中进行。反应物可以任何适当浓度存在于溶剂中,例如为反应混合物总量的约5~约90wt.%。适当溶剂的实施例包括脂肪族和脂环族烃(例如己烷、庚烷、环己烷)、芳香族溶剂(例如苯、甲苯、二甲苯)、醚类(例如二乙醚、甘醇二甲醚、二甘醇二甲醚、二异丙醚)、酯类(例如乙酸乙酯、乙酸丁酯)、醇类(例如乙醇、异丙醇)、酮类(例如丙酮、甲基乙基酮、甲基异丁基酮)、亚砜类(例如二甲亚砜)、胺类(例如N,N-二甲基甲酰胺、N,N-二甲基乙酰胺)、卤化溶剂,例如甲基氯仿、FREONTM113、三氯乙烯、α,α,α-三氟甲苯,等等,及其混合物。
低聚反应可以在任何适于进行有机自由基反应的温度下进行。本领域的技术人员可以基于对例如试剂的溶解性、具体引发剂使用所需的温度、所需的分子量等的考虑,可容易地选择具体使用的温度和溶剂。尽管列举出适用于所有引发剂和所有溶剂的特定温度是不现实的,通常适用的温度为约30℃~约200℃,优选地为50~100℃。
含氟低聚体通常是在链转移剂存在的情况下制备。适用的链转移剂可包括羟基-、氨基-、巯基或卤素基团。该链转移剂可包含两个或多个这类羟基-、氨基、巯基或卤素基团。通常用于制备含氟低聚体的链转移剂包括选自以下的那些:2-巯基乙醇、3-巯基-2-丁醇、3-巯基-2-丙醇、3-巯基-1-丙醇、3-巯基-1,2-丙二醇、2-巯基-乙胺、二(2-巯基乙基)硫化物、辛基硫醇和十二烷基硫醇。
在一个优选的实施方式中,在制备含氟低聚体的低聚反应中,使用了一种包含具有可水解基团的甲硅烷基的链转移剂。包含该甲硅烷基的链转移剂包括依照式V的那些基团:
HS-Q-SiY3 (V)
其中Q表示有机二价连接基团,例如直链、支链或环状亚烃基、亚芳基或亚芳烷基。优选的是含1~20碳原子的亚烃基,Y独立地是如上所示的可水解基团。
可以使用单独的一种链转移剂或者不同链转移剂的混合物。优选的链转移剂是2-巯基乙醇、辛基硫醇和3-巯基丙基三甲氧基硅烷。链转移剂通常的用量足以控制低聚体中聚合单体单元的量,以获得所需分子量的低聚体氟化硅烷。每当量的包括氟化和非氟化单体的单体中,链转移剂的量通常为约0.05~约0.5当量,优选为约0.25当量。
用于本发明的含氟低聚体包括可水解的基团。可通过在带有包含可水解基团的甲硅烷基的链转移剂存在下的低聚反应,在含氟低聚体中引入这些可水解的基团,例如依照上述式V的链转移剂,其中Y表示可水解的基团。可替换地,也可使用功能性链转移剂或功能性共聚单体,其可以在低聚反应之后其可与含甲硅烷基的试剂进行反应。
因此,依照第一种实施方式,通过使氟化单体和任选非氟化的单体与依照上述式IV其中Y表示可水解的基团的单体在链转移剂存在下进行低聚反应而制备含氟低聚体,其中所述链转移剂也可包含任选的甲硅烷基,例如依照上式V的链转移剂,其中Y表示可水解的基团。
作为上述方法的变化,可在不使用含甲硅烷基的单体而使用包含甲硅烷基的链转移剂来进行低聚反应。
表面活性剂
表面活性剂被定义为“一种物质,当在体系中以低浓度存在时,其具有吸附到体系的表面或界面上的性质,并具有可将这些表面的表面自由能或界面自由能明显改变的性质。”(Milton J.Rosen,“Surfactantsand Interfacial Phenomena,”Second Ed.,John Wiley & Sons,New York,NY,1989,page 1)。这些表面活性剂具有“由对溶剂具有极小吸引力而被称为疏液基团的结构基团和对溶剂具有极强吸引力而被成为亲液基团的基团所组成的特性分子结构...”(Milton J.Rosen,“Surfactants andInterfacial Phenomena,”Second Ed.,John Wiley & Sons,New York,NY,1989,page 3-4)。当溶剂是水的时,疏液基团通常是非极性基团,如烷基或氟化烷基,而亲液基团是极性基团。
术语“氟化”(用于术语氟化表面活性剂中)表明烷基部分的氢原子至少约75%,优选至少约85%,更优选至少约95%被氟原子取代。可选择地,其余的氢原子可被其它卤素原子取代,如被氯原子取代。
氟化表面活性剂起到稳定乳状液的作用(即一种液相的液滴分散在另一种液相中),并有助于可稀释的非水浓缩物中的氟化硅烷和有机共溶剂的溶解性或相容性(如果有一种或多种有机共溶剂)。
