CN1647332A - 高功率半导体激光二极管及其制造方法 - Google Patents
高功率半导体激光二极管及其制造方法 Download PDFInfo
- Publication number
- CN1647332A CN1647332A CNA038090244A CN03809024A CN1647332A CN 1647332 A CN1647332 A CN 1647332A CN A038090244 A CNA038090244 A CN A038090244A CN 03809024 A CN03809024 A CN 03809024A CN 1647332 A CN1647332 A CN 1647332A
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- laser diode
- section
- ridge waveguide
- facet
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- 239000004065 semiconductor Substances 0.000 title claims abstract description 19
- 238000000034 method Methods 0.000 title claims description 13
- 238000004519 manufacturing process Methods 0.000 claims abstract description 25
- 230000011218 segmentation Effects 0.000 claims description 31
- 229910052751 metal Inorganic materials 0.000 claims description 5
- 239000002184 metal Substances 0.000 claims description 5
- 238000005086 pumping Methods 0.000 claims description 5
- 239000002800 charge carrier Substances 0.000 claims 3
- 238000002347 injection Methods 0.000 claims 2
- 239000007924 injection Substances 0.000 claims 2
- 241000217377 Amblema plicata Species 0.000 claims 1
- 238000002955 isolation Methods 0.000 claims 1
- 238000013461 design Methods 0.000 abstract description 27
- 230000003287 optical effect Effects 0.000 abstract description 13
- 239000000835 fiber Substances 0.000 abstract description 5
- 238000004891 communication Methods 0.000 abstract description 3
- 230000006872 improvement Effects 0.000 abstract description 3
- 230000005693 optoelectronics Effects 0.000 abstract description 2
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- 229910052691 Erbium Inorganic materials 0.000 description 3
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- 229910001218 Gallium arsenide Inorganic materials 0.000 description 1
- 229910000530 Gallium indium arsenide Inorganic materials 0.000 description 1
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Images
Classifications
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/20—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers
- H01S5/22—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers having a ridge or stripe structure
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/02—Structural details or components not essential to laser action
- H01S5/0201—Separation of the wafer into individual elements, e.g. by dicing, cleaving, etching or directly during growth
- H01S5/0202—Cleaving
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/10—Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/10—Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region
- H01S5/1053—Comprising an active region having a varying composition or cross-section in a specific direction
- H01S5/1064—Comprising an active region having a varying composition or cross-section in a specific direction varying width along the optical axis
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/10—Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region
- H01S5/16—Window-type lasers, i.e. with a region of non-absorbing material between the active region and the reflecting surface
- H01S5/166—Window-type lasers, i.e. with a region of non-absorbing material between the active region and the reflecting surface with window regions comprising non-semiconducting materials
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/20—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers
- H01S5/2036—Broad area lasers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/20—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers
- H01S5/204—Strongly index guided structures
Landscapes
- Physics & Mathematics (AREA)
- Geometry (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Electromagnetism (AREA)
- Optics & Photonics (AREA)
- Semiconductor Lasers (AREA)
Abstract
Description
Claims (22)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US10/131,335 | 2002-04-24 | ||
US10/131,335 US6798815B2 (en) | 2002-04-24 | 2002-04-24 | High power semiconductor laser diode and method for making such a diode |
Publications (2)
Publication Number | Publication Date |
---|---|
