CN1448755A - Method for preparing periodic microstructure on metallic film by femto second laser - Google Patents
Method for preparing periodic microstructure on metallic film by femto second laser Download PDFInfo
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- CN1448755A CN1448755A CN 03116837 CN03116837A CN1448755A CN 1448755 A CN1448755 A CN 1448755A CN 03116837 CN03116837 CN 03116837 CN 03116837 A CN03116837 A CN 03116837A CN 1448755 A CN1448755 A CN 1448755A
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Abstract
The laser beam produced by titanium jewel femto second laser is split into two beams and the two laser beams are focused by lenses to realize temporal and spatial coherent superposing before acting on metal film on quartz, common glass or silicon substrate. The laser pulse width, pulse frequency and single pulse energy are so controlled that the laser beam can burn out metal film and produce no damage of the substrate. The coherent laser beam is fixed and the sample on 3D platform is computer-controlled to move to prepare periodical microstructure of metal film.
Description
Technical field
The present invention is relevant with the periodic micro structure of metallic film, particularly a kind of method of utilizing femtosecond laser coherent field inducing periodic micro structure on metallic film.
Background technology
The periodic micro structure of metallic film has obtained in fields such as semiconductor microactuator electronic applications and high density information storages using widely.At present, the preparation method of conventional metallic film microstructure comprises that beamwriter lithography and ps pulsed laser and ns pulsed laser method such as directly write, yet all there is apparent in view weak point, for example, photoetching technique is because technological process is many and make with photoresist, so it is not only consuming time but also very expensive, especially all the more so for the microstructure of submicron-scale; And the nanosecond laser direct writing technology is owing to there is fusion process to occur, so its machining precision, crudy all are subjected to appreciable impact.
Summary of the invention
The objective of the invention is to overcome the deficiency of technology formerly, the method for a kind of femtosecond laser manufacturing cycle microstructure on metallic film is provided.
Technical solution of the present invention is:
The basic essence of the method for a kind of femtosecond laser manufacturing cycle microstructure on metallic film is that a branch of smooth femtosecond laser is divided into two bundles, relevant superposition on lens focus realization time and space, and make it to act on the metallic film that is deposited on quartz, simple glass or the silicon substrate, produce periodic micro structure.Concrete steps are:
1, is that 50～120fs, wavelength are the ultra-short pulse laser of 325～1200nm with pulse width, is divided into two bundles, then by two convex lens focus, in strict implementation space, focus place and temporal relevant, as shown in Figure 1 through beam splitter;
2, with the metallic film that is deposited on quartz, simple glass or the silicon substrate;
3, system single pulse energy, pulsed frequency and pulse width makes laser action not damage matrix in metallic film,
Thereby in the microcell that two light beams are concerned with, induce periodic micro structure.
First point of above-mentioned specific practice, select for use the reason of femtosecond pulse to be: when the pulse width of laser was the femtosecond magnitude, the femtosecond pulse under the focused condition had high power density, and moment can reach the damage threshold of metal material.Femtosecond pulse is relevant can to form periodic coherent field, thereby can the periodic structural change of atarting material.
Second point of above-mentioned specific practice, quartzy and silicon is matrix material commonly used on microelectronics and the micro-optical device.
Above-mentioned specific practice thirdly, the action time of laser pulse and metallic film is less than electronics cool time and lattice heat time heating time, thereby can not produce fusion process and not have the heat-affected zone, so, when pulse width is that two bundle laser planoconvex lenses of femtosecond focus on and can form periodic micro structure on metallic film and do not damage matrix after focus is relevant.
Said metallic film can be Jin, Chrome, copper, aluminium, silver or other golden Genus film.
The thickness of said metallic film can be 10～200nm.
The invention has the advantages that:
(1) this method is utilized femto-second laser pulse, and in the implementation space with after temporal being concerned with, the induction duration microstructure has the advantages that preparation technology is simple, efficient is high;
(2) this method is utilized the coherent field of femtosecond laser, makes the phase dry strength reach 4 times of single beam intensity, and therefore lower incident intensity (material damage threshold value 1/4) just can induce periodic micro structure;
(3) this method can produce periodic structure on several microns to tens microns microcell, and site size can be controlled by the focal length that changes incident light diameter and condenser lens; Minimum live width can reach 500nm in the microcell, so this periodic micro structure can satisfy the needs in fields such as microelectronics, high density information storage and micro-optic.