用于本发明的氟化表面活性剂是两性物质,其包括一种或多种疏水的含氟部分和一种或多种可增溶的亲水部分。这种物质被称为“氟化表面活性剂和排斥剂(Fluorinated Surfactants and Repellents)”,SecondEdition,by E.Kissa,Surfactant Science Series,Volume 97,MarcelDekker,Inc.:New York,2001,pp 1-21。氟化表面活性剂其氟含量至少为10wt.%。这些氟化表面活性剂可是单体或聚合物,其分子量为约300~约100000克/摩尔,优选为约400~约20000克/摩尔。疏水的含氟基团例如可以是含约3~约20个碳原子的全氟烷基,或分子量为约300~约10000克/摩尔的一价或二价全氟聚醚。在氟化表面活性剂上的亲水基团可以是阴离子型的(如羧酸酯)、阳离子型的(如季铵)、非离子型的(如低聚(氧乙烯))或两性的(如氧化胺),只要它们不含有可引起本发明的浓缩物不稳定的官能团,例如强酸性基团、强碱性基团或由氟化物离子引起的污染。
代表性的氟化表面活性剂包括但不局限于下面的:
C7F15CO2 -NH4 +
C8F17SO2N(C2H5)(C2H4O)7CH3
C8F17(C2H4O)10H
(C4F9SO2)2N-NH4 +
C4F9SO2N(CH3)(C2H4O)nCH3(其中n平均值约为7),和
C3F7O(CF(CF3)CF2O)nCF(CF3)CO2 -NH4 +(其中n平均值约为13)。
本发明的这些和其它氟化表面活性剂的实例例如公开在美国专利No.3772195(Francen)、4090967(Falk)、4099574(Cooper等)、4242516(Mueller)、4359096(Berger)、4383929(Bertocchio等)、4472286(Falk)、4536298(Kamei等)、4795764(Alm等)、4983769(Bertocchio等)和5085786(Alm等)中,在此引入这些专利作为参考。这些氟化表面活性剂中的许多可以商标名FLUORADTM购自Minnestota Mining and Manufacturing Company(St.Paul,Minnesota),或者以商标名ZONYLTM购自E.I.DuPont de Nemours and Co.(Wilmington,Delaware)。
本发明也可使用聚合的氟化表面活性剂。可用在本发明中的聚合氟化表面活性剂的实例公开在美国专利No.3787351(Olson)、美国专利4668406(Chang)和PCT国际公布号WO 01/30873中,在此引入这些专利作为参考。
可以使用的聚合氟化表面活性剂的实例包括无规共聚物氟化表面活性剂。无规共聚物氟化表面活性剂包含下面的结构:
其中a∶b∶c的摩尔比为约30∶约1∶约32,其中表面活性剂的分子量为约1000~约4000克/摩尔;及
其中a’∶b’∶c’的摩尔比为约3∶约3∶约1,其中表面活性剂的分子量为约1000~约40000克/摩尔。
该表面活性剂也可以是烃或有机硅表面活性剂。烃或有机硅表面活性剂可以是上述氟化表面活性剂的助表面活性剂。通常的烃类表面活性剂包括非离子表面活性剂,例如亚烃基二醇聚乙二醇、烷基苯酚-聚乙二醇或其聚合物,例如TritonTM X-305、SulfynolTM 465或TweenTM80;阳离子表面活性剂,例如ArquadTM 2C-75;阴离子表面活性剂,例如WitcolateTM 4085;两性表面活性剂,例如氯化二椰油基甲基铵(dicocomethylammonium)。有机硅类表面活性剂通常包括含烯化氧的有机硅低聚物,例如SilwetTM L-77和SylgardTM 309。
在可稀释的非水浓缩物中通常所含的表面活性剂的量达到可稀释非水浓缩物的约50wt.%,优选达到约30wt.%,最优选达到约15wt.%。
可选择的有机共溶剂
本发明的可稀释非水浓缩物也可任选地含有一种或多种有机共溶剂。有机共溶剂是有机液体成分,其可使表面活性剂和氟化硅烷相容(以防没有有机共溶剂时它们不相容),并可降低可稀释的非水浓缩物的粘度。
