CN1842511B - 手性化合物和包含这些化合物的组合物 - Google Patents
手性化合物和包含这些化合物的组合物 Download PDFInfo
- Publication number
- CN1842511B CN1842511B CN2004800245395A CN200480024539A CN1842511B CN 1842511 B CN1842511 B CN 1842511B CN 2004800245395 A CN2004800245395 A CN 2004800245395A CN 200480024539 A CN200480024539 A CN 200480024539A CN 1842511 B CN1842511 B CN 1842511B
- Authority
- CN
- China
- Prior art keywords
- group
- liquid crystal
- chiral
- compounds
- compound
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C39/00—Compounds having at least one hydroxy or O-metal group bound to a carbon atom of a six-membered aromatic ring
- C07C39/12—Compounds having at least one hydroxy or O-metal group bound to a carbon atom of a six-membered aromatic ring polycyclic with no unsaturation outside the aromatic rings
- C07C39/17—Compounds having at least one hydroxy or O-metal group bound to a carbon atom of a six-membered aromatic ring polycyclic with no unsaturation outside the aromatic rings containing other rings in addition to the six-membered aromatic rings, e.g. cyclohexylphenol
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C255/00—Carboxylic acid nitriles
- C07C255/49—Carboxylic acid nitriles having cyano groups bound to carbon atoms of six-membered aromatic rings of a carbon skeleton
- C07C255/57—Carboxylic acid nitriles having cyano groups bound to carbon atoms of six-membered aromatic rings of a carbon skeleton containing cyano groups and carboxyl groups, other than cyano groups, bound to the carbon skeleton
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C43/00—Ethers; Compounds having groups, groups or groups
- C07C43/02—Ethers
- C07C43/20—Ethers having an ether-oxygen atom bound to a carbon atom of a six-membered aromatic ring
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C43/00—Ethers; Compounds having groups, groups or groups
- C07C43/02—Ethers
- C07C43/20—Ethers having an ether-oxygen atom bound to a carbon atom of a six-membered aromatic ring
- C07C43/23—Ethers having an ether-oxygen atom bound to a carbon atom of a six-membered aromatic ring containing hydroxy or O-metal groups
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C49/00—Ketones; Ketenes; Dimeric ketenes; Ketonic chelates
- C07C49/76—Ketones containing a keto group bound to a six-membered aromatic ring
- C07C49/782—Ketones containing a keto group bound to a six-membered aromatic ring polycyclic
- C07C49/792—Ketones containing a keto group bound to a six-membered aromatic ring polycyclic containing rings other than six-membered aromatic rings
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C49/00—Ketones; Ketenes; Dimeric ketenes; Ketonic chelates
- C07C49/76—Ketones containing a keto group bound to a six-membered aromatic ring
- C07C49/84—Ketones containing a keto group bound to a six-membered aromatic ring containing ether groups, groups, groups, or groups
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
- C09K19/00—Liquid crystal materials
- C09K19/52—Liquid crystal materials characterised by components which are not liquid crystals, e.g. additives with special physical aspect: solvents, solid particles
- C09K19/58—Dopants or charge transfer agents
- C09K19/586—Optically active dopants; chiral dopants
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
- C09K19/00—Liquid crystal materials
- C09K19/52—Liquid crystal materials characterised by components which are not liquid crystals, e.g. additives with special physical aspect: solvents, solid particles
- C09K19/58—Dopants or charge transfer agents
- C09K19/586—Optically active dopants; chiral dopants
- C09K19/588—Heterocyclic compounds
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07B—GENERAL METHODS OF ORGANIC CHEMISTRY; APPARATUS THEREFOR
- C07B2200/00—Indexing scheme relating to specific properties of organic compounds
- C07B2200/07—Optical isomers
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C2603/00—Systems containing at least three condensed rings
- C07C2603/93—Spiro compounds
- C07C2603/94—Spiro compounds containing "free" spiro atoms
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
- C09K2323/00—Functional layers of liquid crystal optical display excluding electroactive liquid crystal layer characterised by chemical composition
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Crystallography & Structural Chemistry (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Liquid Crystal Substances (AREA)
