CN1326394A - 掩膜作轨道运动以形成激光烧蚀的特征物 - Google Patents
掩膜作轨道运动以形成激光烧蚀的特征物 Download PDFInfo
- Publication number
- CN1326394A CN1326394A CN99813496A CN99813496A CN1326394A CN 1326394 A CN1326394 A CN 1326394A CN 99813496 A CN99813496 A CN 99813496A CN 99813496 A CN99813496 A CN 99813496A CN 1326394 A CN1326394 A CN 1326394A
- Authority
- CN
- China
- Prior art keywords
- mask
- substrate
- nozzle
- laser
- ablation
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Images
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/36—Removing material
- B23K26/40—Removing material taking account of the properties of the material involved
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/02—Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
- B23K26/06—Shaping the laser beam, e.g. by masks or multi-focusing
- B23K26/064—Shaping the laser beam, e.g. by masks or multi-focusing by means of optical elements, e.g. lenses, mirrors or prisms
- B23K26/066—Shaping the laser beam, e.g. by masks or multi-focusing by means of optical elements, e.g. lenses, mirrors or prisms by using masks
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/36—Removing material
- B23K26/38—Removing material by boring or cutting
- B23K26/382—Removing material by boring or cutting by boring
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/36—Removing material
- B23K26/38—Removing material by boring or cutting
- B23K26/382—Removing material by boring or cutting by boring
- B23K26/389—Removing material by boring or cutting by boring of fluid openings, e.g. nozzles, jets
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/14—Structure thereof only for on-demand ink jet heads
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/16—Production of nozzles
- B41J2/162—Manufacturing of the nozzle plates
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/16—Production of nozzles
- B41J2/1621—Manufacturing processes
- B41J2/1632—Manufacturing processes machining
- B41J2/1634—Manufacturing processes machining laser machining
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K2103/00—Materials to be soldered, welded or cut
- B23K2103/30—Organic material
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K2103/00—Materials to be soldered, welded or cut
- B23K2103/30—Organic material
- B23K2103/42—Plastics
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K2103/00—Materials to be soldered, welded or cut
- B23K2103/50—Inorganic material, e.g. metals, not provided for in B23K2103/02 – B23K2103/26
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Plasma & Fusion (AREA)
- Mechanical Engineering (AREA)
- Manufacturing & Machinery (AREA)
- Laser Beam Processing (AREA)
- Particle Formation And Scattering Control In Inkjet Printers (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US09/196,962 US6313435B1 (en) | 1998-11-20 | 1998-11-20 | Mask orbiting for laser ablated feature formation |
| US09/196,962 | 1998-11-20 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN1326394A true CN1326394A (zh) | 2001-12-12 |
Family
ID=22727475
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN99813496A Pending CN1326394A (zh) | 1998-11-20 | 1999-03-17 | 掩膜作轨道运动以形成激光烧蚀的特征物 |
Country Status (6)
| Country | Link |
|---|---|
| US (2) | US6313435B1 (enExample) |
| EP (1) | EP1140414A1 (enExample) |
| JP (1) | JP2002530204A (enExample) |
