CN1598061A - 从陶瓷基片上去除含有钽沉积层和铝电弧喷涂层的复合涂层的方法 - Google Patents
从陶瓷基片上去除含有钽沉积层和铝电弧喷涂层的复合涂层的方法 Download PDFInfo
- Publication number
- CN1598061A CN1598061A CNA2004100642391A CN200410064239A CN1598061A CN 1598061 A CN1598061 A CN 1598061A CN A2004100642391 A CNA2004100642391 A CN A2004100642391A CN 200410064239 A CN200410064239 A CN 200410064239A CN 1598061 A CN1598061 A CN 1598061A
- Authority
- CN
- China
- Prior art keywords
- temperature
- hour
- ceramic substrate
- rise rate
- heated
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B41/00—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone
- C04B41/009—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone characterised by the material treated
-
- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B41/00—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone
- C04B41/45—Coating or impregnating, e.g. injection in masonry, partial coating of green or fired ceramics, organic coating compositions for adhering together two concrete elements
- C04B41/52—Multiple coating or impregnating multiple coating or impregnating with the same composition or with compositions only differing in the concentration of the constituents, is classified as single coating or impregnation
-
- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B41/00—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone
- C04B41/80—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone of only ceramics
- C04B41/81—Coating or impregnation
- C04B41/89—Coating or impregnation for obtaining at least two superposed coatings having different compositions
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/4401—Means for minimising impurities, e.g. dust, moisture or residual gas, in the reaction chamber
- C23C16/4407—Cleaning of reactor or reactor parts by using wet or mechanical methods
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
- C23F1/00—Etching metallic material by chemical means
- C23F1/10—Etching compositions
- C23F1/14—Aqueous compositions
- C23F1/16—Acidic compositions
- C23F1/20—Acidic compositions for etching aluminium or alloys thereof
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
- C23F1/00—Etching metallic material by chemical means
- C23F1/10—Etching compositions
- C23F1/14—Aqueous compositions
- C23F1/16—Acidic compositions
- C23F1/26—Acidic compositions for etching refractory metals
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S134/00—Cleaning and liquid contact with solids
- Y10S134/902—Semiconductor wafer
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Ceramic Engineering (AREA)
- Organic Chemistry (AREA)
- Materials Engineering (AREA)
- Structural Engineering (AREA)
- Metallurgy (AREA)
- Mechanical Engineering (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Cleaning And De-Greasing Of Metallic Materials By Chemical Methods (AREA)
- Cleaning Or Drying Semiconductors (AREA)
- Chemically Coating (AREA)
- ing And Chemical Polishing (AREA)
- Coating By Spraying Or Casting (AREA)
- Weting (AREA)
- Manufacturing Of Printed Wiring (AREA)
Abstract
Description
Claims (32)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US10/643,409 US7097713B2 (en) | 2003-08-19 | 2003-08-19 | Method for removing a composite coating containing tantalum deposition and arc sprayed aluminum from ceramic substrates |
US10/643,409 | 2003-08-19 |
Publications (2)
Publication Number | Publication Date |
---|---|
CN1598061A true CN1598061A (zh) | 2005-03-23 |
CN1598061B CN1598061B (zh) | 2011-05-18 |
Family
ID=34063460
