CN1831645A - 精细图案的制作装置 - Google Patents
精细图案的制作装置 Download PDFInfo
- Publication number
- CN1831645A CN1831645A CNA2005101329591A CN200510132959A CN1831645A CN 1831645 A CN1831645 A CN 1831645A CN A2005101329591 A CNA2005101329591 A CN A2005101329591A CN 200510132959 A CN200510132959 A CN 200510132959A CN 1831645 A CN1831645 A CN 1831645A
- Authority
- CN
- China
- Prior art keywords
- substrate
- fine pattern
- brace table
- template
- producing device
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Images
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y40/00—Manufacture or treatment of nanostructures
Landscapes
- Engineering & Computer Science (AREA)
- Nanotechnology (AREA)
- Chemical & Material Sciences (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Crystallography & Structural Chemistry (AREA)
- Theoretical Computer Science (AREA)
- Mathematical Physics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Manufacturing & Machinery (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Shaping Of Tube Ends By Bending Or Straightening (AREA)
- Micromachines (AREA)
- Electroluminescent Light Sources (AREA)
Abstract
Description
Claims (11)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1020050018738 | 2005-03-07 | ||
KR1020050018738A KR100729427B1 (ko) | 2005-03-07 | 2005-03-07 | 미세패턴 형성장치 |
Publications (2)
Publication Number | Publication Date |
---|---|
CN1831645A true CN1831645A (zh) | 2006-09-13 |
CN100533270C CN100533270C (zh) | 2009-08-26 |
Family
ID=36942891
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CNB2005101329591A Expired - Fee Related CN100533270C (zh) | 2005-03-07 | 2005-12-29 | 精细图案的制作装置 |
Country Status (5)
Country | Link |
---|---|
US (1) | US7670128B2 (zh) |
JP (1) | JP2006253644A (zh) |
KR (1) | KR100729427B1 (zh) |
CN (1) | CN100533270C (zh) |
TW (1) | TWI314670B (zh) |
Families Citing this family (16)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20070164476A1 (en) * | 2004-09-01 | 2007-07-19 | Wei Wu | Contact lithography apparatus and method employing substrate deformation |
KR100726724B1 (ko) * | 2006-02-09 | 2007-06-11 | 한국생산기술연구원 | 핫엠보싱용 적층형 금형장치 |
KR101296377B1 (ko) * | 2006-11-10 | 2013-08-14 | 주식회사 디엠에스 | 임프린트 리소그래피 공정용 스템프 |
KR101338308B1 (ko) * | 2006-12-08 | 2013-12-09 | 엘아이지에이디피 주식회사 | 패턴형성장치 |
KR101390389B1 (ko) * | 2007-08-24 | 2014-04-30 | 시게이트 테크놀로지 엘엘씨 | 대면적 나노 임프린트 리소그래피 장치 |
KR101361850B1 (ko) * | 2007-10-29 | 2014-02-12 | 주식회사 디엠에스 | 기판에 식각 영역을 만들기 위한 장치 |
KR100975429B1 (ko) * | 2008-05-30 | 2010-08-11 | 주식회사 디엠에스 | 기판에 식각 영역을 만들기 위한 장치 |
KR101255285B1 (ko) | 2009-12-18 | 2013-04-15 | 엘지디스플레이 주식회사 | 평판 표시 소자의 제조 장치 및 방법 |
NL2005735A (en) * | 2009-12-23 | 2011-06-27 | Asml Netherlands Bv | Imprint lithographic apparatus and imprint lithographic method. |
KR102323256B1 (ko) | 2019-09-19 | 2021-11-08 | 엘지전자 주식회사 | 반도체 발광소자의 자가조립 장치 |
KR102260638B1 (ko) * | 2019-09-26 | 2021-06-04 | 엘지전자 주식회사 | 반도체 발광소자의 자가조립 장치 |
EP4071789A4 (en) * | 2019-09-19 | 2024-02-14 | LG Electronics Inc. | SUBSTRATE CHUCK FOR SELF-ASSEMBLY OF LIGHT-EMITTING SEMICONDUCTOR DIODES |
WO2021054507A1 (ko) | 2019-09-19 | 2021-03-25 | 엘지전자 주식회사 | 반도체 발광소자의 자가조립 장치 |
WO2021054548A1 (en) | 2019-09-19 | 2021-03-25 | Lg Electronics Inc. | Substrate chuck for self-assembling semiconductor light-emitting diodes |
WO2021054550A1 (en) * | 2019-09-19 | 2021-03-25 | Lg Electronics Inc. | Device for self-assembling semiconductor light-emitting diodes |
WO2021054508A1 (ko) | 2019-09-19 | 2021-03-25 | 엘지전자 주식회사 | 반도체 발광소자의 자가조립 장치 |
Family Cites Families (20)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH02126434A (ja) * | 1988-11-05 | 1990-05-15 | Mitsubishi Electric Corp | 光デイスク基板成形方法 |
JPH04333035A (ja) | 1991-05-09 | 1992-11-20 | Seiko Epson Corp | カメラ用データ写し込み装置 |
JPH0580530A (ja) * | 1991-09-24 | 1993-04-02 | Hitachi Ltd | 薄膜パターン製造方法 |
US5772905A (en) | 1995-11-15 | 1998-06-30 | Regents Of The University Of Minnesota | Nanoimprint lithography |