CN1647332A true CN1647332A (zh) | 2005-07-27 |
CN100409513C CN100409513C (zh) | 2008-08-06 |
Family
ID=29268724
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CNB038090244A Expired - Lifetime CN100409513C (zh) | 2002-04-24 | 2003-04-14 | 高功率半导体激光二极管及其制造方法 |
Country Status (7)
Country | Link |
---|---|
US (1) | US6798815B2 (zh) |
EP (1) | EP1518304B1 (zh) |
JP (1) | JP4827410B2 (zh) |
CN (1) | CN100409513C (zh) |
AU (1) | AU2003219436A1 (zh) |
DE (1) | DE60302362T2 (zh) |
WO (1) | WO2003092130A1 (zh) |
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN101490915B (zh) * | 2006-07-19 | 2010-09-29 | 松下电器产业株式会社 | 半导体激光装置 |
CN103329367A (zh) * | 2011-01-18 | 2013-09-25 | 索尼公司 | 半导体激光器件 |
CN103825194A (zh) * | 2014-03-07 | 2014-05-28 | 中国科学院半导体研究所 | 单模光子晶体边发射半导体激光器 |
WO2015011606A1 (en) * | 2013-07-25 | 2015-01-29 | International Business Machines Corporation | Optically pumpable waveguide amplifier device and method of signal radiation amplification using the same |
CN104901159A (zh) * | 2015-05-27 | 2015-09-09 | 中国科学院长春光学精密机械与物理研究所 | 多波导集成谐振半导体激光器 |
Families Citing this family (15)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7301979B2 (en) * | 2003-05-22 | 2007-11-27 | Matsushita Electric Industrial Co., Ltd. | Semiconductor laser |
US20070110379A1 (en) * | 2005-11-14 | 2007-05-17 | Applied Materials, Inc. Legal Department | Pinch waveguide |
GB2432456A (en) * | 2005-11-21 | 2007-05-23 | Bookham Technology Plc | High power semiconductor laser diode |
DE102006011284A1 (de) * | 2006-02-28 | 2007-08-30 | Osram Opto Semiconductors Gmbh | Halbleiterlaservorrichtung |
US7848375B1 (en) * | 2007-05-30 | 2010-12-07 | Finisar Corporation | Ridge waveguide laser with flared facet |
JP2009283605A (ja) * | 2008-05-21 | 2009-12-03 | Mitsubishi Electric Corp | 半導体レーザ |
JP2009295680A (ja) * | 2008-06-03 | 2009-12-17 | Panasonic Corp | 半導体レーザ装置 |
JP4657337B2 (ja) * | 2008-09-29 | 2011-03-23 | シャープ株式会社 | 半導体レーザ装置 |
WO2013055383A1 (en) | 2011-10-11 | 2013-04-18 | Nlight Photonics Corporation | High power semiconductor laser with phase-matching optical element |
WO2015002683A2 (en) | 2013-04-09 | 2015-01-08 | Nlight Photonics Corporation | Diode laser packages with flared laser oscillator waveguides |
US9166369B2 (en) | 2013-04-09 | 2015-10-20 | Nlight Photonics Corporation | Flared laser oscillator waveguide |
US10186836B2 (en) | 2014-10-10 | 2019-01-22 | Nlight, Inc. | Multiple flared laser oscillator waveguide |
WO2016197137A1 (en) | 2015-06-04 | 2016-12-08 | Nlight, Inc. | Angled dbr-grating laser/amplifier with one or more mode-hopping regions |
JP2017050318A (ja) * | 2015-08-31 | 2017-03-09 | ルネサスエレクトロニクス株式会社 | 半導体装置 |
JP2018085468A (ja) | 2016-11-25 | 2018-05-31 | ルネサスエレクトロニクス株式会社 | 半導体レーザ、光源ユニット及びレーザ光照射装置 |
Family Cites Families (19)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4349905A (en) * | 1980-07-22 | 1982-09-14 | Hewlett-Packard Company | Tapered stripe semiconductor laser |
JPS60163486A (ja) | 1984-02-03 | 1985-08-26 | Nec Corp | 半導体レ−ザ |
JPS6151770A (ja) * | 1984-08-21 | 1986-03-14 | Toshiba Corp | 溶融炭酸塩型燃料電池 |
JPS63293989A (ja) * | 1987-05-27 | 1988-11-30 | Hitachi Ltd | 半導体レ−ザ素子およびその製造方法 |
US4875216A (en) * | 1987-11-30 | 1989-10-17 | Xerox Corporation | Buried waveguide window regions for improved performance semiconductor lasers and other opto-electronic applications |
US4965525A (en) * | 1989-11-13 | 1990-10-23 | Bell Communications Research, Inc. | Angled-facet flared-waveguide traveling-wave laser amplifiers |
US5440577A (en) * | 1991-02-13 | 1995-08-08 | The University Of Melbourne | Semiconductor laser |
US5802084A (en) * | 1994-11-14 | 1998-09-01 | The Regents Of The University Of California | Generation of high power optical pulses using flared mode-locked semiconductor lasers and optical amplifiers |
US6075801A (en) * | 1995-01-18 | 2000-06-13 | Nec Corporation | Semiconductor laser with wide side of tapered light gain region |
JPH10145001A (ja) | 1996-11-13 | 1998-05-29 | Sony Corp | 半導体レーザー |
US6014396A (en) * | 1997-09-05 | 2000-01-11 | Sdl, Inc. | Flared semiconductor optoelectronic device |
JP2000133877A (ja) * | 1998-10-27 | 2000-05-12 | Furukawa Electric Co Ltd:The | 半導体レーザ素子 |