| CN (1) | CN1326394A (enExample) |
| AU (1) | AU3451299A (enExample) |
| WO (1) | WO2000030799A1 (enExample) |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN100380596C (zh) * | 2003-04-25 | 2008-04-09 | 株式会社半导体能源研究所 | 液滴排出装置、图案的形成方法及半导体装置的制造方法 |
| CN105345260A (zh) * | 2015-12-08 | 2016-02-24 | 重庆镭宝激光智能机器人制造有限公司 | 激光头运动轨迹的简易表达装置 |
| CN106125513A (zh) * | 2006-05-12 | 2016-11-16 | 许克雕刻有限及两合公司 | 用于使压制板或连续带形成表面结构的方法 |
| CN107073654A (zh) * | 2014-11-06 | 2017-08-18 | 三菱电机株式会社 | 激光加工方法及装置 |
| CN107442934A (zh) * | 2017-07-14 | 2017-12-08 | 华中科技大学 | 一种基于能量带拼接的激光焊接设备 |
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| US6555449B1 (en) * | 1996-05-28 | 2003-04-29 | Trustees Of Columbia University In The City Of New York | Methods for producing uniform large-grained and grain boundary location manipulated polycrystalline thin film semiconductors using sequential lateral solidfication |
| US6573531B1 (en) * | 1999-09-03 | 2003-06-03 | The Trustees Of Columbia University In The City Of New York | Systems and methods using sequential lateral solidification for producing single or polycrystalline silicon thin films at low temperatures |
| US6830993B1 (en) | 2000-03-21 | 2004-12-14 | The Trustees Of Columbia University In The City Of New York | Surface planarization of thin silicon films during and after processing by the sequential lateral solidification method |
| US6657157B1 (en) * | 2000-06-07 | 2003-12-02 | Westar Photonics, Inc. | Method, system and product for producing a reflective mask mirror and for ablating an object using said reflective mask mirror |
| WO2002031869A2 (en) * | 2000-10-10 | 2002-04-18 | The Trustees Of Columbia University In The City Of New York | Method and apparatus for processing thin metal layers |
| AU2002235144A1 (en) * | 2000-11-27 | 2002-06-03 | The Trustees Of Columbia University In The City Of New York | Process and mask projection system for laser crystallization processing of semiconductor film regions on a substrate |
| US6621044B2 (en) * | 2001-01-18 | 2003-09-16 | Anvik Corporation | Dual-beam materials-processing system |
| TW521310B (en) * | 2001-02-08 | 2003-02-21 | Toshiba Corp | Laser processing method and apparatus |
| US6623103B2 (en) | 2001-04-10 | 2003-09-23 | Lexmark International, Inc. | Laser ablation method for uniform nozzle structure |
| US7088758B2 (en) * | 2001-07-27 | 2006-08-08 | Cymer, Inc. | Relax gas discharge laser lithography light source |
| TW556350B (en) * | 2001-08-27 | 2003-10-01 | Univ Columbia | A method to increase device-to-device uniformity for polycrystalline thin-film transistors by deliberately mis-aligning the microstructure relative to the channel region |
| WO2003043826A1 (en) * | 2001-11-22 | 2003-05-30 | Canon Kabushiki Kaisha | Liquid jet head |
| WO2003084688A2 (en) * | 2002-04-01 | 2003-10-16 | The Trustees Of Columbia University In The City Of New York | Method and system for providing a thin film |
| CN1323797C (zh) * | 2002-07-25 | 2007-07-04 | 松下电器产业株式会社 | 喷墨喷嘴和用于喷墨喷嘴的激光钻孔工艺 |
| US6749285B2 (en) * | 2002-07-25 | 2004-06-15 | Matsushita Electric Industrial Co., Ltd. | Method of milling repeatable exit holes in ink-jet nozzles |
| JP2004066327A (ja) * | 2002-08-09 | 2004-03-04 | Tdk Corp | レーザ加工装置、加工方法、および当該加工方法を用いた回路基板の製造方法 |
| KR101058464B1 (ko) * | 2002-08-19 | 2011-08-24 | 더 트러스티스 오브 콜롬비아 유니버시티 인 더 시티 오브 뉴욕 | 기판상의 필름영역과 그 에지영역에서의 실질적인 균일성을제공하기 위한 필름영역의 레이저 결정 가공을 위한 방법과 시스템 및 그 필름영역을 가진 구조물 |
