CN1841695A - Substrate processing device and method - Google Patents
Substrate processing device and method Download PDFInfo
- Publication number
- CN1841695A CN1841695A CN 200610002717 CN200610002717A CN1841695A CN 1841695 A CN1841695 A CN 1841695A CN 200610002717 CN200610002717 CN 200610002717 CN 200610002717 A CN200610002717 A CN 200610002717A CN 1841695 A CN1841695 A CN 1841695A
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- substrate
- process chamber
- magnetite
- aforementioned
- roller
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Abstract
This invention can be used to inhibit steam and mist of processing liquid leak from the inside of a treatment room out of the treatment room. The treatment room is formed in the interior of a chamber 2. The chamber 2 consists of a nonmagnetic material. A spray 3 sprays the processing liquid on the front surface of a substrate 1 in the treatment room. A plurality of shafts 11 are installed at the predetermined spacing in the treatment room. A plurality of rollers 10 are attached in the shaft 11, and a magnet 13 is attached in one end. A motor is installed in the outside of the treatment room, and the shaft 21 is connected with the motor. A plurality of the magnets 23 are attached on the shaft 21 in the position which separates the chamber 2 and counters with each magnet 13. If the magnets 23 rotates by the drive of the motor, the magnet 13 rotates, and the driving force of the motor is transmitted to the roller 10 attached in the shaft 11 by un-contacting through the internal and external spaces of the treatment room.
Description
Technical field
The invention relates to a kind of treatment fluids such as developer solution, etching liquid, stripper, cleaning fluid that utilize, develop, etching, peel off, the substrate board treatment and the substrate processing method using same of the processing of substrate such as cleaning, particularly about a kind of substrate board treatment and substrate processing method using same that substrate is moved and carry out the processing of substrate.
Background technology
In the manufacturing engineering of panel display apparatus such as liquid crystal indicator (flat panel display) and semiconductor device, utilize treatment fluids such as developer solution, etching liquid, stripper, cleaning fluid, on the substrate of display panel substrate and semiconductor crystal wafer etc., develop, etching, peel off, engineering that cleaning etc. is handled.Usually, the engineering of carrying out these processing is known as wet processes (wet process).
In recent years, in wet processes, be mostly in process chamber, utilize roller transfer band base-board conveying devices such as (rollerconveyer) that substrate is moved, and carry out the processing of substrate.As the base-board conveying device that is utilized in the wet processes, the device that has for example patent documentation 1, patent documentation 2 and patent documentation 3 to be recorded and narrated.
The spy of [patent documentation 1] Japanese Patent Laid Open Publication opens flat 8-244946 communique
The spy of [patent documentation 2] Japanese Patent Laid Open Publication opens flat 10-275845 communique
The spy of [patent documentation 3] Japanese Patent Laid Open Publication opens flat 11-130249 communique
Usually, utilizing wet processes that substrate is moved and carrying out under the situation of processing of substrate, treatment fluid is to the supply of substrate, is by utilizing sprayer (spray) that treatment fluid is sprayed and carries out to the surface of substrate.At this moment, in process chamber, produce the steam and the fog of treatment fluid.Therefore, the drive source of base-board conveying device sustains damage for steam and the fog because of treatment fluid not, is set at outside the process chamber.
In known substrate board treatment, be on the wall of process chamber, through hole to be set, and the axle of will be in process chamber set roller transfer band etc. extends to outside the process chamber by through hole, utilize belt (belt) and belt pulley (pulley) or chain (chain) and the such transmission mechanism of sprocket wheel (sprocket), drive source drives power is passed on to the axle of roller transfer band etc.Therefore, exist the steam of treatment fluid and fog in process chamber, to pass through through hole set on the wall of process chamber, and make the environment around the process chamber be subjected to pollution problems to the process chamber external leakage.In patent documentation 1 and patent documentation 2, be in through hole, sealing mechanism to be set and the leakage that suppresses the steam and the fog of treatment fluid, but, can't fully prevent the leakage of the steam and the fog of treatment fluid because of the rotation of axle makes sealing mechanism be easy to generate abrasion.
Summary of the invention
Problem of the present invention be prevent the steam of treatment fluid and fog in the process chamber to the process chamber external leakage.
Substrate board treatment of the present invention is a kind of process chamber that comprises substrate, the substrate mobile device that substrate is moved, the substrate board treatment of the treatment fluid feedway of in process chamber, treatment fluid being supplied with to the substrate that utilizes the substrate mobile device to be moved, it is characterized in that: the substrate mobile device has and is arranged on the substrate that is used for mounted board in the process chamber and carries mechanism, set drive source outside process chamber, and, carry the actuating force reception and registration mechanism that mechanism passes under contactless state to substrate with the interior or exterior space of drive source drives power by process chamber.
