CN1315007C - Transfer basic board platform for exposure equipment - Google Patents
Transfer basic board platform for exposure equipment Download PDFInfo
- Publication number
- CN1315007C CN1315007C CNB031474764A CN03147476A CN1315007C CN 1315007 C CN1315007 C CN 1315007C CN B031474764 A CNB031474764 A CN B031474764A CN 03147476 A CN03147476 A CN 03147476A CN 1315007 C CN1315007 C CN 1315007C
- Authority
- CN
- China
- Prior art keywords
- belt substrate
- substrate
- mentioned
- belt
- exposure sources
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
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Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70733—Handling masks and workpieces, e.g. exchange of workpiece or mask, transport of workpiece or mask
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
- H01L21/67703—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations between different workstations
- H01L21/67706—Mechanical details, e.g. roller, belt
Abstract
A kind of conveying type substrate carrying platform of exposure apparatus is provided in the present invention for conveying the band-shape substrate, which is the object under the exposure operation, so as to arrange each object at the correct position before the exposure operation. The invented transferring-type substrate carrying-platform of exposure apparatus contains the followings: base stand; the conveying mechanism, which is disposed to move the band-shape substrate in its width direction according to the size of band-shape substrate placed on the base stand so as to limit both side terminal edges of the band-shape substrate to move in the vertical edge direction; the arrangement mechanism, which links with the conveying mechanism to limit both side faces of the band-shape substrate in the width direction so as to move the band-shape substrate to the correct position; and the vacuum plate, which is disposed on the base stand to fix the band-shape substrate that is moved by the conveying mechanism and the arrangement mechanism to the correct position.
Description
Technical field
The present invention relates to a kind of exposure sources that utilizes ultraviolet ray on the belt substrate, to form figure, particularly transmission as the belt substrate of exposure operation object, before exposure operation, to make the object of all size be configured to the transfer type substrate platform of the exposure sources of correct position.
Prior art
In general, shadow mask), PCB, C/F (Color Filter: color filter), the equipment that uses in the technologies such as LCD and semiconductor exposure sources is to make PDB, S/M (Shadow Mask:, utilize mask, illuminator, adjustment is with objective table and radiate ultraviolet mercury vapor lamp etc., forms figure on the belt substrate.
Fig. 1 is the front elevation of the general exposure sources of expression.
In general, as shown in Figure 1, exposure sources is made of optical system 10 and transfer type substrate platform, optical system 10 comprises the ultraviolet mercury vapor lamp of radiation 12 and makes the ultraviolet unidirectional condenser of advancing 14 of mercury vapor lamp 12 radiation, utilizes ultraviolet ray that above-mentioned mercury vapor lamp 12 radiates to shine on the belt substrate 40 by photomask and forms figure; And the transfer type substrate platform is used for the conveyor type substrate, and above-mentioned belt substrate 40 is exposed under the ultraviolet ray that above-mentioned optical system 10 shone, and this belt substrate 40 is configured under the state of tram that exposure forms high-precision figure under ultraviolet ray.
Here, above-mentioned transfer type substrate platform comprises: base 1; Conveyer 20 is arranged on the described base 1, and above-mentioned belt substrate 40 is moved above above-mentioned base; And locating device 30, the belt substrate 40 by means of above-mentioned conveyer 20 moves is configured to correct position to belt substrate 40, makes its exposure under the ultraviolet ray of above-mentioned optical system 10 radiation form the high precision figure.
The formation of above-mentioned conveyer 20 comprises: a pair of deflector roll 24, be located at the entrance side and the outlet side of above-mentioned base, so that the belt substrate of supplying with by the 1st reel 22 of rolling above-mentioned belt substrate 40 toward the top supply of above-mentioned base 1 in the horizontal direction; Two pairs of support roller 26, be located at the top of belt substrate 40 and below so that be located between a pair of above-mentioned deflector roll 24, be exposed to ultraviolet position, the described belt substrate 40 of configured in parallel; And the 2nd reel 28 that is driven, make it roll belt substrate 40 by above-mentioned deflector roll 24 and above-mentioned support roller 26.
The formation of above-mentioned locating device 30 comprises: pilot pin part 32, be located between two pairs of support roller 26, and be arranged to and can rise or descend, make it to contact, thereby before exposure operation, above-mentioned belt substrate 40 is configured to the tram and forms the high precision figure with the following of above-mentioned belt substrate 40; With pneumatics cylinder 36, the above-mentioned pilot pin part 32 of being located at cylinder arm 34 upper ends can be moved in vertical direction.
