CN1598061B - 从陶瓷基片上去除含有钽沉积层和铝电弧喷涂层的复合涂层的方法 - Google Patents
从陶瓷基片上去除含有钽沉积层和铝电弧喷涂层的复合涂层的方法 Download PDFInfo
- Publication number
- CN1598061B CN1598061B CN2004100642391A CN200410064239A CN1598061B CN 1598061 B CN1598061 B CN 1598061B CN 2004100642391 A CN2004100642391 A CN 2004100642391A CN 200410064239 A CN200410064239 A CN 200410064239A CN 1598061 B CN1598061 B CN 1598061B
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- CN
- China
- Prior art keywords
- temperature
- ceramic substrate
- hour
- substrate
- metal
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Classifications
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- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B41/00—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone
- C04B41/009—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone characterised by the material treated
-
- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B41/00—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone
- C04B41/45—Coating or impregnating, e.g. injection in masonry, partial coating of green or fired ceramics, organic coating compositions for adhering together two concrete elements
- C04B41/52—Multiple coating or impregnating multiple coating or impregnating with the same composition or with compositions only differing in the concentration of the constituents, is classified as single coating or impregnation
-
- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B41/00—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone
- C04B41/80—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone of only ceramics
- C04B41/81—Coating or impregnation
- C04B41/89—Coating or impregnation for obtaining at least two superposed coatings having different compositions
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/4401—Means for minimising impurities, e.g. dust, moisture or residual gas, in the reaction chamber
- C23C16/4407—Cleaning of reactor or reactor parts by using wet or mechanical methods
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
- C23F1/00—Etching metallic material by chemical means
- C23F1/10—Etching compositions
- C23F1/14—Aqueous compositions
- C23F1/16—Acidic compositions
- C23F1/20—Acidic compositions for etching aluminium or alloys thereof
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
- C23F1/00—Etching metallic material by chemical means
- C23F1/10—Etching compositions
- C23F1/14—Aqueous compositions
- C23F1/16—Acidic compositions
- C23F1/26—Acidic compositions for etching refractory metals
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S134/00—Cleaning and liquid contact with solids
- Y10S134/902—Semiconductor wafer
Abstract
Description
Claims (5)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US10/643,409 | 2003-08-19 | ||
US10/643,409 US7097713B2 (en) | 2003-08-19 | 2003-08-19 | Method for removing a composite coating containing tantalum deposition and arc sprayed aluminum from ceramic substrates |
Publications (2)
Publication Number | Publication Date |
---|---|
CN1598061A CN1598061A (zh) | 2005-03-23 |
CN1598061B true CN1598061B (zh) | 2011-05-18 |
Family
ID=34063460
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN2004100642391A Active CN1598061B (zh) | 2003-08-19 | 2004-08-19 | 从陶瓷基片上去除含有钽沉积层和铝电弧喷涂层的复合涂层的方法 |
Country Status (7)
Country | Link |
---|---|
US (1) | US7097713B2 (zh) |
EP (1) | EP1508629B1 (zh) |
CN (1) | CN1598061B (zh) |
AT (1) | ATE453735T1 (zh) |
DE (1) | DE602004024850D1 (zh) |
SG (1) | SG109558A1 (zh) |
TW (1) | TWI357621B (zh) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN107382376A (zh) * | 2012-02-22 | 2017-11-24 | 应用材料公司 | 陶瓷物品 |
Families Citing this family (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP4653406B2 (ja) * | 2004-03-10 | 2011-03-16 | 株式会社アルバック | 水崩壊性Al複合材料、水崩壊性Al溶射膜、及び水崩壊性Al粉の製造方法、並びに成膜室用構成部材及び成膜材料の回収方法 |
US20050238807A1 (en) * | 2004-04-27 | 2005-10-27 | Applied Materials, Inc. | Refurbishment of a coated chamber component |
US7554052B2 (en) * | 2005-07-29 | 2009-06-30 | Applied Materials, Inc. | Method and apparatus for the application of twin wire arc spray coatings |
US8061888B2 (en) | 2006-03-17 | 2011-11-22 | Barrick Gold Corporation | Autoclave with underflow dividers |
CN102686963B (zh) * | 2009-10-28 | 2014-09-03 | 陶氏技术投资有限责任公司 | 干燥催化剂烘烤器传送带的装置及其使用方法 |
US8709537B2 (en) * | 2010-10-22 | 2014-04-29 | Applied Materials, Inc. | Methods for enhancing tantalum filament life in hot wire chemical vapor deposition processes |
CN106048543B (zh) * | 2016-06-02 | 2018-08-03 | 泉州市依科达半导体致冷科技有限公司 | 半导体晶片表面真空镀膜工艺 |
CN114315428B (zh) * | 2020-09-29 | 2024-03-08 | 航天特种材料及工艺技术研究所 | 一种去除多孔石英陶瓷透波材料锈渍的方法 |
