CN1405554A - Far ultraviolet laser scratch measuring method and device for interface bonding strength - Google Patents
Far ultraviolet laser scratch measuring method and device for interface bonding strength Download PDFInfo
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- CN1405554A CN1405554A CN 02138512 CN02138512A CN1405554A CN 1405554 A CN1405554 A CN 1405554A CN 02138512 CN02138512 CN 02138512 CN 02138512 A CN02138512 A CN 02138512A CN 1405554 A CN1405554 A CN 1405554A
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- Investigating, Analyzing Materials By Fluorescence Or Luminescence (AREA)
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Abstract
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Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
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CN 02138512 CN1272621C (en) | 2002-10-30 | 2002-10-30 | Far ultraviolet laser scratch measuring method and device for interface bonding strength |
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CN 02138512 CN1272621C (en) | 2002-10-30 | 2002-10-30 | Far ultraviolet laser scratch measuring method and device for interface bonding strength |
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CN1405554A true CN1405554A (en) | 2003-03-26 |
CN1272621C CN1272621C (en) | 2006-08-30 |
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CN 02138512 Expired - Fee Related CN1272621C (en) | 2002-10-30 | 2002-10-30 | Far ultraviolet laser scratch measuring method and device for interface bonding strength |
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Cited By (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2008009165A1 (en) * | 2006-07-03 | 2008-01-24 | He Jian Technology(Suzhou)Co.Ltd. | AN OPTICAL INSPECTING METHOD OF A PLASMA PROCESSING DEGREE OF A SiON FILM |
CN101876627A (en) * | 2010-03-16 | 2010-11-03 | 江苏大学 | Optical power meter technology-based method for detecting interface bonding state of laser scratch |
CN101936876A (en) * | 2010-07-28 | 2011-01-05 | 泰州市天创仪器有限公司 | Infrared laser grinding crack detecting device |
CN102012552A (en) * | 2010-09-27 | 2011-04-13 | 江苏大学 | Light path automatic adjusting system for multi-window multi-wavelength laser |
CN102294543A (en) * | 2011-06-22 | 2011-12-28 | 北京工业大学 | Method for observing transparent melt layer in material laser-cutting process |
CN105737773A (en) * | 2010-11-12 | 2016-07-06 | Ev 集团 E·索尔纳有限责任公司 | Measurement device and method used for measuring layer thickness of stacked wafers and lattice imperfection |
WO2017148208A1 (en) * | 2016-03-03 | 2017-09-08 | 北京北方微电子基地设备工艺研究中心有限责任公司 | Surface wave plasmon apparatus |
CN107236926A (en) * | 2017-05-05 | 2017-10-10 | 星弧涂层新材料科技(苏州)股份有限公司 | DLC film physics moves back film method and moves back film device |
US10008424B2 (en) | 2010-11-12 | 2018-06-26 | Ev Group E. Thallner Gmbh | Measuring device and method for measuring layer thicknesses and defects in a wafer stack |
CN109855592A (en) * | 2019-01-08 | 2019-06-07 | 湘潭大学 | Matrix combination surface roughness determines method and device, composite material machining machine |
CN115046921A (en) * | 2022-08-11 | 2022-09-13 | 四川至臻光电有限公司 | Testing method and testing device for representing film adhesion of plastic optical element |
-
2002
- 2002-10-30 CN CN 02138512 patent/CN1272621C/en not_active Expired - Fee Related
Cited By (15)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2008009165A1 (en) * | 2006-07-03 | 2008-01-24 | He Jian Technology(Suzhou)Co.Ltd. | AN OPTICAL INSPECTING METHOD OF A PLASMA PROCESSING DEGREE OF A SiON FILM |
CN101876627A (en) * | 2010-03-16 | 2010-11-03 | 江苏大学 | Optical power meter technology-based method for detecting interface bonding state of laser scratch |
CN101936876A (en) * | 2010-07-28 | 2011-01-05 | 泰州市天创仪器有限公司 | Infrared laser grinding crack detecting device |
CN102012552A (en) * | 2010-09-27 | 2011-04-13 | 江苏大学 | Light path automatic adjusting system for multi-window multi-wavelength laser |
CN102012552B (en) * | 2010-09-27 | 2012-08-15 | 江苏大学 | Light path automatic adjusting system for multi-window multi-wavelength laser |
US10008424B2 (en) | 2010-11-12 | 2018-06-26 | Ev Group E. Thallner Gmbh | Measuring device and method for measuring layer thicknesses and defects in a wafer stack |
CN105737773B (en) * | 2010-11-12 | 2019-04-19 | Ev 集团 E·索尔纳有限责任公司 | For measuring the thickness degree of wafer stacking and the measuring device and method of lattice defect |
CN105737773A (en) * | 2010-11-12 | 2016-07-06 | Ev 集团 E·索尔纳有限责任公司 | Measurement device and method used for measuring layer thickness of stacked wafers and lattice imperfection |
CN102294543B (en) * | 2011-06-22 | 2014-04-09 | 北京工业大学 | Method for observing transparent melt layer in material laser-cutting process |
CN102294543A (en) * | 2011-06-22 | 2011-12-28 | 北京工业大学 | Method for observing transparent melt layer in material laser-cutting process |
WO2017148208A1 (en) * | 2016-03-03 | 2017-09-08 | 北京北方微电子基地设备工艺研究中心有限责任公司 | Surface wave plasmon apparatus |
CN107236926A (en) * | 2017-05-05 | 2017-10-10 | 星弧涂层新材料科技(苏州)股份有限公司 | DLC film physics moves back film method and moves back film device |
CN107236926B (en) * | 2017-05-05 | 2020-01-31 | 星弧涂层新材料科技(苏州)股份有限公司 | Diamond-like carbon film physical film removing method and film removing equipment |
CN109855592A (en) * | 2019-01-08 | 2019-06-07 | 湘潭大学 | Matrix combination surface roughness determines method and device, composite material machining machine |
CN115046921A (en) * | 2022-08-11 | 2022-09-13 | 四川至臻光电有限公司 | Testing method and testing device for representing film adhesion of plastic optical element |
Also Published As
Publication number | Publication date |
---|---|
CN1272621C (en) | 2006-08-30 |
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Assignee: Nantong Kunlun Air Conditioning Co., Ltd. Assignor: Jiangsu University Contract record no.: 2011320000512 Denomination of invention: Method and apparatus for measuring far-ultraviolet laser scratch of interface jointing strength Granted publication date: 20060830 License type: Exclusive License Open date: 20030326 Record date: 20110402 |
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Granted publication date: 20060830 Termination date: 20121030 |