And, substrate processing method using same of the present invention is a kind of in process chamber, substrate moved and treatment fluid is supplied with and the substrate processing method using same that carries out the processing of substrate to substrate, it is characterized in that: with the outer set drive source drives power of process chamber, inside and outside space by process chamber, substrate lift-launch mechanism set in process chamber passes on non-contactly, moves and make substrate carry the substrate that is carried in the mechanism.
Because will be outside process chamber set drive source drives power, inside and outside space by process chamber, substrate lift-launch mechanism set in process chamber passes on non-contactly, so there is no need on the wall of process chamber, through hole to be set, do not worry the steam of treatment fluid and fog in the process chamber to the process chamber external leakage.
In addition, the wall of its process chamber of substrate board treatment of the present invention is made of nonmagnetic substance, substrate carries mechanism and contains roller, drive source contains motor, and the actuating force transmission mechanism contains the 1st magnetite on the axle that is installed in motor, be installed in the 2nd magnetite that the axle of roller is gone up and is rotated according to the rotation of the 1st magnetite.
And, substrate processing method using same of the present invention is the wall that constitutes process chamber with nonmagnetic substance, and roller is set in process chamber, motor is set outside process chamber, and the 1st magnetite installed from the axle of motor, the 2nd magnetite of being installed on the axle of roller is passed on revolving force, and the substrate that is carried on the roller is moved.
Utilization is installed in the 1st magnetite on the axle of motor, be installed in this simple formation of the 2nd magnetite on the axle of roller, and the actuating force that makes motor is passed on to roller non-contactly by the inside and outside space of process chamber.For the magnetic force that makes the 1st magnetite and the 2nd magnetite is passed on mutually by the inside and outside space of process chamber, and the wall portion that makes process chamber by nonmagnetic substance for example plastic material such as Corvic constitute.
As utilize the present invention, by with the outer set drive source drives power of process chamber, inside and outside space by process chamber, substrate lift-launch mechanism set in process chamber passes on non-contactly, thereby there is no need on the wall of process chamber, through hole to be set, can prevent the steam of treatment fluid and fog in the process chamber to the process chamber external leakage.
In addition, as utilize the present invention, can the actuating force of motor be passed on non-contactly to roller by this simple formation of the 2nd magnetite of on the 1st magnetite of being installed on the axle of motor and axle, being installed at roller.
Description of drawings
Figure 1 shows that the summary pie graph of the substrate board treatment of an example of the present invention.
Fig. 2 is the part section side view of the A-A portion of Fig. 1.
Figure 3 shows that the configuration schematic diagram of substrate travel mechanism.
Fig. 4 (a) is depicted as the schematic diagram of the magnetized state of magnetite, and Fig. 4 (b) is depicted as the key diagram of the rotation of magnetite.
Figure 5 shows that the summary pie graph of the substrate board treatment of another example of the present invention.
Figure 6 shows that the schematic diagram of the magnetized state of magnetite.
1: substrate 2: container
3: sprayer 10,30: roller
11,21,31,41: rotating shaft 12,22,32,42: bearing
13,23,33,43: magnetite 20,40: motor
24,25,44,45: substrate
Embodiment
Figure 1 shows that the summary pie graph of the substrate board treatment of an example of the present invention.And Fig. 2 is the part section side view of the A-A portion of Fig. 1.The formation of substrate board treatment comprises process chamber, treatment fluid feed mechanism and substrate travel mechanism.
In Fig. 1,, be formed with the process chamber that stretches to the drawing depth direction in the inside of container 2 (chamber).Container 2 by nonmagnetic substance for example Corvic plastics (plastic) materials such as (polyvinyl chlorideresin) constitute.In process chamber,, be provided with 1 or be provided with most along the drawing depth direction by the treatment fluid feed mechanism that sprayer 3 is constituted.Sprayer 3 is provided with most nozzles.Sprayer 3 is from nozzle, and with treatment fluids such as developer solution, etching liquid, stripper, cleaning fluids, the surface of the substrate 1 that is moved to utilizing substrate travel mechanism described later sprays.The treatment fluid that utilization is sprayed from sprayer 3, to substrate 1 develop, etching, peel off, the processing of substrate such as cleaning.At this moment, in process chamber, produce the steam and the fog of treatment fluid.The treatment fluid that flows out from the surface of substrate 1 is recovered by the set recovery path in the below of process chamber.