- Heterocyclic Carbon Compounds Containing A Hetero Ring Having Oxygen Or Sulfur (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US10/651,692 US7052743B2 (en) | 2003-08-29 | 2003-08-29 | Chiral compounds and compositions containing the same |
| US10/651,692 | 2003-08-29 | ||
| PCT/US2004/026584 WO2005023742A2 (en) | 2003-08-29 | 2004-08-16 | Chiral compounds and compositions containing the same |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN1842511A CN1842511A (zh) | 2006-10-04 |
| CN1842511B true CN1842511B (zh) | 2012-01-04 |
Family
ID=34273388
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN2004800245395A Expired - Lifetime CN1842511B (zh) | 2003-08-29 | 2004-08-16 | 手性化合物和包含这些化合物的组合物 |
Country Status (7)
| Country | Link |
|---|---|
| US (1) | US7052743B2 (https=) |
| EP (1) | EP1663927B1 (https=) |
| JP (1) | JP4805825B2 (https=) |
| KR (1) | KR101150589B1 (https=) |
| CN (1) | CN1842511B (https=) |
| DE (1) | DE602004023623D1 (https=) |
| WO (1) | WO2005023742A2 (https=) |
Families Citing this family (16)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7150900B2 (en) * | 2003-12-16 | 2006-12-19 | Eastman Kodak Company | Liquid-crystal compositions comprising chiral compounds |
| US20060062898A1 (en) * | 2004-09-17 | 2006-03-23 | Eastman Kodak Company | Method of making a display sheet comprising discontinuous stripe coating |
| US7470376B2 (en) * | 2004-10-29 | 2008-12-30 | Industrial Technology Research Institute | Photochemically active chiral compounds and compositions containing the same |
| US7452482B2 (en) * | 2004-12-15 | 2008-11-18 | Industrial Technology Research Institute | Photochemically active chiral compounds and compositions containing the same |
| US20060132430A1 (en) * | 2004-12-21 | 2006-06-22 | Eastman Kodak Company | Color-changing electronic signage |
| US7630029B2 (en) * | 2005-02-16 | 2009-12-08 | Industrial Technology Research Institute | Conductive absorption layer for flexible displays |
| US7564528B2 (en) * | 2005-05-20 | 2009-07-21 | Industrial Technology Research Institute | Conductive layer to reduce drive voltage in displays |
| US7329368B2 (en) | 2005-12-08 | 2008-02-12 | Industrial Technology Research Institute | Temperature compensating chiral dopants |
| US7507449B2 (en) | 2006-05-30 | 2009-03-24 | Industrial Technology Research Institute | Displays with low driving voltage and anisotropic particles |
| TWI493022B (zh) * | 2011-09-09 | 2015-07-21 | Ind Tech Res Inst | 旋光添加物、液晶配方及其形成方法以及液晶顯示器 |
| CN103131427B (zh) * | 2011-11-25 | 2014-10-15 | 财团法人工业技术研究院 | 液晶化合物及包括该化合物的液晶显示器及光变色指示材料 |
| CN105503542A (zh) * | 2014-09-24 | 2016-04-20 | 常熟浸大科技有限公司 | 一种手性配体1,1’-螺二氢茚-7,7’-二酚合成方法 |
| CN106892822A (zh) * | 2015-12-21 | 2017-06-27 | 财团法人工业技术研究院 | 化合物及包含该化合物的液晶组合物 |
| US10035956B2 (en) | 2015-12-21 | 2018-07-31 | Industrial Technology Research Institute | Compound and liquid-crystal composition employing the same |
| US10565015B2 (en) | 2017-09-18 | 2020-02-18 | The Regents Of The University Of Michigan | Spiroketal-based C2-symmetric scaffold for asymmetric catalysis |
| US10807063B1 (en) | 2019-12-31 | 2020-10-20 | Industrial Technology Research Institute | Device and method for continuously manufacturing acrylate compound |
Family Cites Families (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| NL7411952A (nl) * | 1973-09-17 | 1975-03-19 | Rhone Poulenc Sa | Werkwijze voor het tegen warmte stabiliseren van polyurethanen. |
| JPS5729041A (en) * | 1980-07-29 | 1982-02-16 | Fuji Photo Film Co Ltd | Photographic sensitive silver halide material |
| DE3434286A1 (de) * | 1983-11-17 | 1985-05-30 | General Electric Co., Schenectady, N.Y. | Polyarylat-harze mit verbesserter formbestaendigkeit |
| JPS62244046A (ja) * | 1986-04-16 | 1987-10-24 | Fuji Photo Film Co Ltd | ハロゲン化銀カラ−写真感光材料 |
| JPH0814696B2 (ja) * | 1987-09-17 | 1996-02-14 | 富士写真フイルム株式会社 | 感光性樹脂組成物 |
| US5053555A (en) * | 1988-08-01 | 1991-10-01 | General Electric Company | Hydroxy-terminated arylene ethers, and method for making |
| JPH05229979A (ja) * | 1992-02-19 | 1993-09-07 | Kanto Chem Co Inc | 新規なビフェニルシクロヘキサン誘導体および液晶組成物 |
| JPH09244231A (ja) | 1996-03-08 | 1997-09-19 | Fuji Photo Film Co Ltd | ポジ型フォトレジスト組成物 |
| JPH10231350A (ja) * | 1997-02-18 | 1998-09-02 | Toshiba Chem Corp | エポキシ樹脂組成物および半導体封止装置 |
-
2003
- 2003-08-29 US US10/651,692 patent/US7052743B2/en not_active Expired - Fee Related
-
2004
- 2004-08-16 DE DE602004023623T patent/DE602004023623D1/de not_active Expired - Lifetime
- 2004-08-16 KR KR1020067004053A patent/KR101150589B1/ko not_active Expired - Fee Related
- 2004-08-16 EP EP04781298A patent/EP1663927B1/en not_active Expired - Lifetime