Here, above-mentioned pneumatics cylinder 36 links the oil pressure generator 36a that makes said cylinder arm 34 rise or descend thus to the upside and the downside of pressurized air supply cylinder head.
Fig. 2 is illustrated in the planimetric map that forms the belt substrate of figure in the rotine exposure equipment, Fig. 3 a is the locating device side view of expression prior art exposure sources, Fig. 3 b is the locating device action diagram of expression prior art exposure sources, Fig. 4 a is the locking pin planimetric map of expression prior art exposure sources, and Fig. 4 b is the locking pin front elevation of expression prior art exposure sources.
Arrive shown in Fig. 4 b as Fig. 2, the both side ends of above-mentioned belt substrate 40 forms a plurality of continuous holes 42, make belt substrate 40 between above-mentioned support roller 26 by means of conveyer 20, above-mentioned pilot pin part 32 rises and inserts above-mentioned hole 42, thus belt substrate 40 is configured in correct position.
Here, the formation of above-mentioned pilot pin part 32 comprises: the body 32a that is fixed on cylinder arm 34 upper ends of above-mentioned pneumatics cylinder 36, side-prominent a plurality of pin 32b make progress above above-mentioned body 32a, in a single day finish for the configuration of above-mentioned belt substrate 40 and just to adsorb its belt substrate 40, form a plurality of vacuum hole 32c that link with vacuum generator 38 in the side of above-mentioned body 32a.
According to such formation, above-mentioned pilot pin part 32 rises by means of cylinder 36, and the hole 42 of inserting the belt substrate positions action, drives above-mentioned vacuum generator 38, adsorbs above-mentioned belt substrate 40.
And, when above-mentioned pilot pin part 32 descends by means of cylinder 36, remove belt substrate 40 by the constraint that above-mentioned pin 32b comes, become available above-mentioned conveyer 20 and transmit.
; concerning the transfer type substrate platform of prior art exposure sources; because carry out the location of belt substrate 40 by the immutable above-mentioned pilot pin part 32 of its shape; when changing the new product module into; must change above-mentioned pilot pin part 32, above-mentioned deflector roll 24 and support roller 26 etc.; replacing operation to the new product module will take long to, and there is the low problem of productive capacity in the result.
Summary of the invention
The present invention makes in view of above-mentioned prior art problems, its purpose is to provide a kind of transfer type substrate platform of exposure sources, it is by improving the structure of transfer type substrate platform, make it to change the position of deflector roll, support roller and locating device, rather than replacing parts, just can transmit the belt substrate of all size and be positioned correct position, thereby can save time and the cost that spends in the operation that changes the new product module into.
In order to achieve the above object, the transfer type substrate platform of exposure sources of the present invention comprises: base; Conveyer, corresponding with input belt size of substrate above the described base, move along described belt substrate width direction, on one side retrain described belt substrate at above-below direction both side ends move it on one side; Locating device, corresponding with described conveyer interlock with described belt size of substrate, retrain the two sides of described belt substrate at Width, make the belt substrate move to correct position; And evacuated panel, be arranged on described base above, adsorb described belt substrate, so that the fixing belt substrate that is sent to job position by means of described conveyer and locating device.Described conveyer comprises: drive division, move while retrain the two side ends of described belt substrate; And operand, in two side ends engagement, rotate along with the belt substrate that transmits by described drive division with respect to described belt substrate.The formation of described locating device comprises transfer table, and described transfer table is arranged on the described base, so that described drive division and described operand distance variable each other.
Description of drawings
Fig. 1 is the front elevation of the major part of the common exposure sources of expression.
Fig. 2 is the planimetric map of expression with the substrate of common exposure sources making.
Fig. 3 a is the side view of the locating device of expression prior art exposure sources.
Fig. 3 b is the action diagram of the locating device of expression prior art exposure sources.
Fig. 4 a is the planimetric map of the locking pin part of expression prior art exposure sources.
Fig. 4 b is the front elevation of the locking pin part of expression prior art exposure sources.
Fig. 5 a is the front elevation of the transfer type substrate platform of expression exposure sources of the present invention.
