SG109558A1 - Method for removing a composite coating containing tantalum deposition and arc sprayed aluminum from ceramic substrates - Google Patents
Method for removing a composite coating containing tantalum deposition and arc sprayed aluminum from ceramic substratesInfo
- Publication number
- SG109558A1 SG109558A1 SG200404493A SG200404493A SG109558A1 SG 109558 A1 SG109558 A1 SG 109558A1 SG 200404493 A SG200404493 A SG 200404493A SG 200404493 A SG200404493 A SG 200404493A SG 109558 A1 SG109558 A1 SG 109558A1
- Authority
- SG
- Singapore
- Prior art keywords
- ceramic substrate
- composite coating
- coating containing
- ceramic substrates
- containing tantalum
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B41/00—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone
- C04B41/009—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone characterised by the material treated
-
- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B41/00—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone
- C04B41/45—Coating or impregnating, e.g. injection in masonry, partial coating of green or fired ceramics, organic coating compositions for adhering together two concrete elements
- C04B41/52—Multiple coating or impregnating multiple coating or impregnating with the same composition or with compositions only differing in the concentration of the constituents, is classified as single coating or impregnation
-
- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B41/00—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone
- C04B41/80—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone of only ceramics
- C04B41/81—Coating or impregnation
- C04B41/89—Coating or impregnation for obtaining at least two superposed coatings having different compositions
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/4401—Means for minimising impurities, e.g. dust, moisture or residual gas, in the reaction chamber
- C23C16/4407—Cleaning of reactor or reactor parts by using wet or mechanical methods
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
- C23F1/00—Etching metallic material by chemical means
- C23F1/10—Etching compositions
- C23F1/14—Aqueous compositions
- C23F1/16—Acidic compositions
- C23F1/20—Acidic compositions for etching aluminium or alloys thereof
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
- C23F1/00—Etching metallic material by chemical means
- C23F1/10—Etching compositions
- C23F1/14—Aqueous compositions
- C23F1/16—Acidic compositions
- C23F1/26—Acidic compositions for etching refractory metals
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S134/00—Cleaning and liquid contact with solids
- Y10S134/902—Semiconductor wafer
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Organic Chemistry (AREA)
- Ceramic Engineering (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Structural Engineering (AREA)
- Metallurgy (AREA)
- Cleaning And De-Greasing Of Metallic Materials By Chemical Methods (AREA)
- Cleaning Or Drying Semiconductors (AREA)
- Chemically Coating (AREA)
- ing And Chemical Polishing (AREA)
- Coating By Spraying Or Casting (AREA)
- Manufacturing Of Printed Wiring (AREA)
- Weting (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US10/643,409 US7097713B2 (en) | 2003-08-19 | 2003-08-19 | Method for removing a composite coating containing tantalum deposition and arc sprayed aluminum from ceramic substrates |
Publications (1)
Publication Number | Publication Date |
---|---|
SG109558A1 true SG109558A1 (en) | 2005-03-30 |
Family
ID=34063460
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
SG200404493A SG109558A1 (en) | 2003-08-19 | 2004-08-12 | Method for removing a composite coating containing tantalum deposition and arc sprayed aluminum from ceramic substrates |
Country Status (7)
Country | Link |