- 2004-08-16 CN CN2004800245395A patent/CN1842511B/zh not_active Expired - Lifetime
- 2004-08-16 WO PCT/US2004/026584 patent/WO2005023742A2/en not_active Ceased
- 2004-08-16 JP JP2006524707A patent/JP4805825B2/ja not_active Expired - Fee Related
Non-Patent Citations (3)
| Title |
|---|
| Shiro Tan,Shinji Sakaguchi,Kazuya Uenishi,YasumasaKawabe,Tadayoshi, Rochey J. Hurditch.Novel diazonaphthoquinone photoactive compound forg-line/I-line compatible positive photoresist,.SPIE advances in resist technology and processing VII,1262.1990,1262,513-526. * |
| Vladimir B. Birman,Amold L.Rheingold, Kin-Chung Lam.1,1'-spirobiindane-7,7'-diol:a novel, C2-symmetric chiral ligand.Tetrabedron:asymmetry 10.1999,(10),125-131. |
| Vladimir B. Birman,Amold L.Rheingold, Kin-Chung Lam.1,1'-spirobiindane-7,7'-diol:a novel, C2-symmetric chiral ligand.Tetrabedron:asymmetry 10.1999,(10),125-131. * |
Also Published As
| Publication number | Publication date |
|---|---|
| DE602004023623D1 (de) | 2009-11-26 |
| US7052743B2 (en) | 2006-05-30 |
| CN1842511A (zh) | 2006-10-04 |
| JP2007504133A (ja) | 2007-03-01 |
| US20050072961A1 (en) | 2005-04-07 |
| KR20060130012A (ko) | 2006-12-18 |
| WO2005023742A2 (en) | 2005-03-17 |
| WO2005023742A3 (en) | 2005-04-21 |
| JP4805825B2 (ja) | 2011-11-02 |
| EP1663927B1 (en) | 2009-10-14 |
| KR101150589B1 (ko) | 2012-05-30 |
| EP1663927A2 (en) | 2006-06-07 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C06 | Publication | ||
| PB01 | Publication | ||
| C10 | Entry into substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| ASS | Succession or assignment of patent right |
Owner name: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE Free format text: FORMER OWNER: EASTMAN KODAK CO. Effective date: 20071130 |
|
| C41 | Transfer of patent application or patent right or utility model | ||
| TA01 | Transfer of patent application right |
Effective date of registration: 20071130 Address after: Taiwan, China Applicant after: Industrial Technology Research Institute Address before: American New York Applicant before: Eastman Kodak Co. |
|
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| TR01 | Transfer of patent right | ||
| TR01 | Transfer of patent right |
Effective date of registration: 20190116 Address after: No. 5 Ditanggang Road, New Town, Tainan City, Taiwan, China Patentee after: IRIS OPTRONICS CO.,LTD. Address before: 3, 11th floor, 85 Zhongxiao East Road, Zhongzheng District, Taipei City, Taiwan, China Patentee before: Group Creative Knowledge Technology Co.,Ltd. Effective date of registration: 20190116 Address after: 3, 11th floor, 85 Zhongxiao East Road, Zhongzheng District, Taipei City, Taiwan, China Patentee after: Group Creative Knowledge Technology Co.,Ltd. Address before: Taiwan, China Patentee before: Industrial Technology Research Institute |
|
| TR01 | Transfer of patent right |
Effective date of registration: 20190917 Address after: 173 Houxing Road Section, Zhongyu District, Taoyuan City, Taiwan, China Patentee after: Taiwan Yiwu Co.,Ltd. Address before: No. 5 Ditanggang Road, New Town, Tainan City, Taiwan, China Patentee before: IRIS OPTRONICS CO.,LTD. Effective date of registration: 20190917 Address after: 1501 Capital Centre, 151 Gloucester Road, Wanchai District, Hong Kong, China Patentee after: Ruiyin Investment Co.,Ltd. Address before: 173 Houxing Road Section, Zhongyu District, Taoyuan City, Taiwan, China Patentee before: Taiwan Yiwu Co.,Ltd. |
|
| TR01 | Transfer of patent right | ||
| TR01 | Transfer of patent right |
Effective date of registration: 20191219 Address after: Room 333, 3 / F, Part 4, building 1, No. 2001, Yanggao North Road, China (Shanghai) pilot Free Trade Zone Patentee after: Shanghai Hongxia Photoelectric Technology Co.,Ltd. Address before: 1501 Capital Centre, 151 Gloucester Road, Wanchai District, Hong Kong, China Patentee before: Ruiyin Investment Co.,Ltd. |
|
| TR01 | Transfer of patent right | ||
| TR01 | Transfer of patent right |
Effective date of registration: 20230627 Address after: No. 160, No. thirteen GUI Ren Road, Guen Ren District, Tainan, Taiwan, China 3F-3 Patentee after: IRIS OPTRONICS CO.,LTD. Address before: Room 333, 3rd Floor, Part 4, Building 1, No. 2001 Yanggao North Road, China (Shanghai) Pilot Free Trade Zone, 200120 Patentee before: Shanghai Hongxia Photoelectric Technology Co.,Ltd. |
|
| TR01 | Transfer of patent right | ||
| CX01 | Expiry of patent term |
Granted publication date: 20120104 |
|
| CX01 | Expiry of patent term |