Description of drawings
Fig. 1 is the synoptic diagram of femtosecond laser of the present invention method of manufacturing cycle microstructure on metallic film.
Fig. 2 is the periodic micro structure of the gold thin film preparation on the coherent pulse induced with laser quartz substrate of 120fs for embodiment 1 pulse width.Picture is with the observed result of optical microscope (100 */0.9 object lens).
Specific embodiment
The invention will be further described below by embodiment, but should not limit protection scope of the present invention with this.
Embodiment 1:
The femtosecond laser of selecting for use titanium jewel femto-second laser to send, pulse width is 120fs, wavelength is 800nm, pulsed frequency is 1Hz, pulse energy is the laser beam of 50 μ J, by beam splitter light beam is divided into two bundles with 1: 1 ratio, beam diameter is 5mm, the relevant second harmonic by means of the frequency-doubling crystal generation of two-beam is realized, the angle of two-beam is 40 °, with focal length is that two condenser lenses of 100mm focus on two light beams on the golden film, the three-dimensional mobile platform control that sample is handled by computing machine, and focus place spot diameter is about 40 μ m.Induce the district to form the cycle microstructure at laser coherence like this.Focus on the induced with laser district in the glass sample with optical microscope (100 */0.9 object lens), the cycle microstructure of observing as shown in Figure 2, structural cycle is 1.3 μ m, golden film dimension is about 600nm.
Embodiment 2:
Selecting pulse width for use is 120fs, wavelength is 400nm, pulsed frequency is 10Hz, and pulse energy is the laser of 50 μ J, by beam splitter light beam is divided into two bundles with 1: 1 ratio, beam diameter is 5mm, the relevant second harmonic that produces by means of frequency-doubling crystal of two-beam realizes that the angle of two-beam is 30 °, is that two condenser lenses of 100mm focus on two light beams on the aluminium film with focal length, the three-dimensional mobile platform control that sample is handled by computing machine, focus place spot diameter is about 40 μ m.Induce the district to form the cycle microstructure at laser coherence like this.Focus on the induced with laser district in the glass sample with optical microscope (100 */0.9 object lens), observing structural cycle is 1.5 μ m, and aluminium film dimension is about 700nm.
Embodiment 3:
Selecting pulse width for use is 120fs, wavelength is 400nm, pulsed frequency is 10Hz, and pulse energy is the laser of 50 μ J, by beam splitting chip light beam is divided into two bundles with 1: 1 ratio, beam diameter is 5mm, the relevant second harmonic that produces by means of frequency-doubling crystal of two-beam realizes that the angle of two-beam is 45 °, is that two condenser lenses of 100mm focus on two light beams on the chromium film with focal length, the three-dimensional mobile platform control that sample is handled by computing machine, focus place spot diameter is about 40 μ m.Induce the district to form the cycle microstructure at laser coherence like this.Focus on the induced with laser district in the glass sample with optical microscope (100 */0.9 object lens), observing structural cycle is 1.1 μ m, and chromium film dimension is about 500nm.
Claims (5)
1, the method for a kind of femtosecond laser manufacturing cycle microstructure on metallic film, it is characterized in that a branch of smooth femtosecond laser is divided into two bundles, relevant superposition on lens focus realization time and space focuses on the width of cloth according on the metallic film that is deposited on the matrix, produces periodic micro structure.
2, the method for femtosecond laser according to claim 1 manufacturing cycle microstructure on metallic film, its concrete steps are as follows:
(1) selecting pulse width for use is that 50～120fs, wavelength are the ultra-short pulse laser of 325～1200nm, is divided into two bundles through beam splitter, then by two convex lens focus, in strict implementation space, focus place and temporal relevant;
(2) select the metallic film that is deposited on quartz, simple glass or the silicon substrate for use;
(3) control single pulse energy, pulsed frequency and pulse width makes laser action not damage matrix when metallic film, thereby induces periodic micro structure in the microcell that two light beams are concerned with.