| KR20050047103A (ko) | 2002-08-19 | 2005-05-19 | 더 트러스티스 오브 콜롬비아 유니버시티 인 더 시티 오브 뉴욕 | 다양한 조사 패턴을 포함하는 원 샷 반도체 가공 시스템 및방법 |
| KR101131040B1 (ko) | 2002-08-19 | 2012-03-30 | 더 트러스티스 오브 콜롬비아 유니버시티 인 더 시티 오브 뉴욕 | 에지 영역을 최소화하도록 기판 상의 박막 영역을 레이저결정화 처리하는 방법 및 시스템, 그리고 그러한 박막 영역의 구조 |
| JP4879486B2 (ja) * | 2002-08-19 | 2012-02-22 | ザ トラスティーズ オブ コロンビア ユニヴァーシティ イン ザ シティ オブ ニューヨーク | 基板上のフィルム領域をレーザ結晶化処理してほぼ均一にするプロセス及びシステム、及びこのフィルム領域の構造 |
| KR101191837B1 (ko) | 2003-02-19 | 2012-10-18 | 더 트러스티스 오브 콜롬비아 유니버시티 인 더 시티 오브 뉴욕 | 순차적 측면 고상화 기술을 이용하여 결정화되는 복수의 반도체 박막을 가공하는 방법 및 장치 |
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| JP3239661B2 (ja) * | 1994-12-27 | 2001-12-17 | キヤノン株式会社 | ノズルプレートの製造方法及び照明光学系 |
| US5609778A (en) | 1995-06-02 | 1997-03-11 | International Business Machines Corporation | Process for high contrast marking on surfaces using lasers |
| JPH08336966A (ja) * | 1995-06-15 | 1996-12-24 | Minolta Co Ltd | インクジェット記録装置 |
| JPH09320931A (ja) * | 1996-05-28 | 1997-12-12 | Nikon Corp | 結像特性計測方法及び該方法を使用する転写装置 |
| JPH106065A (ja) * | 1996-06-25 | 1998-01-13 | Canon Inc | レーザー加工装置、該レーザー加工装置により溝加工されたインクジェット記録ヘッド |
| JPH10146683A (ja) * | 1996-11-13 | 1998-06-02 | Canon Inc | 液体噴射記録ヘッドの製造装置 |
| US5905020A (en) * | 1996-12-20 | 1999-05-18 | Intel Corporation | Method and apparatus for reducing the critical dimension difference of features printed on a substrate |
-
1998
- 1998-11-20 US US09/196,962 patent/US6313435B1/en not_active Expired - Fee Related
-
1999
- 1999-03-17 WO PCT/US1999/005637 patent/WO2000030799A1/en not_active Ceased
- 1999-03-17 AU AU34512/99A patent/AU3451299A/en not_active Withdrawn
- 1999-03-17 JP JP2000583666A patent/JP2002530204A/ja not_active Withdrawn
- 1999-03-17 CN CN99813496A patent/CN1326394A/zh active Pending
- 1999-03-17 EP EP99916135A patent/EP1140414A1/en not_active Withdrawn
-
2001
- 2001-07-06 US US09/900,819 patent/US20010045974A1/en not_active Abandoned
Cited By (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN100380596C (zh) * | 2003-04-25 | 2008-04-09 | 株式会社半导体能源研究所 | 液滴排出装置、图案的形成方法及半导体装置的制造方法 |
| US7585783B2 (en) | 2003-04-25 | 2009-09-08 | Semiconductor Energy Laboratory Co., Ltd. | Drop discharge apparatus, method for forming pattern and method for manufacturing semiconductor device |
| US8528497B2 (en) | 2003-04-25 | 2013-09-10 | Semiconductor Energy Laboratory Co., Ltd. | Drop discharge apparatus, method for forming pattern and method for manufacturing semiconductor device |
| CN106125513A (zh) * | 2006-05-12 | 2016-11-16 | 许克雕刻有限及两合公司 | 用于使压制板或连续带形成表面结构的方法 |
| US10507475B2 (en) | 2006-05-12 | 2019-12-17 | Hueck Engraving Gmbh & Co. Kg | Device for structuring the surface of a pressed sheet or an endless strip |
| CN107073654A (zh) * | 2014-11-06 | 2017-08-18 | 三菱电机株式会社 | 激光加工方法及装置 |
| CN105345260A (zh) * | 2015-12-08 | 2016-02-24 | 重庆镭宝激光智能机器人制造有限公司 | 激光头运动轨迹的简易表达装置 |
| CN107442934A (zh) * | 2017-07-14 | 2017-12-08 | 华中科技大学 | 一种基于能量带拼接的激光焊接设备 |
Also Published As
| Publication number | Publication date |
|---|---|
| JP2002530204A (ja) | 2002-09-17 |
| AU3451299A (en) | 2000-06-13 |
| EP1140414A1 (en) | 2001-10-10 |
| WO2000030799A1 (en) | 2000-06-02 |
| US20010045974A1 (en) | 2001-11-29 |
| US6313435B1 (en) | 2001-11-06 |
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