适合的有机共溶剂是有机溶剂或有机溶剂的混合物,其包括但不局限于脂肪醇,如甲醇、乙醇和异丙醇;酮类,如丙酮或甲乙酮;酯类,如乙酸乙酯或甲酸甲酯;醚类,如二异丙醚、1,4-二氧杂环己烷和二乙二醇二甲醚;和酰胺,如N-甲基吡咯烷酮和N,N-二甲基甲酰胺。氟化有机溶剂,如七氟丁醇、三氯乙醇和六氟异丙醇,或含氢氟醚,例如HFE-7100(可获自3M Company),可单独使用或与非氟化的有机共溶剂一起使用。
优选的有机共溶剂是脂肪醇。一些优选的脂肪醇的实例是乙醇和异丙醇。其它实例包括含环氧烷基的醇类,例如DOWANOLTM DPnP(可获自Sigma-Aldrich,Milwaukee,WI)和DOWANOLTM DPM(可获自Sigma-Aldrich)等。
优选地,有机共溶剂是水溶性的。此外,优选地,有机共溶剂的沸点低于200℃。
在可稀释的非水浓缩物中如果使用有机共溶剂,通常有机共溶剂的含量达到可稀释非水浓缩物的约75wt.%,优选达到约50wt.%。
可任选的添加剂
可稀释的非水浓缩物也可包含一种或多种可任选的添加剂。
一些可任选的添加剂的例子是催化剂,一旦可稀释的非水浓缩物被稀释并涂覆到基底上,那么添加剂有助于可稀释的非水浓缩物的固化和/或交联。当需要时可加入固化添加剂以促进固化。这种固化添加剂可使用酸前体的形式,一旦暴露于热、紫外光、可见光、电子束照射或微波照射,其将释放酸。酸前体例如包括锍盐及碘鎓盐,和烷基磺酸或氟代烷基磺酸的烷基酯,这些描述在美国专利6204350(Liu等)中,并引入此作为参考。
某些添加剂,例如全氟羧酸、烷基磺酸、芳基磺酸、全氟烷基磺酸的铵盐和全氟烷基磺酰亚胺,可用作潜在的或热活化的固化添加剂和用作表面活性剂。因此,可稀释的非水浓缩物可以包括这些双功能表面活性剂中的一种,而可以不需要单独的催化剂。
其它可能的任选添加剂包括但不局限于:抗菌剂、UV吸收剂、烃硅烷、烷氧基硅烷、钛酸盐、锆酸盐和无机材料的微米或纳米颗粒,如二氧化硅或二氧化钛。
在可稀释的非水浓缩物中可任选的添加剂的含量达到可稀释的非水浓缩物的约50wt.%,更优选达到约5wt.%。
可稀释的非水浓缩物可以通过以任何顺序并以本领域公知的方式混合这些成分而制得。优选地,对于含有至少一种氟化低聚硅烷、至少一种表面活性剂和至少一种有机共溶剂的实施方案,首先混合表面活性剂和有机共溶剂,然后再将氟化低聚硅烷加到混合物中。
如果再混合这些成分后,可稀释的非水浓缩物没有立即变成均相,那么经过一段时间后该浓缩物将变成均相。然而,为了加速均相,可以加热该可稀释的非水浓缩物。
为了易于制备等原因,通常在将要使用前用稀释介质来稀释可稀释的非水浓缩物(或者通常制得水稀释物组合物)。
优选在本发明可稀释的非水浓缩物中避免存在某些化学功能物质如强酸(即磺酸、无机酸、磷酸和全氟化的酸)和例如氟化物离子的物质,如果这些物质导致相应的水稀释物和/或可稀释的非水浓缩物本身不稳定。
水稀释物
本发明的另一个实施方式是一种水稀释物,其含有:如上所述的可稀释的非水浓缩物;和含有水或水溶剂混合物的稀释剂,该水溶剂混合物含有水和水可混溶性共溶剂。水稀释物也可含有任选的添加剂。
稀释介质
水稀释物的稀释介质含有水或水溶剂混合物。水溶剂混合物包含水和水可混溶性共溶剂。
水可混溶性共溶剂的实例包括但不局限于醇类,例如乙醇、异丙醇、DOWANOLTM DPM;酮类,例如丙酮;醚类,例如二乙二醇二甲醚;和其它,例如N-甲基吡咯烷酮。
在水稀释物(如果使用水溶剂混合物)中水可混溶性共溶剂的含量取决于欲用于涂覆水稀释物的涂覆技术,以及取决于所得涂层基底所需要的特性。
可任选的添加剂
水稀释物任选地还可包含至少一种添加剂。添加剂的一些实例如上所述。水稀释物的可任选的添加剂可以是可稀释非水浓缩物的添加剂之外的物质。如上关于可稀释的非水浓缩物所讨论的那样,优选避免使用对水稀释物的稳定性有不利影响的添加剂。这些添加剂可以包括强酸性物质和氟化物离子。水稀释物的pH为约2~约11,最优选的为约4~约8。
水稀释物可通过首先混合可稀释的非水浓缩物的成分,然后将可稀释的非水浓缩物加到稀释介质中而制得。然而,优选通过将稀释介质加到可稀释的非水浓缩物中而制备水稀释物。