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN2004100642391A Active CN1598061B (zh) | 2003-08-19 | 2004-08-19 | 从陶瓷基片上去除含有钽沉积层和铝电弧喷涂层的复合涂层的方法 |
Country Status (7)
Country | Link |
---|---|
US (1) | US7097713B2 (zh) |
EP (1) | EP1508629B1 (zh) |
CN (1) | CN1598061B (zh) |
AT (1) | ATE453735T1 (zh) |
DE (1) | DE602004024850D1 (zh) |
SG (1) | SG109558A1 (zh) |
TW (1) | TWI357621B (zh) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN102686963A (zh) * | 2009-10-28 | 2012-09-19 | 陶氏技术投资有限责任公司 | 干燥催化剂烘烤器传送带的装置及其使用方法 |
Families Citing this family (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP4653406B2 (ja) * | 2004-03-10 | 2011-03-16 | 株式会社アルバック | 水崩壊性Al複合材料、水崩壊性Al溶射膜、及び水崩壊性Al粉の製造方法、並びに成膜室用構成部材及び成膜材料の回収方法 |
US20050238807A1 (en) * | 2004-04-27 | 2005-10-27 | Applied Materials, Inc. | Refurbishment of a coated chamber component |
US7554052B2 (en) | 2005-07-29 | 2009-06-30 | Applied Materials, Inc. | Method and apparatus for the application of twin wire arc spray coatings |
US8061888B2 (en) | 2006-03-17 | 2011-11-22 | Barrick Gold Corporation | Autoclave with underflow dividers |
US8709537B2 (en) * | 2010-10-22 | 2014-04-29 | Applied Materials, Inc. | Methods for enhancing tantalum filament life in hot wire chemical vapor deposition processes |
US9212099B2 (en) * | 2012-02-22 | 2015-12-15 | Applied Materials, Inc. | Heat treated ceramic substrate having ceramic coating and heat treatment for coated ceramics |
CN106048543B (zh) * | 2016-06-02 | 2018-08-03 | 泉州市依科达半导体致冷科技有限公司 | 半导体晶片表面真空镀膜工艺 |
CN114315428B (zh) * | 2020-09-29 | 2024-03-08 | 航天特种材料及工艺技术研究所 | 一种去除多孔石英陶瓷透波材料锈渍的方法 |
CN115846252B (zh) * | 2022-11-22 | 2024-05-14 | 富乐德科技发展(天津)有限公司 | 一种半导体行业用氧化铝陶瓷的清洗方法 |
Family Cites Families (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4971631A (en) * | 1988-03-07 | 1990-11-20 | Bernard Lietaer | Compositions and methods for cleaning hard surfaces |
US5660640A (en) * | 1995-06-16 | 1997-08-26 | Joray Corporation | Method of removing sputter deposition from components of vacuum deposition equipment |
US6494960B1 (en) * | 1998-04-27 | 2002-12-17 | General Electric Company | Method for removing an aluminide coating from a substrate |
US6296716B1 (en) * | 1999-10-01 | 2001-10-02 | Saint-Gobain Ceramics And Plastics, Inc. | Process for cleaning ceramic articles |
US6530388B1 (en) * | 2000-02-15 | 2003-03-11 | Quantum Global Technologies, Llc | Volume efficient cleaning systems |
TW495863B (en) * | 2000-08-11 | 2002-07-21 | Chem Trace Inc | System and method for cleaning semiconductor fabrication equipment |
US6569253B2 (en) * | 2001-04-25 | 2003-05-27 | United Microelectronics Corp. | Method of cleaning a chamber of a CVD machine and elements within |
US6656535B2 (en) * | 2001-12-21 | 2003-12-02 | Applied Materials, Inc | Method of fabricating a coated process chamber component |
US6899798B2 (en) * | 2001-12-21 | 2005-05-31 | Applied Materials, Inc. | Reusable ceramic-comprising component which includes a scrificial surface layer |
US6902628B2 (en) * | 2002-11-25 | 2005-06-07 | Applied Materials, Inc. | Method of cleaning a coated process chamber component |
-
2003
- 2003-08-19 US US10/643,409 patent/US7097713B2/en not_active Expired - Lifetime
-
2004
- 2004-08-05 AT AT04254708T patent/ATE453735T1/de not_active IP Right Cessation
- 2004-08-05 EP EP04254708A patent/EP1508629B1/en active Active
- 2004-08-05 DE DE602004024850T patent/DE602004024850D1/de active Active
- 2004-08-12 SG SG200404493A patent/SG109558A1/en unknown
- 2004-08-19 TW TW093124999A patent/TWI357621B/zh active
- 2004-08-19 CN CN2004100642391A patent/CN1598061B/zh active Active