3, the method for femtosecond laser according to claim 1 manufacturing cycle microstructure on metallic film is characterized in that said matrix can be quartz glass or simple glass or silicon materials.
4, the method for femtosecond laser according to claim 1 manufacturing cycle microstructure on metallic film is characterized in that said metallic film can be Jin, Chrome, copper, aluminium, silver or other golden Genus film.
5, the method for femtosecond laser according to claim 4 manufacturing cycle microstructure on metallic film, the thickness that it is characterized in that said metallic film is 10～200nm.
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Cited By (18)
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| CN100376354C (en) * | 2004-12-29 | 2008-03-26 | 中国科学院理化技术研究所 | Method and system for fabricating multiple periodic microstructure for photosensitive material by laser |
| CN101219506B (en) * | 2008-01-07 | 2010-06-02 | 江苏大学 | Laser production method for metal base ultra-hydrophobicity micro-structure surface |
| CN101219770B (en) * | 2008-01-07 | 2010-06-02 | 江苏大学 | Laser modeling method for semiconductor material micro-nano multi-scale function surface |
| CN101819927A (en) * | 2010-04-13 | 2010-09-01 | 上海理工大学 | System and method for preparing micro/nano structured silicon materials |
| CN101121575B (en) * | 2007-07-06 | 2010-11-03 | 中国科学院上海光学精密机械研究所 | Method for realizing selectivity metallization on glass surface by femto-second laser |
| CN102179622A (en) * | 2011-04-08 | 2011-09-14 | 南开大学 | Method for preparing microstructural target by using laser to improve laser propulsion impulse coupling coefficient |
| CN102184888A (en) * | 2011-04-11 | 2011-09-14 | 常州大学 | Multilayer copper interconnection manufacturing method |
| CN101640169B (en) * | 2009-08-21 | 2012-05-09 | 中山大学 | Preparation method of nano patterned substrate used for nitride epitaxial growth |
| CN103268064A (en) * | 2013-03-18 | 2013-08-28 | 大连理工大学 | Analog calculation method of ablating silicon nitride by ultrashort pulse laser |
| KR20160067830A (en) * | 2013-07-22 | 2016-06-14 | 키티 쿠마 | Interferometric laser processing |
| CN105855710A (en) * | 2016-05-11 | 2016-08-17 | 西安交通大学 | Method of preparing periodic structure on ITO film based on Au induction |
| CN107069156A (en) * | 2017-04-12 | 2017-08-18 | 福州大学 | A kind of inexpensive Terahertz frequency-selective surfaces system of processing and method |
| CN108821229A (en) * | 2018-06-15 | 2018-11-16 | 西北工业大学 | A kind of preparation method of ZnS infrared window anti-reflection micro-structure surface |
| CN109149047A (en) * | 2018-08-27 | 2019-01-04 | 中国科学院上海光学精密机械研究所 | A kind of preparation method of the ultra-fine rib waveguide of on piece low-loss |
| CN110361797A (en) * | 2018-03-28 | 2019-10-22 | 福州高意光学有限公司 | A kind of manufacturing method changing laser intensity distribution diaphragm |
| CN111673271A (en) * | 2020-06-16 | 2020-09-18 | 南京萃智激光应用技术研究院有限公司 | Method for preparing nanobelt by femtosecond laser |
| CN112230318A (en) * | 2020-11-06 | 2021-01-15 | 山东交通学院 | Device and method for preparing plane grating by femtosecond laser direct writing technology |
| CN112872597A (en) * | 2021-01-21 | 2021-06-01 | 北京理工大学 | Method for preparing super-hydrophobic surface by combining femtosecond laser direct writing and electroplating method |
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- 2003-05-09 CN CN 03116837 patent/CN1448755A/en active Pending
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| Publication number | Priority date | Publication date | Assignee | Title |