在水稀释物中可稀释的非水浓缩物的量通常为水稀释物的约0.05wt.%~约10wt.%,优选为约0.1wt.%~约5wt.%。水稀释物可以是透明的溶液和有些浑浊的溶液。
在可稀释的非水浓缩物被稀释后,向水稀释物中可加入可任选的添加剂。一种优选的任选添加剂是如上所述的那些固化添加剂,其可加到水稀释物中,其量多达水稀释物的约3wt.%。
水稀释物通常足量涂覆到基底上(在下面的方法中详细说明该基底),从而产生斥水和斥油的涂层。这种涂层可以是极薄的,例如约10~约20纳米厚,尽管实际上涂层可以更厚,例如厚度达到约50~100纳米。
本发明的水稀释物可有利地在基底上良好扩展,从而在被经处理基底的全部表面上获得均匀的性质。此外,水稀释物最小化或消除挥发性有机化合物(VOCs),从而减小了污染及潜在有害的和通常可燃的溶剂蒸汽的暴露。
方法
本发明还提供一种处理基底的方法,包括如下步骤:将如上所述本发明的水稀释物涂覆到基底上,固化水稀释物以形成经处理的基底。
可以用本发明的水稀释物处理的适当基底包括但不局限于具有硬表面的基底,其优选具有能够与硅烷反应的官能团,如在硅质或金属基底上的-OH。优选地,基底表面的这种反应通过具有活性氢原子的官能团例如-OH来提供。当不存在这种活性氢原子时,基底首先在含氧等离子体或电晕气氛中处理,从而使其对氟化硅烷具有反应活性。
基底的处理使得被处理的表面对污物具有较低的保持力,并且由于被处理表面的斥油和斥水性使其更易于清洁。由于被处理表面的高度耐久性,因此不论长期曝露或使用及重复清洗,这些所需的性质都可以保持。
优选地,在涂覆本发明的水稀释物之前清洗基底,从而保持最佳的特性,特别是耐久性。即优选地,待涂覆的基底表面在涂覆之前优选基本上不含有机污物。清洗技术取决于基底的类型,包括例如使用有机溶剂如丙酮或乙醇的洗涤步骤,或者暴露于反应性气相处理,如空气等离子体或UV/臭氧。
适用的基底包括但不限于:纺织品、衣物、皮革、纸、硬纸板、地毯、陶瓷、涂釉陶瓷、瓷器、平玻璃、中空玻璃、金属(例如铝、铁、不锈钢、铜等)、金属氧化物、天然或人造石、热塑性材料(如聚甲基丙烯酸酯、聚碳酸酯、乙烯基、聚苯乙烯、苯乙烯共聚物,如苯乙烯/丙烯腈共聚物、及聚酯,如聚对苯二甲酸乙二醇酯)、油漆(例如丙烯酸树脂基的那些)、粉末涂料(例如聚氨酯、环氧涂料或混合的粉末涂料),和木材。
优选的基底包括金属和硅质基底,如陶瓷、涂釉陶瓷、玻璃、混凝土、灰泥、水泥浆与天然和人造石。特别优选的基底包括涂釉陶瓷和玻璃。各种具有至少一种基底的制品能够有效地用本发明的水稀释物处理,从而在其上提供斥水和斥油的涂层。实例包括涂釉陶瓷瓷砖。搪瓷浴缸或马桶、玻璃淋浴板、建筑玻璃、车辆的各种部件(例如镜子或挡风玻璃),和涂釉陶瓷或搪瓷材料。
另一种特别优选的基底是其上具有抗反射(AR)膜的基底。抗反射(AR)膜可通过在由玻璃和塑料制成的基底上真空喷射金属氧化薄膜来制备,其特别适用于电子设备的显示装置中。这种金属氧化物膜是相对多孔的,并由相对粗糙外形的簇组成。AR膜有助于降低闪光和反射。当AR膜是导电性时,它们也有助于降低放出静电和电磁辐射。因此,AR膜的主要应用是提供相对增强和抗反射性质,从而提高诸如计算机显示器等显示装置的可读性。美国专利No.5851674(Pellerite等)公开了AR膜,此专利在此引入作为参考。
溅射的金属氧化物抗反射膜通常是耐久和均匀的。此外,它们的光学性质也是可控制的,这使得它们非常合乎需要。它们还具有非常高的表面能和折射率。然而,溅射的金属氧化物表面的较高表面能使其易受有机杂质的污染(如皮脂油)。表面污染物的存在使得金属氧化物涂层的抗反射性能显著降低。此外,由于表面污染物的高折射率,因此对于终端用户非常明显。本发明的方法使得在抗反射膜上的保护性涂层相对耐久,比抗反射膜本身更耐污染和更易于清洁。
优选地,在抗反射制品上水稀释物干燥涂层(“干燥下的涂层”(“dried down coating”))的全部涂层厚度大于单层(其厚度通常大于约1.5纳米(nm))。即优选地,在具有AR膜的制品上从水稀释物得到的涂层厚度至少约为2.0nm以实现抗污染的目的,更优选厚度至少约为3.0nm。从水稀释物得到的涂层的量通常基本上不会改变抗反射制品的抗反射特性。