Fig. 5 b is the planimetric map of the transfer type substrate platform of expression exposure sources of the present invention.
Fig. 6 is the front elevation of the conveyer of expression exposure sources of the present invention.
Fig. 7 is the planimetric map of the locating device of expression exposure sources of the present invention.
Embodiment
Below, with reference to accompanying drawing on one side describe an embodiment of the transfer type substrate platform of of the present invention exposure sources on one side.
Fig. 5 a is the front elevation of the transfer type substrate platform of expression exposure sources of the present invention, and Fig. 5 b is the planimetric map of the transfer type substrate platform of expression exposure sources of the present invention.
The transfer type substrate platform of exposure sources of the present invention is shown in Fig. 5 a and Fig. 5 b, by constituting with the lower part: base 50; Conveyer 60, the belt substrate 90 that make to drop into moves above above-mentioned base 50, particularly, and the occasion that moves at the belt substrate 90 that varies in size, its sensing also can be moved at the Width of belt substrate 90, the belt substrate 90 of all size is moved; And locating device 70, be arranged to make itself and described conveyer 60 interlocks, retrain the two sides of described belt substrate 90, make its belt substrate 90 move to correct position.
And then, on described base 50, evacuated panel 80 being set, the adsorption hole 81 that go up to form by its surface sucks air, so that fix this belt substrate 90 when with described conveyer 60 and locating device 70 belt substrate 90 being delivered to correct position.
Fig. 6 is the side view of the conveyer of expression exposure sources of the present invention.
As shown in Figure 6, conveyer 60 comprises: drive division 61, with respect to the configuration of the rear side of above-mentioned base 50, while retrain along top mobile belt substrate 90 two side ends, transmit; And operand 67, with respect to the configuration of the front side of above-mentioned base 50, and with the two side ends engagement of above-mentioned belt substrate 90, rotate along with the belt substrate 90 that transmits by above-mentioned drive division 61.
Above-mentioned drive division 61 is provided with the above and below of above-mentioned belt substrate 90 and meshes upper and lower driven roller 62a, 62b respectively, these driven rollers can rotate along above-mentioned belt substrate 90 moving directions, the formation of above-mentioned drive division 61 comprises: driven pulley 63 is arranged on the rotation axis of above-mentioned driven roller 62b; Drive pulley 65 links itself and above-mentioned driven pulley 63 interlocks by synchronous belt 64; And motor 66, plugging rotation axis 66a at the central part of above-mentioned drive pulley 65, power rotates.
Here, the outer peripheral face of driven roller 62a and following driven roller 62b forms the gear teeth of mutual correspondence on above-mentioned, when therefore driving above-mentioned driven roller 62b down, and the above-mentioned upward driven roller 62a of rotation while mesh.
And, since with relative with the rotation axis of above-mentioned motor 66 to mode form above-mentioned drive pulley 65, so, can form respectively at the Width of above-mentioned base 50 and make a long driver to move very much belt pulley 65, even the fore-and-aft direction at above-mentioned base 50 moves above-mentioned driven pulley 63 and driven roller 62, above-mentioned synchronous belt 64 also can slide by an edge drive pulley 65 outer peripheral faces, on one side the driving force of drive pulley 65 is passed to driven pulley 63.
And above-mentioned operand 67 disposes upper and lower driven roll 68a, the 68b of engagement separately in pairs in the above and below of above-mentioned belt substrate 90, along with the belt substrate 90 that transmits by above-mentioned drive division 61 rotates.
Promptly, above-mentioned belt substrate 90, with drive division 61 engagements that are positioned at above-mentioned base 50 rear sides, just move from the place ahead backward, be positioned at the operand 67 of above-mentioned drive division 61 front sides, with above-mentioned belt substrate 90 engagements, when moving, above-mentioned belt substrate 90 is driven, thereby above-mentioned drive division 61 usually is subjected to the tension force effect when rotating between above-mentioned drive division 61 and operand 67, and above-mentioned belt substrate 90 can not advanced floppily.
Fig. 7 is the side view of the locating device of expression exposure sources of the present invention.