The formation of substrate travel mechanism comprises roller 10 (roller), rotating shaft 11 (shaft), bearing 12 (bearing), magnetite 13, motor 20, rotating shaft 21, bearing 22 and magnetite 23.In the process chamber in Fig. 1, along be arranged at intervals with most the rotating shafts 11 of drawing depth direction to set.Utilize bearing 12 and supporting rotating shaft 11 rotatably.Bearing 12 is fixed on the container 2.Most rollers 10 are installed on rotating shaft 11.And, at an end of rotating shaft 11 magnetite 13 is installed.Magnetite 13 its profiles are cylindrical, and make the side of cylinder and container 2 in abutting connection with and dispose.
In Fig. 2, be outside equipped with motor 20 in process chamber, and on motor 20, link rotating shaft 21.Utilize bearing 22 and supporting rotating shaft 21 rotatably.Motor 20 is to be fixed in the substrate 24, and bearing 22 is to be fixed in the substrate 25.On rotating shaft 21, most magnetites 23 are installed on the position of container 2 and each magnetite 13 subtend.Magnetite 23 its profiles are cylindrical, and are configured with the side of cylinder and container 2 approaching forms.
Figure 3 shows that the configuration schematic diagram of substrate travel mechanism.This figure is depicted as substrate 1, container 2 and the sprayer 3 that omits Fig. 1, and observes the state of substrate travel mechanism from the top.When observing substrate travel mechanism from the top, the configuration that is perpendicular to one another of each rotating shaft 11 and rotating shaft 21.Therefore, the axle of each magnetite 13 of on each rotating shaft 11, being installed, with the axle of the magnetite of on rotating shaft 21, being installed 23, not shown container 2 and depart from 90 ° at interval.
Fig. 4 (a) is depicted as the schematic diagram of the magnetized state of magnetite, and Fig. 4 (b) is depicted as the key diagram of the rotation of magnetite.Shown in Fig. 4 (a), magnetite 13 makes the N utmost point and the S utmost point tilt 45 ° of mutual forms of arranging with the side at cylinder and is magnetized.Magnetite 23 also is same.Magnetite 13 and magnetite 23 are across the 2 approaching configurations of not shown container, and magnetic force is each other propagated mutually by both spaces.Therefore, the N utmost point of magnetite 13 and the S utmost point of magnetite 23 are attracted and subtend each other, the S utmost point of magnetite 13 and the N utmost point of magnetite 23 attract and subtend each other.
As shown in Figure 1, on roller 10, be equipped with substrate 1.Roller 10 utilizes the actuating force of being passed on from motor 20, is rotated with the speed of setting, and the drawing depth direction (the direction flechette-type symbol of Fig. 2 shown in) of substrate 1 to Fig. 1 moved with the speed of setting.
As utilize this example, and the drive source of substrate travel mechanism is set in can the space below process chamber, so do not need to be used for to be provided with the space of the drive source of substrate travel mechanism on the next door of process chamber, can reduce the area that is provided with of substrate board treatment.
And, as utilize this example, owing to the roller 10 that the actuating force of motor 20 is installed on most rotating shafts 11 is passed on, so can utilize 1 motor 20 to drive the roller of being installed on most individual rotating shafts 11 10.
Figure 5 shows that the summary pie graph of the substrate board treatment of another example of the present invention.The formation of the substrate travel mechanism of this example comprises roller 30, rotating shaft 31, bearing 32, magnetite 33, motor 40, rotating shaft 41, bearing 42 and magnetite 43.
In process chamber, along be arranged at intervals with most the rotating shafts 31 of drawing depth direction to set.Utilize bearing 32 and supporting rotating shaft 31 rotatably.Bearing 32 is to be fixed on the container 2.Most rollers 30 are installed on rotating shaft 31.And, at an end of rotating shaft 31 magnetite 33 is installed.Magnetite 33 is discoideus, and is configured with the approaching form of the sidewall of the surface of plectane and container 2.
Outside process chamber, be provided with most rotating shafts 41 along the drawing depth direction.Each rotating shaft 41 and rotating shaft 31 arranged coaxial, and utilize bearing 42 and rotatably be supported.On each rotating shaft 41, link motor 40 is arranged.Motor 40 is to be fixed in the substrate 44, and bearing 42 is to be fixed in the substrate 45.On each rotating shaft 41,, magnetite 43 is installed on the position of the sidewall of container 2 and magnetite 33 subtends.Magnetite 43 is discoideus, and is configured with the approaching form of the sidewall of the surface of plectane and container 2.