将水稀释物涂覆到基底上的方法包括但不局限于喷涂法、旋涂法、浸涂法、流动涂覆法和辊涂法等。用于水稀释物的优选涂覆方法包括喷涂法。可以通过使加压水稀释物通过适合的喷口、喷嘴或喷孔以气流或雾状的形式喷射到基底表面,来实现喷涂法。
待涂覆的基底通常可与水稀释物在室温下接触(通常为约20℃~约25℃)。可选择地,水稀释物可涂覆到例如在60℃~150℃的温度下经预热处理的基底上。这对于工业生产是特别有用的,例如在生产线末端的燃烧炉后立即处理瓷砖。涂覆后,被处理的基底可在环境温度或较高的温度下在足以干燥或固化的时间内进行干燥和固化。
在基底上获得的涂层可用UV照射或加热固化。对于UV固化,可以加入固化添加剂(如上所述的那些任选添加剂)。热固化在约40℃~约300℃的高温下进行,尽管可能不需要较高的温度。用于固化的热量可通过具有足够热容以提供固化热的基底的初始预热提供,或者通过由涂覆后的外部热源加热涂覆的基底来提供。
制品
本发明的另一个实施方式是一种制品,其包括:(a)基底(如上所述的);和(b)通过将水稀释物(上述)涂覆到所述基底上并固化所述的水稀释物而得到的在所述基底上的涂层。
实施例
下面通过实施例进一步说明本发明,但在这些实施例中所引用的特定材料及其用量,以及条件和细节不应当被解释为对本发明不恰当的限定。
术语表
描述符 | 名称,结构和/或分子式 | 可获自 |
AIBN | (CH3)2C(CN)N=NC(CH3)2CN | Sigma-Aldrich |
“ARQUAD 2C-75” | 季铵盐表面活性剂 | Akzo NobelChem..Netherlands |
A-160 | HS(CH2)3Si(OCH3)3 | Sigma-Aldrich |
ME | 2-巯基乙醇;HSCH2CH2OH | Sigma-Aldrich |
ODMA | 甲基丙烯酸十八烷酯;H2C=C(CH3)C(O)O(CH2)17CH3 | Sartomer,Exton,PA |
TMPMA | 甲基丙烯酸3-(甲氧基甲硅烷基)丙酯;H2C=C(CH3)C(O)O(CH2)3Si(OCH3)3 | Sigma-Aldrich |
“TRITON X-405” | 乙氧基化的辛基苯酚 | Union Carbide.Danbury.CT |
OCN(CH2)3Si(OCH2CH3)3 | 3-(三乙氧基甲硅烷基)丙基异氰酸酯 | Sigma-Aldrich |
MeFB SEA,C4F9SO2N(CH3)CH2CH2OC(O)CH=CH2,可如WO01/30873 A1中实施例2的A&B部分中所述的方法制备。
FCS-1:C4F9SO2N(CH3)(CH2CH2O)7.5CH3,可如WO 01/30873 A1中实施例1的A&B部分中所述的方法制备。
FCS-2:可如WO 01/30873 A1中实施例16所述的方法制备。
C4F9SO2N(CH3)H:可如WO 01/30873 A1中实施例1的A部分所述的方法制备。
接触角测试
使用Olympus TGHM测角器(Olympus Corp,Pompano Beach,FI)测量代被处理的基体与水(W)和正-十六烷(O)的接触角。除非特别指出,在磨擦之前(开始)和磨擦之后(磨擦)测量接触角。在使用之后或磨擦之后至少24小时,测量其与水和十六烷的接触角。值是四次测量的平均值,并以度表示。接触角的最小可测量值是20。小于20的值表示液体在表面上扩展。
磨擦/刮擦方法
使用Erichsen清洗机(可获自DCI,Belgium)、3MTM HIGHPERFORMANCETM Cloth(可获自3M Co.,St.Paul,Minnesota)和CIFTM乳剂清洁器(可获自Lever Faberge,France)使用40个周期来完成磨擦测试。
制备物1:MeFBSEA/A-160=4/1
向带有冷凝器、搅拌器和温度计的500mL三颈圆底瓶中加入MeFBSEA(41.1g;0.1摩尔)、A-160(4.9g;0.025摩尔)、乙酸乙酯(46.0g)和AIBN(0.1g)。用真空抽吸器除气3次并再充满氮气。混合物在氮气气氛中于75℃下反应8小时。再加入AIBN(0.05g),在75℃下继续反应3小时。再加入另外等份的AIBN(0.05g),在82℃下继续反应2小时。得到低聚含氟硅烷MeFBSEA/A-160=4/1的透明溶液。
