CN1421933A - 一种功率型多晶硅发射极晶体管 - Google Patents
一种功率型多晶硅发射极晶体管 Download PDFInfo
- Publication number
- CN1421933A CN1421933A CN 02159740 CN02159740A CN1421933A CN 1421933 A CN1421933 A CN 1421933A CN 02159740 CN02159740 CN 02159740 CN 02159740 A CN02159740 A CN 02159740A CN 1421933 A CN1421933 A CN 1421933A
- Authority
- CN
- China
- Prior art keywords
- type
- base
- layer
- dense
- power
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Images
Landscapes
- Bipolar Transistors (AREA)
Abstract
Description
Claims (6)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CNB021597405A CN1189946C (zh) | 2002-12-30 | 2002-12-30 | 一种功率型多晶硅发射极晶体管 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CNB021597405A CN1189946C (zh) | 2002-12-30 | 2002-12-30 | 一种功率型多晶硅发射极晶体管 |
Publications (2)
Publication Number | Publication Date |
---|---|
CN1421933A true CN1421933A (zh) | 2003-06-04 |
CN1189946C CN1189946C (zh) | 2005-02-16 |
Family
ID=4753342
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CNB021597405A Expired - Fee Related CN1189946C (zh) | 2002-12-30 | 2002-12-30 | 一种功率型多晶硅发射极晶体管 |
Country Status (1)
Country | Link |
---|---|
CN (1) | CN1189946C (zh) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN112864230A (zh) * | 2021-03-12 | 2021-05-28 | 深圳市昭矽微电子科技有限公司 | 双极晶体管及其制作方法 |
-
2002
- 2002-12-30 CN CNB021597405A patent/CN1189946C/zh not_active Expired - Fee Related
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN112864230A (zh) * | 2021-03-12 | 2021-05-28 | 深圳市昭矽微电子科技有限公司 | 双极晶体管及其制作方法 |
Also Published As
Publication number | Publication date |
---|---|
CN1189946C (zh) | 2005-02-16 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
CN103247681B (zh) | 沟槽底部氧化物屏蔽以及三维p-本体接触区的纳米mosfet | |
CN103681665B (zh) | 半导体装置 | |
CN103022115B (zh) | 半导体装置 | |
CN101969073B (zh) | 快速超结纵向双扩散金属氧化物半导体管 | |
CN105210187A (zh) | 半导体装置 | |
CN103180961A (zh) | 改进的肖特基整流器 | |
CN102723363B (zh) | 一种vdmos器件及其制作方法 | |
CN108461537B (zh) | 一种沟槽栅电荷存储型igbt及其制作方法 | |
CN1620715A (zh) | 双掩模沟槽肖特基二极管 | |
CN112928156B (zh) | 一种浮空p柱的逆导型槽栅超结IGBT | |
CN102623492A (zh) | 一种mos场控晶闸管 | |
CN210805778U (zh) | 一种SiC-MOS器件结构 | |
CN106024876A (zh) | 用于消除回滞现象的逆导型横向绝缘栅双极型晶体管器件 | |
CN104779279B (zh) | 一种能抑制负阻效应的rc‑igbt | |
CN1189946C (zh) | 一种功率型多晶硅发射极晶体管 | |
CN103681811A (zh) | 一种非完全发射区的绝缘栅双极晶体管及其制备方法 | |
CN104282689A (zh) | 嵌入frd的igbt器件及制造方法 | |
CN218069857U (zh) | 具有倒t型埋层的深沟槽型功率器件 | |
CN101308869B (zh) | 绝缘栅型晶体管以及逆变器电路 | |
CN115036293B (zh) | 抗电磁干扰的超结功率器件及其制造方法 | |
CN103855197B (zh) | 一种igbt器件及其形成方法 | |
CN201749852U (zh) | 快速超结纵向双扩散金属氧化物半导体管 | |
CN105702720B (zh) | 一种绝缘栅双极型晶体管的关断性能提升方法 | |
CN109713030B (zh) | 一种rc-igbt器件 | |
CN110504168B (zh) | 一种多槽栅横向高压功率器件制造方法 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
C06 | Publication | ||
PB01 | Publication | ||
C10 | Entry into substantive examination | ||
SE01 | Entry into force of request for substantive examination | ||
C14 | Grant of patent or utility model | ||
GR01 | Patent grant | ||
ASS | Succession or assignment of patent right |
Owner name: SHENZHEN SHENG YUAN SEMICONDUCTORS CO., LTD. Free format text: FORMER OWNER: LI SIMIN Effective date: 20100919 |
|
C41 | Transfer of patent application or patent right or utility model | ||
COR | Change of bibliographic data |
Free format text: CORRECT: ADDRESS; FROM: 100011 NO.202, UNIT 3, BUILDING 8, ANHUAXILI SANQU, ANDINGMEN OUTSIDE, CHAOYANG DISTRICT, BEIJING TO: 518103 BUILDING E, VENTURE PARK, FENGHUANG INDUSTRIAL AREA 3, FUYONG STREET, BAOAN DISTRICT, SHENZHEN CITY, GUANGDONG PROVINCE, 2, 3/F ) |
|
TR01 | Transfer of patent right |
Effective date of registration: 20100919 Address after: 518103 E building (first, second, third storey), Pioneer Park, Phoenix third industrial zone, Fuyong street, Shenzhen, Guangdong, Baoan District Patentee after: Element, semiconductor Co., Ltd is contained by Shenzhen Address before: 100011 Beijing city Chaoyang District Anwai Anwar Sirirath three District 8 Building 3 No. 202 Patentee before: Li Simin |
|
CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20050216 Termination date: 20161230 |
|
CF01 | Termination of patent right due to non-payment of annual fee |