Figure 6 shows that the schematic diagram of the magnetized state of magnetite.Fig. 6 (a) expression is about magnetite 33, and Fig. 6 (b) expression is about magnetite 43, respectively the magnetized state on surface opposite to one another.Shown in Fig. 6 (a) and (b), the surface of magnetite 33 and magnetite 43 is magnetized axle with the N utmost point and the S utmost point as the mutual form of arranging in center.In addition, in Fig. 6, the N utmost point and the S utmost point are cut apart by two, but also can as four cut apart, six cut apart etc., axle is cut apart more meticulously as the center.
Magnetite 43 utilizes the driving of motor 40, is rotated around rotating shaft 41.At this moment, the N utmost point of magnetite 33 is attracted and subtend by the S utmost point of magnetite 43, and the S of the magnetite 33 very N utmost point of magnetite 43 attracts and subtend, so magnetite 33 is rotated around rotating shaft 31.By this, the actuating force that makes motor 40 is by the inside and outside space of process chamber, the roller of being installed on rotating shaft 31 30 and passing on non-contactly.Therefore, there is no need, the through hole that rotating shaft 31 passes through is set on the sidewall of container 2 as known techniques.
As shown in Figure 5, on roller 30, be equipped with substrate 1.Roller 30 utilizes the actuating force of being passed on from motor 40, is rotated with the speed of setting, and the drawing depth direction of substrate 1 to Fig. 5 moved with the speed of setting.
As utilize this example, even below process chamber, be not used in the space of drive source that substrate travel mechanism is set etc., the drive source of substrate travel mechanism etc. can be set also on the next door of process chamber.
And, by on each rotating shaft 41, motor 40 being linked respectively, can control the rotary speed of roller 30 independently at every rotating shaft 31.But, also can be substituted on each rotating shaft 41 and link motor 40 respectively, and utilize belt, belt pulley or chain and sprocket wheel etc., the actuating force of 1 motor 40 is passed on to most rotating shafts 41.
As utilize example discussed above, can be with the actuating force of motor set outside process chamber 20 or motor 40, inside and outside space by process chamber, roller 10 or roller 30 set in process chamber are passed on non-contactly, thereby there is no need in container 2, through hole to be set, can prevent that the steam of treatment fluid and fog are outdoor to handling from the process chamber internal leakage.
In addition, as utilize example discussed above, can simply constitute, the actuating force of motor 20 or motor 40 is passed on non-contactly to roller 10 or roller 30 by magnetite 23 and magnetite 13 or magnetite 43 and magnetite 33 are this.
But actuating force of the present invention passes on mechanism to be not limited to magnetite, as long as for the inside and outside space by process chamber, with getting final product that actuating force is passed on non-contactly.And substrate of the present invention carries mechanism and is not limited to roller, also can be the substrate that moves and carry mechanism as belt and chain etc.In addition, drive source of the present invention is not limited to motor, also can be engine and cylinder etc.
Claims (4)
1. substrate board treatment comprises for a kind of:
The process chamber of substrate,
Aforementioned processing indoor make substrate mobile device that substrate moves,
The substrate board treatment of the treatment fluid feedway of supplying with at the indoor substrate that treatment fluid is moved to utilizing the aforesaid base plate mobile device of aforementioned processing;
It is characterized in that:
The aforesaid base plate mobile device has:
Be arranged on the indoor substrate that is used for mounted board of aforementioned processing carry mechanism,
The outdoor set drive source of aforementioned processing, and
With the inside and outside space of aforementioned drive source drives power, carry the actuating force reception and registration mechanism that mechanism passes under contactless state to aforesaid base plate by the aforementioned processing chamber.
2. substrate board treatment as claimed in claim 1 is characterized in that:
The wall of aforementioned processing chamber is made of nonmagnetic substance,
Aforesaid base plate carries mechanism and contains roller,
Aforementioned drive source contains motor,
Aforementioned actuating force transmission mechanism contains the 1st magnetite on the axle that is installed in the aforementioned electric motivation and is installed in the 2nd magnetite of going up and being rotated according to the rotation of aforementioned the 1st magnetite of aforementioned roller.
3. substrate processing method using same, moves substrate and treatment fluid is supplied with and the substrate processing method using same that carries out the processing of substrate to substrate in process chamber for a kind of,
It is characterized in that:
With the outer set drive source drives power of process chamber, by the inside and outside space of process chamber, substrate lift-launch mechanism set in process chamber passes on non-contactly, moves and make substrate carry the substrate that is carried in the mechanism.
