CN1416013A - 高聚物全息感光材料的制备方法 - Google Patents
高聚物全息感光材料的制备方法 Download PDFInfo
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- CN1416013A CN1416013A CN 02137473 CN02137473A CN1416013A CN 1416013 A CN1416013 A CN 1416013A CN 02137473 CN02137473 CN 02137473 CN 02137473 A CN02137473 A CN 02137473A CN 1416013 A CN1416013 A CN 1416013A
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- high polymer
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Abstract
Description
实施例组分(mg) 1 2 3 4醋酸乙烯酯/丙烯酸酯 聚乙烯醇缩丁醛 醋酸乙烯酯/丙烯酸丁酯 聚醋酸乙烯酯 |
成膜物 18.9 18.9 18.9 18.9单体N-乙烯咔唑 3.18 3.18 3.18 3.18甲基丙烯酸苄酯 2.00 2.00 2.00 2.00光引发体系0-Cl-HABI 0.91 0.91 0.91 0.91巯基苯并噻唑 0.52 0.52 0.52 0.522,5-二{[4-(二乙氨基)苯基]亚甲基}环戊酮0.0089 0.0089 0.0089 0.0089增塑剂癸二酸二乙酯 0.068 0.068 0.068 0.068表面活性剂FC-4430 0.078 0.078 0.078 0.078溶剂(ml)二氯甲烷 120 120 120 120甲醇 5.5 5.5 5.5 5.5膜厚(μm) 28.3 31.8 29.7 30.3 |
曝光能量 实施例(mJ/cm2) 1 2 3 4反射效率 折射率调制 反射效率 折射率调制 反射效率 折射率调制 反射效率 折射率调制 |
9.29 84.3 0.01260 87.8 0.01267 88.9 0.01348 83.1 0.0102318.58 90.8 0.01501 92.6 0.01501 93.5 0.01293 86.5 0.0110137.17 90.8 0.01492 93.4 0.01593 95.9 0.01328 88.9 0.0135855.75 93.2 0.01258 95.4 0.01612 97.3 0.01718 90.2 0.0127865.04 94.1 0.01379 96.7 0.01874 98.0 0.01914 92.4 0.0117874.33 94.5 0.01618 97.3 0.01855 98.1 0.01918 92.2 0.01156 |
Claims (5)
Priority Applications (1)
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CNB021374732A CN1186692C (zh) | 2002-10-16 | 2002-10-16 | 高聚物全息感光材料的制备方法 |
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CNB021374732A CN1186692C (zh) | 2002-10-16 | 2002-10-16 | 高聚物全息感光材料的制备方法 |
Publications (2)
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CN1416013A true CN1416013A (zh) | 2003-05-07 |
CN1186692C CN1186692C (zh) | 2005-01-26 |
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CNB021374732A Expired - Fee Related CN1186692C (zh) | 2002-10-16 | 2002-10-16 | 高聚物全息感光材料的制备方法 |
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Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN101059654B (zh) * | 2007-04-19 | 2010-05-19 | 上海复旦天臣新技术有限公司 | 一种光刻衍射图像防伪薄膜及其制备方法 |
CN101034257B (zh) * | 2007-04-06 | 2010-09-08 | 上海复旦天臣新技术有限公司 | 用于全息记录的感光薄膜及其制备方法 |
-
2002
- 2002-10-16 CN CNB021374732A patent/CN1186692C/zh not_active Expired - Fee Related
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN101034257B (zh) * | 2007-04-06 | 2010-09-08 | 上海复旦天臣新技术有限公司 | 用于全息记录的感光薄膜及其制备方法 |
CN101059654B (zh) * | 2007-04-19 | 2010-05-19 | 上海复旦天臣新技术有限公司 | 一种光刻衍射图像防伪薄膜及其制备方法 |
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Publication number | Publication date |
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CN1186692C (zh) | 2005-01-26 |
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Owner name: SHANGHAI FUDAN TIANCHEN NEW TECHNOLOGY CO., LTD. Free format text: FORMER OWNER: SHANGHAI LANGCHUANG PHOTOELECTRIC TECHNOLOGY DEVELOPMENT CO., LTD. Effective date: 20080627 |
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Effective date of registration: 20080627 Address after: Floor 1, building 127, Lane 5, Cathay Road, Yangpu District, Shanghai Patentee after: Tianchen New Technology Co., Ltd., Fudan Univ, Shanghai Address before: Shanghai Hutai Road 1895 Lane 51, room A118 Patentee before: Langchuang Photoelectricity Science and Technology Development Co., Ltd., Shanghai |
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Address after: 5, building 1, building 127, Lane 200433, Cathay Road, Yangpu District, Shanghai Patentee after: Shanghai Tiancheng Anticounterfeit Technology Co.,Ltd. Address before: 5, building 1, building 127, Lane 200433, Cathay Road, Yangpu District, Shanghai Patentee before: Tianchen New Technology Co., Ltd., Fudan Univ, Shanghai |
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CF01 | Termination of patent right due to non-payment of annual fee |