---|---|
US (1) | US7097713B2 (zh) |
EP (1) | EP1508629B1 (zh) |
CN (1) | CN1598061B (zh) |
AT (1) | ATE453735T1 (zh) |
DE (1) | DE602004024850D1 (zh) |
SG (1) | SG109558A1 (zh) |
TW (1) | TWI357621B (zh) |
Families Citing this family (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP4653406B2 (ja) * | 2004-03-10 | 2011-03-16 | 株式会社アルバック | 水崩壊性Al複合材料、水崩壊性Al溶射膜、及び水崩壊性Al粉の製造方法、並びに成膜室用構成部材及び成膜材料の回収方法 |
US20050238807A1 (en) * | 2004-04-27 | 2005-10-27 | Applied Materials, Inc. | Refurbishment of a coated chamber component |
US7554052B2 (en) | 2005-07-29 | 2009-06-30 | Applied Materials, Inc. | Method and apparatus for the application of twin wire arc spray coatings |
US8061888B2 (en) | 2006-03-17 | 2011-11-22 | Barrick Gold Corporation | Autoclave with underflow dividers |
EP2494296B1 (en) * | 2009-10-28 | 2016-11-23 | Dow Technology Investments LLC | Device to dry catalyst roaster conveyor belt and method of using same |
US8709537B2 (en) * | 2010-10-22 | 2014-04-29 | Applied Materials, Inc. | Methods for enhancing tantalum filament life in hot wire chemical vapor deposition processes |
US9212099B2 (en) * | 2012-02-22 | 2015-12-15 | Applied Materials, Inc. | Heat treated ceramic substrate having ceramic coating and heat treatment for coated ceramics |
CN106048543B (zh) * | 2016-06-02 | 2018-08-03 | 泉州市依科达半导体致冷科技有限公司 | 半导体晶片表面真空镀膜工艺 |
CN114315428B (zh) * | 2020-09-29 | 2024-03-08 | 航天特种材料及工艺技术研究所 | 一种去除多孔石英陶瓷透波材料锈渍的方法 |
Family Cites Families (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4971631A (en) * | 1988-03-07 | 1990-11-20 | Bernard Lietaer | Compositions and methods for cleaning hard surfaces |
US5660640A (en) * | 1995-06-16 | 1997-08-26 | Joray Corporation | Method of removing sputter deposition from components of vacuum deposition equipment |
US6494960B1 (en) * | 1998-04-27 | 2002-12-17 | General Electric Company | Method for removing an aluminide coating from a substrate |
US6296716B1 (en) * | 1999-10-01 | 2001-10-02 | Saint-Gobain Ceramics And Plastics, Inc. | Process for cleaning ceramic articles |
US6530388B1 (en) * | 2000-02-15 | 2003-03-11 | Quantum Global Technologies, Llc | Volume efficient cleaning systems |
EP1320879A4 (en) * | 2000-08-11 | 2009-03-11 | Chem Trace Corp | SYSTEM AND METHOD FOR CLEANING PARTS OF SEMICONDUCTOR MANUFACTURING PARTS |
US6569253B2 (en) * | 2001-04-25 | 2003-05-27 | United Microelectronics Corp. | Method of cleaning a chamber of a CVD machine and elements within |
US6656535B2 (en) * | 2001-12-21 | 2003-12-02 | Applied Materials, Inc | Method of fabricating a coated process chamber component |
US6899798B2 (en) * | 2001-12-21 | 2005-05-31 | Applied Materials, Inc. | Reusable ceramic-comprising component which includes a scrificial surface layer |
US6902628B2 (en) * | 2002-11-25 | 2005-06-07 | Applied Materials, Inc. | Method of cleaning a coated process chamber component |
-
2003
- 2003-08-19 US US10/643,409 patent/US7097713B2/en not_active Expired - Lifetime
-
2004
- 2004-08-05 DE DE602004024850T patent/DE602004024850D1/de active Active
- 2004-08-05 AT AT04254708T patent/ATE453735T1/de not_active IP Right Cessation
- 2004-08-05 EP EP04254708A patent/EP1508629B1/en active Active
- 2004-08-12 SG SG200404493A patent/SG109558A1/en unknown
- 2004-08-19 CN CN2004100642391A patent/CN1598061B/zh active Active
- 2004-08-19 TW TW093124999A patent/TWI357621B/zh active
Also Published As
Publication number | Publication date |
---|---|
ATE453735T1 (de) | 2010-01-15 |
DE602004024850D1 (de) | 2010-02-11 |
EP1508629A1 (en) | 2005-02-23 |
CN1598061A (zh) | 2005-03-23 |
US7097713B2 (en) | 2006-08-29 |
US20050039774A1 (en) | 2005-02-24 |
TW200522191A (en) | 2005-07-01 |
CN1598061B (zh) | 2011-05-18 |
TWI357621B (en) | 2012-02-01 |
EP1508629B1 (en) | 2009-12-30 |
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