制备物2:MeFBSEA/ODMA/TMPMA/A-160=6/1/1/1
除了在瓶中加入MeFBSEA(61.6g;0.15摩尔)、ODMA(8.5g;0.025摩尔)、TMPMA(6.2g;0.025摩尔)、A-160(4.9g;0.025摩尔)和AIBN(0.1g)外,如制备1中所述的方法完成MeFBSEA/ODMA/TMPMA/A-160=6/1/1/1的制备。
制备物3:(MeFBSEA)4SCH2CH2OH和与OCN(CH2)3Si(OCH2CH3)3的反应产物
依照两步反应来制备含氟硅烷(MeFBSEA)4SCH2CH2OH和与OCN(CH2)3Si(OCH2CH3)3的反应产物。第一步,依照下面的方法制备含氟低聚体(MeFBSEA)4SCH2CH2OH:
在装有2个回流冷凝器、1个机械聚四氟乙烯叶片搅拌器、温度计、氮气入口和抽真空出口的3L反应烧瓶中,加入MeFBSEA(2.4摩尔)和乙酸乙酯(987g)。将该混合物加热到40℃直到所有物质都溶解。再加入HSCH2CH2OH(0.6摩尔)和AIBN(0.15%),将溶液加热到80℃,同时以160rpm的速度搅拌。在氮气气氛中在80℃下反应16小时,得到超过95%的转化率。
第二步,将得到的含氟低聚体与等摩尔的OCN(CH2)3Si(OCH2CH3)3发生反应,依照如下方法:
在氮气气氛下,向带有冷凝器、搅拌器和温度计的500mL三颈圆底瓶中加入如上制备的MeFBSEA/HSCH2CH2OH(在60%的含氟低聚体溶液中含0.02摩尔)、乙酸乙酯(22g)、OCN(CH2)3Si(OCH2CH3)3(5g)和2滴辛酸亚锡催化剂。将混合物在氮气气氛下加热至75℃,并反应16小时。红外分析表明没有残留的异氰酸酯。得到透明的溶液。
制备物4:MeFBSEA/TMPMA/A-160=4/1/1
根据对制备物1描述进行MeFBSEA/TMPMA/A-160=4/1/1的制备,除了向烧瓶中还加入TMPMA(6.2克;0.025摩尔)。
制备物5:C4F9SO2N(CH3)(CH2)3Si(OCH3)3
根据如下过程制备用于对比例C-2中的含氟化合物C4F9SO2N(CH3)(CH2)3Si(OCH3)3:
向带有冷凝器、搅拌器、氮气入口和温度计的500mL三颈圆底瓶中加入0.1摩尔C4F9SO2N(CH3)H和30克干燥二甲基甲酰胺。加入NaOCH3(0.1摩尔;在甲醇中的30%溶液),反应混合物在氮气气氛中于50℃下加热1小时。保持温度为50℃的同时在真空抽吸下除去甲醇。将反应物冷却到25℃,之后加入Cl(CH2)3Si(OCH3)3(0.1摩尔)。将反应混合物在氮气气氛中于90℃下加热16小时。将反应过程中产生的NaCl滤出。反应完成后进行GLC。得到透明的黄褐色溶液。通过真空蒸馏除去DMF,将氟化物反应产物在120~150℃时蒸馏(约0.4mmHg),得到浅黄色液体。
实施例1
在150mL的玻璃瓶中加入制备物2(60.0g;含量约50%的含氟固体)和FCS-2(20.0g;含氟低聚表面活性剂在乙酸乙酯中的50%溶液)。轻微搅拌2分钟后,得到含50%含氟固体的透明溶液。将2g混合物稀释在97g的DI-水中,加入1g HCl 37%。然后将该水基稀释物喷涂到热的(温度约为120℃)获自Villeroy & Boch,Germany的白色釉面墙砖上。在约10分钟后使用轻擦除去过量的涂层。依照上述程序在磨擦之前和之后测量接触角,结果总结在表1中。
实施例2~8和对比例C1和C2
依照实施例1中的方法制备实施例2~8和对比例C1和C2,使用的如表1中所示的成分和用量。依照实施例1的方法进行产品应用和测试。结果总结在表1中。
表1
接触角水/十六烷(℃) | |||
实施例 | 组合物 | 摩擦前 | 磨擦后 |
1 | 制备物2(60.0g)和FCS-2(20.0g) | 95/65 | 70/50 |
2 | 制备物2(60.0g)和FCS-1(10.0g) | 95/63 | 65/47 |
3 | 制备物2(60.0g)和“ARQUAD 2C-75”(20.0g) | 92/60 | 60/42 |
4 | 制备物2(60.0g)和“TRITON X-405”(10.0g) | 95/68 | 68/46 |