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN102686963A (zh) * | 2009-10-28 | 2012-09-19 | 陶氏技术投资有限责任公司 | 干燥催化剂烘烤器传送带的装置及其使用方法 |
CN102686963B (zh) * | 2009-10-28 | 2014-09-03 | 陶氏技术投资有限责任公司 | 干燥催化剂烘烤器传送带的装置及其使用方法 |
Also Published As
Publication number | Publication date |
---|---|
SG109558A1 (en) | 2005-03-30 |
US20050039774A1 (en) | 2005-02-24 |
EP1508629A1 (en) | 2005-02-23 |
DE602004024850D1 (de) | 2010-02-11 |
US7097713B2 (en) | 2006-08-29 |
TW200522191A (en) | 2005-07-01 |
ATE453735T1 (de) | 2010-01-15 |
CN1598061B (zh) | 2011-05-18 |
EP1508629B1 (en) | 2009-12-30 |
TWI357621B (en) | 2012-02-01 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP3308091B2 (ja) | 表面処理方法およびプラズマ処理装置 | |
CN101342534B (zh) | 用选择性喷涂刻蚀来清洁沉积室零件的方法和设备 | |
US7323230B2 (en) | Coating for aluminum component | |
TWI292184B (en) | Single wafer cleaning apparatus and cleaning method thereof | |
CN1598061B (zh) | 从陶瓷基片上去除含有钽沉积层和铝电弧喷涂层的复合涂层的方法 | |
US20090133782A1 (en) | Solution for processing of metal replacement with metal aluminum or aluminum alloy and method for surface processing using such solution | |
TWI424973B (zh) | 立式熱處理設備之石英構件上沉積之金屬汙染物的移除 | |
CN1527364A (zh) | 晶圆的清洗方法及其装置 | |
CN114231997A (zh) | 载板的清洗方法及其应用 | |
TW201325744A (zh) | 具有氧化釔包覆層的工件的污染物的處理方法 | |
JP2005167087A (ja) | クリーニング方法及び半導体製造装置 | |
CN1224077C (zh) | 回收芯片的清洗方法 | |
CN114496710A (zh) | 一种半导体设备陶瓷窗氧化钇涂层清洗方法 | |
CN117043387A (zh) | 高温腔室及腔室部件清洁和维护方法及设备 | |
WO2000024045A1 (en) | Low haze wafer treatment process | |
JP2008031038A (ja) | 石英ガラス表面の洗浄方法 | |
US6274504B2 (en) | Minimizing metal corrosion during post metal solvent clean | |
TWI843088B (zh) | 高溫腔室及腔室部件清洗維護的方法及設備 | |
KR20240068623A (ko) | 프로세스 챔버 구성요소들에 대한 진보된 배리어 니켈 산화물(bnio) 코팅 개발 | |
US6458707B1 (en) | Tool for semiconductor manufacturing apparatus and method for using the same | |
JP2006165372A (ja) | 枚葉式洗浄装置および洗浄方法 | |
CN115874242A (zh) | 一种半导体反应腔室内壁表面的陶瓷化处理方法 | |
CN102246323A (zh) | 用于加工用于制造太阳能电池的晶片的表面的方法及晶片 | |
CN114059026A (zh) | 一种半导体表面处理方法 | |
CN102021625A (zh) | 电化学电镀设备和方法 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
C06 | Publication | ||
PB01 | Publication | ||
C10 | Entry into substantive examination | ||
SE01 | Entry into force of request for substantive examination | ||
C41 | Transfer of patent application or patent right or utility model | ||
TA01 | Transfer of patent application right |
Effective date of registration: 20081219 Address after: California, USA Applicant after: APPLIED MATERIALS, Inc. Address before: New jersey, USA Applicant before: Polk Ed Hua Co.,Ltd. Effective date of registration: 20081219 Address after: New jersey, USA Applicant after: Polk Ed Hua Co.,Ltd. Address before: New jersey, USA Applicant before: THE BOC Group Inc. |
|
ASS | Succession or assignment of patent right |
Owner name: BOAC EDWARD CO., LTD. Free format text: FORMER OWNER: BCC INC. Effective date: 20081219 Owner name: APPLICATION MATERIAL LTD. Free format text: FORMER OWNER: BOAC EDWARD CO., LTD. Effective date: 20081219 |
|
C14 | Grant of patent or utility model | ||
GR01 | Patent grant | ||
ASS | Succession or assignment of patent right |
Owner name: QUANTUM GLOBAL TECHNOLOGIES, LLC Free format text: FORMER OWNER: APPLIED MATERIALS INC. Effective date: 20120412 |
|
C41 | Transfer of patent application or patent right or utility model | ||
TR01 | Transfer of patent right |
Effective date of registration: 20120412 Address after: American Pennsylvania Patentee after: APPLIED MATERIALS, Inc. Address before: California, USA Patentee before: APPLIED MATERIALS, Inc. |