Above-mentioned locating device 70 is by constituting with the lower part: a pair of transfer table 75, above-mentioned driven roller 62 and driven pulley 63 are set, make the belt substrate 90 that transmits with above-mentioned drive division 61 be configured in correct position before ultraviolet being exposed to, and mutual distance variable and dispose with the opposed mode of the upside of above-mentioned base 50; Drive unit is located at a side of above-mentioned transfer table 75, according to above-mentioned belt substrate 90 width of being supplied with, regulates between the above-mentioned transfer table 75 at interval; And the control part (not shown), the width of sensing belt substrate 90 flowed to above-mentioned drive unit to drive signal when above-mentioned belt substrate 90 was supplied with base 50.Locating device 70 is adjusted the interval of above-mentioned transfer table 75 according to belt substrate 90 width of sensing.
The formation of above-mentioned drive unit comprises: above-mentioned base 50 1 sides are located at motor 77 in the location; Driving shaft 78 links with motor 77 with above-mentioned location, is the center with central authorities, and both sides form the helix of advancing in the other direction; And a pair of ball bearing 79, the both sides with above-mentioned driving shaft 78 combine respectively, are fixed on above-mentioned transfer table 75 1 sides.If drive above-mentioned location with motor 77 to a certain direction, above-mentioned transfer table 75 interval each other just dwindles, and drives above-mentioned location with motor 77 to other direction, above-mentioned transfer table 75 interval each other just away from.
Above-mentioned locating device 70 comprises: a plurality of guide rods 71, and be set to and can move at above-mentioned base 50 Widths, retrain above-mentioned belt substrate 90 two sides at Width; And guide plate 72, be arranged on above-mentioned guide rod 71 tops, and with the top of above-mentioned belt substrate 90 and below leave predetermined distance 91 configuration, blocking constrains in the up-down vibration of the belt substrate 90 on the above-mentioned guide rod 71.
On the other hand, below the above-mentioned base 50, Width at above-mentioned base 50 is provided with multiple row guide rail 52, and in the lower end of above-mentioned transfer table 75, form a plurality of guide waies 76 corresponding with above-mentioned guide rail 52, make it along above-mentioned guide rail 52 slippages, when moved with motor 77 above-mentioned location, above-mentioned transfer table 75 is become can be moved easily at above-mentioned base 50 upsides.
And above-mentioned locating device 70 also comprises deflector roll 73, is arranged on the entrance side and the outlet side of above-mentioned base 50, support the downside of above-mentioned belt substrate 90 and prevent sagging so that level is supplied with above-mentioned belt substrate 90.
The transfer type substrate platform action of the exposure sources of the present invention that following explanation constitutes like this.
At first, one applies power supply, just drive above-mentioned motor 66, above-mentioned drive pulley 65, driven pulley 63 and drive division 61 interlocks, belt substrate 90 is delivered between a pair of above-mentioned drive division 61, supply the width of belt substrate 90 by above-mentioned control part (not shown) sensing, control signal is flowed to above-mentioned location with motor 77.
Then, the signal according to input drives above-mentioned location with motor 77, while move above-mentioned ball bearing 79 by rotating the driving shaft 78 that forms the different directions helix, adjusting transfer table 75 distance to each other.
Like this, regulate transfer table 75 distance to each other, thereby above-mentioned belt substrate 90 is moved to correct position by means of the guide rod 71 that is provided with on the above-mentioned transfer table 75, above-mentioned belt substrate 90 advances to after the correct exposure position, by the adsorption hole 81 of evacuated panel 80, above-mentioned belt substrate 90 is fixed on job position while suck air.
In the above detailed description, though with reference to description of drawings the transfer type substrate platform of exposure sources of the present invention, but be not limited to disclosed embodiment and accompanying drawing in this instructions, self-evident, in present technique design scope, those of ordinary skill in the art can comprise the various distortion of material.
More than the transfer type substrate platform of the exposure sources of the present invention that constitutes like this, employing will be provided with a pair of transfer table that makes the driven roller of conveyor type substrate and the belt substrate is delivered to the guide rod of tram, the front side and the rear side that are arranged on base make it can regulate its way at interval, can regulate the interval of transfer table according to the belt substrate width of supplying with from base one side, the belt substrate of the mobile all size of energy, make it be configured to correct position simultaneously, the result, even occasion in the product module change, also conveyer and locating device need not be changed, large-duty exposure operation can be realized.