5 | 制备物1(60.0g)和FCS-2(20.0g) | 98/62 | 64/46 |
6 | 制备物4(60.0g)和FCS-2(20.0g) | 108/68 | 77/52 |
7 | 制备物3(60.0g)和FCS-2(20.0g) | 102/67 | 68/44 |
8 | 制备物2(60.0g)和FCS-2(15.0g)和“ARQUAD 2C-75”(15.0g) | 96/61 | 60/40 |
C-1 | 见US 5550184制备物8使用“TRITON X-405” | 94/58 | 45/30 |
C-2 | C4F9SO2N(CH3)(CH2)3Si(OCH3)3(30.0g)和FCS-2(15.0g)和乙醇(30.0g) | 90/57 | 49/32 |
本发明实施例的磨擦后接触角值明显高于对比例的值。这表明实施例的涂层具有改进的抗磨擦性。
Claims (26)
1.一种可稀释的非水浓缩物,包含以下物质的混合物:
(a)至少一种具有下式的氟化低聚硅烷
A-Mn fMm hMr a-G
其中:
A是氢或引发物质的残基;
Mf表示一种或多种氟化单体的衍生单元;
Mh表示一种或多种非氟化单体的衍生单元;
Ma表示一种或多种包含甲硅烷基SiY3的非氟化单体的衍生单元;其中Y是可水解的基团;和
G是具有下式的链转移剂的残基
-S-Q-Y3
其中Y是可水解的基团,Q是有机二价连接基团;
n是1~100的整数;
m是0~100的整数;和
r是0~100的整数;和
(b)至少一种表面活性剂。
2.权利要求1的浓缩物,其中的氟化单体具有如下通式
Rf-Q-E
其中:Rf是C2~C8的全氟烷基;
Q是有机二价连接基团;和
E是烯不饱和基团。
3.权利要求1的浓缩物,包括:
(a)至少一种具有下式的氟化低聚硅烷
其中:
Rf是C2~C8的全氟烷基;
R是含4~30个碳原子的烃基,其可由一种或多种活性基团取代;
R1和R2分别是氢或C1~C4烷基;
Q是-(CH2)-d,其中n’是1~20的整数;
Q’是式为-SO2N(R1)(CH2)d-OC(O)-的连接基团;
Q”是式为-(CH2)d-OC(O)-的连接基团或化学键;
n是1~20的整数;
m和r是0~20的整数;和
d是1~20的整数。
4.权利要求1的浓缩物,其进一步包括至少一种有机共溶剂和至少一种添加剂中的一种或两种。
5.权利要求4的浓缩物,其中的共溶剂是醇类、酮类、醚类、N-甲基吡咯烷酮、N,N-二甲基甲酰胺或其混合物。
6.权利要求1的浓缩物,其中的至少一种表面活性剂包括碳氟化合物、烃类、有机硅表面活性剂或其混合物。
7.权利要求6的浓缩物,其中的至少一种碳氟化合物表面活性剂包括:
C4F9SO2N(CH3)(C2H4O)nCH3
其中n的平均值约为7。
8.权利要求6的浓缩物,其中的至少一种碳氟化合物表面活性剂包括:
C3F7O(CF(CF3)CF2O)nCF(CF3)CO2 -NH4 +
其中n的平均值约为13。
9.权利要求6的浓缩物,其中的至少一种碳氟化合物表面活性剂是聚合表面活性剂。
10.权利要求6的浓缩物,其中的至少一种碳氟化合物表面活性剂是无规共聚物表面活性剂。
12.权利要求10的浓缩物,其中的无规共聚物表面活性剂包括:
其中a’∶b’∶c’的摩尔比为约3∶约3∶约1,其中的无规共聚物氟化表面活性剂的分子量为约5000~约40000克/摩尔。
13.权利要求6的浓缩物,其中的至少一种烃类表面活性剂是氯化二椰油基甲基铵。
14.权利要求6的浓缩物,其中的至少一种烃类表面活性剂包括亚烃基二醇聚乙二醇、烷基苯酚-聚乙二醇或其混合物。
15.权利要求6的浓缩物,其中的至少一种有机硅表面活性剂包括含烯化氧的有机硅低聚体。
16.权利要求2的浓缩物,其中Rf是C3~C5的全氟烷基。
17.权利要求2的浓缩物,其中Rf是C4的全氟烷基。
18.权利要求1的浓缩物,其中Y独立地是-Cl、OCH3、OC2H5、或被链中氧原子间隔的C3-C6烷氧基。
19.权利要求18的浓缩物,其中Y是-Cl、-OCH3或-OC2H5。
20.一种含水组合物,包括:
(a)稀释介质,其包括水、或包含水和至少一种水可混溶性共溶剂的水溶剂混合物;和