US6482742B1 (en) * | 2000-07-18 | 2002-11-19 | Stephen Y. Chou | Fluid pressure imprint lithography |
JPH10180893A (ja) * | 1996-12-27 | 1998-07-07 | Asahi Opt:Kk | プラスチックレンズとその製造方法及び装置 |
US5947027A (en) * | 1998-09-08 | 1999-09-07 | Motorola, Inc. | Printing apparatus with inflatable means for advancing a substrate towards the stamping surface |
KR100335070B1 (ko) * | 1999-04-21 | 2002-05-03 | 백승준 | 압축 성형 기법을 이용한 미세 패턴 형성 방법 |
JP2000323461A (ja) * | 1999-05-11 | 2000-11-24 | Nec Corp | 微細パターン形成装置、その製造方法、および形成方法 |
IT1313118B1 (it) | 1999-08-25 | 2002-06-17 | Morton Int Inc | Apparecchiatura di applicazione a vuoto dotata di mezzi trasportatorie procedimento per applicare un resist a film secco ad un pannello |
SE515607C2 (sv) | 1999-12-10 | 2001-09-10 | Obducat Ab | Anordning och metod vid tillverkning av strukturer |
SE515962C2 (sv) * | 2000-03-15 | 2001-11-05 | Obducat Ab | Anordning för överföring av mönster till objekt |
US6696220B2 (en) * | 2000-10-12 | 2004-02-24 | Board Of Regents, The University Of Texas System | Template for room temperature, low pressure micro-and nano-imprint lithography |
US7635262B2 (en) * | 2000-07-18 | 2009-12-22 | Princeton University | Lithographic apparatus for fluid pressure imprint lithography |
CA2380114C (en) * | 2002-04-04 | 2010-01-19 | Obducat Aktiebolag | Imprint method and device |
US20050172848A1 (en) * | 2002-04-24 | 2005-08-11 | Lennart Olsson | Device and method for transferring a pattern to a substrate |
WO2004013693A2 (en) * | 2002-08-01 | 2004-02-12 | Molecular Imprints, Inc. | Scatterometry alignment for imprint lithography |
JP4061220B2 (ja) * | 2003-03-20 | 2008-03-12 | 株式会社日立製作所 | ナノプリント装置、及び微細構造転写方法 |
KR20030097735A (ko) * | 2003-11-19 | 2003-12-31 | 엔엔디 주식회사 | 임프린팅 장치 및 임프린팅 기판지지장치 |
KR100540135B1 (ko) * | 2003-11-21 | 2006-01-11 | 주식회사 미뉴타텍 | 미세 패턴 제조용 디웨팅 장치 및 그 방법 |
-
2005
- 2005-03-07 KR KR1020050018738A patent/KR100729427B1/ko not_active IP Right Cessation
- 2005-12-13 JP JP2005359409A patent/JP2006253644A/ja active Pending
- 2005-12-20 TW TW094145252A patent/TWI314670B/zh active
- 2005-12-28 US US11/319,637 patent/US7670128B2/en not_active Expired - Fee Related
- 2005-12-29 CN CNB2005101329591A patent/CN100533270C/zh not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
KR100729427B1 (ko) | 2007-06-15 |
KR20060097862A (ko) | 2006-09-18 |
CN100533270C (zh) | 2009-08-26 |
TW200632544A (en) | 2006-09-16 |
US7670128B2 (en) | 2010-03-02 |
TWI314670B (en) | 2009-09-11 |
US20060196415A1 (en) | 2006-09-07 |
JP2006253644A (ja) | 2006-09-21 |
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Legal Events
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C06 | Publication | ||
PB01 | Publication | ||
C10 | Entry into substantive examination | ||
SE01 | Entry into force of request for substantive examination | ||
C14 | Grant of patent or utility model | ||
GR01 | Patent grant | ||
ASS | Succession or assignment of patent right |
Owner name: WEIHAI DIANMEI SHIGUANG MECHANICAL AND ELECTRONIC Free format text: FORMER OWNER: DISPLAY PRODUCTION SERVICE CO., LTD. Effective date: 20140319 |
|
C41 | Transfer of patent application or patent right or utility model | ||
COR | Change of bibliographic data |
Free format text: CORRECT: ADDRESS; TO: 264205 WEIHAI, SHANDONG PROVINCE |
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TR01 | Transfer of patent right |
Effective date of registration: 20140319 Address after: 264205 Shandong city in Weihai Province, its economic and Technological Development Zone Road No. 88-1 Patentee after: Weihai dianmei Shiguang electromechanical Co Ltd Address before: Gyeonggi Do, South Korea Patentee before: Display Production Service Co., Ltd. |
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CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20090826 Termination date: 20181229 |
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CF01 | Termination of patent right due to non-payment of annual fee |