Claims (9)
1. the transfer type substrate platform of an exposure sources is characterized in that comprising:
Base;
Conveyer, corresponding with input belt size of substrate above the described base, move along described belt substrate width direction, on one side retrain described belt substrate at above-below direction both side ends move it on one side;
Locating device, corresponding with described conveyer interlock with described belt size of substrate, retrain the two sides of described belt substrate at Width, make the belt substrate move to correct position; And
Evacuated panel, be arranged on described base above, adsorb described belt substrate so that fixing be sent to the belt substrate of job position by means of described conveyer and locating device,
Described conveyer comprises: drive division, move while retrain the two side ends of described belt substrate; And operand, in two side ends engagement, rotate along with the belt substrate that transmits by described drive division with respect to described belt substrate,
The formation of described locating device comprises transfer table, and described transfer table is arranged on the described base, so that described drive division and described operand distance variable each other.
2. according to the transfer type substrate platform of the described exposure sources of claim 1, it is characterized in that the formation of described drive division comprises:
Upper and lower driven roller is set to mesh respectively with the above and below of described belt substrate, along the moving direction rotation of described belt substrate;
Driven pulley is arranged on the rotation axis of a driven roller of described upper and lower driven roller;
Drive pulley links itself and described driven pulley interlock by synchronous belt; And
Motor plugs rotation axis at described drive pulley central part, and power rotates.
3. according to the transfer type substrate platform of the described exposure sources of claim 2, the transfer type substrate platform that it is characterized in that described exposure sources forms very longly at described base Width, so that described drive pulley is set, be mounted slidably described synchronous belt along the outer peripheral face of described drive pulley on the rotation axis of described motor.
4. according to the transfer type substrate platform of the described exposure sources of claim 1, it is characterized in that described operand is made of upper and lower driven roll, described driven roll is set to mesh respectively with the above and below of described belt substrate, and its transmission with described belt substrate is rotated.
5. according to the transfer type substrate platform of the described exposure sources of claim 1, it is characterized in that the formation of described locating device comprises:
Drive unit is arranged on a side of described transfer table, according to the described belt substrate width of supplying with, regulates the interval between the described transfer table; And
Control part is supplied with base with described belt substrate, the width of its belt substrate of sensing, and drive signal sent to described drive unit.
6. according to the transfer type substrate platform of the described exposure sources of claim 5, it is characterized in that described drive unit constitutes to comprise: drive motor is arranged on a side of described base; Driving shaft links with described motor, is the center with central authorities, and both sides form the helix of advancing in the other direction; And pair of bearings, combine with the both sides of described driving shaft respectively, and fix with a side of described transfer table;
Drive described motor in a direction, the interval between the described transfer table dwindled, and drive in another direction, then make between the described transfer table spaced far from.
7. according to the transfer type substrate platform of the described exposure sources of claim 1, it is characterized in that the following of described base is provided with a plurality of guide rails at described base Width, the lower end of described transfer table forms a plurality of guide waies corresponding with described guide rail, so that along described guide rail slippage.
8. according to the transfer type substrate platform of the described exposure sources of claim 1, it is characterized in that the formation of described locating device comprises:
A plurality of guide rods are arranged to make it can move at described base Width, retrain described belt substrate two sides at Width; And
Guide plate is arranged on described guide rod top, on described belt substrate and below leave predetermined distance and be configured, the up-down vibration of the belt substrate that blocking is retrained by described guide rod.
9. according to the transfer type substrate platform of the described exposure sources of claim 1, it is characterized in that described locating device also comprises deflector roll, be arranged on the entrance side and the outlet side of described base, support the downside of described belt substrate, so that on described base, flatly supply with described belt substrate.