CN115846252A (zh) * | 2022-11-22 | 2023-03-28 | 富乐德科技发展(天津)有限公司 | 一种半导体行业用氧化铝陶瓷的清洗方法 |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20030116276A1 (en) * | 2001-12-21 | 2003-06-26 | Weldon Edwin Charles | Methods of roughening a ceramic surface |
US20030118731A1 (en) * | 2001-12-21 | 2003-06-26 | Applied Materials, Inc. | Method of fabricating a coated process chamber component |
Family Cites Families (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4971631A (en) * | 1988-03-07 | 1990-11-20 | Bernard Lietaer | Compositions and methods for cleaning hard surfaces |
US5660640A (en) * | 1995-06-16 | 1997-08-26 | Joray Corporation | Method of removing sputter deposition from components of vacuum deposition equipment |
US6494960B1 (en) * | 1998-04-27 | 2002-12-17 | General Electric Company | Method for removing an aluminide coating from a substrate |
US6296716B1 (en) * | 1999-10-01 | 2001-10-02 | Saint-Gobain Ceramics And Plastics, Inc. | Process for cleaning ceramic articles |
US6530388B1 (en) * | 2000-02-15 | 2003-03-11 | Quantum Global Technologies, Llc | Volume efficient cleaning systems |
US6810887B2 (en) * | 2000-08-11 | 2004-11-02 | Chemtrace Corporation | Method for cleaning semiconductor fabrication equipment parts |
US6569253B2 (en) * | 2001-04-25 | 2003-05-27 | United Microelectronics Corp. | Method of cleaning a chamber of a CVD machine and elements within |
US6902628B2 (en) * | 2002-11-25 | 2005-06-07 | Applied Materials, Inc. | Method of cleaning a coated process chamber component |
-
2003
- 2003-08-19 US US10/643,409 patent/US7097713B2/en not_active Expired - Lifetime
-
2004
- 2004-08-05 AT AT04254708T patent/ATE453735T1/de not_active IP Right Cessation
- 2004-08-05 EP EP04254708A patent/EP1508629B1/en active Active
- 2004-08-05 DE DE602004024850T patent/DE602004024850D1/de active Active
- 2004-08-12 SG SG200404493A patent/SG109558A1/en unknown
- 2004-08-19 TW TW093124999A patent/TWI357621B/zh active
- 2004-08-19 CN CN2004100642391A patent/CN1598061B/zh active Active
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20030116276A1 (en) * | 2001-12-21 | 2003-06-26 | Weldon Edwin Charles | Methods of roughening a ceramic surface |
US20030118731A1 (en) * | 2001-12-21 | 2003-06-26 | Applied Materials, Inc. | Method of fabricating a coated process chamber component |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN107382376A (zh) * | 2012-02-22 | 2017-11-24 | 应用材料公司 | 陶瓷物品 |
CN107382376B (zh) * | 2012-02-22 | 2021-08-17 | 应用材料公司 | 陶瓷物品 |
Also Published As
Publication number | Publication date |
---|---|
TW200522191A (en) | 2005-07-01 |
ATE453735T1 (de) | 2010-01-15 |
TWI357621B (en) | 2012-02-01 |
DE602004024850D1 (de) | 2010-02-11 |
SG109558A1 (en) | 2005-03-30 |
CN1598061A (zh) | 2005-03-23 |
US20050039774A1 (en) | 2005-02-24 |
EP1508629B1 (en) | 2009-12-30 |
EP1508629A1 (en) | 2005-02-23 |
US7097713B2 (en) | 2006-08-29 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
C06 | Publication | ||
PB01 | Publication | ||
C10 | Entry into substantive examination | ||
SE01 | Entry into force of request for substantive examination | ||
C41 | Transfer of patent application or patent right or utility model | ||
TA01 | Transfer of patent application right |
Effective date of registration: 20081219 Address after: California, USA Applicant after: APPLIED MATERIALS, Inc. Address before: New jersey, USA Applicant before: Polk Ed Hua Co.,Ltd. Effective date of registration: 20081219 Address after: New jersey, USA Applicant after: Polk Ed Hua Co.,Ltd. Address before: New jersey, USA Applicant before: THE BOC Group Inc. |
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ASS | Succession or assignment of patent right |
Owner name: BOAC EDWARD CO., LTD. Free format text: FORMER OWNER: BCC INC. Effective date: 20081219 Owner name: APPLICATION MATERIAL LTD. Free format text: FORMER OWNER: BOAC EDWARD CO., LTD. Effective date: 20081219 |
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C14 | Grant of patent or utility model | ||
GR01 | Patent grant | ||
ASS | Succession or assignment of patent right |
Owner name: QUANTUM GLOBAL TECHNOLOGIES, LLC Free format text: FORMER OWNER: APPLIED MATERIALS INC. Effective date: 20120412 |
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C41 | Transfer of patent application or patent right or utility model | ||
TR01 | Transfer of patent right |
Effective date of registration: 20120412 Address after: American Pennsylvania Patentee after: APPLIED MATERIALS, Inc. Address before: California, USA Patentee before: APPLIED MATERIALS, Inc. |