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| CN100376354C (en) * | 2004-12-29 | 2008-03-26 | 中国科学院理化技术研究所 | Method and system for fabricating multiple periodic microstructure for photosensitive material by laser |
| CN101121575B (en) * | 2007-07-06 | 2010-11-03 | 中国科学院上海光学精密机械研究所 | Method for realizing selectivity metallization on glass surface by femto-second laser |
| CN101219506B (en) * | 2008-01-07 | 2010-06-02 | 江苏大学 | Laser production method for metal base ultra-hydrophobicity micro-structure surface |
| CN101219770B (en) * | 2008-01-07 | 2010-06-02 | 江苏大学 | Laser modeling method for semiconductor material micro-nano multi-scale function surface |
| CN101640169B (en) * | 2009-08-21 | 2012-05-09 | 中山大学 | Preparation method of nano patterned substrate used for nitride epitaxial growth |
| CN101819927A (en) * | 2010-04-13 | 2010-09-01 | 上海理工大学 | System and method for preparing micro/nano structured silicon materials |
| CN102179622A (en) * | 2011-04-08 | 2011-09-14 | 南开大学 | Method for preparing microstructural target by using laser to improve laser propulsion impulse coupling coefficient |
| CN102179622B (en) * | 2011-04-08 | 2013-07-10 | 南开大学 | Method for preparing microstructural target by using laser to improve laser propulsion impulse coupling coefficient |
| CN102184888A (en) * | 2011-04-11 | 2011-09-14 | 常州大学 | Multilayer copper interconnection manufacturing method |
| CN102184888B (en) * | 2011-04-11 | 2013-10-30 | 常州大学 | Multilayer copper interconnection manufacturing method |
| CN103268064A (en) * | 2013-03-18 | 2013-08-28 | 大连理工大学 | Analog calculation method of ablating silicon nitride by ultrashort pulse laser |
| CN103268064B (en) * | 2013-03-18 | 2015-04-29 | 大连理工大学 | Analog calculation method of ablating silicon nitride by ultrashort pulse laser |
| KR20160067830A (en) * | 2013-07-22 | 2016-06-14 | 키티 쿠마 | Interferometric laser processing |
| CN106102899A (en) * | 2013-07-22 | 2016-11-09 | 凯蒂·库马尔 | Interference formula laser treatment |
| KR102334911B1 (en) | 2013-07-22 | 2021-12-07 | 키티 쿠마 | Interferometric laser processing |
| CN105855710A (en) * | 2016-05-11 | 2016-08-17 | 西安交通大学 | Method of preparing periodic structure on ITO film based on Au induction |
| CN107069156A (en) * | 2017-04-12 | 2017-08-18 | 福州大学 | A kind of inexpensive Terahertz frequency-selective surfaces system of processing and method |
| CN107069156B (en) * | 2017-04-12 | 2019-12-31 | 福州大学 | Low-cost terahertz frequency selection surface machining system and method |
| CN110361797A (en) * | 2018-03-28 | 2019-10-22 | 福州高意光学有限公司 | A kind of manufacturing method changing laser intensity distribution diaphragm |
| CN108821229A (en) * | 2018-06-15 | 2018-11-16 | 西北工业大学 | A kind of preparation method of ZnS infrared window anti-reflection micro-structure surface |
| CN109149047A (en) * | 2018-08-27 | 2019-01-04 | 中国科学院上海光学精密机械研究所 | A kind of preparation method of the ultra-fine rib waveguide of on piece low-loss |
| CN111673271A (en) * | 2020-06-16 | 2020-09-18 | 南京萃智激光应用技术研究院有限公司 | Method for preparing nanobelt by femtosecond laser |
| CN112230318A (en) * | 2020-11-06 | 2021-01-15 | 山东交通学院 | Device and method for preparing plane grating by femtosecond laser direct writing technology |
| CN112872597A (en) * | 2021-01-21 | 2021-06-01 | 北京理工大学 | Method for preparing super-hydrophobic surface by combining femtosecond laser direct writing and electroplating method |
| CN112872597B (en) * | 2021-01-21 | 2022-03-22 | 北京理工大学 | Method for preparing super-hydrophobic surface by combining femtosecond laser direct writing and electroplating method |
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