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| KR48023/2002 | 2002-08-14 | ||
| KR10-2002-0048023A KR100479078B1 (en) | 2002-08-14 | 2002-08-14 | A feeding panel stage of the facing exposure apparatus |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN1477450A CN1477450A (en) | 2004-02-25 |
| CN1315007C true CN1315007C (en) | 2007-05-09 |
Family
ID=36121985
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CNB031474764A Expired - Fee Related CN1315007C (en) | 2002-08-14 | 2003-07-14 | Transfer basic board platform for exposure equipment |
Country Status (4)
| Country | Link |
|---|---|
| JP (1) | JP3967294B2 (en) |
| KR (1) | KR100479078B1 (en) |
| CN (1) | CN1315007C (en) |
| TW (1) | TWI231559B (en) |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR100529897B1 (en) * | 2003-04-25 | 2005-11-22 | 엘지전자 주식회사 | feeding apparatus of An exposer |
| KR100923671B1 (en) * | 2009-02-18 | 2009-10-28 | 서상길 | Scan type exposure device |
| CN104102092A (en) * | 2013-04-11 | 2014-10-15 | 常熟晶悦半导体设备有限公司 | Four-phtotoheads optical exposure machine having automatic aligning system |
| KR101468664B1 (en) * | 2013-07-18 | 2014-12-04 | 에버테크노 주식회사 | Substrate sucking device of exposure apparatus for printed circuit board |
| KR102200438B1 (en) * | 2020-01-06 | 2021-01-11 | 주식회사 로티 | Film laminating apparatus of fabrating organic light emitting diode for illumination |
Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4653008A (en) * | 1984-06-21 | 1987-03-24 | Iwatsu Electric Co., Ltd. | Method of controlling platemaking positions and errors |
| JPH0689845A (en) * | 1992-09-08 | 1994-03-29 | Nikon Corp | Substrate positioning device |
| JPH06252026A (en) * | 1993-02-22 | 1994-09-09 | Canon Inc | Stage device and system using same |
| US5978071A (en) * | 1993-01-07 | 1999-11-02 | Nikon Corporation | Projection exposure apparatus and method in which mask stage is moved to provide alignment with a moving wafer stage |
| CN1286818A (en) * | 1998-03-11 | 2001-03-07 | 株式会社尼康 | Ultraviolet laser apparatus, and exposure apparatus and mehtod comprising ultraviolet laser apparatus |
| US6379103B1 (en) * | 1999-12-22 | 2002-04-30 | Orc Manufacturing Co., Ltd. | Substrate transfer apparatus |
Family Cites Families (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5988859A (en) * | 1982-11-12 | 1984-05-22 | Sumitomo Metal Mining Co Ltd | Manufacture of carrier tape |
| JPH05160207A (en) * | 1991-12-04 | 1993-06-25 | Hitachi Cable Ltd | Aligner for manufacturing tape carrier for tab |
| JPH0629354A (en) * | 1992-07-07 | 1994-02-04 | Asahi Optical Co Ltd | Aligner |
| JP4501257B2 (en) * | 2000-08-29 | 2010-07-14 | 凸版印刷株式会社 | Exposure device for tape carrier |
| KR100458641B1 (en) * | 2002-05-02 | 2004-12-03 | 삼성테크윈 주식회사 | Method for aligning mask in light exposure unit for manufacturing TAB tape |
-
2002
- 2002-08-14 KR KR10-2002-0048023A patent/KR100479078B1/en not_active IP Right Cessation
-
2003
- 2003-06-16 TW TW92116238A patent/TWI231559B/en not_active IP Right Cessation
- 2003-06-26 JP JP2003183054A patent/JP3967294B2/en not_active Expired - Fee Related
- 2003-07-14 CN CNB031474764A patent/CN1315007C/en not_active Expired - Fee Related
Patent Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4653008A (en) * | 1984-06-21 | 1987-03-24 | Iwatsu Electric Co., Ltd. | Method of controlling platemaking positions and errors |
| JPH0689845A (en) * | 1992-09-08 | 1994-03-29 | Nikon Corp | Substrate positioning device |
| US5978071A (en) * | 1993-01-07 | 1999-11-02 | Nikon Corporation | Projection exposure apparatus and method in which mask stage is moved to provide alignment with a moving wafer stage |
| JPH06252026A (en) * | 1993-02-22 | 1994-09-09 | Canon Inc | Stage device and system using same |
| CN1286818A (en) * | 1998-03-11 | 2001-03-07 | 株式会社尼康 | Ultraviolet laser apparatus, and exposure apparatus and mehtod comprising ultraviolet laser apparatus |
| US6379103B1 (en) * | 1999-12-22 | 2002-04-30 | Orc Manufacturing Co., Ltd. | Substrate transfer apparatus |
Also Published As
| Publication number | Publication date |
|---|---|
| TW200405504A (en) | 2004-04-01 |
| KR20040015884A (en) | 2004-02-21 |
| JP2005056869A (en) | 2005-03-03 |
| KR100479078B1 (en) | 2005-03-25 |
| CN1477450A (en) | 2004-02-25 |
| JP3967294B2 (en) | 2007-08-29 |
| TWI231559B (en) | 2005-04-21 |
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