4. substrate processing method using same as claimed in claim 3 is characterized in that:
Constitute the wall of process chamber by nonmagnetic substance,
Roller is set in process chamber,
Motor is set outside process chamber, and
The 1st magnetite installed from the axle of motor, the 2nd magnetite of being installed on the axle of roller is passed on revolving force, and the substrate that is carried on the roller is moved.
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2005100742A JP2006286691A (en) | 2005-03-31 | 2005-03-31 | Apparatus and method of processing substrate |
| JP2005100742 | 2005-03-31 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN1841695A true CN1841695A (en) | 2006-10-04 |
| CN100511626C CN100511626C (en) | 2009-07-08 |
Family
ID=37030629
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CNB2006100027175A Expired - Fee Related CN100511626C (en) | 2005-03-31 | 2006-01-25 | Substrate processing device and method |
Country Status (2)
| Country | Link |
|---|---|
| JP (1) | JP2006286691A (en) |
| CN (1) | CN100511626C (en) |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102602684A (en) * | 2012-03-14 | 2012-07-25 | 深圳市华星光电技术有限公司 | Method and system for transport control for base materials of liquid crystal display panels |
| CN105151803A (en) * | 2015-09-24 | 2015-12-16 | Abb技术有限公司 | Conveying device and system |
| CN107187873A (en) * | 2017-04-28 | 2017-09-22 | 武汉华星光电技术有限公司 | A kind of conveyer |
| CN110364456A (en) * | 2018-04-11 | 2019-10-22 | 显示器生产服务株式会社 | Substrate board treatment |
| CN110813669A (en) * | 2019-11-15 | 2020-02-21 | 江苏上达电子有限公司 | Novel COF substrate spray coating method |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR100761319B1 (en) * | 2006-12-01 | 2007-09-27 | 아프로시스템 주식회사 | Glass transfer apparatus for flat panel display |
| KR100837629B1 (en) | 2006-12-19 | 2008-06-12 | 세메스 주식회사 | Apparatus and method for treating substrate |
| KR100911671B1 (en) | 2008-05-30 | 2009-08-10 | 세메스 주식회사 | Apparatus for processing a substrate |
| KR101105387B1 (en) | 2010-12-13 | 2012-01-16 | 주식회사 에스아이이 | Substrate drying apparatus |
Family Cites Families (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0727290U (en) * | 1993-10-29 | 1995-05-19 | 大日本スクリーン製造株式会社 | Driving force transmission device |
| JP3353107B2 (en) * | 1998-08-20 | 2002-12-03 | マルヤス機械株式会社 | Conveyor |
| JP2003341835A (en) * | 2002-05-27 | 2003-12-03 | Shimada Phys & Chem Ind Co Ltd | Substrate gas treatment device |
| JP4120009B2 (en) * | 2003-03-13 | 2008-07-16 | 株式会社エフ・イー・シー | Conveying device using rotating shaft with magnetized cylinder |
-
2005
- 2005-03-31 JP JP2005100742A patent/JP2006286691A/en active Pending
-
2006
- 2006-01-25 CN CNB2006100027175A patent/CN100511626C/en not_active Expired - Fee Related
Cited By (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102602684A (en) * | 2012-03-14 | 2012-07-25 | 深圳市华星光电技术有限公司 | Method and system for transport control for base materials of liquid crystal display panels |
| CN105151803A (en) * | 2015-09-24 | 2015-12-16 | Abb技术有限公司 | Conveying device and system |
| CN105151803B (en) * | 2015-09-24 | 2018-03-27 | Abb瑞士股份有限公司 | Conveying device and its Transmission system |
| US10421626B2 (en) | 2015-09-24 | 2019-09-24 | Abb Schweiz Ag | Conveying apparatus and transmitting system |
| CN107187873A (en) * | 2017-04-28 | 2017-09-22 | 武汉华星光电技术有限公司 | A kind of conveyer |
| CN110364456A (en) * | 2018-04-11 | 2019-10-22 | 显示器生产服务株式会社 | Substrate board treatment |
| CN110364456B (en) * | 2018-04-11 | 2023-08-04 | 显示器生产服务株式会社 | Substrate processing apparatus |
| CN110813669A (en) * | 2019-11-15 | 2020-02-21 | 江苏上达电子有限公司 | Novel COF substrate spray coating method |
Also Published As
| Publication number | Publication date |
|---|---|
| CN100511626C (en) | 2009-07-08 |
| JP2006286691A (en) | 2006-10-19 |
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Granted publication date: 20090708 Termination date: 20140125 |