JP2000312052A (ja) * | 1999-02-23 | 2000-11-07 | Mitsubishi Chemicals Corp | 半導体光デバイス装置 |
US6807213B1 (en) | 1999-02-23 | 2004-10-19 | Mitsubishi Chemical Corporation | Semiconductor optical device apparatus |
US6826220B2 (en) * | 1999-12-27 | 2004-11-30 | Corning O.T.I. S.R.L. | Semiconductor laser element having a diverging region |
US6375364B1 (en) * | 2000-01-06 | 2002-04-23 | Corning Lasertron, Inc. | Back facet flared ridge for pump laser |
US6463088B1 (en) * | 2000-07-07 | 2002-10-08 | Lucent Technologies Inc. | Mesa geometry semiconductor light emitter having chalcogenide dielectric coating |
JP3974852B2 (ja) * | 2000-09-08 | 2007-09-12 | 三井化学株式会社 | 半導体レーザ素子 |
GB2367376B (en) * | 2000-09-13 | 2003-04-30 | Bookham Technology Plc | Rib waveguide device with mode filter |
-
2002
- 2002-04-24 US US10/131,335 patent/US6798815B2/en not_active Expired - Lifetime
-
2003
- 2003-04-14 CN CNB038090244A patent/CN100409513C/zh not_active Expired - Lifetime
- 2003-04-14 AU AU2003219436A patent/AU2003219436A1/en not_active Abandoned
- 2003-04-14 JP JP2004500378A patent/JP4827410B2/ja not_active Expired - Lifetime
- 2003-04-14 DE DE60302362T patent/DE60302362T2/de not_active Expired - Lifetime
- 2003-04-14 WO PCT/IB2003/001677 patent/WO2003092130A1/en active IP Right Grant
- 2003-04-14 EP EP03715248A patent/EP1518304B1/en not_active Expired - Lifetime
Cited By (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN101490915B (zh) * | 2006-07-19 | 2010-09-29 | 松下电器产业株式会社 | 半导体激光装置 |
CN103329367A (zh) * | 2011-01-18 | 2013-09-25 | 索尼公司 | 半导体激光器件 |
WO2015011606A1 (en) * | 2013-07-25 | 2015-01-29 | International Business Machines Corporation | Optically pumpable waveguide amplifier device and method of signal radiation amplification using the same |
US9929534B2 (en) | 2013-07-25 | 2018-03-27 | International Business Machines Corporation | Optically pumpable waveguide amplifier with amplifier having tapered input and output |
US10008820B2 (en) | 2013-07-25 | 2018-06-26 | International Business Machines Corporation | Optically pumpable waveguide amplifier with amplifier having tapered input and output |
CN103825194A (zh) * | 2014-03-07 | 2014-05-28 | 中国科学院半导体研究所 | 单模光子晶体边发射半导体激光器 |
CN103825194B (zh) * | 2014-03-07 | 2016-04-27 | 中国科学院半导体研究所 | 单模光子晶体边发射半导体激光器 |
CN104901159A (zh) * | 2015-05-27 | 2015-09-09 | 中国科学院长春光学精密机械与物理研究所 | 多波导集成谐振半导体激光器 |
CN104901159B (zh) * | 2015-05-27 | 2018-01-05 | 中国科学院长春光学精密机械与物理研究所 | 多波导集成谐振半导体激光器 |
Also Published As
Publication number | Publication date |
---|---|
EP1518304B1 (en) | 2005-11-16 |
DE60302362D1 (de) | 2005-12-22 |
US6798815B2 (en) | 2004-09-28 |
WO2003092130A1 (en) | 2003-11-06 |
EP1518304A1 (en) | 2005-03-30 |
US20040008746A1 (en) | 2004-01-15 |
JP4827410B2 (ja) | 2011-11-30 |
JP2005524234A (ja) | 2005-08-11 |
AU2003219436A1 (en) | 2003-11-10 |
DE60302362T2 (de) | 2006-07-20 |
CN100409513C (zh) | 2008-08-06 |
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Owner name: OCLARO SWITZERLAND CO., LTD. Free format text: FORMER OWNER: OCLARO TECHNOLOGY LTD. Effective date: 20141009 |
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Owner name: II-VI II-VI LASER ENTERPRISE CO., LTD. Free format text: FORMER NAME: OCLARO SWITZERLAND CO., LTD. Owner name: OCLARO TECHNOLOGY LTD. Free format text: FORMER NAME: AOLAN TECHNOLOGY COMPANY Owner name: AOLAN TECHNOLOGY COMPANY Free format text: FORMER NAME: BOOKHAM TECHNOLOGY PLC |
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CP01 | Change in the name or title of a patent holder |
Address after: Zurich Patentee after: II-VI Laser Enterprise Co.,Ltd. Address before: Zurich Patentee before: Oran Switzerland Ltd. Address after: The British county of Northampton Patentee after: OCLARO TECHNOLOGY Ltd. Address before: The British county of Northampton Patentee before: Oran Technology Co. Address after: The British county of Northampton Patentee after: Oran Technology Co. Address before: The British county of Northampton Patentee before: Bookham Technology PLC |
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Granted publication date: 20080806 |
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