(b)包括依照权利要求1的非水均相混合物的可稀释非水浓缩物。
21.一种含水组合物,包括:
(a)稀释介质,其包括水、或包含水和至少一种水可混溶性共溶剂的水溶剂混合物;和
(b)依照权利要求3的可稀释非水浓缩物均相混合物。
22.一种处理基底的方法,包括以下步骤:将依照权利要求20的含水组合物应用到所述基底上,并固化所述的含水组合物。
23.一种制品,包括:
(a)基底;和
(b)在依照权利要求22的方法获得的所述基底上的涂层。
24.权利要求23的制品,其中的基底包括玻璃。
25.权利要求23的制品,其中的基底包括陶瓷。
26.权利要求23的制品,其中的基底包括抗反射膜。
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-
2003
- 2003-12-23 US US10/745,003 patent/US7321018B2/en not_active Expired - Fee Related
-
2004
- 2004-11-16 DE DE200460021718 patent/DE602004021718D1/de active Active
- 2004-11-16 WO PCT/US2004/038258 patent/WO2005066258A1/en not_active Application Discontinuation
- 2004-11-16 EP EP20040811106 patent/EP1697455B1/en not_active Not-in-force
- 2004-11-16 JP JP2006546999A patent/JP2007518854A/ja active Pending
- 2004-11-16 AT AT04811106T patent/ATE434642T1/de not_active IP Right Cessation
- 2004-11-16 CN CN2004800388562A patent/CN1898313B/zh not_active Expired - Fee Related
-
2007
- 2007-12-06 US US11/951,359 patent/US20080090086A1/en not_active Abandoned
-
2010
- 2010-05-21 US US12/784,892 patent/US7998585B2/en not_active Expired - Fee Related
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN107074631A (zh) * | 2014-04-30 | 2017-08-18 | 康宁股份有限公司 | 把保护涂层施加到基材边缘的方法 |
Also Published As
Publication number | Publication date |
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US20080090086A1 (en) | 2008-04-17 |
US7998585B2 (en) | 2011-08-16 |
US20100233492A1 (en) | 2010-09-16 |
CN1898313B (zh) | 2011-02-02 |
JP2007518854A (ja) | 2007-07-12 |
EP1697455A1 (en) | 2006-09-06 |
WO2005066258A1 (en) | 2005-07-21 |
EP1697455B1 (en) | 2009-06-24 |
ATE434642T1 (de) | 2009-07-15 |
US20050136264A1 (en) | 2005-06-23 |
US7321018B2 (en) | 2008-01-22 |
DE602004021718D1 (de) | 2009-08-06 |
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